Patents Represented by Attorney The Mueller Law Office, P.C.
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Patent number: 7981575Abstract: A method for optical proximity correction (OPC) of a desired pattern for a substrate is disclosed in which a plurality of variable shaped beam (VSB) shots are determined which can form on a surface an OPC-corrected version of the desired substrate pattern. Shots within the plurality of VSB shots are allowed to overlap each other. Dosages of the shots may also be allowed to vary with respect to each other. The union of the plurality of shots may deviate from the OPC-corrected version of the desired pattern for the substrate. In some embodiments, optimization may be used to minimize shot count. In other embodiments, the plurality of shots may be optionally selected from one or more pre-computed VSB shots or groups of VSB shots, that is, glyphs. A method for creating glyphs is also disclosed, in which patterns that would result on a surface from one or a group of VSB shots are pre-calculated.Type: GrantFiled: May 27, 2009Date of Patent: July 19, 2011Assignee: DS2, Inc.Inventors: Akira Fujimura, Lance Glasser
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Patent number: 7967936Abstract: Methods for bonding a donor wafer to a receiver element and transferring a lamina from the donor wafer to the receiver element are disclosed herein. The donor wafer may be, for example, a monocrystalline silicon wafer with a thickness of from about 300 microns to about 1000 microns, and the lamina may be may be less than 100 microns thick. The receiver element may be composed of, for example, metal or glass, and the receiver element may have dissimilar thermal expansion properties from the lamina. Although the lamina and the receiver element may have dissimilar thermal expansion properties, the methods disclosed herein maintain the integrity of the bond between the lamina and the receiver element.Type: GrantFiled: December 15, 2008Date of Patent: June 28, 2011Assignee: Twin Creeks Technologies, Inc.Inventors: Aditya Agarwal, Srinivasan Sivaram, Michael Vyvoda
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Patent number: 7964431Abstract: A photovoltaic cell is formed by bonding a donor body to a receiver element and cleaving a thin lamina from the donor body. Electrical contact is made to the bonded surface of the lamina through vias formed in the lamina. In some embodiments the emitter exists only at the bonded surface or only at the cleaved surface face; the emitter does not wrap through the vias between the surfaces. Wiring contacting each of the two surfaces is formed only at the cleaved face, and one set of wiring contacts the bonded surface through conductive material formed in the vias, insulated from the via sidewalls.Type: GrantFiled: March 19, 2009Date of Patent: June 21, 2011Assignee: Twin Creeks Technologies, Inc.Inventors: Christopher J Petti, Mohamed M Hilali
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Patent number: 7955175Abstract: The present invention is a method of providing role based game play on a social computer network. User inputs are received via a computer network from user computers. These inputs are stored in a memory, and at least a portion of the memory is located away from the user computers. A group of two or more characters for a single user are created based on inputs from a user. One or more of these characters is associated with a friend user on the social computer network. At least a portion of information related to an outcome from the game is displayed on a device of the single user. Finally, the single user controls all the inputs for the actions of their characters during the game.Type: GrantFiled: April 20, 2010Date of Patent: June 7, 2011Assignee: Face It Applications LLCInventors: Jason S. Holloway, David Jon Castor, Oleg Tsiupka, Dmytro Kobylokha, Thorpe A. Mayes, III, Adrienne Marie Hunter, Conrad Thomas Spotts, Brian Hensel
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Patent number: 7950979Abstract: A toy vehicle is transformed from a first configuration to a second configuration through relative movement of two portions of the vehicle. The vehicle includes a roof panel which closes a roof area during the transition from the first configuration to the second configuration. The closing of the roof area hides the displacement of a first seat in the vehicle by a second seat. When the first seat is mounted with a first toy figure and the second seat is mounted with a different toy figure, an illusion is created that the initial toy figure has changed appearance. The roof panel may close and reopen at a rate rapid enough to render the change of toy figures to be an instantaneous transformation. Additional deployable components such as projectile launchers, tail fins, and front bumpers may be incorporated into the toy vehicle.Type: GrantFiled: September 15, 2008Date of Patent: May 31, 2011Assignee: Mattel, Inc.Inventor: Mark J. Barthold
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Patent number: 7950977Abstract: This invention sets forth a vehicle launcher assembly comprising an inner vehicle carried within an outer vehicle. The outer vehicle has movable panel components which allow an inner vehicle to be released from the outer vehicle when the panel components are opened. Operation of the toy assembly involves one actuation step to open the panels of the outer vehicle, and second actuation step to launch the inner vehicle. In one embodiment, the outer vehicle is in the form of a car and the inner vehicle is in the form of a motorcycle. The vehicle launcher assembly may also include projectile launchers.Type: GrantFiled: September 15, 2008Date of Patent: May 31, 2011Assignee: Mattel, Inc.Inventors: Steed Sun, Binh Luong, Peter Fan
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Patent number: 7942751Abstract: A sporting facility comprises a plurality of rotary elements having flexible components extending therefrom, the rotary elements being arranged so that the flexible components thereof provide a substantially continuous supporting surface, and means for rotating the rotary elements. The flexible components are preferably filaments or fibers, extending perpendicular to the substantially continuous surface. The facility is of particular use in providing an artificial surface for skiing, snow boarding, surfing or the like.Type: GrantFiled: June 8, 2007Date of Patent: May 17, 2011Inventor: Kyle Graham John Dent
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Patent number: 7928316Abstract: The present invention is a contoured backpan for a solar concentrator array. The backpan has depressions integrally formed in its bottom surface for seating solar concentrator modules. The depressions, in combination connecting toughs, provide a structure which is able to support an array of solar concentrators. Optional stiffening members may be attached to fee backpan to provide additional structural rigidity, as well as to support a front panel for the array.Type: GrantFiled: June 5, 2008Date of Patent: April 19, 2011Assignee: SolFocus, Inc.Inventors: Peter Young, Stephen J. Horne, Gary D. Conley, Martin Vasquez
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Patent number: 7914954Abstract: Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a surface is reduced by introducing shield areas, which preserve the shape and fidelity of the written image. The shape of the written image is further corrected by systematically adjusting the shape of the character or mask.Type: GrantFiled: September 9, 2008Date of Patent: March 29, 2011Assignee: D2S, Inc.Inventors: Akira Fujimura, Takashi Mitsuhashi, Katsuo Komuro
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Patent number: 7915522Abstract: A novel surface texturing provides improved light-trapping characteristics for photovoltaic cells. The surface is asymmetric and includes shallow slopes at between about 5 and about 30 degrees from horizontal as well as steeper slopes at about 70 degrees or more from horizontal. It is advantageously used as either the front or back surface of a thin semiconductor lamina, for example between about 1 and about 20 microns thick, which comprises at least the base or emitter of a photovoltaic cell. In embodiments of the present invention, the shallow slopes are formed using imprint photolithography.Type: GrantFiled: May 30, 2008Date of Patent: March 29, 2011Assignee: Twin Creeks Technologies, Inc.Inventor: Christopher J. Petti
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Patent number: 7915837Abstract: A lighting ballast is programmable as to input and output parameters. Both operational characteristics and sensed data are used to control the ballast parameters. The ballast is configured to recapture as electrical energy heat produced by the lamp. The ballast is constructed in modular fashion with a power factor correction circuit module and a ballast control circuit module that snap together to achieve a large number of input voltage and lamp type variations with a small number of separate units.Type: GrantFiled: April 6, 2009Date of Patent: March 29, 2011Assignee: Lumetric, Inc.Inventors: Moshe Shloush, Gregory Davis
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Patent number: 7901845Abstract: A method for optical proximity correction of a design of a pattern on a surface is disclosed with the method comprising the steps of inputting desired patterns for the substrate and inputting a set of characters some of which are complex characters that may be used for forming the patterns on the surface. A method of creating glyphs is also disclosed.Type: GrantFiled: September 1, 2008Date of Patent: March 8, 2011Assignee: D2S, Inc.Inventors: Akira Fujimura, Lance Glasser, Takashi Mitsuhashi, Kazuyuki Hagiwara
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Patent number: 7901850Abstract: A method for fracturing or mask data preparation or proximity effect correction of a desired pattern to be formed on a reticle is disclosed in which a plurality of variable shaped beam (VSB) shots are determined which can form the desired pattern. Shots within the plurality of VSB shots are allowed to overlap each other. Dosages of the shots may also be allowed to vary with respect to each other. The union of the plurality of shots may deviate from the desired pattern. The plurality of shots may be determined such that a pattern on the surface calculated from the plurality of shots is within a predetermined tolerance of the desired pattern. In some embodiments, an optimization technique may be used to minimize shot count. In other embodiments, the plurality of shots may be optionally selected from one or more pre-computed VSB shots or groups of VSB shots.Type: GrantFiled: May 27, 2009Date of Patent: March 8, 2011Assignee: D2S, Inc.Inventors: Akira Fujimura, Lance Glasser
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Patent number: 7858430Abstract: In aspects of the present invention, a method is disclosed to form a lamina having opposing first and second surfaces. Heavily doped contact regions extend from the first surface to the second surface. Generally the lamina is formed by affixing a semiconductor donor body to a receiver element, then cleaving the lamina from the semiconductor donor body wherein the lamina remains affixed to the receiver element. In the present invention, the heavily doped contact regions are formed by doping the semiconductor donor body before cleaving of the lamina. A photovoltaic cell comprising the lamina is then fabricated. By forming the heavily doped contact regions before bonding to the receiver element and cleaving, post-bonding high-temperature steps can be avoided, which may be advantageous.Type: GrantFiled: December 18, 2008Date of Patent: December 28, 2010Assignee: Twin Creeks Technologies, Inc.Inventors: Mohamed M. Hilali, Christopher J. Petti, S. Brad Herner
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Patent number: 7855423Abstract: A mount for a semiconductor device has a first surface with at least one contact region and a second surface. The mount has a substrate to receive the second surface of the semiconductor device and a planar element. The planar element has an aperture sized to surround the semiconductor. A first surface of the planar element is mounted to the substrate and is located to surround the semiconductor device such that the semiconductor device is aligned by the aperture. The mount further has means for mounting the semiconductor device to the substrate in an aligned position. Some embodiments include a method of making and/or using such a mount.Type: GrantFiled: February 3, 2009Date of Patent: December 21, 2010Assignee: SolFocus, Inc.Inventors: Stephen Horne, Gary D. Conley
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Patent number: 7848111Abstract: A slide type electronic device includes a first device body, a second device body stacked on the first device body, and a slide mechanism provided between the first and second device bodies. The first device body has first and second input interfaces located at different positions. The slide mechanism enables the second device body to slide relative to the first device body in different directions to permit access to one of the first and second input interfaces.Type: GrantFiled: January 23, 2009Date of Patent: December 7, 2010Assignee: Wistron CorporationInventors: Chu-Chia Tsai, Wei-Kuo Lee, Kuo-Kun Lin
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Patent number: 7841327Abstract: The present invention is a toy projectile launcher in the form of a role play accessory such as a belt. The belt assembly includes a strap, a launcher housing, and projectiles stored on the belt strap. The belt strap feeds through the launcher housing so that projectiles may be launched from the strap. In one embodiment the launcher is hand-held, and includes a handle which serves both for holding the launcher during operation and as a power switch for the launcher. Projectiles may be discharged singly from the launcher or continuously in a rapid-fire mode.Type: GrantFiled: September 15, 2007Date of Patent: November 30, 2010Assignee: Mattel, Inc.Inventors: Brandon C. Sopinsky, Binh Luong, Steed Sun, Peter Fan, Henry Miller
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Patent number: 7799489Abstract: A method is disclosed for using non-overlapping variable shaped beam (VSB) shots in the design and manufacture of a reticle, where the union of the plurality of shots deviates from the desired pattern. Methods are described for fracturing or mask data preparation or proximity effect correction of a desired pattern to be formed on a reticle; for forming a pattern on a reticle using charged particle beam lithography; and for optical proximity correction (OPC) of a desired pattern. Dosages of the shots may be allowed to vary with respect to each other. The plurality of shots may be determined such that a pattern on the surface calculated from the plurality of shots is within a predetermined tolerance of the desired pattern. In some embodiments, an optimization technique may be used to minimize shot count.Type: GrantFiled: August 12, 2009Date of Patent: September 21, 2010Assignee: D2S, Inc.Inventors: Akira Fujimura, Michael Tucker
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Patent number: 7772575Abstract: A method and system for particle beam lithography, such as electron beam (EB) lithography, is disclosed. The method and system include selecting one of a plurality of cell patterns from a stencil mask and partially exposing the cell pattern to a particle beam, such as an electron beam, so as to selectively project a portion of the cell pattern on a substrate.Type: GrantFiled: November 21, 2006Date of Patent: August 10, 2010Assignee: D2S, Inc.Inventors: Kenji Yoshida, Takashi Mitsuhashi, Shohei Matsushita, Akira Fujimura
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Patent number: D638412Type: GrantFiled: September 10, 2010Date of Patent: May 24, 2011Assignee: Sunrex Technology Corp.Inventor: Chien-Chung Lee