Abstract: An improved metal mask-making process is disclosed which involves starting with a metal mask having etched apertures using existing processes and coating it conformably with a substantially thick layer, so as to reduce the minimum aperture size while increasing the metal mask thickness. The conformal layer is chosen for minimum stress, good adhesion and thermal compatibility to the original metal mask material. Additional thin conformal coatings can be provided for imparting mechanical and chemical resistance to the metal mask.
Type:
Grant
Filed:
December 8, 1992
Date of Patent:
December 7, 1993
Assignee:
International Business Machines Corporation
Inventors:
Donald R. Cowell, Mark W. Jones, Chang-Ching Kin, John J. Nahlik, John A. Trumpetto