Abstract: Methods and apparatus for connecting a tubular to a tubular string are provided. In one embodiment, an apparatus suitable for engaging, compensating, and connecting a tubular includes one or more compensating pistons, an engaging assembly for engaging a tubular, and a connector for connecting the engaging assembly to the one or more compensating pistons while allowing for rotation of the tubular relative to the compensation pistons.

Abstract: An ion beam apparatus and a method for providing an energy-filtered primary ion beam are described. Therein, a primary ion beam having an asymmetric first energy distribution is generated by means of an ion source. The primary ion beam is energy filtered using, for example, a retarding lens.

Abstract: A Bragg reflector grating comprises a plurality of chirped grating sections (65-72), in which at least a first chirped grating section and a second chirped grating section have differing ranges of grating pitches. The combined range of grating pitches provided by the first and second chirped grating sections includes at least one discontinuity, such that the first and second chirped grating sections have one or more grating pitches in common and/or there are one or more ranges of grating pitches within the combined range of grating pitches that are absent.

Abstract: Techniques for controlling current flow in semiconductor devices, such as LEDs are provided. For some embodiments, a current guiding structure may be provided including adjacent high and low contact areas. For some embodiments, a second current path (in addition to a current path between an n-contact pad and a metal alloy substrate) may be provided. For some embodiments, both a current guiding structure and second current path may be provided.

Abstract: An end effector assembly for a substrate transfer robot is described. The end effector assembly includes a robot wrist. At least one end effector is secured to the robot wrist. The end effector has a fixed end, a free end, a load-supporting surface and a tension member. The fixed end is coupled with the robot wrist. The free end is disposed opposite to the fixed end. The load-supporting surface is coupled between the fixed end and the free end. The tension member is coupled with the load-supporting surface between the fixed end and the free end.

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

Abstract: Embodiments of the disclosure generally provide a method and apparatus for processing a substrate in a vacuum process chamber. In one embodiment a vacuum process chamber is provided that includes a chamber body and lid disposed on the chamber body. A blocker plate is coupled to the lid and bounds a staging plenum therewith. A gas distribution plate is coupled to the lid. The gas distribution plate separates a main plenum defined between the gas distribution plate and the blocker plate from a process volume defined within the chamber body. The gas distribution plate and the blocker plate define a spacing gradient therebetween which influences mixing of gases within the main plenum.

Abstract: An apparatus for generating a gaseous chemical precursor is provided and contains a canister having a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an outlet port in fluid communication with the interior volume, and an inlet tube extending into the canister and having an inlet end and an outlet end, wherein the inlet end is coupled to the inlet port. The apparatus further contains a gas dispersion plate coupled to the outlet end of the inlet tube, wherein the gas dispersion plate is at an angle within a range from about 3° to about 80°, relative to a horizontal plane which is perpendicular to a vertical axis of the canister.

Abstract: A method and apparatus are provided to form spacer materials adjacent substrate structures. In one embodiment, a method is provided for processing a substrate including placing a substrate having a substrate structure adjacent a substrate surface in a deposition chamber, depositing a spacer layer on the substrate structure and substrate surface, and etching the spacer layer to expose the substrate structure and a portion of the substrate surface, wherein the spacer layer is disposed adjacent the substrate structure. The spacer layer may comprise a boron nitride material. The spacer layer may comprise a base spacer layer and a liner layer, and the spacer layer may be etched in a two-step etching process.

Abstract: The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

Abstract: Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.

Abstract: Aspects of the present invention include methods for controlling a plasma in a substrate processing system. One embodiment provides controlling a first set of wavelength intensities of reflected electromagnetic radiation reflected from the plasma within a chamber before processing a first set of one or more substrates, associating the first set of wavelength intensities of reflected electromagnetic radiation to an RF power within the processing system, adjusting a matching circuit based on the first set of wavelength intensities of reflected electromagnetic radiation, processing the first set of one or more substrates in the substrate processing system, controlling a second set of wavelength intensities of reflected electromagnetic radiation reflected from the plasma within the chamber, and associating the second set of wavelength intensities of reflected electromagnetic radiation to the RF power within the processing system.

Abstract: Apparatus and methods for selectively releasing a first wellbore component to a second wellbore component using a disconnect device. The method includes coupling a disconnect device to a workstring and a downhole tool; performing a downhole operation using the downhole tool, and selectively releasing an upper portion of the disconnect device from a lower portion of the disconnect device, thereby releasing the downhole tool from the workstring. The method may also include reconnecting the upper portion of the disconnect device to the lower portion of the disconnect device. The disconnect device is capable of transferring torque to the wellbore component.

Abstract: An LC-based optical device compensates for differences in optical path lengths of polarization components of input beam. As a result, PDL and PMD of the optical device are reduced. The compensation mechanism may be a glass plate that is disposed in an optical path of a polarization component so that the optical path length of that polarization component can be made substantially equal to the optical path length of the other polarization component that traverses through a half-wave plate. Another compensation mechanism is a birefringent displacer that has two sections sandwiching a half-wave plate, wherein the two sections are of different widths and the planar front surface of the birefringent displacer can be positioned to be non-orthogonal with respect to the incident input light beam.

Abstract: Techniques for fabricating metal devices, such as vertical light-emitting diode (VLED) devices, power devices, laser diodes, and vertical cavity surface emitting laser devices, are provided. Devices produced accordingly may benefit from greater yields and enhanced performance over conventional metal devices, such as higher brightness of the light-emitting diode and increased thermal conductivity. Moreover, the invention discloses techniques in the fabrication arts that are applicable to GaN-based electronic devices in cases where there is a high heat dissipation rate of the metal devices that have an original non- (or low) thermally conductive and/or non- (or low) electrically conductive carrier substrate that has been removed.

Abstract: A method of operating a focused ion beam device for emitting during operation a focused ion beam including ions of a gas generated at a first partial pressure, comprising cleaning an emitter tip positioned in an emitter tip region of the focused ion beam device, the cleaning comprises introducing the gas into the emitter tip region such that the gas has a second partial pressure of at least two times the first pressure. Further, a focused ion beam device is provided, comprising a gas field emitter tip (13) in an emitter tip region emitting an ion beam including ions of a gas, a gas inlet for supplying a gas with different pressures (110), a gas outlet (120), a pressure measurement device for measuring the pressure in the emitter tip region and a control unit (130) for controlling switching between an operation mode and a cleaning mode, further controlling the pressures in the emitter tip region and being connected to the pressure measurement device.

Abstract: The present invention generally relates to thin film transistors (TFTs) and methods of making TFTs. The active channel of the TFT may comprise one or more metals selected from the group consisting of zinc, gallium, tin, indium, and cadmium. The active channel may also comprise nitrogen and oxygen. To protect the active channel during source-drain electrode patterning, an etch stop layer may be deposited over the active layer. The etch stop layer prevents the active channel from being exposed to the plasma used to define the source and drain electrodes. The etch stop layer and the source and drain electrodes may be used as a mask when wet etching the active material layer that is used for the active channel.

Abstract: Methods and apparatus having a gradient spacing created between a substrate support assembly and a gas distribution plate for depositing a silicon film for solar cell applications are provided. In one embodiment, an apparatus for depositing films for solar cell applications may include a processing chamber, a substrate support disposed in the processing chamber and configured to support a quadrilateral substrate thereon, and a gas distribution plate disposed in the processing chamber above the substrate support, wherein a bottom surface of the gas distribution plate has a perimeter that includes edges and corners, and wherein the corners of the gas distribution plate are closer to the substrate support than the edges of the gas distribution plate.

Abstract: Embodiments of the present invention generally relate to a subsea salvage operation using a lifting magnet. In one embodiment, a method of salvaging a submerged production platform includes deploying a salvage vessel to a wreckage site of the submerged production platform; lowering a lifting magnet from the salvage vessel to the submerged production platform; and activating the lifting magnet, thereby capturing at least a portion of the submerged production platform.

Abstract: This invention relates to a system and method to generate a private, auditable, evidentiary quality record of the location-history of an asset or person. This invention addresses ten critical improvements over existing systems that are proposed or used for metering for payment services for tolling roads, parking or pay-as-you-drive insurance, namely, cost-effective location accuracy in harsh signal environments, evidentiary assurance of location estimation, handling of dynamic and stationary positioning in a single device, high-ratio compression for a set of stationary positions in urban canyon, high-ratio compression for a dynamic tracklog in urban canyon, high-ratio compression for a set of asset motion behaviors, a method of remote device health check, including anti-tampering, removal of residual price assignment errors, anonymous use without on-board maps, and a method of deconsolidating payments to multiple payees with multiple payment regimes.