Patents Represented by Attorney, Agent or Law Firm Snider & Associates
  • Patent number: 6212952
    Abstract: Gravity gradient measurements taken by an accelerometer type gradiometer are optimized by tilting the measuring plane of the instrument by a selected angle above and below the horizontal to obtain data that can be differenced or otherwise processed to remove instrument bias and by taking data at first and then at a second orthogonal azimuth heading to obtain absolute non-relative gradient measurements.
    Type: Grant
    Filed: February 18, 2000
    Date of Patent: April 10, 2001
    Assignee: Lockheed Martin Corporation
    Inventors: Melvin Schweitzer, Walter K. Feldman, William F Konig, Daniel J. DiFrancesco, David L. Sieracki, Carlo P. San Giovanni
  • Patent number: 6210002
    Abstract: A lens holding mechanism of spectacles with an extremely simple structure is provided, which mechanism nonetheless enables the respective lenses to be securely clamped. The respective lenses are held onto the respective endpieces or the bridge by abutting an elastically deformable holding member having a receiving portion with a first corresponding hole provided therethrough and an abutment portion with a second corresponding hole provided therethrough onto the lens surface and tightly inserting a first inserting pin of a joint member mounted onto the respective endpieces or the bridge into a holding aperture provided in the vicinity of the circumferential fringe side of the respective lenses so as to be tightly received into the first corresponding hole while at the same time by tightly inserting the second inserting pin into the second corresponding hole. In spite of such an extremely simple structure, the reliable lens clamping is assured.
    Type: Grant
    Filed: June 5, 2000
    Date of Patent: April 3, 2001
    Inventor: Hideaki Tachibana
  • Patent number: 6204264
    Abstract: A benzimidazole derivative or a salt thereof expressed by the following Formula (I): wherein one of A and B is a hydrocarbon group of C10-30 expressed by R1 and the other is —(CH2)n—NR2R3; R2 and R3 individually represent H, lower alkyl, phenyl or benzyl, or —NR2R3 may be a heterocycle having 3-7 members, or —CONR5—(CH2)n—NR2R3 may be the following Group (W): wherein R2 is H, lower alkyl, phenyl or benzyl and ring E is a heterocycle of 6 or 7 members; R4 is selected from the group consisting of H, halogen, cyano, trifluoromethyl, lower alkyl and etc.; R5 is H, lower alkyl, lower acyl or lower alkylcarbamoyl; m is 0 or 1; and n is an integer of 0-5. The benzimidazole derivative or the salt thereof has excellent hair growth and regrowth promoting effects, which are useful for care, improvement or prevention of hair loss in mammals and, in particular, in human.
    Type: Grant
    Filed: September 17, 1999
    Date of Patent: March 20, 2001
    Assignee: Shiseido Co., Ltd.
    Inventors: Koji Kobayashi, Hirotada Fukunishi, Kenichi Umishio, Masahiro Tajima
  • Patent number: 6205014
    Abstract: The multilayer ceramic capacitor has a plurality of dielectric layers and inner layers laminated alternately laminated on one another. In each of the dielectric layers, the rate of ceramic grain which form the dielectric layers and present singly in one dielectric layer over its entire longitudinal thickness is set to amount to 20% or more. The multilayer ceramic capacitor can prevent a decrease in a CR product to a value lower than a desired level even if the dielectric layer becomes as thin as 5 &mgr;m or less. This can comply with demands for a multilayer ceramic capacitor that the number of the dielectric layers to be laminated on the inner electrodes should be increased yet the thickness of the dielectric layers should be made thinner in order to meet requirements for making electronic circuit more compact in size and higher in density.
    Type: Grant
    Filed: April 19, 1999
    Date of Patent: March 20, 2001
    Assignee: Taiyo Yudan Co., Ltd.
    Inventors: Yasuyuki Inomata, Yoshikazu Okino
  • Patent number: 6199431
    Abstract: Modal frequencies of known good sample parts (SN) are analyzed to determine a pattern which will identify acceptable material and dimensional variations. The data obtained by analysis is then archived. Production parts are then measured at the modal frequencies and the production parts are accepted or rejected after pattern analysis of each part by comparing the production part with response to the pattern identified as acceptable for material and dimensional variations. Production part data is archived for future testing. This procedure is repeated throughout the lifetime of a part, and may be used on parts which are part of an assembly, including other unmeasured parts.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: March 13, 2001
    Assignee: Quasar International, Inc.
    Inventors: Robert H Nath, James J Schwarz, Jay G Saxon
  • Patent number: 6194691
    Abstract: This invention provides a method of manufacturing a wafer heating furnace having a desired heating distribution with less trials and errors by predicting heating distributions in the process of designing the heating furnace.
    Type: Grant
    Filed: March 15, 1999
    Date of Patent: February 27, 2001
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Hitoshi Habuka, Toru Otsuka
  • Patent number: 6191525
    Abstract: In a spark plug, a resistor is placed between a terminal and a center electrode within a through hole of an insulator. The through hole of the insulator has a first portion which allows the center electrode to be inserted therethrough, and a second portion which is formed on a rear side of the first portion so as to be larger in diameter than the first portion and which accommodates the resistor therein, where the second portion is connected to the first portion via a connecting portion including a two- or more-stepped reduced-diameter portion. Then, an electrically conductive glass seal layer is placed at a position corresponding to the connecting portion between the resistor and the center electrode.
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: February 20, 2001
    Assignee: NGK Spark Plug Co., Ltd.
    Inventors: Yutaka Tanaka, Makoto Sugimoto
  • Patent number: 6185044
    Abstract: In a still-image-capturing system, a still-image-capturing lens group having totally the same configuration (the same number of lens sheets, lens form, and lens material) as the lens group used only for a TV-image-capturing system is disposed downstream a half mirror, and a rectangular prism is disposed for providing a luminous flux with an optical path length identical to that within a color-decomposing prism when the luminous flux passes therethrough. In another aspect, a focal length conversion lens group for changing the focal length of zoom lens groups and a total reflection mirror is disposed on the optical axis of the zoom lens groups exclusively from each other. In still another aspect, an electronic still camera is attached to the still-image-capturing system.
    Type: Grant
    Filed: January 15, 1999
    Date of Patent: February 6, 2001
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventors: Kazuo Yoshikawa, Hisao Takemae, Takami Hasegawa
  • Patent number: 6184049
    Abstract: A method for fabricating a compound semiconductor epitaxial wafer having a uniform epitaxial layer-thickness distribution independently of positions of compound semiconductor wafers placed within a reaction furnace (19), and a vapor phase growth apparatus for implementing the method. A group III source gas (13) is flowed from a gas inlet (14) of the reaction furnace (19) to a gas outlet (16) thereof, whereas a group V source gas (15) is supplied as dispersedly from a plurality of groups of gas discharge ports (18a, 18b, 18c) provided in a flow direction of the group III source gas (13).
    Type: Grant
    Filed: August 5, 1998
    Date of Patent: February 6, 2001
    Assignee: Shin-Etsu Handotai, Co., Ltd.
    Inventors: Masataka Watanabe, Tsuneyuki Kaise, Masayuki Shinohara
  • Patent number: 6181481
    Abstract: An endoscope objective lens comprises, successively from the object side, a first lens group G1 constituted by a first lens L1 made of a planoconcave lens having a concave surface directed onto the image side and a second lens L2 made of a convex meniscus lens having a convex surface directed onto the object side, a stop 1, and a second lens group G2 having a positive refracting power, wherein the image-side surface of the first lens L1 is formed as a diffraction optical surface. This endoscope objective lens further satisfies the following conditional expressions: E>0  (1) −2.0<fN/f<−0.3  (2) where E is the coefficient of the second-order term of the phase difference function of the diffraction optical surface; fN is the focal length of the lens having the diffraction optical surface and the strongest negative refracting power in the first lens group; and f is the focal length of the whole lens system.
    Type: Grant
    Filed: October 29, 1999
    Date of Patent: January 30, 2001
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventors: Chikara Yamamoto, Hitoshi Miyano
  • Patent number: 6181484
    Abstract: In a compact wide-angle zoom lens having a two-group configuration composed of positive and negative lens groups, the first lens group is composed of G1A and G1B groups, while a stop is disposed between the G1A and G1B groups, thereby yielding a small lens thickness at its telephoto end and making it compact. The first lens group G1 is composed of G1A group comprising, successively from the object side, a negative lens having a meniscus form with a concave surface directed onto the object side and a positive lens having a meniscus form with a convex surface directed onto the object side, and G1B group having at least one biconvex lens. A shutter (stop) is disposed between the G1A and G1B groups, thereby allowing the first and second lens groups to be disposed close to each other at the telephoto end. Further, the zoom lens is set so as to satisfy the following conditional expressions: −0.6<f′w/f′g1a<1.4, 0.07<Dab/f′w<0.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: January 30, 2001
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Kenichi Sato
  • Patent number: 6181483
    Abstract: A retro-focus type wide-angle lens attains a wide angle of view of 100 degrees in terms of taking angle of view, a far exit pupil position so as to suppress the occurrence of color shading, and a long back focus which is five times the focal length, thus being sufficient for disposing a three-color-separating optical system. The wide-angle lens comprises, successively from the object side, a first lens group G1, having a negative refracting power, constituted by a negative first-a lens group G1a and a positive first-b lens group G1b, and a second lens group G2 having a positive refracting power; and satisfies the following conditional expressions (1) and (2): 5.0<Bf/f  (1) −0.05<tan &thgr;<0.05  (2) where f is the focal length of the whole system; Bf is the back focus of the whole system; and &thgr;is an angle formed between a principal ray directed to a screen corner portion and an optical axis.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: January 30, 2001
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Akiko Takatsuki
  • Patent number: 6176902
    Abstract: An electric dust collector that is capable of enhancing collection efficiency. An exhaust pipe (4) consists of a steel pipe (14) whose exterior surface is lined with refractory material (15). A supporting member (5) is supported outside the exhaust pipe (4) and is inserted into the exhaust pipe (4). A discharge electrode (7) is fixed to the supporting member (5) so that it is electrically insulated from the exhaust pipe (4). A surface electrode (6) is fixed to the discharge electrode (7) and has a pyramid-shaped mesh (6c). The mesh (6) is arranged coaxially with the exhaust pipe (4) so that it spreads within the exhaust pipe (4) toward the exit of the exhaust pipe (4). The discharge electrode (7) penetrates the center line of the surface electrode (6) and protrudes downward from the vertex of the mesh (6c).
    Type: Grant
    Filed: March 12, 1998
    Date of Patent: January 23, 2001
    Assignee: Galaxy Yugen Kaisha
    Inventor: Makoto Matsubara
  • Patent number: 6178030
    Abstract: In a light-scanning optical system comprising a laser light source 11, a collimating lens 12, a first imaging optical system 1, a second imaging optical system 2, and a surface 19 to be scanned, the second imaging optical system 2 comprises, successively from the light-deflecting/reflecting surface side, a toric first lens 16 in which both sections in the main-scanning direction and in the sub-scanning direction have a positive power, a second lens 17 in which both surfaces are aspheric, and a third lens 18 having a positive power only in the cross section in the sub-scanning direction. As a consequence, the absolute value of imaging magnification of the second imaging optical system 2 between the light-deflecting/reflecting surface 15 and the surface 19 to be scanned in the cross section in the sub-scanning direction becomes 1 to 2, whereby the light-scanning optical system has a wobble-correcting function which is also applicable to apparatus having a relatively long scanning length.
    Type: Grant
    Filed: April 12, 2000
    Date of Patent: January 23, 2001
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Hiromitsu Yamakawa
  • Patent number: 6174740
    Abstract: A method for analyzing impurities within a silicon wafer in a convenient and simple manner with high accuracy and sensitivity. In a first example 1, a silicon wafer is subjected on its surface to a sandblasting process with use of powder of SiO2 and then to a thermal oxidation process in a dry-oxygen gas atmosphere to easily move impurities present within the silicon wafer into a distorted layer and to form a thermal oxide film and a surface layer of the wafer positioned directly therebelow and containing the distorted layer. The thermal oxide film or the surface layer containing the distorted layer is dissolved with, e.g., a solution of hydrofluoric acid to recover and analyze the dissolved solution. In a comparative example 1, the same processes as in the example 1 are carried out to analyze a predetermined solution, except that the sandblasting process is omitted.
    Type: Grant
    Filed: September 16, 1996
    Date of Patent: January 16, 2001
    Assignee: Shin-Etsu Handotai, Co., Ltd.
    Inventors: Yutaka Ohta, Hirofumi Nishijo, Akira Kosugi
  • Patent number: 6174885
    Abstract: A [6-(substituted-methyl)-3-cyclohexenyl]formamide derivative or a salt thereof expressed by the following Formula (I): wherein one of A and B is a hydrocarbon group of C10-30 expressed by R1 and the other is—(CH2)n-NR2R3; Z is —O—, —OCO—, —OCONR6— or —NR6—; R2 and R3 individually represent a hydrogen, lower alkyl, phenyl or benzyl group, or together represent a heterocycle having 3-7 members; —NR5—(CH2)n-NR2R3 or —NR6—(CH2)n-NR2R3 may be Group W, and —OCONR6—(CH2)n-NR2R3 may be —OCO—W, wherein W is a formula of: wherein ring E is a heterocycle of 6 or 7 members including two nitrogen atoms and R2 is a hydrogen, lower alkyl, phenyl or benzyl group; R4 is a halogen, lower alkyl, lower acyl, nitro, cyano, lower alkoxycarbonyl, carbamoyl, lower alkylcarbamoyl, lower alkylamino, lower acylamino, lower alkoxy or lower acyloxy group; each of R5 and R6 is a hydrogen, low
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: January 16, 2001
    Assignee: Shiseido Co., Ltd.
    Inventors: Hirotada Fukunishi, Tsunao Magara, Koji Kobayashi
  • Patent number: 6171394
    Abstract: A method for manufacturing compound semiconductor epitaxial wafer allowing sharp changes in alloy composition and growth of high-quality epitaxial layers.
    Type: Grant
    Filed: May 20, 1998
    Date of Patent: January 9, 2001
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Masataka Watanabe, Tsuneyuki Kaise, Masayuki Shinohara
  • Patent number: 6164552
    Abstract: A formation method of a two-dimensional code according to the present invention is characterized in that the method comprises the steps of: substituting a square unit cell, in which a plurality of dark round dots 6 are arranged in a matrix, for a dark unit cell from image data of a two-dimensional code 1 formed in a bright and dark pattern to transform the image data; burning these dark round dots 6 on a marking surface with a laser beam; and forming the two-dimensional code in a dark and bright pattern formed by combining dark unit cells 2A, formed with dark round dots 6, and bright unit cells 2b to which laser burning has not been performed.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: December 26, 2000
    Inventor: Kazuo Sato
  • Patent number: 6166854
    Abstract: A zone plate having an aberration correcting function in a wavelength selecting manner and a diffraction grating substantially having a light shielding function in a wavelength selecting manner are formed, respectively, in a center region and a marginal region of a filter, whereby only a predetermined wavelength of light is converged or diverged by the zone plate and is diffracted sideways by the diffraction grating, whereby the luminous flux diameter of the irradiation light is changed while the aberration caused by a convergent lens is favorably corrected. The diffraction type filter 8A is constituted by a first region 11 comprising a central circular portion and a second region 12 comprising a marginal portion thereof. The first region 11 is provided with a zone plate 11A (diffraction grating formed like concentric circles) having such a wavelength selectivity that light at a wavelength of 635 nm is transmitted therethrough as it is and that light at a wavelength of 780 nm is converged thereby.
    Type: Grant
    Filed: December 11, 1998
    Date of Patent: December 26, 2000
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Toshiaki Katsuma
  • Patent number: 6166480
    Abstract: A spark plug (1) comprises a center electrode (5), an insulator (3), a metallic shell (2), and a ground electrode (6). The center electrode (5) comprises a body portion (12) having a cylindrical peripheral surface and a front-end-side opposing face (11) opposed in generally parallel to a side face of the ground electrode (6), and a protruding portion (15) which is protruded from the front-end-side opposing face (11) at a position decentered toward one side opposite to the ground electrode (6) with respect to a center axis line of the body portion (12) and which has a top face (14) formed generally parallel to the side face of the ground electrode (6).
    Type: Grant
    Filed: July 30, 1998
    Date of Patent: December 26, 2000
    Assignee: NGK Spark Plug Co., Ltd.
    Inventors: Kenji Ishida, Yoshihiro Matsubara