Patents Represented by Attorney, Agent or Law Firm David H. Jaffer
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Patent number: 6261528Abstract: A metal hydride getter purifier operated at less than 350° C. to remove impurities such as carbon dioxide, carbon monoxide, nitrogen, oxygen and water to levels of the order of one ppb or less from hydrogen without creating greater than 10 ppb methane. A cryogenic stage after the getter stage may be used to ensure removal of methane from hydrogen.Type: GrantFiled: January 25, 2000Date of Patent: July 17, 2001Assignee: D.D.I. LimitedInventors: Giovanni Carrea, Brian D. Warrick
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Patent number: 6242879Abstract: A method and apparatus for automatically calibrating the precise positioning of a wafer handling robot relative to a target structure is disclosed. The apparatus comprises a machine controller connected to robot having an end-effector with three degrees of movement. The controller has a memory with stored rough distance and geometrical data defining the general location of structural features of the target structure. The robot is programmed to move toward the target structure in a series of sequential movements, each movement culminating with the robot end-effector touching a preselected exterior feature of the target structure. Each touching of the end-effector is sensed and provides data for the controller which then calculates the precise location of the target structure. The data accumulated during a series of touching steps by the robot end-effector is utilized by the controller to provide a precise calibrated control program for future operation of the robot.Type: GrantFiled: March 13, 2000Date of Patent: June 5, 2001Assignee: Berkeley Process Control, Inc.Inventors: Paul Sagues, Robert T. Wiggers, Steven M. Kraft
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Patent number: 6235652Abstract: High rate silicon dioxide deposition at low pressures, including a method of depositing silicon dioxide providing a high rate of deposition at a low process chamber pressure, yielding a film with excellent uniformity and with an absence of moisture inclusion and gas phase nucleation. According to the method, a wafer is placed in a reaction chamber wherein a reactant gas flow of silane and oxygen is directed in parallel with the wafer via a plurality of temperature-controlled gas injectors, and confined to a narrow region above the wafer. The gas is injected at a high velocity resulting in the deposition rate being limited only by the rate of delivery of unreacted gas to the wafer surface and the rate of removal of by-products. The high velocity gas stream passing across the wafer has the effect of thinning the layer adjacent the wafer surface containing reaction by-products, known as the “boundary layer,” which results in faster delivery of the desired reactant gas to the wafer surface.Type: GrantFiled: September 15, 1999Date of Patent: May 22, 2001Assignee: Torrex Equipment CorporationInventors: Robert C. Cook, Daniel L. Brors
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Patent number: 6235935Abstract: High purity oximes are prepared from aqueous hydroxylamine and ketones reacted at ambient temperature without addition of impurities such as salts or acids.Type: GrantFiled: November 24, 1998Date of Patent: May 22, 2001Assignee: Silicon Valley Chemlabs, Inc.Inventors: Javad J. Sahbari, Jin Wang Russell
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Patent number: 6232048Abstract: A method of preparing a narrow photoresist line by first forming a resist pattern on a substrate, wherein a resist line is designed to have a width “w” in excess of a desired width “w1” The resist is then subjected to ionic bombardment with ionized particles in a direction normal to the planar surface of a resistant substrate. The ionic bombardment causes formation of a hardened “chemically less reactive” skin on the exposed top surface of the photoresist. The resist is then subjected to an isotropic etch procedure. Due to the hardened top surface of the narrow pattern, the side wall erode at a faster rate than the top, causing a narrowing of the line width, while retaining a more substantial photoresist thickness than would occur if the top surface would not be hardened in advance of the etch procedure.Type: GrantFiled: March 1, 1999Date of Patent: May 15, 2001Assignee: Advanced Micro DevicesInventors: Matthew S. Buynoski, Che-Hoo Ng, Bhanwar Singh, Shekhan Pramanick, Subhash Gupta
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Patent number: 6231591Abstract: A method and apparatus for treating a localized portion of body tissue including an endoscopic surgical instrument including a probe with a canal for guiding a hollow core needle assembly, the assembly having apparatus for extending and retracting a needle relative to the probe. According to the method, the needle is extended into body tissue to deliver a treatment fluid to a localized portion.Type: GrantFiled: June 26, 1998Date of Patent: May 15, 2001Assignee: 2000 InjecTx, Inc.Inventor: Ashvin H. Desai
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Patent number: 6222877Abstract: A method for performance monitoring of data transparent communication links, including a method wherein each symbol in an incoming data symbol stream is sampled at the center of each bit period to create a main line data bit stream, and concurrently sampled at a time instant displaced from the center of each bit period to create a second line data bit stream. During each bit period, the digital value of the second line data stream is compared with the digital value for the corresponding bit period in the main line. If the main line and second line digital values are the same, no error is indicated. If they are different, i.e. if, for example, the main line is bit “1” and the second line is bit zero, an error called a pseudo error is entered on a counter. The number of errors counted per number of bits or time is indicated as a pseudo error rate for each point of time displacement in the user-defined set.Type: GrantFiled: November 18, 1999Date of Patent: April 24, 2001Assignee: LuxN, Inc.Inventor: Madabusi Govindarajan
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Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor
Patent number: 6167837Abstract: A PECVD reactor for processing a single wafer. The reactor has a susceptor for holding a wafer horizontally, an apparatus for lifting the wafer from the susceptor for loading and unloading. The horizontally positioned thermal plate is positioned above the susceptor for uniform transfer of radiant heat energy from heat lamps to the wafer. The thermal plate also serves as an RF plate, being constructed of an electrically conductive material and connected to an RF transmission line and connector for receiving RF energy from an RF generator for the purpose of providing an RF field for plasma enhancement. The thermal plate is configured thinner near its edges, so as to space the plate further from the susceptor and thicker near the center, placing it closer to the susceptor.Type: GrantFiled: January 12, 1999Date of Patent: January 2, 2001Assignee: Torrex Equipment Corp.Inventor: Robert C. Cook -
Patent number: 6151073Abstract: An intelligent flash system for a digital camera having components including an image optical pickup, an interface circuit, a flash unit and a processor. Upon activation of the camera, ambient lighting conditions are evaluated and if flash energy is required, a first low energy pre-flash is radiated, the reflected light received by the optical pickup having a multiplicity of pixels, and the output of the pixels converted to image intensity data by the interface circuit. The processor samples the image intensity data, weighing the center image area more heavily, and creates a histogram plot of quantity of pixels v.s. intensity, and separates the plot into a bar graph from which a determination of exposure is obtained. The histogram is then used to calculate a multiplicative scaling factor used to multiply the first flash energy to an estimate of a flash energy for correct exposure. Conditions of extreme over and under exposure result in the activation of a second flash at an adjusted energy level.Type: GrantFiled: March 28, 1996Date of Patent: November 21, 2000Assignee: FotoNation, Inc.Inventors: Eran Steinberg, Hari Vasudev, Sumat Mehra
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Patent number: 6082182Abstract: A method and improved apparatus for detecting leaks in pressurized pipeline systems, which compensate for the thermally induced volume changes of the liquid in the line during a test that are produced by both the nonlinear changes in the mean temperature of the liquid and the pressure-induced perturbations of the temperature of the liquid.Type: GrantFiled: February 12, 1999Date of Patent: July 4, 2000Assignee: Vista Research, Inc.Inventors: Michael R. Fierro, Joseph W. Maresca, Jr., James W. Starr
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Patent number: 6057553Abstract: A detachable, portable SEM column that is easily disconnected from the electron gun assembly and specimen chamber of the system, allowing different column designs to be used in a given SEM system. As an alternate design, the electron gun and column are configured as a single detachable, portable assembly. The column of the present invention contains a condenser lens and an objective lens, both designed employing permanent magnet elements for primary field generation. Relatively small coils are used for scanning and precise adjustment of focus.Type: GrantFiled: January 30, 1998Date of Patent: May 2, 2000Assignee: Institute of Materials Research & EngineeringInventors: Anjam Khursheed, Jacob Chee Hong Phang, John Thiam Leong Thong
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Patent number: 6036412Abstract: A housing having a cylindrical upper portion for attachment to the quill of a vertical milling machine. The lower portion of the housing includes two concentric cones of funnel shape extending downward from the upper portion having a funnel opening at the bottom for passage of a cutting tool, and for use as a vacuum port for extraction of waste coolant and chips. The space between the two cones provides passage of air and coolant which is ejected at the bottom of the cones and directed to the cutting tool and work piece. The angle of air ejection depends on the angle of the cone. The housing upper portion has an air input connector for supplying the air to the space between the two concentric cones, and contains channels for directing coolant from a coolant input connection to a plurality of fluid lines configured between the cones to carry the fluid to the opening at the bottom of the cones for directing the coolant towards the cutting tool.Type: GrantFiled: March 24, 1998Date of Patent: March 14, 2000Inventor: Joseph E. Dalla
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Patent number: 6027502Abstract: A surgical apparatus having an elongated probe assembly providing passage for irrigation and evacuation, as well as for inserting surgical tools such as an endoscope, RF electrodes and cutting tools. The probe assembly has a light weight handle for accurate positioning of the probe. An irrigation port is connected by way of a tube assembly to an irrigation pump having a novel, inexpensive, replaceable cartridge. An evacuation port on the probe assembly is connected to a tube assembly leading to an evacuation pump.Type: GrantFiled: January 29, 1998Date of Patent: February 22, 2000Inventor: Ashvin H. Desai
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Patent number: 6017502Abstract: A metal hydride getter purifier operated at less than 350.degree. C. to remove impurities such as carbon dioxide, carbon monoxide, nitrogen, oxygen and water to levels of the order of one ppb or less from hydrogen without creating greater than 10 ppb methane. A cryogenic stage after the getter stage may be used to ensure removal of methane from hydrogen.Type: GrantFiled: October 16, 1997Date of Patent: January 25, 2000Assignee: D.D.I., LimitedInventors: Giovanni Carrea, Brian D. Warrick
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Patent number: 6003376Abstract: An acoustic method and apparatus for measuring the horizontal surface location and depth of any type of underground pipe or conduit, including nonmetallic or nonconductive pipe, such as sewer, gas, and water pipes, which cannot be detected with electromagnetic locators. A continuous-wave (CW) acoustic signal is injected into and transmitted through the fluid (liquid or gas) in the pipe. The horizontal surface location and depth of the pipe are determined from an analysis of the phase measurements derived from an array of acoustic measurements, which are made at the surface and approximately perpendicular to the direction of the underground pipe.Type: GrantFiled: June 11, 1998Date of Patent: December 21, 1999Assignee: Vista Research, Inc.Inventors: Alan A. Burns, Gary A. Hayter, Stephanie A. Griffin, Joseph W. Maresca, Jr.
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Patent number: 6006039Abstract: A camera having a built in microprocessor for accepting configuration data from an external device. The camera has a serial port, and a slot for receiving standard type II and III PCMCIA cards for data input and output. These features provide the camera with the capability of being programmed by an external device, including downloading configuration data including a particular operating system, custom modules, graphics and textual data, and data base information and operational parameters. The configuration data can also be downloaded from one camera to another.Type: GrantFiled: July 18, 1997Date of Patent: December 21, 1999Assignee: FotoNation, Inc.Inventors: Eran Steinberg, Hari Vasudev
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Patent number: 5985007Abstract: A method and an apparatus for removing impurities from a noble gas or nitrogen utilizing a single purifier vessel having three zones. In the first zone, the gas is preheated to a temperature greater than 200.degree. C.; in the second zone, the preheated gas is contacted with a getter material at greater than 335.degree. C. for removal of impurities such as methane and other hydrocarbons, water, carbon monoxide, nitrogen, oxygen, and carbon dioxide; in the third zone, the gas is contacted with a second getter material at a temperature greater than 150.degree. C. for removal of hydrogen. Hot gas exiting the purifier vessel is passed through a recuperative heat exchanger where the hot exiting gas preheats in-coming gas before it enters the first zone of the purifier vessel.Type: GrantFiled: May 9, 1997Date of Patent: November 16, 1999Assignee: D.D.I. Ltd.Inventors: Giovanni Carrea, Brian D. Warrick
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Patent number: 5976129Abstract: An improved electrode apparatus for use with an endoscopic surgical instrument provides an adjustable volume of tissue ablation and may be used with an RF energy source in either monopolar or bipolar output mode. The electrode apparatus may be used in any endoscopic surgical application, and provides a new method for any endoscopic treatment involving soft tissue ablation, including hysteroscopic and laparoscopic treatment of uterine fibroids/myomas.An improved electrode for use with an endoscopic surgical instrument providing for vaporization and coagulation, or cutting and coagulation of tissue. A field enhancement tip having outwardly projecting surfaces serves to provide an intense localized RF field for vaporizing of surface tissue and simultaneously coagulating the underlying tissue. An alternate electrode embodiment combines a cutting electrode tip followed by a coagulation tip to reduce bleeding.Type: GrantFiled: April 22, 1996Date of Patent: November 2, 1999Inventor: Ashvin H. Desai
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Patent number: D422058Type: GrantFiled: November 2, 1998Date of Patent: March 28, 2000Inventor: Brian Meredith
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Patent number: RE36957Abstract: A CVD reactor includes a vacuum chamber having first and second thermal plates disposed therein and two independently-controlled multiple-zone heat sources disposed around the exterior thereof. The first heat source has three zones and the second heat source has two zones. A wafer to be processed is positioned below the first thermal plate and immediately above the second thermal plate, thereby being indirectly heated from above by the first heat source via the first thermal plate and indirectly heated from below by the first zone of the second heat source via the second thermal plate. A thermal ring plate which laterally surrounds the edge of the wafer absorbs heat energy emitted from the second zone of the second heat source and heats the outer edge of the wafer.Type: GrantFiled: September 3, 1998Date of Patent: November 21, 2000Assignee: Torrex Equipment CorporationInventors: Daniel L. Brors, Robert C. Cook