Abstract: The present invention comprises a dry cleaning system and method, in which dry cleaning machinery is used in conjunction with a specific solvent which is derived from an organic/inorganic hybrid (organo silicone). Such solvent is used in combination with an organic and/or organo-silicone-based detergent which is specifically tailored for working in conjunction with the solvent to afford optimal cleaning. In a preferred embodiment, the method comprises the steps of loading articles into a cleaning basket; agitating the articles in the solvent and detergent composition in which they are immersed; removing most of the solvent and detergent composition; centrifuging the articles; heating the articles and remaining composition and creating vapors, condensing vapors and optionally reducing the pressure to dry the articles, recovering and recycling solvent and removing the articles from the basket after cooling the articles.

Abstract: A method of optical proximity correction suitable for use in a mixed mode photomask. An original pattern is to be transferred from the mixed mode photomask. A binary mask curve and a phase shift mask curve reflecting relationship between critical dimensions of the photomask and the original pattern are obtained. A critical value of the critical dimension is selected. For the binary mask curve, the portion with the critical dimension of the original pattern larger than the critical value is selected. In contrast, for the phase shift mask curve, the portion with the critical dimension of the original pattern smaller than the critical value is selected. These two portions are combined as an optical characteristic curve. The mixed mode photomask can thus be fabricated according to the optical characteristic curve.

Abstract: A cutting interment (10) for use on multi-strand plastic fiber materials. Opposed handles (22a and 22b) on arms (18a and 18b) may be manually operated to close jaws (14a and 14b) with a cavity (42) for crimping. At the base of the cavity (42) are cutting edges (52a), which employ heat from either heating elements (54a and 54b) or an external source to cut and simultaneously cauterize the cut ends. Optional reliefs (44 and 46) may also be provided to contain and focus the heat at the cavity (42) and thus efficiently apply it specifically to the working material.

Abstract: A system and method are provided for dry cleaning articles utilizing a siloxane solvent. The system includes a cleaning basket for receiving articles therein and a one or more tanks for containing a siloxane solvent. Coupled between the tank and the cleaning basket is a pump for immersing the articles in the cleaning basket with the siloxane solvent. Also included is a still for distilling the dirty siloxane solvent to recover the pure siloxane solvent. A condenser is coupled to the cleaning basket and/or the still for recovering condensed vapors. For decanting any water in the siloxane solvent received from the condenser, a separator is coupled to the condenser. A fan is coupled to the cleaning basket for circulating air past the condenser, then the heater coils and into the cleaning basket for drying and cooling the articles.

Abstract: A digital cartoon or animation creation process, alternately describable as digital rotoscoping. Images are obtained in digital format by set-up steps (32, 44), image capture steps (34-36 and 46), and image storage (38, 48). The rotoscoping process (10) includes an image to line art rendering sub-process (14) which optionally may be followed by a specialized line art rendering sub-process (16) or a coloring sub-process (18). The line art rendering sub-process (14) includes a series of filters, particularly including a high-pass filter (68) using a gaussian blur convolution matrix. The specialized rendering sub-process (16) has particular use for carrying image regions having particularized detail through into final images in a manner that such detail is not lost, and the coloring sub-process (18) permits creation of colorized final images.

Abstract: A hollow panel having a cover material bonded thereto includes a first wall having an inner surface and a substantially planar outer surface. A second wall opposes the first wall so as to define a hollow space therebetween and has at least one protrusion formed therein. Each protrusion has a tip which is integrally joined to the inner surface of the first wall to form a double-walled rib bridging the hollow space. The double-walled rib has integrally joined opposing walls such that an outer surface of the second wall is substantially planar. The cover material is bonded to the outer surface of the first wall.

Abstract: A transistor structure for an ESD protection device, which includes a gate structure constituted by a connecting part and a plurality of protecting parts on a substrate. The protecting parts include a first protecting part and a second protecting part, wherein the first protecting part is located closer to the middle of the gate structure and the second protecting part is located further from the middle of the gate structure. The width of the second protecting part is larger than that of the first protecting part. There are sources and drains alternated with the protecting parts, wherein the sources include a first isolated from the drain by the first protecting part and a second source isolated from the drain by the second protecting part. The substrate junction is connected to the second source with a butting face and a butting contact is located above the butting face to connect the second source and the substrate junction simultaneously.

Abstract: A payment method (100) suitable for network (10) transactions in merchandise (12) between purchasers (14) and vendors (18), employing the services of guarantors (16) which issue vouchers (20) for payment. The vendors (18) offer the merchandise (12) on the network (10) as URLs (50), which optionally may include a URL address (52) separated from a URL request (56). The URL (50) or the URL address (52) initially includes the network (10) address of the guarantor (16), and the URL (50) or the URL request (56) specifies particular merchandise (12). By selecting the URL (50) the purchaser (14) is initially taken to the guarantor (16), where the voucher (20) is placed into the URL (50) or the URL request (56) and the network (10) address of the vendor (18) is placed into the URL (50) or the URL address (52).

Abstract: The present invention comprises a closed loop dry cleaning system and method, in which dry cleaning machinery is used in conjunction with a specific solvent which is derived from an organic/inorganic hybrid (organo silicone). In this class of organo silicones is a group known as cyclic siloxanes. The cyclic siloxanes present the basis for material composition of the solvent chemistry which allows this dry cleaning system to be highly effective. The cyclic-siloxane-based solvent allows the system to result in an environmentally friendly process which is, also, more effective in cleaning fabrics and the like than any known prior system. The siloxane composition is employed in a dry cleaning machine to carry out the method of the invention.

Abstract: A fabricating method for a dynamic random access memory capacitor includes the following steps. A cap layer and a spacer are formed on the gate to protect the gate from being etched. A self-aligned contact hole is formed and then the self-aligned contact hole is etched again to form a contact node opening. In this way, the difficulty of forming the contact node opening can be reduced. The method of forming the storage electrode includes forming and patterning a stacked layer, which is formed by several conductive layers and isolation layers interlaced with each other, to form the self-aligned contact hole. A conductive spacer is formed on the sidewall of the stacked layer. The conductive spacer is used as a mask to etch the dielectric layer below the bit line so as to form a contact node opening. The contact opening exposes a source/drain region. A conductive layer is formed to fill the contact node opening. The conductive layer and the staked layer are patterned.

Abstract: A wafer handling apparatus and method includes a wafer carrier station for supporting a wafer carrier, such as an enclosed pod, that holds one or more wafers. A grounded interface panel is provided between the carrier station and a clean testing or processing environment. A z-movement mechanism moves the carrier station and the wafer carrier in a z-direction. A door opening mechanism removes a door from said carrier through a door opening in the interface panel. A handler mechanism includes a wafer holding device, such as a flat end effector, that moves into the wafer carrier at a separate access opening to load or unload a wafer to or from the wafer carrier. Wafer carriers holding different amounts of wafers can be used with no major structural changes to the apparatus.

Abstract: The present invention is a laser system (10, 100, 200) employing paired simple lasers (12, 16) or paired Zeeman type lasers (102, 112 or 202, 204). Systems of beambenders (20, 108, 210, 212, 214), half-wave plates (106, 116), and polarizing beamsplitters (22, 104, 114, 118, 216) pair the frequency component of one laser (12, 16, 102, 112, 202, 204) with that of another to produce one or more measurement beams (24, 150, 160, 228, 230) having orthogonally polarized frequency components. Systems of beamsplitters (26, 120, 124, 218, 220) and photodetectors (30, 122, 126, 206, 208) provide reference information about the frequency difference (196, 198) between the respective frequency components in the measurement beams (24, 150, 160, 228, 230). The frequency difference (196, 198) is tunable across a wide range, specifically including 4 MHz to 40 MHz when the lasers (12, 16, 102, 112, 202, 204) are conventional He--Ne types.

Abstract: An apparatus is provided including a semiconductor processing chamber enclosed by a plurality of walls. Also included is a source of process gas that is required for processing a wafer within the processing chamber. Mounted on one of the walls of the processing chamber is a window. An inlet is positioned adjacent to the window and remains in communication with the processing chamber. The inlet is further coupled to the source of process gas to channel the process gas into the processing chamber for both preventing the deposition of byproducts on the window and further processing the wafer within the processing chamber. In another embodiment, a source of light, an analysis mechanism, and an optical transmission medium are provided. Such optical transmission medium is coupled between the source of light and the analysis mechanism and is further aligned with the window for directing light into the processing chamber and analyzing the wafer within the processing chamber.

Abstract: A method for forming the dielectric layer of a capacitor. A titanium layer and a tantalum pentoxide layer are sequentially formed over a polysilicon lower electrode. A high-temperature treatment is performed so that titanium in the titanium layer and silicon in the polysilicon lower electrode react to form a titanium silicide layer at their interface. Titanium in the titanium layer also reacts with oxygen in the atmosphere to form a titanium oxide layer at its interface with the tantalum pentoxide layer. The titanium silicide layer, the titanium oxide layer and the tantalum pentoxide layer together constitute a composite dielectric layer with a high dielectric constant capable of increasing the capacitance of the capacitor.

Abstract: A wireless network system includes a server having a server controller and a server radio modem, and a number of clients each including a client controller and a client radio modem. The server controller implements a server process that includes the receipt and the transmission of data packets via the radio modem. The client controllers of each of the clients implements a client process that includes the receipt and transmission of data packets via the client radio modem. The client process of each of the clients initiates, selects, and maintains a radio trasmission path to the server that is either a direct path to the server, or is an indirect path or "link" to the server through at least one of the remainder of the clients.

Abstract: A process for producing a field emitter flat display includes providing a supported porous layer of a non-evaporable getter material by depositing the non-evaporable getter material on a substrate followed by sintering the deposited material. The substrate having the porous layer of non-evaporable getter material thereon is then housed in an inner space defined by opposing plates. The inner space is then evacuated and hermetically sealed. The non-evaporable getter material is preferably deposited by preparing a suspension of non-evaporable getter material particles in a suspending medium, coating a surface of a substrate with the suspension by, e.g., spraying, and sintering the coating.

Abstract: The present invention comprises a dry cleaning system and method, in which dry cleaning machinery is used in conjunction with a specific solvent which is derived from an organic/inorganic hybrid (organo silicone). In this class of organo silicones is a group known as cyclic siloxanes. Such cyclic-siloxane-based solvent allows the system to result in an environmentally friendly process which is, also, more effective in cleaning fabrics and the like than any known prior system. The siloxane composition is employed in a dry cleaning machine to carry out the method of the invention. In order to enhance the cleaning capabilities of the cyclic-siloxane-based solvent, such solvent is modified with a chemical that is selected from the group of chemicals including 2-ethylhexyl acetate, esters, alchohols, and ethers.

Abstract: The present invention comprises a dry cleaning system and method, in which dry cleaning machinery is used in conjunction with a specific solvent which is derived from an organic/inorganic hybrid (organo silicone). In this class of organo silicones is a group known as cyclic siloxanes. The cyclic siloxanes present the basis for material composition of the solvent chemistry which allows this dry cleaning system to be highly effective. The cyclic-siloxane-based solvent allows the system to result in an environmentally friendly process which is, also, more effective in cleaning fabrics and the like than any known prior system. The siloxane composition is employed in a dry cleaning machine to carry out the method of the invention.

Abstract: A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

Abstract: An improved method for fabricating an ESD protection device so as to avoid ESD damage to a wafer. The improved method includes simultaneously forming an internal circuit and the ESD protection device without additional photomask or other process. The improved method uses a P.sup.+ doped region to take the place of an N.sup.- doped region of an interchangeable source/drain region with a LDD structure for the ESD protection device, of which its trigger voltage is adjusted by simply varying the P.sup.+ concentration.