Abstract: Semiconductor wafers having patterns of steps and grooves defining microcircuit elements thereon are coated with metallic film by supporting the wafers individually adjacent a respective ring-shaped sputtering source in stationary relationship thereto. To effectuate such individual wafer processing on a continuous basis and preserve the evacuated argon environment, a vacuum chamber sputter coating apparatus is provided which has a number of work stations therein, at least one of which includes said ring-shaped sputtering source. Also included is a load lock; and an intermittently rotating vertical plate-like wafer carrier means therewithin positioned closely adjacent the chamber entrance, and carrying wafers in turn from the load lock to the work stations. The carrier includes apertures each accepting a wafer therewithin in an upright position, with the wafers edgewise resiliently supported by clip means, without the use of any externally-originating supports such as platens.

Abstract: A high voltage, high power DC power supply includes a single turn primary winding driven through a resonating capacitor by an AC source having a frequency in excess of about 100 kHz. The primary winding includes a pair of concentric cylindrical metal walls having opposite ends electrically connected to each other. A volume between the walls includes plural secondary winding assemblies, having different axial positions along the walls. Each of the assemblies includes an annular magnetic core surrounding the interior wall, a winding on the core and a voltage doubler rectifier. DC voltages developed across each secondary winding assembly by the rectifier are added together to provide the high voltage, high power output. The power supply energizes an X-ray tube having a grounded anode and a cathode at a DC voltage of approximately -150 kV, with a power requirement of between 15 and 60 kW.

Abstract: In a spectrophotometer having photodetectors positioned at fixed wavelengths, the photodetector is divided into three subdetectors, a main subdetector on the wavelength of interest and two background subdetectors located on each side of the main subdetector, the background subdetectors together having area equal to that of the main subdetector, the background subdetectors being connected in polarity reverse that of the main subdetector to correct for changes in background radiation.

Abstract: In order to bring a high power vacuum tube to full power in a few seconds, it is necessary to heat the cathode quickly to 1100.degree. C. In large tubes, prior art structures cannot be simply enlarged. A novel cathode structure in which the heater element is anisotropic pyrolytic graphite coated with anisotropic pyrolytic boron nitride for insulation and then sintered to the cathode avoids these problems.

Abstract: In a gyrotron cavity resonator, generated energy is extracted into a symmetric set of fundamental-mode waveguides by ports disposed to couple energy in phase from the operating electromagnetic mode but in anti-phase with respect to an unwanted mode of lower cutoff frequency than the operating mode, thereby neutralizing coupling to the unwanted mode. A second set of interspersed ports may be disposed to load degenerate, orthogonal modes.

Abstract: A method of correcting for background changes in a plasma emission detector comprising a photodetector array is disclosed. In the photodetector array a plurality of sensors are used to detect the emission lines from a discrete number of selected elements including carbon. It is shown that, to the first order, there is a correlation between the response at detectors other than the carbon detector with the response at a carbon detector. The exact extent of this correlation is highly dependent on the amount of nitrogen present in the carrier gas used in the system. A calibration curve can be generated which allows compensation at a frequency of interest as a function of the magnitude of the carbon signal. This curve will depend on the level of nitrogen in the carrier gas and can be empirically determined each time a new bottle of gas is connected to the system.

Abstract: Pre- and post-processing of a semiconductor wafer within a main vacuum chamber is accomplished by a wafer holder disposed within a clam shell-like device. The clam shell device includes a first member disposed above the wafer holder and a second member disposed below the wafer holder in a facing relationship to the first member. The first member and the second member each have a respective mating surface. The first member and the second member are movable between a closed position wherein the mating surface of each of the first member and second member hermetically engage each other in an open position. The clam shell device forms an interior chamber when in its closed position. Gases are evacuated from the interior chamber, exteriorally of the main chamber, when the clam shell device is in in a closed position to avoid contamination of the vacuum environment.

Abstract: A flame detector comprising a ceramic flame jet for use in a high temperature gas chromatography system is disclosed. The interior volume of the flame jet is fabricated of a highly inert ceramic material so that sample eluting from the end of a gas chromatography column located within the interior volume of the flame jet does not contact any metallic surface en route to the flame. By avoiding sample contact with metallic surfaces, interferences which are prone to occur at high temperature, such as peak tailing, are avoided. In a further aspect the flame detector is treated with a silylating reagent to further passivate the surfaces which may affect the sample.

Abstract: Thermal transfer between a semiconductor wafer and a platen during vacuum processing is provided through a soft, thermally-conductive polymer layer having a thin, hard surface film. The soft polymer layer, which is preferably silicon rubber containing thermally-conductive particles, conforms to surface irregularities on the wafer and has low thermal resistance. The surface film is preferably silicon dioxide in the form of a multiplicity of flat plates integrally formed on the silicone rubber. Adherence of the wafer and of foreign matter to the polymer layer is prevented by the surface film. In addition, the underlying polymer layer is protected by the surface film. A high purity polymer layer is fabricated by evacuating the mold cavity and the resin container prior to injection of resin. The mold for the polymer layer utilizes a hard, smooth mold release surface and a resilient gasket between the platen and the mold release surface.

Abstract: A magnetron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by ##EQU1## where .xi.(u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

Abstract: A very fine-mesh, non-emissive shadow grid is formed on the smooth emissive surface 16 of a thermionic cathode 12 by deposition from a vapor a continuous layer 22 of non-emissive conductive material. Between the elements 24 of the grid the non-emissive material is removed by bombardment through an apertured mask to restore emissivity between the elevated grid elements 24.

Abstract: A small sample of material is introduced into a vacuum to be analyzed, by ionization of atoms or molecular fragments of the sample using an electron or photon beam. The ionized species are trapped in a structure that defines electric fields or a combination of electric and magnetic fields in such a way that their motions are confined to the interior of the trap and that their motions within the trap are characterized by unique and discrete frequencies of oscillation dependent on the mass-to-charge ratio of the individual species. In order to provide for the detection of the frequencies of the motions, additional electrical signals are applied to the trapping structure so as to cause the motions to take place with a considerable degree of coherence. Alternatively, the coherence may be caused by creation of the ions during a very short pulse of the electron or photon beam at a position within the trapping structure but displaced from a positon of equilibrium.

Abstract: A compact, small diameter, standing-wave linear accelerator structure suitable for industrial and medical applications is disclosed. The novel structure utilizes a new type of coupling cavity for Pi/2 mode, standing-wave operation. The coupling cavity fits into the webs between the accelerating cavities substantially within the diameter of the acclerating cavities. This is made possible by keeping the center section of the cavity thin to concentrate the electric field vector at the center of a section of the cavity and by enlarging the ends of a section of the coupling cavity to accommodate the magnetic field vector. This structure offers a significant reduction in overall diameter over the side-coupled, annular ring, and existing coaxial coupled structures, while maintaining a high shunt impedance and large nearest neighbor coupling (high group velocity). A prototype 4 MeV, 36 cm long, S-band accelerator incorporating the new structure has been built and tested.

Abstract: A radiation therapy unit with a beam of rays propagating from a focal point along a beam axis comprises a radiator head arranged on the beam axis with a double-focus multi-leaf collimator. The multi-leaf collimator exhibits a plurality of adjacently arranged diaphragm plates which in each case have two side faces, two front faces and an inside and an outside face. Each side face of each diaphragm plate forms a part of a surface area of a cone, all such cones having both a common cone axis which extends perpendicularly to the beam axis through the focal point, and a common cone point which coincides with the focal point. Means are provided for guiding the diaphragm plates so that each diaphragm plate performs a pure rotation about the cone axis during its displacement.

Abstract: A heat sink element, preferably one formed with a relatively large surface area from which thermal energy can be transferred convectively and radiatively to an ambient atmosphere, with or without forced fluid flow, is held forcibly in contact with a heat transmitting surface of a heat source for thermal conduction of heat therefrom. A heat sink attachment element affixed to the heat sink element has flexibly attached castellated extensions formed with tapered end teeth contacting a correspondingly inclined surface of the heat source. The castellated extensions are each subjected to a continual externally applied force and the total resultant force thereof, holding the heat sink element to the heat source, thereby can be maintained or will increase as the assembly experiences thermal cycling and mechanical disturbances during use. The effectiveness of thermally conductive contact between the heat sink and heat source therefore does not deteriorate during prolonged use.

Abstract: A dual track substrate handling and processing system includes an entrance load lock station, an exit load lock station and a plurality of substrate processing stations, all positioned above a transfer vacuum chamber. The load lock station and each processing station are configured to hold two vertically oriented workpieces. A transport system conveys workpieces two at a time from parallel input cassettes to the entrance load lock station. The transport system includes a transport assembly that simultaneously advances two workpieces from each station to the next station; thus workpieces are processed two at a time in the same environment in each processing station and system throughput is correspondingly increased.

Abstract: An ion beam scanning method and apparatus produce a parallel, scanned ion beam with a magnetic deflector having, in one instance, wedge-shaped pole pieces that develop a uniform magnetic field. A beam accelerator for the scanned beam has a slot-shaped passage which the scanned beam traverses. The beam scan and the beam traverse over a target object are controlled to attain a selected beam current and corresponding ion dose on a target object. Methods and apparatus are disclosed for increasing ion beam utilization efficiency without adversely effecting dose accuracy.

Abstract: A signal processor receives random input signals from a pair of sensors such as beam sensing electrodes, antennas, microphones or optical position sensors. An estimation equation implemented by the signal processor uses weighted integration of log ratios where the weighting is adaptive and depends upon the values of signal samples being processed. The signal processor uses digital signal processing to provide an estimate of the desired parameter. Nonlinear functions such as hyperbolic tangent and logarithm are contained in programmable read only memories in order to obtain high speed operation. When the signal processor is used in conjunction with channel switching, errors due to channel mismatch are completely eliminated. In a preferred embodiment, the sensors are beam sensing electrodes and the signal processor is used for estimating the position of a scanned ion beam in a ion implantation system.

Abstract: A mechanical scanning system for a batch ion implanter includes a disk for mounting wafers at sites near its periphery and a disk drive assembly for rotating the disk. The disk and the disk drive assembly are supported in an end station vacuum chamber by a scan arm which extends through a sealed opening in an access door. A scan drive assembly attached to the access door scans the scan arm and the disk in an arc-shaped path. Simultaneous rotation and scanning of the disk cause the ion beam to be distributed over the surfaces of the wafers mounted on the disk. A pivot drive assembly rotates the scan arm and the disk about a pivot axis between an implant position and a load/unload position. A bellows seals the scan arm to the vacuum chamber while tranmitting arc-shaped movement into the vacuum chamber. A bellows guide apparatus guides an intermediate portion of the bellows so as to limit lateral distortion caused by pressure differences applied to the bellows in combination with asymmetrical deflection thereof.

Abstract: A mechanism for locking and unlocking a reciprocating shaft includes a plate fixed to the shaft having an inclined surface. A housing surrounds the shaft and plate having a wall surrounding the inclined surface. A set of balls is located between the inclined surface and the housing wall. An assembly is translatable relative to the shaft and is biased by a spring to jam the balls between the inclined surface and the housing wall to lock the shaft against reciprocation. The assembly is movable against the force of the spring by a fluid pressure actuated cylinder to move the balls away from the inclined surface to unlock the shaft.