Patents Represented by Attorney Donald A. Nissen
  • Patent number: 6428666
    Abstract: A method for separating and concentrating charged species from uncharged or neutral species regardless of size differential. The method uses reversible electric field induced retention of charged species, that can include molecules and molecular aggregates such as dimers, polymers, multimers, colloids, micelles, and liposomes, in volumes and on surfaces of porous materials. The retained charged species are subsequently quantitatively removed from the porous material by a pressure driven flow that passes through the retention volume and is independent of direction thus, a multi-directional flow field is not required. Uncharged species pass through the system unimpeded thus effecting a complete separation of charged and uncharged species and making possible concentration factors greater than 1000-fold.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: August 6, 2002
    Assignee: Sandia National Laboratories
    Inventors: Anup K. Singh, David W. Neyer, Joseph S. Schoeniger, Michael G. Garguilo
  • Patent number: 6344145
    Abstract: Apparatus and method for improving the resolution of non-pressure driven capillary chromatographic systems, and particularly for capillary electrochromatography (CEC) systems. By reducing the cross-sectional area of a packed capillary column by means of a second open capillary contiguous with the outlet end of a packed capillary column, where the packed capillary column has a cross sectional area of between about 2 and 5 times that of the open capillary column, the phenomenon of band broadening in the transition region between the open capillary and the packed capillary column, where the individual components of the mixture are analyzed, can be eliminated, thereby providing for a significant improvement in resolution and more accurate detection and analysis.
    Type: Grant
    Filed: April 10, 2000
    Date of Patent: February 5, 2002
    Assignee: Sandia Corporation
    Inventors: Michael G. Garguilo, Phillip H. Paul, David J. Rakestraw
  • Patent number: 6290909
    Abstract: Apparatus and method for driving a sample, having a well-defined volume, under pressure into a chromatography column. A conventional high pressure sampling valve is replaced by a sample injector composed of a pair of injector components connected in series to a common junction. The injector components are containers of porous dielectric material constructed so as to provide for electroosmotic flow of a sample into the junction. At an appropriate time, a pressure pulse from a high pressure source, that can be an electrokinetic pump, connected to the common junction, drives a portion of the sample, whose size is determined by the dead volume of the common junction, into the chromatographic column for subsequent separation and analysis. The apparatus can be fabricated on a substrate for microanalytical applications.
    Type: Grant
    Filed: April 13, 2000
    Date of Patent: September 18, 2001
    Assignee: Sandia Corporation
    Inventors: Phillip H. Paul, Don W. Arnold, David W. Neyer
  • Patent number: 6279601
    Abstract: A seal assembly that provides a means for establishing multiple pressure zones within a system. The seal assembly combines a plate extending from the inner wall of a housing or inner enclosure that intersects with and is immersed in the fluid contained in a well formed in a tray contained within the enclosure. The fluid is a low vapor pressure oil, chemically inert and oxidation resistant. The use of a fluid as the sealing component provides a seal that is self-healing and mechanically robust not subject to normal mechanical wear, breakage, and formation of cracks or pinholes and decouples external mechanical vibrations from internal structural members.
    Type: Grant
    Filed: May 2, 2000
    Date of Patent: August 28, 2001
    Assignee: EUV LLC
    Inventor: Leonard E. Klebanoff
  • Patent number: 6277257
    Abstract: An electrokinetic high pressure hydraulic pump for manipulating fluids in capillary-based systems. The pump uses electro-osmotic flow to provide a high pressure hydraulic system, having no moving mechanical parts, for pumping and/or compressing fluids, for providing valve means and means for opening and closing valves, for controlling fluid flow rate, and manipulating fluid flow generally and in capillary-based systems (Microsystems), in particular. The compact nature of the inventive high pressure hydraulic pump provides the ability to construct a micro-scale or capillary-based HPLC system that fulfills the desire for small sample quantity, low solvent consumption, improved efficiency, the ability to run samples in parallel, and field portability. Control of pressure and solvent flow rate is achieved by controlling the voltage applied to an electrokinetic pump.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: August 21, 2001
    Assignee: Sandia Corporation
    Inventors: Phillip H. Paul, David J. Rakestraw, Don W. Arnold, Kenneth R. Hencken, Joseph S. Schoeniger, David W. Neyer
  • Patent number: 6253464
    Abstract: A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected.
    Type: Grant
    Filed: August 18, 2000
    Date of Patent: July 3, 2001
    Assignee: Euv LLC
    Inventors: Leonard E. Klebanoff, Daniel J. Rader
  • Patent number: 6242049
    Abstract: The present invention employs a constrained stagnation flow geometry apparatus to achieve the uniform deposition of materials or heat. The present invention maximizes uniform fluxes of reactant gases to flat surfaces while minimizing the use of reagents and finite dimension edge effects. This results, among other things, in large area continuous films that are uniform in thickness, composition and structure which is important in chemical vapor deposition processes such as would be used for the fabrication of semiconductors.
    Type: Grant
    Filed: September 8, 1994
    Date of Patent: June 5, 2001
    Assignee: Sandia Corporation
    Inventors: Kevin F. McCarty, Robert J. Kee, Andrew E. Lutz, Ellen Meeks
  • Patent number: 6224728
    Abstract: A valve for controlling fluid flows. This valve, which includes both an actuation device and a valve body provides: the ability to incorporate both the actuation device and valve into a unitary structure that can be placed onto a microchip, the ability to generate higher actuation pressures and thus control higher fluid pressures than conventional microvalves, and a device that draws only microwatts of power. An electrokinetic pump that converts electric potential to hydraulic force is used to operate, or actuate, the valve.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: May 1, 2001
    Assignee: Sandia Corporation
    Inventors: Michael C. Oborny, Phillip H. Paul, Kenneth R. Hencken, Gregory C. Frye-Mason, Ronald P. Manginell
  • Patent number: 6162577
    Abstract: A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: December 19, 2000
    Inventors: T. E. Felter, G. D. Kubiak
  • Patent number: 6153044
    Abstract: A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected.
    Type: Grant
    Filed: April 30, 1998
    Date of Patent: November 28, 2000
    Assignee: EUV LLC
    Inventors: Leonard E. Klebanoff, Daniel J. Rader
  • Patent number: 6019882
    Abstract: A compact high pressure hydraulic pump having no moving mechanical parts for converting electric potential to hydraulic force. The electrokinetic pump, which can generate hydraulic pressures greater than 2500 psi, can be employed to compress a fluid, either liquid or gas, and manipulate fluid flow. The pump is particularly useful for capillary-base systems. By combining the electrokinetic pump with a housing having chambers separated by a flexible member, fluid flow, including high pressure fluids, is controlled by the application of an electric potential, that can vary with time.
    Type: Grant
    Filed: April 7, 1998
    Date of Patent: February 1, 2000
    Assignee: Sandia Corporation
    Inventors: Phillip H. Paul, David J. Rakestraw
  • Patent number: 6015640
    Abstract: A method for fabricating masks and reticles useful for projection lithography systems. An absorber layer is conventionally patterned using a pattern and etch process. Following the step of patterning, the entire surface of the remaining top patterning photoresist layer as well as that portion of an underlying protective photoresist layer where absorber material has been etched away is exposed to UV radiation. The UV-exposed regions of the protective photoresist layer and the top patterning photoresist layer are then removed by solution development, thereby eliminating the need for an oxygen plasma etch and strip and chances for damaging the surface of the substrate or coatings.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: January 18, 2000
    Assignee: EUV LLC
    Inventor: Gregory F. Cardinale
  • Patent number: 6013164
    Abstract: A compact high pressure hydraulic system having no moving parts for converting electric potential to hydraulic force and for manipulating fluids. Electro-osmotic flow is used to provide a valve and means to compress a fluid or gas in a capillary-based system. By electro-osmotically moving an electrolyte between a first position opening communication between a fluid inlet and outlet and a second position closing communication between the fluid inlet and outlet the system can be configured as a valve. The system can also be used to generate forces as large as 2500 psi that can be used to compress a fluid, either a liquid or a gas.
    Type: Grant
    Filed: June 25, 1997
    Date of Patent: January 11, 2000
    Assignee: Sandia Corporation
    Inventors: Phillip H. Paul, David J. Rakestraw
  • Patent number: 6011267
    Abstract: A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: January 4, 2000
    Assignee: EUV LLC
    Inventors: Glenn D. Kubiak, Luis J. Bernardez, II
  • Patent number: 5939577
    Abstract: A novel method for the synthesis of chlorinated or partially chlorinated organosilanes and organopolysilanes. The chlorination is effected by contacting an organosilanes or organopolysilanes with anhydrous CuCl.sub.2 in a nonpolar alkane solvent, preferably pentane or hexadecane, without the use of a catalyst. Copper metal, which is easily filtered, is a reaction product. The filtrate containing the chlorinated organosilane or organopolysilane can be used directly as a reactant to produce, for example, aminoorganosilanes.
    Type: Grant
    Filed: July 22, 1998
    Date of Patent: August 17, 1999
    Assignee: Sandia Corporation
    Inventors: David R. Wheeler, Timothy P. Pollagi
  • Patent number: 5710658
    Abstract: An optical system uses a nonlinear optical medium to alter the frequency of a relatively narrow band light source tunable over a plurality of different frequencies using an optical system for passively directing light to the nonlinear medium at a correct phase matching angle. In this manner, the light from the tunable light source can be efficiently frequency-doubled or frequency-tripled without the need of moving parts. An all prism design provides a system of optimal efficiency.
    Type: Grant
    Filed: December 13, 1995
    Date of Patent: January 20, 1998
    Assignee: Sandia Corporation
    Inventors: Alexander Gerson Jacobson, Scott Bisson, Rick Trebino
  • Patent number: 5703562
    Abstract: A method is described for transferring data from an unsecured computer to a secured computer. The method includes transmitting the data and then receiving the data. Next, the data is retransmitted and rereceived. Then, it is determined if errors were introduced when the data was transmitted by the unsecured computer or received by the secured computer. Similarly, it is determined if errors were introduced when the data was retransmitted by the unsecured computer or rereceived by the secured computer. A warning signal is emitted from a warning device coupled to the secured computer if (i) an error was introduced when the data was transmitted or received, and (ii) an error was introduced when the data was retransmitted or rereceived.
    Type: Grant
    Filed: November 20, 1996
    Date of Patent: December 30, 1997
    Assignee: Sandia Corporation
    Inventor: Curt A. Nilsen
  • Patent number: 5691080
    Abstract: Novel hybrid thin film electrolyte, based on an organonitrile solvent system, which are compositionally stable, environmentally safe, can be produced efficiently in large quantity and which, because of their high conductivities .apprxeq.10.sup.-3 .OMEGA..sup.-1 cm.sup.-1 are useful as electrolytes for rechargeable lithium batteries.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: November 25, 1997
    Assignee: Sandia Corporation
    Inventors: Dora K. Derzon, Charles Arnold, Jr.
  • Patent number: 5668188
    Abstract: A method of preparing near net shape, monolithic, porous SiC foams is disclosed. Organosilicon precursors are used to produce polymeric gels by thermally induced phase separation, wherein, a sufficiently concentrated solution of an organosilicon polymer is cooled below its solidification temperature to form a gel. Following solvent removal from the gel, the polymer foam is pretreated in an oxygen plasma in order to raise its glass transition temperature. The pretreated foam is then pyrolized in an inert atmosphere to form a SiC foam.
    Type: Grant
    Filed: January 16, 1996
    Date of Patent: September 16, 1997
    Assignee: Sandia Corporation
    Inventors: LeRoy Louis Whinnery, Monte Carl Nichols, David Roger Wheeler, Douglas Anson Loy
  • Patent number: 5648866
    Abstract: An optical system for efficiently directing a large bandwidth light (e.g., a femtosecond laser pulse) onto a nonlinear optical medium includes a plurality of optical elements for directing an input light pulse onto a nonlinear optical medium arranged such that the angle .theta..sub.in which the light pulse directed onto the nonlinear optical medium is substantially independent of a position x of the light beam entering the optical system. The optical system is also constructed such that the group velocity dispersion of light pulses passing through the system can be tuned to a desired value including negative group velocity dispersion.
    Type: Grant
    Filed: June 12, 1995
    Date of Patent: July 15, 1997
    Assignee: Sandia Corporation
    Inventors: Rick Trebino, Ken DeLong, Carl Hayden