Abstract: An apparatus for measuring a temperature of a substrate is disclosed. The apparatus includes a phosphor material in direct contact with the substrate and in thermal contact with the substrate, the phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, the fluorescent response decaying at a decay rate that is related to a temperature of the phosphor material, and the phosphor material producing a first set of non volatile byproducts when expose to a plasma.

Abstract: The invention relates to a method in which at a first location (A), such as a dental technician's laboratory or a dentist's surgery, digital image data (18) in the form of single images and/or image sequences are generated and these are transmitted to a second location (B), such as a production centre for denture parts, wherein the digital image data (18) and/or image sequences relate to information on the manufacture of denture parts (15). Furthermore, the invention relates to a scanning device for obtaining data records of dental models with a scanning appliance, such as a scanning head and with a camera, wherein remote data transmission means (8) are provided for transmitting digital image data (18) from the camera in the form of single images and/or image sequences to another location (B), such as a production centre.

Abstract: The invention relates to a method for processing of a three-dimensional image data set, wherein the three-dimensional image data set is converted to a data set suitable for a two-dimensional image reproduction. The invention further relates to apparatuses for performing the required calculations and/or for reproduction of the data representations. The invention is particularly appropriate for medical applications of endoscopy, in particular, coloscopy.

Abstract: A method of electronically signing a document includes initializing a user, including generating an asymmetric key pair including a private signing key and a public signing key, and storing the private signing key and the public signing key; and providing an electronic signature, including receiving document data corresponding to at least one selected portion of the document, binding the stored private signing key and the document data to create an electronic signature, and providing the electronic signature for a recipient.

Abstract: A communications network tap with a link fault detector, comprises a first terminal and a second terminal adapted to couple the tap in-line in the network and communicate data packets with network devices. A tap circuit is coupled to the first terminal and second terminal and configured to provide data packets to a monitor terminal. A link fault circuit coupled to the first terminal and second terminal and when a failure is detected in the first terminal, to cause a failure on the second terminal. Advantages of the invention include ensuring the integrity of the network by alerting network devices of fault conditions.

Abstract: A magnetic latch mechanism for latching a first electronic assembly to a second electronic assembly. The magnetic latch mechanism includes a Halbach array captured by the first electronic assembly. The Halbach array is configured to provide a first magnetic flux in a first direction. The magnetic latch mechanism further includes an attraction plate captured by the second electronic assembly. The attraction plate is configured to be coupled with the first magnetic flux when the first electronic assembly is in a closed position with respect to the second electronic assembly such that there is mutual attraction between the attraction plate and the Halbach array in the closed position.

Abstract: A detector for the measurement of radiation, preferably ionizing radiation, includes a medium, means for the conversion of the radiation energy absorbed by the medium into electrical charge, means for digital sampling of the charge signals, means for the determination of a calibration factor K, and means for the stabilization of the output signals of the detector. The medium at least partly absorbs the radiation to be measured. The electric charge is at least partially proportional to the energy of the radiation. The sampling is done preferably with a sampling rate between 1 and 1000 MHz. Further signal processing is digital. The calibration factor K has a fixed relation with respect to the decay time ? of the medium. The output signals of the detector are mainly proportional to the radiation energy, and are stabilized with the help of the calibration factor K.

Abstract: The invention relates, in an embodiment, to a power supply module configured to be coupled to a power outlet to supply an operating voltage to a data processing device. The power supply module includes a set of signal connectors having at least a first signal connector. The set of signal connectors is configured to provide at least a portion of data received from the data processing device to devices external to the data processing device, whereby the power supply module is disposed in a flexibly-coupled, spaced-apart relationship relative to the data processing device.

Abstract: A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.

Abstract: A volumetric compressor comprising: a casing provided with a suction chamber and a delivery chamber, between which a pair of screw rotors is included; a pan containing oil, and a delivery adjustment unit equipped with a slide valve, cooperating with the rotors and with a fluid-operated actuator, in which it is possible to identify an active chamber with a sliding piston connected to the slide valve. The adjustment unit comprises a flow switching unit, that connects the active chamber of the actuator to the pan and to the suction chamber and comprises a static flow switch removably associated with a switching solenoid valve electrically connected to a control unit. The switching solenoid valve is suited to be associated, alternatively, with different static flow switches that make it possible to obtain deliveries of compressed fluid varying discretely or continuously, depending on the position of the slide valve with respect to the rotors.

Abstract: A method for etching a barrier material on a semiconductor substrate is disclosed. The method includes placing the substrate in a plasma processing chamber of the plasma processing system, wherein the substrate includes the barrier material and a low-k material, and wherein the barrier material and a low-k material are configured to be exposed to a plasma. The method also includes flowing an etchant gas mixture, including CH3F from about 4% to about 8% of a plasma gas flow, into the plasma processing chamber, wherein the etchant gas mixture is configured to etch the barrier material at a first etch rate, the etchant gas mixture is configured to etch the low-k material at a second etch rate, wherein the first etch rate is substantially greater than the second etch rate. The method further includes striking a plasma from the etchant source gas; and etching the barrier layer and the low-k layer.

Abstract: A method for calculating a process center for a chuck in a processing chamber is provided. The method includes generating pre-processing and post-processing measurement data points, which is perform by measuring thickness of a film substrate at a set of orientations and a set of distances from a geometric center of the substrate. The method also includes comparing the pre-processing and post-processing measurement data points to calculate a set of etch depth numbers. The method further includes generating etch profiles for the set of orientations. The method yet also includes extrapolating a set of radiuses, which is associated with a first etch depth, from the etch profiles. The method yet further includes generating an off-centered plot, which is a graphical representation of the set of radiuses versus the set of orientations. The method more over includes calculating the process center by applying a curve-fitting equation to the off-centered plot.

Abstract: Methods for improving the stability of RF power delivery to a plasma load are disclosed. The method includes adding an RF resistor and/or a power attenuator at one of many specific locations in the RF power system to lower the impedance derivatives while keeping the matching circuit substantially in tune with the RF transmission line.

Abstract: A mobility architectural arrangement for managing telecommunication mobility for a handset is provided. The arrangement includes a DiVitas protocol proxy (DPP), which is configured to manage connectivity between a mobility client of the handset and a mobility server within an enterprise. The DPP includes a client DPP being configured to manage the connectivity for the mobility client of the handset. The client DPP receives a plurality of client connectivity requests from a plurality of application clients. The server DPP is configured to manage the connectivity for the mobility server. The server DPP receives a plurality of server connectivity requests from a plurality of application servers. The client DPP and the server DPP are configured to interact with one another to establish a secure channel.

Abstract: An automated process control system for controlling a plasma processing system having a chamber, for processing a substrate is disclosed. The automatic process control system includes a first sensor disposed within the chamber, for making a first plurality of measurements pertaining to a first parameter associated with a structure disposed at least partially within the chamber. The automatic process control system further includes first logic coupled to receive the first plurality of measurements from the first sensor. The first logic is configured for analyzing the first plurality of measurements during a test step. There is also included second logic coupled to receive a first signal from the first logic, the second logic being configured to stop the test step if the first signal indicates a fault.

Abstract: The invention provides a reliable way to fabricate a new vertical structure compound semiconductor device with improved light output and a laser lift-off processes for mass production of GaN-based compound semiconductor devices. A theme of the invention is employing direct metal support substrate deposition prior to the LLO by an electro-plating method to form an n-side top vertical structure. In addition, an ITO DBR layer is employed right next to a p-contact layer to enhance the light output by higher reflectivity. A perforated metal wafer carrier is also used for wafer bonding for easy handling and de-bonding. A new fabrication process is more reliable compared to the conventional LLO-based vertical device fabrication. Light output of the new vertical device having n-side up structure is increased 2 or 3 times higher than that of the lateral device fabricated with same GaN/InGaN epitaxial films.

Abstract: A magnet structure includes a permanent magnet assembly and first and second pole assemblies. The permanent magnet assembly includes an enclosure having an open portion and a magnetic mass disposed within the enclosure. Each of the first and second pole assemblies includes a base portion, disposed within the enclosure, a pole extension, extending from the first base portion outward from the enclosure, and a pole on the pole extension, having a pole face. The first and second pole assemblies are arranged such that the pole face of the first pole opposes the pole face of the second pole.

Abstract: In a plasma processing system, a method for optimizing etching of a substrate is disclosed. The method includes selecting a first plasma process recipe including a first process variable, wherein changing the first process variable by a first amount optimizes a first substrate etch characteristic and aggravates a second substrate etch characteristic. The method also includes selecting second plasma process recipe including a second process variable, wherein changing the second process variable by a second amount aggravates the first substrate etch characteristic and optimizes the second substrate etch characteristic. The method further includes positioning a substrate on a chuck in a plasma processing chamber; and striking a plasma within the plasma processing chamber.

Abstract: A method of fabricating and separating semiconductor structures comprises the steps of: (a) partially forming a semiconductor structure attached to a support structure, the partially formed semiconductor structure comprising a plurality of partially formed devices, where the partially formed devices are attached to one another by at least one connective layer; (b) forming a partial mask layer over at least a part of the partially formed devices; (c) etching the connective layer to separate the devices; and (d) removing the partial mask layer. Advantages of the invention include higher yield than conventional techniques. In addition, less expensive equipment can be used to separate the devices. The result is a greater production of devices per unit of time and per dollar.

Abstract: A bed guard assembly includes a one or more end panels, a spanner, connectors and an extension. The spanner is placed against the top or bottom surface a mattress. The connectors connect the spanner to the end panels such that one end panel opposes another end panel across the mattress when the spanner is disposed against the surface of the mattress. The extension is removably attached to one of the connectors and extends from the connector at a substantially right angle with respect to the spanner.