Abstract: A cart for the changeout of modules such as a laser chamber module. In one example, the cart includes at least two platforms that are movable with respect to a frame of the cart and that are coupled together such that an upward force for a vertical movement with respect to the frame of one platform provides a vertical movement with respect to the frame of a second platform at an elevated position. The platforms are coupled to each other with chains, wire, or linkage structures. With some carts, the platforms are removable from the rest of the frame. Also with some carts, an upper platform is collapsible on a lower platform. Some carts include two wheel bases that are foldable with respect to one another so as to allow the cart to traverse a surface obstacle by folding one wheel base down over the surface obstacle and transferring a load to that wheel base from another wheel base located on the opposite side of the surface obstacle.

Abstract: A portable laser beam monitor utilizes a plurality of optical trains to monitor ultraviolet laser beam profiles at a plurality of positions along a laser beam path. A preferred embodiment useful for monitoring beam profiles of lithography lasers measures the beam profile at the front aperture, the rear aperture, the shutter plane and at infinity (the divergence plane). The beam profiles are imaged on a fluorescent screen which is monitored by a visible light camera. Images of the profiles may be discharged on the screen of a lap top computer.

Abstract: A lithograph quality optimization process for controlling laser beam parameters when changing operating modes. The laser is programmed to automatically conduct an optimization procedure preferably in less than one minute to adjust laser operating parameters such as blower speed, total gas pressure and F2 partial pressure in order to optimize beam quality parameters.

Abstract: A tunable injection seeded very narrow band F2 lithography laser. The laser combines modular design features of prior art long life reliable lithography lasers with special techniques to produce a seed beam operated in a first gain medium which beam is used to stimulate narrow band lasing in a second gain medium to produce a very narrow band laser beam useful for integrated circuit lithography. In a preferred embodiment, two tunable etalon output couplers are used to narrow band an F2 laser and the output of the seed laser is amplified in an F2 amplifier.

Abstract: A tunable injection seeded very narrow band F2 lithography laser. The laser combines modular design features of prior art long life releasable lithography lasers with special F2 line narrowing and tuning techniques applied to a seed beam operated in a first gain medium which beam is used to stimulate narrow band lasing in a second gain medium to produce a very narrow band laser beam useful for integrated circuit lithography.

Abstract: A long life laser chamber for a halogen containing gas discharge laser. In a preferred embodiment electrode erosion caused by excited fluorine (i.e., atomic fluorine and fluorine ions) is reduced by forcing the excited fluorine away from the discharge footprint of the electrodes. Preferred embodiments include electrodes with a large number of small holes in the discharge footprint through which laser gas flows to remove the excited fluorine from the footprint region in the time period between electric discharges.

Abstract: A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge along with laser optics create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes and discharges are arranged so that debris from one of the gain media is not circulated to the other gain media during discharges until the debris has made a loop around at least 90% of the chamber circulation path.

Abstract: A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.

Abstract: A catadioptric anamorphic beam expanding telescope expands an optical beam in a first axis substantially perpendicular to the beam propagation axis, and deflects it in a plane substantially perpendicular to the first axis. The beam expanding telescope can include reflective, refractive, and combined reflective/refractive elements. An embodiment includes an off axis convex spheric reflector and an off axis combined reflective/reflective optical element, commonly known as a Mangin mirror, incorporating a refractive first surface and a reflective rear surface, which compensate for aberrations introduced by the off axis deflection of the beam. The telescope is particularly useful for deep ultraviolet (DUV) applications at wavelengths shorter than about 250 nm. In some applications, the telescope illuminates a diffraction grating or other wavelength dispersive element, aligned to retroreflect a preferential wavelength, thereby providing wavelength narrowing.

Abstract: The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber, a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control.

Abstract: A reliable, modular, production quality F2 excimer laser capable of producing, at repetition rates in the range of 1,000 to 2,000 Hz or greater, laser pulses with pulse energies greater than 10 mJ with a full width half, maximum bandwidth of about 1 pm or less at wavelength in the range of 157 nm. Laser gas concentrations are disclosed for reducing unwasted infrared emissions from the laser. Also disclosed are UV energy detectors which are substantially insensitive to infrared light. Preferred embodiments of the present invention can be operated in the range of 1000 to 4000 Hz with pulse energies in the range of 10 to 5 mJ with power outputs in the range of 10 to 40 watts. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.1 &mgr;m or less. Replaceable modules include a laser chamber and a modular pulse power system.

Abstract: An improvement over prior art voltage timing compensation circuits is achieved by incorporating a function generator to provide a more accurate non-linear compensation to pulse timing delay, which is typically a non-linear function of voltage. An improvement over prior art temperature timing compensation circuits is achieved by providing for actual temperature measurements to be made and used to drive the timing compensation circuitry for a more accurate temperature timing compensation than provided by prior art temperature synthesis, while still using a relatively simple compensating circuit. In some embodiments a timing compensation circuit combines both voltage and temperature timing compensation.

Abstract: An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F2 “sweet spot” in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines &Dgr;E/&Dgr;V, the change of pulse energy with voltage, and automatically and precisely controls the fluorine concentration based on &Dgr;E/&Dgr;V without the need to actually measure the fluorine concentration. The present invention is especially useful in lithography environments in which photo resist having a wide range of sensitivity are used. The present invention permits operation of the laser at substantially maximum efficiency over a wide range of pulse energy outputs.

Abstract: A fast response etalon based spectrometer for spectral measurement of a pulse laser beam. A portion of the beam is directed through a double pass etalon device which provides angular separation of spectral components of the beam. The spectral components are measured by a fast photodiode array. In a preferred embodiment periodic photodiode data is also collected between pulses to record background dark current values for each photodiode in the array. In a preferred embodiment at least one set of dark current data is collected for each set of laser spectral data embodiments and the dark current data are subtracted from the laser spectral data to provide corrected spectral data at rates of up to 2000 Hz or greater. The spectrometer is very compact producing precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.

Abstract: A wavelength system for measuring the bandwidth of a narrowband laser utilizing prior art equipment normally provided for calibrating wavelength measurement equipment. The prior art includes a wavemeter for measuring incremental changes in wavelength and an atomic wavelength reference for calibrating the wavemeter. The atomic wavelength reference includes a vapor cell for providing a vapor having at least one absorption line near a desired operating wavelength. The system includes a wavelength tuning device with a tuning range sufficient to tune the laser to operate at the wavelength of the absorption line in order to calibrate the wavemeter. Measurements of the bandwidth of the absorption spectrum obtained by scanning the laser output wavelength over the absorption line are used to estimate the bandwidth of the output beam. This estimate in a preferred embodiment is used to confirm the accuracy of the normal bandwith measurements. In a preferred system the laser is a KrF laser and the vapor is iron vapor.

Abstract: Methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. Applicants have identified the major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. The timing of the arrival of the pressure wave is determined by the temperature of the laser gas through which the wave is traveling. During burst mode operation, the laser gas temperature in prior art lasers changes by several degrees over periods of a few milliseconds. These changing temperatures change the location of the coincident pressure waves from pulse to pulse within the discharge region causing a variation in the pressure of the laser gas which in turn affects the index of refraction of the discharge region causing the laser beam exiting the rear of the laser to slightly change direction.

Abstract: An excimer laser with optical pulse multiplication produced by separating a laser beam into a plurality of beams and multiplying the pulse rate in each beam. A pulse multiplier optical system receives the laser output beam and produces multiple output beams, each beam having a larger number of pulses with substantially reduced intensity values as compared to the laser output beam. In a preferred embodiment, CaF2 flats are used along with maximum reflection mirrors to split the laser beam into four beams each with a 4× increased pulse rate. The present invention is particularly important as an improvement to the ArF excimer laser industry to reduce two-photon absorption damage to optical equipment in lithography machines.

Abstract: A visible light alignment system mounted on a line narrowing module of a UV laser. The system includes an alignment platform on which a small visible light laser is mounted and beam directing optics to direct the visible light beam to reflect off an illumination surface of a first prism in a prism beam expander at an angle such that the visible light beam proceeds collinearly with the UV laser output beam.

Abstract: A double pass etalon based spectrometer. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.

Abstract: An F2 laser having an etalon-based line narrowing output coupler and a technique for tuning the laser. The etalon based output coupler is adjusted to preferentially reflect a percentage of light at or near the spectral maximum of one of the primary F2 spectral lines and to not reflect light at the other primary F2 spectral line. Thus, a selected range of the selected line is preferentially amplified in the gain medium and the other line is transmitted out of the laser cavity and, therefore, receives no amplification and is suppressed. The result is substantial narrowing in the preferred embodiment of the 157.630 nm line and effective suppression of the 157.523 nm line. Substantial improvement in line narrowing of 157.630 nm line results from a wavelength selective properties of etalon based line-narrowing output coupler.