Abstract: The present invention provides an image acquisition and viewing system that employs a fish-eye lens and an imager, such as, a CCD array, to obtain a wide angle image, e.g., an image of a hemispherical field of view. The system of the invention further includes a primary display for displaying the image, and a secondary display for presenting a perspective-corrected view of a selected portion of the image. A processor effects correction of a selected portion of the image for distortions introduced by the fish-eye lens by utilizing methods according to the teachings of the invention. The processor further effects the display of the image and its perspective-corrected portion thereof on the primary and the secondary displays, respectively. Moreover, the processor effects the display of a graphical object on the first display to delineate the portion that is presented on the secondary display.

Abstract: A radiation sensitive resin composition including a photo-acid generator and an aliphatic polymer having one or more electron withdrawing groups adjacent to or attached to a carbon atom bearing a protected hydroxyl group, wherein the protecting group is labile in the presence of in situ generated acid is described. The radiation sensitive resin composition can be used as a resist suitable for image transfer by plasma etching and enable one to obtain an etching image having high precision with high reproducibility with a high degree of resolution and selectivity.

Abstract: The present invention provides a beam stop for use in an ion implantation system that includes a base formed of a thermally conductive material, and a heat transfer layer formed of a semi-elastic material that is disposed on a surface of the base. The beam stop further includes one or more tiles, each formed of a thermally conductive refractory material, that are disposed on the semi-elastic layer so as to face an ion beam in the implantation system. The heat transfer layer transfers heat generated in the tile in response to ion beam impact to the base. The base in turn can be coupled to a heat sink to remove heat from the base. The thickness and the thermal conductivity of the base, and those of the heat transfer layer and the tile are chosen so as to ensure uniform expansion of the base and the tile when the beam stop is heated by ion beam impact.

Abstract: The present invention provides a method for creation of high quality semiconductor-on-insulator structures, e.g., silicon-on-insulator structures, using implantation of sub-stoichiometric doses of oxygen at multiple energies. The method employs sequential steps of ion implantation and high temperature annealing to produce structures with a top silicon layer having a thickness ranging from 10-250 nm and a buried oxide layer having a thickness 30-300 nm. The buried oxide layer has a breakdown field greater than 5 MV/cm. Further, the density of silicon inclusions in the BOX region is less than 2×107 cm−2. The process of the invention can be used to create an entire SOI wafer, or be used to create patterned SOI, regions where SOI regions are integrated with non-SOI regions.

Abstract: The present invention provides photoresist materials for use in photolithography at wavelengths less than about 248 nm. More particularly, the photoresists of the invention are particularly suited for use in 157 nm lithography. A photoresist composition of the invention includes a polymer having at least one monomeric unit having an aromatic moiety. The monomeric unit further includes at least a group, such as an electron withdrawing group, attached to the aromatic moiety. The attached group includes at least one CF bond. The polymer further includes an acidic hydroxyl group. A photoresist composition of the invention can have an absorbance in a range of 1-5 &mgr;m−1 at 157 nm, rendering it particularly suitable for use as a single layer resist in 157 nm lithography.

Abstract: Wafer-holding structures formed from thermosetting resins are disclosed for use in semiconductor processing including, for example, SIMOX wafer processing. In one embodiment a pin is disclosed that is adapted to receive a wafer edge, and is coupled with a wafer holder assembly. The pin can be filled with a conductive material to provide an electrical pathway between the wafer and the wafer holder assembly, which can be coupled to a ground. This arrangement provides a conductive path for inhibiting electrical discharges from the wafer during the ion implantation process. The pin exhibits thermal isolation characteristics and sufficient hardness so as to not effect localized thermal dissipation of the wafer, yet is sufficiently soft so as to not mark or otherwise damage the wafer.

Abstract: The present invention describes encapsulated inorganic resists which are compatible with conventional resist processing such as spin casting from organic solvents and development with aqueous 2.38% TMAH developers. The resist includes encapsulated inorganic materials as resist components, a fact that significantly increases the plasma etch selectivity of the resists compared to conventional polymeric resists. In effect, these resist systems act as a photoimagable single layer hard mask, although use as the top layer in a bilayer resist scheme is contemplated.

Abstract: A wafer holder assembly includes first and second main structural members from which first and second wafer-holding arms extend. The first arm is secured to the main structural members by a graphite distal retaining member. The second arm is pivotally biased to a wafer-hold position by a graphite bias member. This arrangement provides a conductive path from the wafer to the assembly for inhibiting electrical discharges from the wafer during the ion implantation process. The assembly can further include additional graphite retaining members for maintaining the structural integrity of the assembly during the extreme conditions associated with SIMOX wafer processing without the need for potentially wafer-contaminating adhesives and conventional fasteners. The wafer-contacting pins at the distal end of the arms can be formed from silicon. The silicon pins can be coated with titanium nitride to enhance electrical contact with the wafer and to provide an abrasion resistant surface.

Abstract: The present invention provides a high switching capacity network device in one telco rack including both physical layer switch/router subsystems and an upper layer switch/router subsystem. Instead of providing a single physical layer switch/router subsystem, multiple physical layer switch/router subsystems are provided. Segmenting the physical layer switch/router into multiple, for example, four, subsystems better utilizes routing resources by allowing etches for the physical layer subsystems to be moved away from the center of the mid-plane/back-plane of the network device. Moving the physical layer subsystem etches away from the center of the mid-plane enables the network device to include an upper layer/switch router subsystem with etches toward the center of the mid-plane.

Abstract: The present invention provides a heating assembly that includes a thermally conductive, lamp-mounting block manufactured from aluminum or a similar material, which can be machined as a single-piece (e.g., unibody) block. The unibody block includes one or more networks of inner passageways bored or otherwise machined within the block for transporting one or more cooling fluids. The mounting block can also have a reflective coating on one or more of its surfaces that face the lamps to efficiently reflect heat and/or light generated by the lamps onto a desired surface, for example, a semiconductor wafer. Thermal isolation devices, e.g., pads, provide for both physical mounting of the heating lamps to the mounting block and also provide thermal isolation between the heating lamp and its electrical connections are also disclosed to protecting heat-sensitive elements of the heating assembly such as seals.

Abstract: The present invention provides a computer system having a control process and a device driver process that is in communication with the control process, and a local back-up process, independent of both the control process and the device driver process. The local back-up process facilitates recovery of the device driver process. In one aspect of the invention, the computer system is a network device that includes a control plane and a data plan. The control plane includes a control process, and the data plane includes a device driver process. A local back-up process, independent of both the control process and the device driver process, facilitates recovery of the device driver process if the device driver process is terminated.

Abstract: The present invention provides an intra-ocular lens (IOL) whose focusing performance can be modified after its implantation in the eye without a need for any invasive procedure. An IOL of the invention has an optical chamber having at least a flexible region that is deformable under influence of a fluid. The IOL further include a reservoir for storing an optical fluid in fluid communication with the optical chamber, and a valve that regulates the fluid communication between the reservoir and the optical chamber. The lens can also include a pump that is actuated by an external energy source to transfer the optical fluid between the reservoir and the optical chamber to change the amount of fluid in the optical chamber, thereby modifying the focusing performance of the IOL.

Abstract: Computer systems and methods of data processing are disclosed in which hierarchical levels of fault/event management are provided that intelligently monitor hardware and software and proactively take action in accordance with a defined fault policy. A fault policy based on a defined hierarchy ensures that for each particular type of failure the most appropriate action is taken. In one embodiment, a master Software Resiliency Manager (SRM) serves as the top hierarchical level fault/event manager, with one or more slave SRMs serving as the next hierarchical level fault/event manager. The software applications resident on each board can also include sub-processes (e.g., local resiliency managers or LRMs) that serve as the lowest hierarchical level fault/event managers.

Abstract: Computer systems and methods of data processing are disclosed in which hierarchical descriptors define levels of fault/event management to intelligently monitor hardware and software and proactively take action in accordance with a defined fault policy. A fault policy based on a defined hierarchy ensures that for each particular type of failure the most appropriate action is taken. Hierarchical descriptors can be used to provide information specific to each failure or event. The hierarchical descriptors provide granularity with which to report faults, take action based on fault history and apply fault recovery policies. The descriptors can be stored in a master event log file or local event log files through which faults and events may be tracked and displayed to the user and allow for fault detection at a fine granular level and proactive response to events. In addition, the descriptors can be matched with descriptors in a fault policy to determine the recovery action to be taken.

Abstract: The present invention provides methods and systems for generating ultrasound images of a plurality of scatterers disposed in a target region. More particularly, a method of the invention derives model response functions for each of a plurality of transducers for a given distribution of scattering media. The interrogation pattern can be selected to include a set of unfocused ultrasound waves generated by one or more of the transducers. The interrogation pattern is transmitted into the target region, and the transducers are utilized to detect echoes generated by the scatterers in the target region in response to the interrogation pattern. The methods and systems of the invention advantageously allow obtaining ultrasound images of a target region without employing beamforming either in transmission of ultrasound waves into the region or in detection of echoes generated by scatterers in the target region in response to the transmitted waves.

Abstract: The present invention pertains to polymeric compositions useful for the suppression or elimination of outgassing of volatile components generated from photoresist polymers during lithographic construction. In resists of the invention, an aromatic compound is mixed with a photoresist composition, such that the aromatic compound suppresses or eliminates outgassing of volatile components upon exposure of the resist to radiation. The aromatic additive is preferably an aromatic polymer and in at least some instances can be substituted with at least one electron-donating group or electron-withdrawing group to enhance its stabilizing effects. In one embodiment, the aromatic compound can be an additive to a resist composition. In another embodiment, the aromatic compound can be incorporated into the polymeric backbone of the resist composition.

Abstract: The present invention provides methods for operating a computer system that call for executing a plurality of modular processes, providing a data file for use by the plurality of the processes, and incorporating a view identification within each of the plurality of processes to define data accessible by each process within the data file. The processes can include, for example, two identical processes that are executed simultaneously to access the same data within the data file in accordance with the same incorporated view identification.

Abstract: The present invention provides improved ion implantation systems and methods in which a high voltage probe is utilized in an ion implantation system to directly measure energy of an ion beam incident on a substrate. More particularly, an exemplary ion implantation system can include an ion source maintained at a high electric potential that generates ions, and a plurality of extraction electrodes that can accelerate the ions to a desired energy. The system further includes an end-station, maintained at ground electric potential, in which a wafer holding for positioning a wafer in the path of an ion beam is disposed. The ion implantation system is further characterized by a high energy probe disposed between a high voltage terminus of the ion source and ground for directly measuring the energy of the ions.

Abstract: The present invention provides a catheter having an x-ray generator unit at its tip which generates x-ray radiation having a wavelength in a range effective for treating biological tissue. In one embodiment, the x-ray generator unit includes a miniature x-ray generator and a miniature transformer that form, in combination, a monolithic device. The transformer includes a primary winding that receives an input voltage in a range of 100 V to 4 kV from a power source, via a flexible cable that runs from the proximal end of the catheter body to its distal end. The transformer further includes a secondary winding that up-converts the input voltage to generate an output voltage in a range of 10 kV to 40 kV to be applied to a cathode of the x-ray generator. The cathode emits electrons in response to the applied voltage, and an extraction electrode guides the emitted electrons to an anode, which is preferably formed of a high-Z refractory metal.

Abstract: The present invention provides a network device including redundant, synchronous central timing subsystems (CTSs) each having a voltage controlled timing circuit for receiving a constant master voltage signal and variable slave voltage signal. Each CTS also includes a control logic circuit for selecting the constant master voltage signal for use by the voltage controlled timing circuit when the CTS is master and for selecting the variable slave voltage signal when the CTS is slave. Using a constant master voltage signal eliminates the need for a separate master oscillator in each CTS. Oscillators are typically expensive, consume significant space on the printed circuit board and have location restrictions on where they may be placed on the printed circuit board.