Abstract: A microelectronic device includes a P-I-N (p+ region, intrinsic semiconductor, and n+ region) semiconductive body with a first gate and a second gate. The first gate is a gate stack disposed on an upper surface plane, and the second gate accesses the semiconductive body from a second plane that is out of the first plane.
Type:
Grant
Filed:
August 24, 2011
Date of Patent:
July 3, 2012
Assignee:
Intel Corporation
Inventors:
Ravi Pillarisetty, Jack Kavalieros, Marko Radosavljevic, Benjamin Chu-Kung
Abstract: An embodiment of the present invention is a technique to fabricate a cover assembly. A cover has a base plate and sidewalls attached to perimeter of the base plate. The sidewalls have a height. A plurality of devices is attached to underside of the base plate. The devices have length corresponding to the height such that the devices are sealed within the cover when the cover is attached to a surface.
Abstract: A quantum well (QW) layer is provided in a semiconductive device. The QW layer is provided with a beryllium-doped halo layer in a barrier structure below the QW layer. The semiconductive device includes InGaAs bottom and top barrier layers respectively below and above the QW layer. The semiconductive device also includes a high-k gate dielectric layer that sits on the InP spacer first layer in a gate recess. A process of forming the QW layer includes using an off-cut semiconductive substrate.
Type:
Grant
Filed:
February 20, 2009
Date of Patent:
February 14, 2012
Assignee:
Intel Corporation
Inventors:
Ravi Pillarisetty, Titash Rakshit, Mantu Hudait, Marko Radosavljevic, Gilbert Dewey, Benjamin Chu-Kung
Abstract: A mounting substrate for a processor includes a die side and a land side with a processor footprint configured on the die side. The processor footprint is coupled to at least one processor interconnect and a microelectronic die is embedded in the mounting substrate. The microelectronic die is coupled to the processor interconnect and communication between a processor to be installed on the processor footprint is in a rate between 10 Gb/s and 1 Tb/s.
Type:
Grant
Filed:
June 5, 2009
Date of Patent:
February 7, 2012
Assignee:
Intel Corporation
Inventors:
Sriram Dattaguru, Lesley A. Polka Wood, Yoshihiro Tomita, Kinya Ichikawa, Robert L. Sankman
Abstract: A chip package includes a microstrip spacer disposed between a first die and a second die. The microstrip spacer includes electrically conductive planes that are ground planes for at least one of the first die and the second die. A method includes operating the first die at a first clock speed and operating the second die at a second clock speed. A system includes a chip package with a microstrip spacer and a system housing.
Abstract: An underfill composition is formulated to increase the surface tension thereof for use in capillary underfilling of an integrated circuit die that is coupled to a mounting substrate. A method includes mixing a surface tension-increasing additive with a bulk polymer and a hardener and allowing the underfill composition to flow between the integrated circuit die and the mounting substrate. An article is achieved by the method. The article can be assembled into a computing system.
Abstract: Wafer-level bonding of the hybrid laser portion of a silicon photonics platform is done by forming a weakened level in a semiconductive pillar that supports laser-active layers by ion implantation into the semiconductive pillar without penetrating the laser-active layers, and by separating the laser-active layers from the semiconductive pillar by cracking the weakened level by an epitaxial lift-off processes.
Type:
Grant
Filed:
April 2, 2010
Date of Patent:
December 27, 2011
Assignee:
Intel Corporation
Inventors:
John Heck, Richard Jones, Matthew N. Sysak
Abstract: A back-side lamination (BSL) is applied after thinning a microelectronic die. The BSL is configured to be a thermal-expansion complementary structure to a metal wiring interconnect layout that is disposed on the active side of the microelectronic die.
Abstract: A microelectronic device includes a P-I-N (p+ region, intrinsic semiconductor, and n+ region) semiconductive body with a first gate and a second gate. The first gate is a gate stack disposed on an upper surface plane, and the second gate accesses the semiconductive body from a second plane that is out of the first plane.
Type:
Grant
Filed:
August 6, 2008
Date of Patent:
November 22, 2011
Assignee:
Intel Corporation
Inventors:
Ravi Pillarisetty, Jack Kavalieros, Marko Radosavljevic, Benjamin Chu-Kung
Abstract: A charged device model (CDM) electrostatic discharge (ESD) testing is carried out at wafer level. Wafer CDM pulses are repeatedly applied and monitored. The wafer CDM (WCDM) pulses are accomplished with a probe-mounted printed-circuit board and a high-frequency transformer that captures fast CDM pulses. Modeling of CDM and WCDM in the time and frequency domain illustrates the dominant effects, and shows that WCDM can reproduce all the major phenomena of package-level CDM testing.
Abstract: A multiple-gate field-effect transistor includes a fluid in a top gate, two lateral gates, and a bottom gate. The multiple-gate field-effect transistor also includes a patterned depletion zone and a virtual depletion zone that has a lesser width than the patterned depletion zone. The virtual depletion zone width creates a virtual semiconductor nanowire that is lesser in width than the patterned depletion zone.
Abstract: Embodiments of the invention includes a heat dissipating device. The heat dissipating device includes a main body having a surface, wherein the surface is plated or coated with at least two different metals to form a design effective for bonding to solder and for adhering to polymer in a polymer solder hybrid. The heat dissipating device also includes surface perturbations.
Type:
Grant
Filed:
April 3, 2008
Date of Patent:
August 16, 2011
Assignee:
Intel Corporation
Inventors:
Ashay A. Dani, Sabina J. Houle, Christopher L. Rumer, Thomas J Fitzgerald
Abstract: An article includes a top electrode that is embedded in a solder mask. An article includes a top electrode that is on a core structure. A process of forming the top electrode includes reducing the solder mask thickness and forming the top electrode on the reduced-thickness solder mask. A process of forming the top electrode includes forming the top electrode over a high-K dielectric that is in a patterned portion of the core structure.
Type:
Grant
Filed:
November 10, 2009
Date of Patent:
August 2, 2011
Assignee:
Intel Corporation
Inventors:
John J. Tang, Xiang Yin Zeng, Jiangqi He, Ding Hai
Abstract: A process of forming a semiconductive capacitor device for a memory circuit includes forming a first capacitor cell recess and a second capacitor cell recess that are spaced apart by a capacitor cell boundary of a first height. The process includes lowering the first height of the capacitor cell boundary to a second height. A common plate capacitor bridges between the first recess and the second recess over the boundary above the second height and below the first height.
Type:
Grant
Filed:
December 22, 2008
Date of Patent:
July 19, 2011
Assignee:
Intel Corporation
Inventors:
Nick Lindert, Brian Doyle, Dinesh Somasekhar, Christopher J. Jezewski, Swaminathan Sivakumar, Kevin Zhang, Stephen Wu
Abstract: A carbon nanotube (CNT) array is patterned on a substrate. The substrate can be a microelectronic die or a heat sink for a die. The patterned CNT array is patterned by using a patterned catalyst on the substrate to form the CNT array by growing. The patterned CNT array can also be patterned by using a patterned mask on the substrate to form the CNT array by growing. A computing system that uses the CNT array for heat transfer from the die is also used.
Type:
Grant
Filed:
May 8, 2009
Date of Patent:
June 21, 2011
Assignee:
Intel Corporation
Inventors:
Gregory M. Chrysler, Thomas S. Dory, James G. Maveety, Edward Prack, Unnikrishnan Vadakkanmaruveedu
Abstract: A ball-limiting metallurgy (BLM) stack is provided for an electrical device. The BLM stack resists tin migration toward the metallization of the device. A solder system is also provided that includes a eutectic-Pb solder on a substrate that is mated to a high-Pb solder, and that withstands higher temperature reflows and other higher temperature processes.
Type:
Grant
Filed:
August 17, 2007
Date of Patent:
June 14, 2011
Assignee:
Intel Corporation
Inventors:
Fay Hua, Albert T. Wu, Kevin Jeng, Krishna Seshan
Abstract: Some embodiments of the invention include a coated thermal interface to bond a die with a heat spreader. The coated thermal interface may be used to bond the die with the heat spreader without flux. Other embodiments are described and claimed.
Abstract: An underfill composition is formulated to increase the surface tension thereof for use in capillary underfilling of an integrated circuit die that is coupled to a mounting substrate. A method includes mixing a surface tension-increasing additive with a bulk polymer and a hardener and allowing the underfill composition to flow between the integrated circuit die and the mounting substrate. An article is achieved by the method. The article can be assembled into a computing system.
Abstract: A method and apparatus provide an integrated circuit package with improved heat dissipation and easier fabrication. The integrated circuit package includes a thinned semiconductor die attached to a heat spreader using a thermally conductive material. The thinned die reduces the thermal resistance of the die/heat spreader combination to improve heat extraction from the die as well as eliminating processing steps in fabrication. Additionally, the thinned die becomes more compliant as it takes on the thermal/mechanical properties of the heat spreader to reduce stress-induced cracking of the die.
Type:
Grant
Filed:
March 5, 2008
Date of Patent:
February 15, 2011
Assignee:
Intel Corporation
Inventors:
Cheng-Yi Liu, Johanna Swan, Steven Towle, Anna George, legal representative, Chuan Hu
Abstract: Embodiments of the invention relate to semiconductor packages in which electrical power is delivered to die-side components removably installed in sockets formed between a package stiffener and an electrical conductor. To this purpose, the package stiffener and the electrical conductor may be electrically coupled to the power and ground terminals of the semiconductor package.