Patents Represented by Attorney Smith, Gambrell & Russell
  • Patent number: 8177990
    Abstract: Disclosed is a method of etching a substrate having a layered structure in which a photoresist mask with a pattern, a coating film made of silicon oxide, and an organic film are laminated in that order from the top. Before etching the coating film of silicon oxide, a deposit is deposited on the photoresist mask by using plasma generated from a hydrocarbon gas such as CH4 gas so as to narrow the size of openings in the pattern of the photoresist mask. The pattern of the photoresist mask is well transferred to the organic film through the coating film, and a pattern with openings having a high aspect ratio can be formed in the organic film and toppling of the pattern in the organic film can be prevented. The organic film with the transferred pattern is used as an etch mask for etching the underlying layer.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: May 15, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Ryou Mochizuki, Jun Yashiro
  • Patent number: 8177550
    Abstract: A vertical heat treatment apparatus includes: at least one loading and unloading part 3 and 4 for loading and unloading a carrying container 2 containing a plurality of process objects W into and from said vertical heat treatment apparatus; a first storage part 5 that stores a plurality of carrying containers loaded into said vertical heat treatment apparatus via the loading and unloading part; a heat treatment furnace 7 that accommodates a holder 6 holding a plurality of process objects at multiple levels to perform a predetermined heat treatment to the process objects; and a transfer 8 part that supports thereon a carrying container for transferring process objects between the holder and the carrying container, wherein an upper loading and unloading part 3 and a lower loading and unloading part 4 are provided as said at least one loading and unloading part, and a second storage part 20 that stores a carrying container is disposed between the upper and lower loading and unloading parts.
    Type: Grant
    Filed: October 17, 2005
    Date of Patent: May 15, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Kenjiro Haraki, Hiroyuki Yamamoto, Satoshi Uemura, Yuji Tsunoda, Yasushi Takeuchi, Hirofumi Kaneko
  • Patent number: 8179082
    Abstract: The invention relates to a soft starting method and system thereof in the way of wave-skipping with stepped frequency and stepless voltage regulating for a motor which can be applied to the large torque starting of AC motor under the condition of a power supply of a industrial frequency supply source and the safe starting of higher load. Trigger signals generated by a control system, in the soft starting method of the invention, act on five sets of anti-parallel thyristor valves connected between the power supply and the motor to conduct a pair of thyristors thereof according to a set frequency and sequence, and the motor is started from a standstill status to full speed in the way of wave-skipping by controlling the sets of the thyristor valves. The method may improve the starting torque for more than 10 times of the traditional motor soft starting of the voltage reduction and control the starting current for about two times of the rated current.
    Type: Grant
    Filed: July 24, 2007
    Date of Patent: May 15, 2012
    Assignee: Rongxin Power Electronics Co., Ltd
    Inventors: Xing Li, Qiang Zuo, Yingsheng Xu, Mingqi Si
  • Patent number: 8178448
    Abstract: Disclosed is a method for using a film formation apparatus to form a silicon nitride film by CVD on target substrates while suppressing particle generation. The apparatus includes a process container and an exciting mechanism attached on the process container. The method includes conducting a pre-coating process by performing pre-cycles and conducting a film formation process by performing main cycles. Each of the pre-cycles and main cycles alternately includes a step of supplying a silicon source gas and a step of supplying a nitriding gas with steps of exhausting gas from inside the process container interposed therebetween. The pre-coating process includes no period of exciting the nitriding gas by the exciting mechanism. The film formation process repeats a first cycle set that excites the nitriding gas by the exciting mechanism and a second cycle that does not excite the nitriding gas by the exciting mechanism.
    Type: Grant
    Filed: August 6, 2010
    Date of Patent: May 15, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Nobutake Nodera, Masanobu Matsunaga, Kazuhide Hasebe, Koto Umezawa, Pao-Hwa Chou
  • Patent number: 8178631
    Abstract: Disclosed is a resin composition comprising a benzoxazole resin precursor having a first repeating unit obtained by reacting a bisaminophenol compound and a dicarboxylic acid compound, and a cross-linking agent wherein at least one of the bisaminophenol compound and the dicarboxylic acid compound has a diamondoid structure. The benzoxazole resin precursor further comprises a second repeating unit obtained by reacting a bisaminophenol compound not having a diamondoid structure and a dicarboxylic acid compound not having a diamondoid structure. Also disclosed is a resin film comprising the resin composition.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: May 15, 2012
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Takashi Enoki, Atsushi Izumi, Hiromi Oki, Yukiharu Ono, Kazuyoshi Fujita
  • Patent number: 8180273
    Abstract: A meandering detection device capable of detecting meandering of a subject with high accuracy includes: a contact which has an open end making contact with and following a subject body and which is supported by a support part; a reflection part integrally provided to the contact and reflecting light; an emission part emitting light toward the reflection part; and a first and a second light receiving parts which are disposed in front of the reflection part, which receive the light reflected by the reflection part and then outputs signals in accordance with respective amounts of light received, and which detect meandering of the subject based on a difference in the amount of light received.
    Type: Grant
    Filed: November 13, 2007
    Date of Patent: May 15, 2012
    Assignee: Kyocera Mita Corporation
    Inventor: Kensuke Fujihara
  • Patent number: 8178599
    Abstract: The object of the present invention is to provide an epoxy resin composition which is excellent in flash characteristics and thermal conductivity, and gives an area mounting type semiconductor apparatus having little warpage and excellent temperature cycle properties. According to the present invention, there is provided an epoxy resin composition for semiconductor encapsulation which comprises, as essential components, (A) a spherical alumina, (B) an ultrafine silica having a specific surface area of 120-280 m2/g, (C) a silicone compound, (D) an epoxy resin, (E) a phenolic resin as a curing agent, and (F) a curing accelerator, in which said ultrafine silica is contained in an amount of 0.2-0.8% by weight based on the total weight of the resin composition, and said silicone compound is a polyorganosiloxane and is contained in an amount of 0.3-2.0% by weight based on the total weight of the resin composition.
    Type: Grant
    Filed: October 22, 2008
    Date of Patent: May 15, 2012
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventor: Hironori Osuga
  • Patent number: 8171910
    Abstract: The present invention a cylinder liner which controls gap formation at the interface between the cylinder liner and a cylinder block main body for accepting the cylinder liner therein, and serves to acquire closely contacting state and enhanced bonding strength between the cylinder liner and the cylinder block main body, and to provide a cylinder block, and further to provide a process for the preparation of the cylinder liner. A plurality of circumferential grooves 15 extending in the circumferential direction is formed from a first circumferential groove 16 having a shape of “J” of the alphabet in sectional view and extending in a circumferential direction formed on an outer surface 12 of an cast iron cylinder liner 10, and a second circumferential groove 18 having a shape of “J” of the alphabet in sectional view and linking to the first circumferential groove 16.
    Type: Grant
    Filed: September 2, 2009
    Date of Patent: May 8, 2012
    Assignees: Fuji Jukogyo Kabushiki Kaisha, Koyama Co., Ltd.
    Inventors: Yuki Tachibana, Yoshiro Shina, Makoto Miyasaka, Hiroki Shimizu, Daisuke Shinkai
  • Patent number: 8175763
    Abstract: An automatic landing apparatus for an aircraft includes: an altitude sensor; an airspeed sensor; an attitude angle sensor; a direction sensor; a position sensor; a landing command inputting section; and a control device, including: an approaching flight control section for realizing an approaching flight along a predetermined path by controlling a propulsion device and a control surface, in response to a landing command; a flare control section for controlling the propulsion device to provide a minimum output and controlling the control surface to perform a flare when the altitude of the aircraft becomes less than a predetermined landing altitude; and a landing run control section for realizing a landing run by controlling the propulsion device to maintain the minimum output and controlling the control surface to maintain the attitude angle and the traveling direction of the aircraft when the airspeed of the aircraft becomes less than a predetermined landing speed.
    Type: Grant
    Filed: January 13, 2009
    Date of Patent: May 8, 2012
    Assignee: Fuji Jukogyo Kabushiki Kaisha
    Inventors: Akihiro Yamane, Mitsuru Kono, Takahiro Kumamoto
  • Patent number: 8173204
    Abstract: The present invention relates to the technical field of electrochemistry and describes a method and an apparatus for producing fuel cell components, in particular membrane electrode units (“MEUs”) for membrane fuel cells. In the case of the method according to the invention, anode and cathode electrodes are applied to two neighboring heated rollers that are subjected to a vacuum. The applied vacuum has the effect that they are introduced exactly in position into a roller nip and then laminated with an ion-conducting membrane. Due to the extended heat influencing zone, high production rates are achieved with the method according to the invention. The apparatus according to the invention comprises a rolling mill with heatable vacuum rollers. It has advantages due to the simple construction and the absence of transfer locations.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: May 8, 2012
    Assignee: Umicore AG & Co. KG
    Inventor: Lutz Rohland
  • Patent number: 8175797
    Abstract: A form of a travel path of an oncoming vehicle is recognized based on white-line data. A speed component of the oncoming vehicle with respect to the travel path (route) is calculated by weighting a lateral speed component orthogonal to the route and a lateral speed component following the route, with a speed correction coefficient which is set in accordance with a relative distance between a subject vehicle and the oncoming vehicle. A change in behavior of the oncoming vehicle is predicted, and a possibility of collision against the subject vehicle is determined. If it is determined that there is a possibility of collision, an alarm is output to alert a driver to the possibility of collision.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: May 8, 2012
    Assignee: Fuji Jukogyo Kabushiki Kaisha
    Inventor: Masaru Kogure
  • Patent number: 8175334
    Abstract: A vehicle environment recognition apparatus includes stereo-image taking means for outputting a reference image of the surroundings of a subject vehicle, stereo matching means for correlating a parallax with each pixel block in the reference image by stereo matching, preceding-vehicle detecting means for detecting a preceding vehicle from the reference image on the basis of the parallax or the like, and smear determining means for searching a pixel column vertically extending in the reference image for brightnesses of pixels, the pixel column including a pixel block having a parallax less than or equal to a long-distance parallax threshold value corresponding to the long distance including infinity, and determining that a smear occurs when a ratio of the number of pixels having brightnesses more than or equal to a predetermined brightness to the total number of pixels in the pixel column is more than or equal to a predetermined ratio.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: May 8, 2012
    Assignee: Fuji Jukogyo Kabushiki Kaisha
    Inventor: Yasushi Takahashi
  • Patent number: 8174563
    Abstract: An object detecting system includes stereo-image taking means for taking images of an object and outputting the images as a reference image and a comparative image, stereo matching means for calculating parallaxes by stereo matching, and determination means for setting regions of objects in the reference image on the basis of the parallaxes grouped by grouping means, and performing stereo matching again for an area on the left side of a comparative pixel block specified on an epipolar line in the comparative image corresponding to a reference pixel block in a left end portion of each region. When a comparative pixel block that is different from the specified comparative pixel block and provides the local minimum SAD value less than or equal to a threshold value is detected, the determination means determines that the object in the region is mismatched.
    Type: Grant
    Filed: October 29, 2008
    Date of Patent: May 8, 2012
    Assignee: Fuji Jukogyo Kabushiki Kaisha
    Inventor: Toru Saito
  • Patent number: 8169090
    Abstract: An encapsulation resin composition for preapplication, comprising (a) an epoxy resin, and (b) a curing agent having flux activity, wherein the tack after B-staging is at least 0 gf/5 mm? and at most 5 gf/5 mm?, and the melt viscosity at 130° C. is at least 0.01 Pa·s and at most 1.0 Pa·s; a preapplied encapsulated component and semiconductor device using the composition, and a process of fabrication thereof. The resin composition is less susceptible to air entrapment during provisional placement of semiconductor chips, and excels in workability and reliability.
    Type: Grant
    Filed: May 30, 2006
    Date of Patent: May 1, 2012
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Satoru Katsurayama, Yushi Sakamoto, Masaya Koda
  • Patent number: 8166914
    Abstract: A plasma processing apparatus of the batch type includes a tubular process container having a closed end and an open end opposite to each other, and a process field for accommodating target substrates, the process container including a tubular insulating body. The apparatus further includes a holder configured to hold the target substrates at intervals, a loading mechanism configured to load and unload the holder into and from the process container, and a lid member connected to the loading mechanism and configured to airtightly close the open end. A first electrode is disposed at the closed end of the process container, and a second electrode is disposed at the lid member, to constitute a pair of parallel-plate electrodes. An RF power supply is connected to one of the first and second electrodes and configured to apply an RF power for plasma generation.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: May 1, 2012
    Assignee: Tokyo Electron Limited
    Inventor: Toshiki Takahashi
  • Patent number: 8168270
    Abstract: An oxide film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including a source gas containing a film source element and no amino group, a second process gas including an oxidizing gas, and a third process gas including a preliminary treatment gas. A first step includes an excitation period of supplying the third process gas excited by an exciting mechanism, thereby performing a preliminary treatment on the target substrate by preliminary treatment gas radicals. A second step performs supply of the first process gas, thereby adsorbing the film source element on the target substrate. A third step includes an excitation period of supplying the second process gas excited by an exciting mechanism, thereby oxidizing the film source element adsorbed on the target substrate by oxidizing gas radicals.
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: May 1, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Kazuhide Hasebe, Yoshihiro Ishida, Takehiko Fujita, Jun Ogawa, Shigeru Nakajima
  • Patent number: 8167521
    Abstract: The present invention restrains, during a transfer of a substrate, a central portion of the substrate from being warped by its own weight, which might be caused by a super-enlargement of a diameter of the substrate. A substrate transfer apparatus 18 includes: a support part 17 which is moved above a substrate w of a large diameter; and an upside grip mechanism 28 disposed on the support part 17, the upside grip mechanism 28 capable of supporting a peripheral portion of the substrate w from above. The support part 17 is provided with a non-contact sucking and holding part 30 having a suction hole 31 and a blow hole 32. The non-contact sucking and holding part 30 sucks and holds the substrate w in a non-contact manner, by blowing a gas onto the central portion of the upper surface of the substrate w and sucking the central portion to form an air layer 50 such that the central portion of the wafer w is not warped.
    Type: Grant
    Filed: April 23, 2007
    Date of Patent: May 1, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Ken Nakao, Hitoshi Kato, Junichi Hagihara
  • Patent number: 8163328
    Abstract: The invention can be summarized as follows. There is provided one or more DNA coating compositions that comprise one or more polymer compounds, water, and optionally one or more non-water polar solvents. The DNA coating composition may also comprise DNA. Also provided are methods and kits for marking objects with a DNA coating composition comprising DNA.
    Type: Grant
    Filed: November 17, 2005
    Date of Patent: April 24, 2012
    Assignee: Forensink Corporation, Inc.
    Inventors: Marc Gaudreau, Faisal Ibrahim
  • Patent number: 8163532
    Abstract: The present invention relates to microorganisms and methods for producing methionine by reactivation of the MetH enzyme.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: April 24, 2012
    Assignee: Evonik Degussa GmbH
    Inventors: Oskar Zelder, Hartwig Schröder, Corinna Klopprogge, Andrea Herold, Stefan Haefner, R. Rogers Yocum, Thomas A. Patterson, Mark Williams
  • Patent number: 8164805
    Abstract: An image reading apparatus includes: a lamp shining light on a target original document to be read; a lamp operating circuit for turning on the lamp; an image sensor receiving light shone from the lamp to the original document and reflected from the original document, for generating image data; a control section outputting a lamp control signal for controlling turning-on and -off of the lamp to the lamp operating circuit; and a lamp control circuit, separate from the control section, outputting a lamp control signal for controlling turning-on and -off of the lamp and, when a main power switch of the apparatus is turned on, permitting the lamp to be turned on before the control section is activated.
    Type: Grant
    Filed: June 9, 2009
    Date of Patent: April 24, 2012
    Assignee: Kyocera Mita Corporation
    Inventor: Masami Shibahara