Abstract: A wafer W is processed by supplying a two-fluid, high pressure jet water, or mega-sonic water onto the wafer W, while rotating the wafer W in an essentially horizontal state. After supply of the cleaning fluid is stopped, the wafer W is dried by rotating the wafer W at a higher speed than that used in supplying the cleaning fluid. No rinsing process using purified water is performed in a period after stopping supply of the cleaning fluid and before rotating the substrate at the higher speed.

Abstract: The present invention provides a latent catalyst for epoxy resin, comprising: a cation moiety having an activity of accelerating curing reaction of epoxy resin; and a silicate anion moiety of suppressing the curing reaction-accelerating activity. Also disclosed are an epoxy resin composition comprising the latent catalyst and a semiconductor device using the epoxy resin composition.

Abstract: Provided is an instrument housing case, which allows an instrument to be readily taken in and out of the instrument. The instrument housing case (10) includes: a main body case (20), which has a bottomed cylindrical shape, and includes an opened upper end surface and opened upper portions of parts of side surfaces; and a cover body (30). The cover body (30) includes: a top plate (31) adapted for an opening portion (26) of the upper end surface of the main body case; and a side plate (33) adapted for an opening portion (28) of the parts of the side surfaces of the main body case (20), the side plate (33) including a lower end portion pivotably fixed to the main body case (20) through a hinge (40). The cover body (30) covers the opening portion (26) of the upper end surface and the opening portion (28) of the parts of the side surfaces of the main body case (20) to thereby allow the opening portions (26, 28) to open and close.

Abstract: Alleles of the thrA gene from Enterobacteriaceae encoding desensitized aspartokinase I-homoserine dehydrogenase I enzymes and methods for the fermentative production of L-threonine using bacteria containing these alleles.

Abstract: A water collection, storage, and distribution system includes one or more individual water storage tanks. Each water storage tank has its own microprocessor that controls the operation of the storage tank so that each storage tank can operate either as a stand-alone storage tank or can be integrated into a series or a daisy chain of storage tanks. Each individual storage tank monitors its water level, its temperature, and its flow rate. When a risk of freezing exists, based on time and temperature, the storage tank can dump water. When the water in the storage tank is approaching stagnation, based on flow rate and time, the storage tank can dump water. When a storage tank is part of a daisy chain of storage tanks, each individual tank monitors not only its own water level but also the water level of the next downstream storage tank and pumps water to the downstream storage tank as required.

Abstract: As ignition control patterns for a multi-stage inflator, a first control pattern for controlling a maximum internal pressure of an airbag in a deployed state to be a set pressure or higher and a second control pattern for controlling the maximum internal pressure of the airbag in a deployed state to the set pressure or lower are set to a control unit. A connecting band for partially limiting deployment of an airbag body in a side closer to an occupant protecting portion by connecting the side closer to a base and the side closer to the occupant protecting portion of the airbag body is provided to the airbag, and the strength of the connecting band is set such that the connecting band is to be torn when an internal pressure of the airbag in a deployed state reaches the set pressure or higher.

Abstract: Provided is a fixing device including: a heater; a heating body that is heated by the heater and is caused to rotate; a pressure body that is in contact with the heating body, and is caused to rotate; a plurality of temperature sensor units each including a temperature sensing element that is covered with a protective member and is in contact with the heating body in order to sense a temperature of the heating body; and a control unit that recognizes temperatures of the heating body at respective portions thereof based on signals received from the temperature sensor units, brings the heater into an ON state if the recognized temperatures exhibit a temperature difference of a predetermined value or larger, judges that the protective member has peeled off if all the temperatures sensed by using the temperature sensor units are recognized to have risen, and corrects the temperature.

Abstract: A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next, a second fluid which is more volatile than the process liquid is supplied to the upper surface of the substrate (W) from the fluid nozzle (12), while the wafer (W) is being rotated. During this supply operation, a supply position (Sf) of the second fluid to the substrate (W) is moved radially outward from a rotational center (Po) of the substrate (W). As a result, it is possible to prevent the generation of particles on the substrate (W) after it is dried by using the first and second fluids.

Abstract: A processing system 1 comprises: a processing vessel 30 configured to accommodate an object to be processed W in a processing space 83; a process-fluid generating part 41 configured to generate a process fluid of a predetermined temperature; and a main duct 56 arranged between the process-fluid generating part 41 and the processing vessel 30, the main duct 56 being configured to guide the process fluid supplied from the process-fluid generating part 41. A process-fluid supply duct 171 is arranged on a downstream side of the main duct 56 via a switching valve 70, the process-fluid supply duct 171 being configured to introduce the process fluid into the processing space 83 of the processing vessel 30. A process-fluid bypass duct 172 is arranged on the downstream side of the main duct 56 via the switching valve 70, the process-fluid bypass duct 172 being configured to guide a process fluid, which is not introduced to the process-fluid supply duct 171, so as to bypass the processing space 83.

Abstract: In the present invention, an image of a substrate is picked up by an image pickup unit with the substrate being held by a transfer member. A drive unit for the transfer member is controlled by a driving signal from a first controller. A driving signal outputted to the first controller is outputted also to a second controller so that the second controller controls the image pickup unit based on the driving signal, thereby synchronizing drive of the transfer member with the image pickup by the image pickup unit. According to the present invention, the throughput in performing a defect inspection for the substrate is improved and a precise image is captured and subjected to accurate inspection.

Abstract: A heat processing furnace comprises: a processing vessel for receiving an object to be processed by a heat process; a cylindrical heat insulation member surrounding the processing vessel; a helical heating resistor arranged along an inner peripheral surface of the heat insulation member; a support member for supporting the heating resistor. The support member includes a base part positioned on an inside of the heating resistor, and a plurality of support pieces extending radially outward from the base part through spaces between adjacent portions of the heating resistor so as to support the heating resistor, the support member being formed to have a comb-like shape. An upper surface part of each of the support pieces is formed to have a curved shape in order to reduce a frictional resistance generated when the heating resistor is moved upon a thermal expansion and a thermal shrinkage thereof.

Abstract: Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is processed with the chemical liquid. The control of the humidity is performed at least in a drying step that dries the substrate W. In one embodiment, the ambient humidity around the substrate is controlled when a fluid containing IPA as a drying fluid is supplied to the substrate W after processing the substrate W with the chemical liquid.

Abstract: A driving force control device includes an individual-wheel friction-circle limit-value calculating portion that calculates friction-circle limit-values of individual wheels, an individual-wheel requested-resultant-tire-force calculating portion that calculates requested resultant tire forces of the individual wheels, an individual-wheel resultant-tire-force calculating portion that calculates resultant tire forces of the individual wheels, an individual-wheel requested-excessive-tire-force calculating portion that calculates requested excessive tire forces of the individual wheels, an individual-wheel excessive-tire-force calculating portion that calculates excessive tire forces of the individual wheels, an excessive-tire-force calculating portion that calculates an excessive tire force, an over-torque calculating portion that calculates an over-torque, and a control-amount calculating portion that calculates a control amount that is output to an engine control unit.

Abstract: A development device 4a is separated into a toner agitating portion 21 and a toner supply portion 22 by a boundary wall 23 in which a first opening 28 and a second opening 29 are formed. Inside the toner agitating portion 21, an agitation paddle 24 is rotatably supported, and inside the toner supply portion 22, components such as a development roller 25, a toner supply roller 16, and a regulation member 27 made of metal for regulating the thickness of a thin toner layer formed on the development roller 25 and for electrically charging toner are provided. A groove 27a is formed in the regulation member 27 all along the length thereof.

Abstract: A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, which has a large number of gas-discharging holes, a gas-supplying mechanism that supplies a process gas into the chamber through the showerhead, and a showerhead-temperature controlling unit that controls a temperature of the showerhead.