Abstract: An apparatus for adjusting an orientation of an optical component mounted within a laser resonator with suppressed hysteresis includes an electromechanical device, a drive element, and a mechano-optical device coupled to the mounted optical component. The drive element is configured to contact and apply a force to the mechano-optical device in such a way as to adjust the orientation of the mechano-optical device, and thereby that of the optical component, to a known orientation within the laser resonator. The optical component is mounted such that stresses applied by the mount to the optical component are homogeneous and substantially thermally-independent.

Abstract: A headset and a method of manufacturing headsets are disclosed where a single transceiver form-factor design is utilized with a number of styles of housings. By utilizing the same transceiver with the different styles of housings, manufacturing costs are reduced while at the same time providing a wider variety of choices to the consumer.

Abstract: A preionization device for a gas laser includes an internal preionization electrode having a dielectric housing around it such that the preionization device is of corona type. The internal electrode connects to advantageous electrical circuitry, preferably external to the discharge chamber via a conductive feedthrough. The circuitry reduces the voltage across the dielectric tube of the preionization unit to reduce over-flashing at tube ends and oscillations due to residual energies stored in the dielectric. A semi-transparent mesh electrode between the preionization unit and the discharge area prevents field distortions and discharge instabilities.

Abstract: The subject invention relates to a translating wafer stage for use in optical wafer metrology instruments. The stage contains a wafer-chuck connected to translation stages for the purpose of clamping and translating the wafer so that a plurality of sites on the wafer surface may be measured. The chuck includes a holder for mounting a reference sample. The holder is movable between a retracted position where the reference sample is held below the chuck surface and an extended position where the surface of the reference sample is co-planar with the wafer surface. Therefore the holder may be installed within the area of the chuck that is utilized for wafer clamping. By this arrangement, the size of the wafer translation system can be reduced minimizing the stage travel and enabling increased spatial resolution, increased wafer throughput and reduced capital equipment and operating costs.

Abstract: An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer.

Abstract: The teachings of the subject invention lead to a new application of the XRR and RXRR systems. In particular, it has been recognized for the first time that such systems can be used to measure thickness of a variety of thin films (both dielectric, opaque and metal films) on patterned wafers where the feature size is smaller than the measurement spot. Broadly speaking, one aspect of the invention is the recognition that XRR and RXRR systems can be used not only on test wafers but on patterned wafers as well. The approach of the present invention to measuring the film thicknesses of patterned semiconductor wafers using XRR relies on the recognition that the measured X-ray reflection curve can be attributed primarily to the thicknesses of the layers rather than the structure of the pattern. In one aspect of the present invention, analysis of the patterned wafer may be reduced to the problem of analyzing an unpatterned wafer through a relatively simple transformation of the data.

Abstract: A chip scale package structure formed by adhering a glass sheet having a pattern of holes matching a pattern of bond pads on a semiconductor wafer so that the pattern of holes on the glass sheet are over the pattern of bond pads on the semiconductor wafer. Metallized pads are formed on the glass sheet adjacent to each hole and in one embodiment a conductive trace is formed from each metallized pad on the glass sheet to the bond pad on the semiconductor wafer under the adjacent hole. In a second embodiment, a pad is formed on the glass sheet adjacent to each hole and the pad extends down the sides of the adjacent hole. The hole is filled with a metal plug that electrically connects the pad on the glass sheet to the bond pad on the semiconductor wafer. In each embodiment, a solder ball is formed on each pad on the glass sheet.

Abstract: A spectroscopic ellipsometer having a multiwavelength light source, spectrometer (or wavelength-scanning monochromator and photodetector), a polarizer and polarization analyzer, and one or more objectives in the illumination and collection light paths, further comprises a stationary polarization modulator that modulates the light polarization versus wavelength. Modulator can be an optically active crystal rotating the linear polarization plane by a different angle for each wavelength or a non-achromatic waveplate retarder that varies the relative phase delay of the polarization components periodically over wavelength. The measured spectrum can be used to characterize selected features or parameters of a sample, e.g. by comparison with one or more theoretical spectra.

Abstract: An optical inspection system and method which uses a procedure for determining an offset between a field of view and a center or rotation of an R-theta stage, or polar coordinate stage. Determining this offset allows the precise location of a site being inspected on a wafer to be determined. The system and method take advantage of the fact that in a R-theta system there can be only two positions for the R-theta stage that will position a particular site under the lens of the imaging system of the optical inspection system. By moving the stage from a first position where a particular site is positioned in the field of view, to the second position where the particular site is positioned in the field of view, the offset can be determined.

Abstract: An apparatus measures a spectral distribution of a narrow-band laser beam generated by a line-narrowed excimer laser or a molecular fluorine laser system. The apparatus includes an an interferometric device disposed along an optical path of an output beam of the laser system such that the beam traverses the interferometric device on a first pass, a retro-reflector disposed after the interferometric device along the optical path for retro-reflecting the beam back through the interferometric device on a second pass, and a detector for detecting an intensity of the beam after the second pass through the interferometric device. Preferably, spectral information is determined when the free spectral range of the interferometric device is tuned and the detector measures the intensity of the beam at a plurality of free spectral ranges or when the wavelength of the output beam is tuned.

Abstract: The subject invention relates to the design of a compact imaging spectrometer for use in thin film measurement and general spectroscopic applications. The spectrometer includes only two elements, a rotationally symmetric aspheric reflector and a plane grating. When employed in a pupil centric geometry the spectrometer has no coma or image distortion. Both spherical aberration and astigmatism can be independently corrected.

Abstract: An x-ray reflectometry system for measuring thin film samples. The system includes an adjustable x-ray source, such that characteristics of an x-ray probe beam output by the x-ray source can be adjusted to improve the resolution of the measurement system. The x-ray probe beam can also be modified to increase the speed of evaluating the thin film sample, for situations where some degree of resolution can be sacrificed. In addition, or alternatively, the system can also provide an adjustable detector position device which allows the position of the detector to be adjusted to increase the resolution of the system, or to reduce the time it takes to evaluate the thin film material.

Abstract: A system and method for detecting perforations in a body cavity. In accordance with the method of the invention, a fluid (liquid or gas) is delivered into a body cavity to slightly pressurize the cavity. A pressure sensing system monitors the pressure within the cavity for a predetermined test period. If cavity pressure is not substantially sustained during the test period, the physician is alerted to further assess the cavity for perforations before initiating treatment within the cavity. In a preferred form of the system, a medical treatment system such as an RF ablation system is provided with perforation detection functionality. The system preferably includes a pre-test lockout that prevents RF power delivery unless a perforation detection procedure previously has been performed.

Abstract: An ellipsometer capable of generating a small beam spot is disclosed. The ellipsometer includes a light source for generating a narrow bandwidth probe beam. An analyzer is provided for determining the change in polarization state of the probe beam after interaction with the sample. A lens is provided having a numerical aperture and focal length sufficient to focus the beam to a diameter of less than 20 microns on the sample surface. The lens is formed from a graded index glass wherein the index of refraction varies along its optical axis. The lens is held in a relatively stress free mount to reduce stress birefringence created in the lens due to changes in ambient temperature. The ellipsometer is capable of measuring features on semiconductors having a dimensions as small as 50×50 microns.

Abstract: An excimer or molecular fluorine laser system includes a wavelength calibration module permitting the wavelength of the narrow band output beam to be calibrated to a specific absolute wavelength. The module is preferably a lamp which contains at least one species including platinum with an optical transition within the emission spectrum of the laser system. Light from the lamp is preferably coincident at a spectrometer with a beam portion from the laser, and the laser beam wavelength is calibrated by simultaneous analysis at the spectrograph.

Abstract: The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.

Abstract: A communication interface circuit transfers signals between a TTL microcontroller and a RS232 device while avoiding level translation. The interface circuit includes two switch elements. A first switch element is connected between the TTL receive terminal and the ground supply. The second switch element includes a first node that is an electrical communication with the TTL transmit data terminal, the RS232 transmit data terminal and the RS232 receive data terminal, a second node in electrical communication with the first TTL power supply and a control node in electrical communication with the TTL receive data terminal. The interface circuit is configurable to a first switching state in which electrically connects the first TTL power supply terminal to the RS 232 receive data terminal.

Abstract: An integrated system generates a model of a three-dimensional object. A scanning laser device scans the three-dimensional object and generates a point cloud. The points of the point cloud each indicate a location of a corresponding point on a surface of the object. A first model is generated, responsive to the point cloud, that generates a first model representing constituent geometric shapes of the object. A data file is generated, responsive to the first model, that can be inputted to a computer-aided design system.

Abstract: In geodetic measuring systems and measuring devices (14) there exists a need to find and detect, rapidly and automatically, marker points to be measured that are provided with a marker (retro reflector) (2a). For the rapid detection, identification and determination of the horizontal angles of such a marker, even at greater distances, electromagnetic radiation in the form of a vertical fan (17) is transmitted by a transmitter unit (1) whose radiation is received, after reflection from the marker, by a receiving unit with a view field in the form of a vertical fan. By analyzing the signal strength and the apparent object size, a plausibility test and a reliable suppression of foreign or interference markers can be achieved. Such a marker searching device is marked by a selective analysis of specific characteristics of a marker detected. On the basis of the plausibility test, a rapid, certain and robust location of markers is possible.

Abstract: A method of operating a laser system for increasing the lifetimes of optical components of the resonator includes the steps of configuring the laser system to initially output laser pulses at an energy in a range above a predetermined energy for industrial lithographic processing, and attenuating the energy of the output pulses to the predetermined energy. A further step includes reducing an amount of attenuation as optics of the laser resonator age to maintain the laser pulses at the predetermined energy, or reducing the amount of attenuation to produce pulses having a higher energy than the predetermined energy.