Patents Represented by Attorney Gilbert W. Rudman
  • Patent number: 6911393
    Abstract: A family of slurries are disclosed which are useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working slurries, and semiconductor wafers. The slurries of the invention are comprised of a liquid carrier; a sulfur-bearing compounds capable of converting copper to copper sulfide; optionally, abrasive particles (polishing agent; optionally a chelating agent; optionally a buffering agent; optionally, a stopping compound; optionally, other additives; and optionally, a co-solvent.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: June 28, 2005
    Assignee: Arkema Inc.
    Inventors: Martin Nosowitz, Nicholas M. Martyak, Glenn Carroll, Patrick K. Janney
  • Patent number: 6878436
    Abstract: Disclosed is a polished translucent co-extruded sheet having utility as a light diffusing protective cover or sign face for light emitting diode (LED) light sources and other purposes. The sheet is comprised of (a) a particle layer containing particles having a mean particle size of about 4 to 100 microns and having a particle size distribution of between 1-110 microns, at a loading of 1 to 60% melt blended with a thermoplastic matrix, wherein the particle and matrix have refractive indices that differ by greater than 0.001 units of each other when measured in conformance with ASTM D 542; and (b) at least one substrate layer comprised of thermoplastic compositions, wherein the substrates have a refractive index within 0.2 units of the refractive index of the particle layer matrix when measured in conformance with ASTM D 542.
    Type: Grant
    Filed: May 8, 2003
    Date of Patent: April 12, 2005
    Assignee: Atofina
    Inventors: Jack J. Reilly, Paul J. Keating, Ryan R. Dirkx
  • Patent number: 6841612
    Abstract: Composite plastic compositions based on the dispersion of selected cross-linked polymers in certain thermoplastic matrices are disclosed. The composite compositions are readily formed and processed by thermal extrusion processes versus conventional casting processes. Preferred composite plastics compositions based on cross-linked poly(alkyl (meth)acrylate) polymers and modified poly(alkyl (meth)acrylate) thermoplastics are especially useful in the preparation of synthetic architectural materials having a mineral-like appearance, such as that of granite.
    Type: Grant
    Filed: June 15, 1998
    Date of Patent: January 11, 2005
    Assignee: Elf Atochem S.A.
    Inventors: Shijun Yang, Paul Joseph Keating
  • Patent number: 6803353
    Abstract: A family of slurries useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working slurries, and semiconductor wafers.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: October 12, 2004
    Assignee: Atofina Chemicals, Inc.
    Inventors: Nicholas Martyak, Glenn Carroll
  • Patent number: 6761833
    Abstract: Vinyl monomers are stabilized by a composition which includes an alkyl hydroxyl amine and a sulfide compound or at least two alkyl hydroxyl amines and a phenolic compound.
    Type: Grant
    Filed: February 4, 2002
    Date of Patent: July 13, 2004
    Assignee: Atofina Chemicals, Inc.
    Inventors: Jianfeng Lou, Martin Nosowitz
  • Patent number: 6723255
    Abstract: Disclosed are compositions for shortstopping free radical emulsion polymerizations and stabilizing polymers produced from the corresponding emulsion processes. Such compositions include at least one hydrophillic radical scavenger (i.e, shortstopper) and at least one hydrophobic radical scavenger. The compositions are preferably targeted for applications in the emulsion processes of rubber latexes. These compositions exhibit excellent performance not only as shortstoppers of free radical emulsion polymerizations but also as stabilizers of the corresponding polymers. Thus, the compositions prevent additional polymerization in the particles without requiring additional stabilizer even after such polymers are steam stripped. They do so without the use of chemicals which carry a high safety, health, or environmental risk.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: April 20, 2004
    Assignee: Atofina Chemicals, Inc.
    Inventors: Thomas S. Buszta, Jianfeng Lou, Martin Nosowitz
  • Patent number: 6673232
    Abstract: The invention relates to a combination of compounds and a process using such combination useful for reducing or preventing coke formation in thermal cracking furnaces such as ethylene steam crackers.
    Type: Grant
    Filed: June 15, 2001
    Date of Patent: January 6, 2004
    Assignee: Atofina Chemicals, Inc.
    Inventor: Michael J. Lindstrom
  • Patent number: 6605204
    Abstract: Disclosed is an improved electrolyte formulation for the electrodeposition of copper onto electronic devices substrates and a process using the formulation. The formulation is a solution which contains copper alkanesulfonate salts and free alkanesulfonic acids and which is intended for the metallization of micron or sub-micron dimensioned trenches or vias.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: August 12, 2003
    Assignee: Atofina Chemicals, Inc.
    Inventors: Nicholas M. Martyak, Michael D. Gernon, Patrick Janney
  • Patent number: 6515187
    Abstract: A method of purifying acrolein or propionaldehyde with a single column distillation system is provided, where the distillation system has a side-draw take-off outlet for recovering purified acrolein or propionaldehyde located between the crude product feed point and the light-boiling impurities distillation site.
    Type: Grant
    Filed: June 21, 2002
    Date of Patent: February 4, 2003
    Assignee: Atofina Chemicals, Inc.
    Inventors: Steven Gabriel Schon, Samuel Marc Daniel, Richard Alan Sander
  • Patent number: 6495065
    Abstract: The present invention is a composition for and a method of shortstopping free radical emulsion polymerizations that inhibits the formation of nitrosamines. The composition comprised nitrosamine inhibitors in combination with conventional alkylhydroxylamine shortstoppers. Such nitrosamine inhibitors are based on primary amines, amine-containing polymers, pyrroles, hydroquinones, certain phenols, ascorbic acid, and other well-known nitrosation inhibitors; they may be used individually or as a blend. The compositions are targeted for applications in the emulsion processes for producing rubber latexes and the preparation of rubber products thereafter.
    Type: Grant
    Filed: August 3, 2000
    Date of Patent: December 17, 2002
    Assignee: Atofina Chemicals, Inc.
    Inventors: Jianfeng Lou, Thomas S. Buszta, Michael D. Gernon
  • Patent number: 6428872
    Abstract: Disclosed is a molded disc useful in optical information recording carriers, the disc is comprised of a copolymer of methyl methacrylate and ethyl acrylate, wherein the copolymer is comprised of 97 to 99.9 wt. % of methyl methacrylate and 0.1 to 3 weight % ethyl acrylate, has a molecular weight in the range of from 90,000 to 115,000, has a Tg of from 105° C. to 115.
    Type: Grant
    Filed: April 21, 2000
    Date of Patent: August 6, 2002
    Assignee: ATOFINA
    Inventors: Michael Stefan Cholod, Donald Richard Hone, David Henry Stone
  • Patent number: 6407047
    Abstract: This invention provides an improved composition and process for pretreatment of aluminum prior to electroplating. The invention is an aqueous composition comprised of an acid, an oxidizing agent, and, optionally, a halogenated compound. This composition is useful in a process that effectively removes smut that results from the etching step of the aluminum pretreatment process. Alternatively, the composition can be used in a process which combines the etch and desmut steps in Al pretreatment.
    Type: Grant
    Filed: January 30, 2001
    Date of Patent: June 18, 2002
    Assignee: Atotech Deutschland GmbH
    Inventors: Maulik Dhanesh Mehta, Paul Andrew Butkovsky
  • Patent number: 6340729
    Abstract: In the process according to the invention for the aqueous suspension polymerization of vinyl chloride, alone or as a mixture with another vinyl monomer, the polymerization initiator comprises at least one compound chosen from dialkyl peroxydicarbonates, peroxy-tert-alkanoates and diacyl peroxides and use is made, as agent for halting the polymerization, of a mono- or disubstituted hydroxylamine. The resins thus obtained exhibit improved color and heat stability.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: January 22, 2002
    Assignees: Atofina Chemicals, Inc., Atofina
    Inventors: Christian Bonardi, Pierre Hebrard, Richard Peres, Kenneth Malone, Martin Nosowitz, Michael Mendolia, Peter Callais, Barbara Stainbrook, Jianfeng Lou
  • Patent number: 6261660
    Abstract: The invention relates to a process for preparing molded discs suitable for use in optical information recording carriers and to the optical information recording carriers thereby obtainable. The process comprises plasticating a homopolymer or a copolymer of methyl methacrylate, injecting the plasticated homopolymer or copolymer into a mold to form a disc and removing the molded disc in a very short cycle time. Good quality discs which are particularly suitable for use in optical information recording carriers may thereby be obtained.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: July 17, 2001
    Assignee: Atofina
    Inventors: Michael Stefan Cholod, Donald Richard Hone, David Henry Stone
  • Patent number: 6251249
    Abstract: Formulations and procedures for the deposition of precious metals onto solid substrates are disclosed wherein the formulations are iodide-free and contain an organosulfur compound and/or a carboxylic acid and a source of soluble precious metal ion which is one or more precious metal alkanesulfonates, precious metal alkanesulfonamides and/or precious metal alkanesulfonimides. The formulations and processes may be cyanide-free, and the deposition may be effected by electrolytic, electroless and/or immersion plating techniques.
    Type: Grant
    Filed: July 13, 1999
    Date of Patent: June 26, 2001
    Assignee: Atofina Chemicals, Inc.
    Inventors: Jean W. Chevalier, Michael D. Gernon, Patrick K. Janney
  • Patent number: 6187169
    Abstract: A procedure for the generation of organosulfonic acids from solutions of corresponding metal organosulfonate compounds by electrowinning, electrolytically driven hydrolysis or chemically driven hydrolysis is described. Appropriate organosulfonate compounds include the water soluble salts of alkanesulfonic and aromatic sulfonic acids which incorporate metals from Group VIB, VIIB, VIIIB, IB, IIB or VA of the periodic table. The electrowinning and electrolytic techniques described can be applied in divided or undivided cells and can be operated in continuous fashion to provide the greatest efficiency. Hydrolysis based methods can employ either anodic oxidation or oxidation both of which function to oxidize the metal cation(s) present to hydrolytically unstable higher oxidation states.
    Type: Grant
    Filed: April 8, 1999
    Date of Patent: February 13, 2001
    Assignee: ATOFINA Chemicals, Inc.
    Inventors: Michael D. Gernon, Nicholas M. Martyak, Martin Nosowitz, Gary S. Smith
  • Patent number: 6099624
    Abstract: Nickel phosphorus alloys can be electroplated from an aqueous acidic solution containing nickel alkane sulfonate and phosphorus acid.
    Type: Grant
    Filed: May 14, 1998
    Date of Patent: August 8, 2000
    Assignee: Elf Atochem North America, Inc.
    Inventor: Nicholas M. Martyak
  • Patent number: 6083874
    Abstract: This invention relates to an improved composition of matter for and method of desiccating plants such as, for example, cotton. More particularly, this invention relates to an improved desiccating composition comprising a solution of endothall, an ammonium salt, a glutamine synthetase inhibitor, and optionally, a surface active agent, and a method of using the composition.
    Type: Grant
    Filed: October 9, 1998
    Date of Patent: July 4, 2000
    Assignee: Elf Atochem North America, Inc.
    Inventor: Nasir S. A. Malik
  • Patent number: 6066760
    Abstract: A process is disclosed for the efficient production of high purity alkane sulfonic acid and/or alkane sulfonyl chloride product wherein a compound of the formula RSX, where X is hydrogen or --SR.sup.1 and R and R.sup.1 are alkyl radicals is continuously reacted with chlorine in aqueous hydrochloric acid to produce a turbulent evolution of hydrochloride gas, passing the reactants through stationary mixing elements to promote plug-flow, and separately withdrawing a product. Apparatus for this process is also disclosed.
    Type: Grant
    Filed: March 31, 1994
    Date of Patent: May 23, 2000
    Assignee: Elf Atochem North America, Inc.
    Inventor: Steven Gabriel Schon
  • Patent number: 6048585
    Abstract: Orthophosphite ions produced by oxidation of hypophosphite in an electroless nickel plating bath can be removed by precipitation with an alkali metal or alkaline earth metal cation such as calcium. In order to avoid the precipitation of calcium sulfate and the generation of large amounts of particulates in the bath, nickel sulfate can be replaced by a nickel salt of an alkylsulfonic acid or hypophosphorous acid, whose anion forms a soluble salt with an alkali metal or alkaline earth metal cation.
    Type: Grant
    Filed: January 25, 1998
    Date of Patent: April 11, 2000
    Assignee: Atotech Deutschland GmbH
    Inventors: Nicholas M. Martyak, John E. McCaskie