Abstract: A solar energy conversion device comprises a vertical stack of at least two panels stacked in a hierarchy from an upper panel to a lower panel with each of the panels including a matching array of solar cells having a different energy bandgap from other panels of solar cells in the vertical stack of panels. Each panel in the vertical stack may be arranged with one of the panels having solar cells with a higher energy bandgap situated in the hierarchy and in the stack above others of the panels containing solar cells with a lower energy bandgap. The top surface of the device is adapted for receiving solar energy incident upon the uppermost panel. Each upper panel absorbs a fraction of sunlight with larger solar photon energies larger than the energy bandgap thereof and transmits solar photons with photon energies less than larger solar photon energies to a remaining one of the panels lower in the hierarchy and positioned lower in the stack.

Abstract: Two junction solar energy conversion devices, i.e. photovoltaic cells have a bottom silicon N+/P/P+ photovoltaic cell and an upper GaP N+/P/P+ photovoltaic cell containing quantum well layers which extend the wavelength range over which the GaP cell absorbs light. The quantum well layers are composed of materials other than Gallium Phosphide (GaP) and may be either pseudomorphic or metamorphic. Light trapping may be incorporated at the top surface of the GaP photovoltaic cell along with anti-reflective coatings, and light trapping may be incorporated on the bottom surface of the silicon cell. The bottom surface of the silicon photovoltaic cell is coated with a passivating dielectric layer and electrical contact to the silicon is made with conductive vias extending through the passivating layer.

Abstract: A semiconductor product comprises a semiconductor substrate having a top surface and a bottom surface including a semiconductor chip. The semiconductor substrate has a top surface and a perimeter. A barrier is formed in the chip within the perimeter. An Ultra Deep Isolation Trench (UDIT) is cut in the top surface of the chip extending down therein between the perimeter and the barrier. A ILD structure with low-k pSICOH dielectric and hard mask layers is formed over the substrate prior to forming the barrier and the UDIT. The ILD structure interconnection structures can be recessed down to the substrate aside from the UDIT.

Abstract: A semiconductor product comprises a semiconductor substrate having a top surface and a bottom surface including a semiconductor chip. The semiconductor substrate has a top surface and a perimeter. A barrier is formed in the chip within the perimeter. An Ultra Deep Isolation Trench (UDIT) is cut in the top surface of the chip extending down therein between the perimeter and the barrier. A ILD structure with low-k pSICOH dielectric and hard mask layers is formed over the substrate prior to forming the barrier and the UDIT. The ILD structure interconnection structures can be recessed down to the substrate aside from the UDIT.

Abstract: A PCM cell structure comprises a first electrode, a phase change element, and a second electrode, wherein the phase change element is inserted in between the first electrode and the second electrode and only the peripheral edge of the first electrode contacts the phase change element thereby reducing the contact area between the phase change element and the first electrode and thereby increasing the current density through the phase change element and effectively inducing the phase change at lower levels of current and reduced programming power.

Abstract: A vertical Field Effect Transistor (FET) comprising a vertical semiconductor nanowire is formed by the following steps. Create a columnar pore in a bottom dielectric layer formed on a bottom electrode. Fill the columnar pore by plating a vertical semiconductor nanowire having a bottom end contacting the bottom electrode. Form a doped source region and a doped drain region in the vertical semiconductor nanowire thereby forming an FET device with a FET channel region between the source region and a drain region, which are formed in distal ends of the vertical semiconductor nanowire. Form a gate dielectric layer around the channel region of the vertical semiconductor nanowire. Then form a gate electrode around the gate dielectric layer. Form a top electrode contacting a top end of the vertical semiconductor nanowire.

Abstract: An exercise bar includes a pair of handles having proximal ends with at least one fulcrum hole extending through the proximal end of each thereof. A center plate has a periphery and a pair of pivot holes therethrough. One of a pair of pivot pins is inserted through each of the fulcrum hole and a pivot hole to connect the handles to the center plate. Locating means extending through the center plate are spaced about the periphery thereof. Movable locking elements in the form of locking pins or clevis type pins are inserted into selected ones of the locating means to retain the handles at selected angular positions relative to the center plate.

Abstract: A magnetic memory device including a Magnetic Tunnel Junction (MTJ) device comprises a substrate and Front End of Line (FEOL) circuitry. A Via level (VA) InterLayer Dielectric (ILD) layer, a bottom conductor layer, and an MTJ device formed over the top surface of the VA ILD layer are formed over a portion of the substrate. An alignment region including alignment marks extends through the bottom conductor layer and extends down into the device below the top surface of the VA ILD layers is juxtaposed with the MJT device.

Abstract: A process and system for determining alignment data for partially obscured features on wafers or chips when a wafer or chip is substantially coated by an over bump applied material, e.g. a resin or film, and using that data to align the wafers or chips for subsequent operations such as dicing or joining. Position data for alignment is produced by identifying a location of an at least partially obscured feature by varying the depth of focus upon a work piece to determine an SNR approximating a maximum value from an image captured by optical scanning. An SNR above a threshold value can be employed.

Abstract: A method is provided for forming an SOI MOSFET device with a silicon layer formed on a dielectric layer with a gate electrode stack, with sidewall spacers on sidewalls of the gate electrode stack and raised source/drain regions formed on the surface of the silicon layer. The gate electrode stack comprises a gate electrode formed of polysilicon over a gate dielectric layer formed on the surface of the silicon layer. A thin amorphous silicon cap layer is formed in the top surface of the gate electrode by implanting dopant into the surface thereof. A notch is etched into the periphery of the cap layer. A plug of dielectric material is formed in the notch. The sidewalls of the gate electrode are covered by the sidewall spacers which cover a portion of the plug for the purpose of eliminating the exposure of the gate polysilicon so that formation of spurious epitaxial growth during the formation of raised source/drain regions is avoided.

Abstract: A CMOS EPROM, EEPROM or inverter device includes an nFET device with a thin gate dielectric layer and a pFET device juxtaposed with the nFET device with a thick gate dielectric layer and a floating gate electrode. The thick gate dielectric layer is substantially thicker than the thin gate dielectric layer. A common drain node connected both FET devices has no external connection in the case of a memory device and has an external connection in the case of an inverter. There are external circuit connections to the source regions of both FET devices and to the gate electrode of the nFET device. The pFET and nFET devices can be planar, vertical or FinFET devices.

Abstract: A Phase Change Memory (PCM) cell structure comprises both a lower electrode composed of a PCM layer and a conductive encapsulating upper electrode layer. The PCM layer is protected from damage by the conductive encapsulating layer. Electrical isolation between adjacent PCM cells is provided by high electrical resistance regions which were formed by modifying the conductivity of both the PCM layer and the conductive encapsulating upper electrode layer subsequent to deposition thereof.

Abstract: A method for forming a Phase Change Material (PCM) cell structure comprises forming both a lower electrode composed of a PCM layer and a conductive encapsulating upper electrode layer. The PCM is protected from damage by a conductive encapsulating layer. Electrical isolation between adjacent cells is provided by modifying the conductivity of both the PCM layer and the conductive encapsulating upper electrode layer subsequent to deposition thereof, thereby forming high electrical resistance regions between the cells.

Abstract: A method of formation of integrated circuit devices includes forming a gate electrode stack over a portion of a semiconductor. The stack includes a gate dielectric layer with a gate electrode thereabove. Implant diatomic nitrogen and/or nitrogen atoms into the substrate aside from the stack at a maximum energy less than or equal to 10 keV for diatomic nitrogen and at a maximum energy less than or equal to 5 keV for atomic nitrogen at a temperature less than or equal to 1000° C. for a time of less than or equal to 30 minutes. Then form silicon oxide offset spacers on sidewalls of the stack. Form source/drain extension regions in the substrate aside from the offset spacers. Form nitride sidewall spacers on outer surfaces of the offset spacers over another portion of the nitrogen implanted layer. Then form source/drain regions in the substrate aside from the sidewall spacers.

Abstract: A mechanical coupling device is provided for temporarily interconnecting a gem or a crystal to be used for acupressure treatment to a vibration generating device. Alternatively a mechanical coupling device is provided for temporarily interconnecting the handle of an acupuncture needle to a gem or a crystal. The mechanical coupling device can be a helical or spiral, metal wire, a cylindrical linkage, a conical linkage or a clamp connecting the acutreatment device to the other element. The method employed is to apply the acutreatment devices to acupoints of a patient with the above devices including the combination of a gem or a crystal interconnected to an acupuncture needle or a vibration generating device interconnected to an acupressure gem or crystal.

Abstract: Apparatus for exposure and probing of features in a semiconductor workpiece includes a hollow concentrator for covering a portion of the workpiece connected by a gas conduit to a supply of etchant gas. A stage supports and positions the semiconductor workpiece. Control means moves the stage and the semiconductor workpiece to the series of positions sequentially. An energy beam source directs a focused energy beam through an aperture through the concentrator onto a region on the surface of the workpiece in the presence of the etchant gas. The control means moves the stage to a series of positions with respect to the concentrator and the energy beam to direct the energy beam in the presence of the etchant gas to expose a series of regions on the surface of the semiconductor workpiece positioned below the hollow interior space of the concentrator, sequentially.

Abstract: A double-polysilicon, self-aligned bipolar transistor has a collector region formed in a doped semiconductor substrate, an intrinsic counterdoped base formed on the surface of the substrate and a doped intrinsic emitter formed in the surface of the intrinsic base. An etch stop insulator layer overlies the intrinsic base layer above the collector. A base contact layer of a conductive material overlies the etch stop dielectric layer and the intrinsic base layer. A dielectric layer overlies the base contact layer. A wide window extends through the insulator layer and the base contact layer down to the insulator layer. An island or a peninsula is formed in the wide window leaving at least one narrowed window within the wide window, with sidewall spacers in either the wide window or the narrowed window. The narrowed windows are filled with doped polysilicon forming an extrinsic emitter with the intrinsic emitter formed below the extrinsic emitter in the surface of the intrinsic base.

Abstract: A method of forming an SRAM cell device includes the following steps. Form pass gate FET transistors and form a pair of vertical pull-down FET transistors with a first common body and a first common source in a silicon layer patterned into parallel islands formed on a planar insulator. Etch down through upper diffusions between cross-coupled inverter FET transistors to form pull-down isolation spaces bisecting the upper strata of pull-up and pull-down drain regions of the pair of vertical pull-down FET transistors, with the isolation spaces reaching down to the common body strata. Form a pair of vertical pull-up FET transistors with a second common body and a second common drain. Then, connect the FET transistors to form an SRAM cell.

Abstract: Form a dielectric layer on a semiconductor substrate. Deposit an amorphous Si film or a poly-Si film on the dielectric layer. Then deposit a SiGe amorphous-Ge or polysilicon-Ge thin film theteover. Pattern and etch the SiGe film using a selective etch leaving the SiGe thin film intact in a PFET region and removing the SiGe film exposing the top surface of the Si film in an NFET region. Anneal to drive Ge into the Si film in the PFET region. Deposit a gate electrode layer covering the SiGe film in the PFET region and cover the exposed portion of the Si film in the NFET region. Pattern and etch the gate electrode layer to form gates. Form FET devices with sidewall spacers and source regions and drains regions in the substrate aligned with the gates.

Abstract: A dual damascene conductor structure is formed on a substrate with an exposed conductor on top covered by a buried cap, a dielectric layer (DL) and an organic layer (OL). Form a lower via hard mask layers over the OL and form a top trench patterning hard mask over the lower, via hard mask. Form a trench pattern hole through the trench hard mask layer; and form a via pattern hole through the via hard mask layer in a region exposed below the trench pattern hole. Etch a via pattern hole into the OL and then etch a via pattern hole down into the DL. Etch away the trench pattern layer and the OL layer below the trench pattern hole. Etch the via hole through the DL exposing the cap while simultaneously partially etching the DL to a final trench depth to form a trench in the DL below the trench pattern hole, with the trench having a bottom above the cap and sidewalls in the DL.