Abstract: A high voltage semiconductor device is provided. The high voltage semiconductor device includes a tow voltage region, a high voltage region, and a high breakdown voltage isolation region. The high voltage region is surrounded by the low voltage region and has corner portions at one side thereof. The high breakdown voltage isolation region has an isolation region for electrically separating the low and high voltage regions from each other and a lateral double diffused metal-oxide-semiconductor (DMOS) transistor for transmitting a signal from the low voltage region to the high voltage region. In particular, a drain region of the lateral DMOS transistor is disposed between the corner portions of the high voltage region, and opposite edges of the corner portions of the high voltage region and drain region of the lateral DMOS transistor are curved.

Abstract: A process forms a power semiconductor device with reduced input capacitance and improved switching speed. A substrate with an epitaxial has an oxide layer patterned to form a narrow terraced gate. A gate oxide layer is formed on the upper surface of the epitaxial layer. A layer of polysilicon is deposited on the narrow terraced gate oxide region and the gate oxide layer. The polysilicon layer is anisotropically etched to form polysilicon spacers abutting each of the two side surfaces of the narrow terraced gate region. A p-type dopant is implanted through the gate oxide layer and the polysilicon spacers and is driven in to form P-well regions in the epitaxial layer. A source mask is formed and an n-type dopant is implanted through the gate oxide layer and the polysilicon spacers. It is driven in to form N+ source regions in the P-well regions.

Abstract: A method of analyzing an electrocardiogram (ECG) paper chart includes the steps of scanning the ECG chart, to thereby create a computer-readable ECG image file representative of the ECG chart, storing the ECG image file in a memory of a computer, opening the ECG image file and displaying on a computer display an ECG plot corresponding to the ECG image file, calibrating the x-axis and y-axis of the displayed ECG plot with an x-axis scale and a y-axis scale, identifying characteristics of the ECG plot by using an input device connected to the computer, and measuring the identified characteristics.

Abstract: A trench MOS-gated device having an upper surface includes a substrate having an upper layer of doped monocrystalline semiconductor material of a first conduction type. A gate trench in the upper layer has sidewalls and a floor lined with a first dielectric material and a centrally disposed core that is formed of a second dielectric material and extends upwardly from the first dielectric material on the trench floor to contact an interlevel dielectric layer overlying the gate trench. The remainder of the trench is substantially filled with a conductive material that encompasses and contacts the core of second dielectric material. A doped well region of a second conduction type overlies a drain zone of the first conduction type in the upper layer, and a heavily doped source region of the first conduction type contiguous to the gate trench and a heavily doped body region of the second conduction type are disposed in the well region at the upper surface.

Abstract: A trench MOS-gated device has an upper surface and includes a substrate having an upper layer of doped monocrystalline semiconductor material of a first conduction type. A gate trench in the upper layer has sidewalls and a floor lined with a first dielectric material and a centrally disposed core formed of a second dielectric material extending upwardly from the first dielectric material on the trench floor and having lateral and top surfaces. The remainder of the trench is substantially filled with a conductive material that encompasses and contacts the lateral and top surfaces of the core of second dielectric material. A doped well region of a second conduction type overlies a drain zone of the first conduction type in the upper layer, and a heavily doped source region of the first conduction type contiguous to the gate trench and a heavily doped body region of the second conduction type are disposed in the well region at the upper surface of the device.

Abstract: An improved low-voltage MOS device having high ruggedness, low on-resistance, and improved body diode reverse recovery characteristics comprises a semiconductor substrate on which is disposed a doped upper layer of a first conduction type. The upper layer includes a doped first well region of the first conduction type and a doped well region of the second conduction type underlying the first well region. The upper layer further includes at its upper surface a heavily doped source region of the first conduction type and a heavily doped body region of a second and opposite conduction type. A trench gate comprising a conductive material separated from the upper layer by an insulating layer is disposed in the upper layer of the substrate.

Abstract: The invention relates to a circuit arrangement for energy-saving operation of a fluorescent tube (1) whereby two respective connections (2a, 2b, 3a, 3b) are arranged on the end caps (1a, 1b) of said tube. The fluorescent tube is mechanically and electrically linked to brackets (8, 9) via said connections (2a, 2b, 3a, 3b) and can be connected to an alternating current supply (6) via a reactance coil (4) and a starter (5). The objective of the invention is to allow the fluorescent tube to be retrofitted in a simple manner. This is achieved by means of a quadrupole (4) circuit arrangement, whereby the input terminals (7a, 7b) of said quadrupole form a series connection with the two connections (2a, 2b, 3a, 3b) on one end cap (1a, 1b) and the reactance coil (4), whereby said circuit is connected in parallel to the alternating current source (6), and the output terminals (7c, 7d) of said quadrupole are electrically connected to the two connections (3a, 3b, 2a, 2b) on the other end cap (1b, 1a).

Abstract: A visual pattern of insulating material is used to guide visually the placement of test probes on a semiconductor wafer. A passivation layer is patterned over the probed areas on the wafer, and then planarized. Planarization of the passivation layer permits reliable addition and retention of an acceptable layer of under bump metal over the planarization after probing is completed. Acceptable test probing of semiconductor device pads may thus be performed before bump connections are fabricated. Each wafer that does not pass testing is eliminated from the bump fabrication process, saving the cost of fabricating bumps on an unusable wafer.

Abstract: A converter 10 has an IGBT power switch 34. A resonant tank circuit 30 couples the IGBT to a voltage source. A gate controller turns the IGBT on and off by applying a suitable gate control voltage to the gate. The resonant tank circuit imposes a sinusoidal waveform on the emitter current. After the emitter current reverses direction, the gate signal is terminated and the IGBT is shut off. Minority carriers in the emitter are swept away by the tank circuit and are further deposited in a transformer that is coupled to the tank circuit.

Abstract: Airbridge structures and processes for making air bridge structures and integrated circuits are disclosed. One airbridge structure has metal conductors 24 encased in a sheath of dielectric material 249. The conductors extend across a cavity 244 and a semiconductor substrate 238. In one embodiment, the conductors traversing the cavity 244 are supported by posts 248 that extend from the substrate. In another embodiment, oxide posts 258 extend from the substrate to support the conductors. In another embodiment, trenches 101 are made in a device substrate 110 bonded to a handle substrate 100. The trenches are filled with a dielectric and a conductor pattern is formed over the filled trenches. The substrate material between the conductors is then removed to leave a pattern of posts 116, 114, 112 that included dielectrically encased conductors 106. In another bonded wafer embodiment, conductors 204 are encased in a dielectric above a sacrificial device region.

Abstract: A process for filling a trench having sidewalls and a floor in a semiconductor device or integrated circuit comprises: forming an insulating layer on the sidewalls and floor of a trench in a semiconductor substrate, substantially filling the trench with semiconductor material, removing semiconductor material from an upper portion of the trench, depositing a first layer of BPSG in the upper portion of the trench, heating the substrate to a first temperature greater than about 850° C. and up to about 1100° C., depositing a second layer of BPSG above the first layer of BPSG, and heating the substrate to a second temperature greater than about 850° C. and up to about 1100° C. The first and second BPSG layers each comprises boron and phosphorus in a weight ratio of boron: phosphorus of greater than 1:1.

Abstract: The invention relates in general to a method and apparatus for locking one element to another with a gimbal lock without castoring about a gimbal axis. In one preferred embodiment, a mounting apparatus and method for a roller transfer assembly for use in a reproduction apparatus are provided that accurately positions the roller transfer assembly in operative relation with a dielectric member of a reproduction apparatus with an anti-castor gimbal locking coupling.

Abstract: A method and apparatus for identifying the root causes of image artifacts visible in the printed output of an electrophotographic printer, activating a special operating mode for the marking engine, and referencing the printing process intentionally to each rotating member of the electrophotographic process in turn. The referencing insures that image artifacts and/or non-uniformities originating from each rotating member are visible in the same location on each printed output. Since the rotating members employed are intentionally designed to be different in diameter, the referencing of the printing process to each one of the rotating members in conjunction with variable receiver sizes enables an operator to associate each image artifact or non-uniformity with a specific rotating member causing it. The appearance of image artifacts is enhanced through zero offset voltage printing and flat-field exposure of the rotating member images as appropriate.

Abstract: A power trench MOS-gated transistor is constructed with a buried gate to source dielectric inside a gate trench region. In the innovative device, a thick oxide (grown or deposited) is used to define the height of the trench walls. A body region is initially formed by selective epitaxial growth and etch back. Source regions are formed also by selective epitaxial growth. The body is finally formed by selective epitaxial growth and etch back. The oxide is removed from the trench, the trench walls are oxidized to form a gate oxide, and doped polysilicon fills the trench to form a gate. By the formation of the source region using the spacer etch, this process simplifies the fabrication of power trench gated devices, and provides for increased contact surface area without increasing device size.

Abstract: An MOS power device a substrate comprises an upper layer having an upper surface and an underlying drain region, a well region of a first conductance type disposed in the upper layer over the drain region, and a plurality of spaced apart buried gates, each of which comprises a trench that extends from the upper surface of the upper layer through the well region into the drain region. Each trench comprises an insulating material lining its surface, a conductive material filling its lower portion to a selected level substantially below the upper surface of the upper layer, and an insulating material substantially filling the remainder of the trench. A plurality of highly doped source regions of a second conductance type are disposed in the upper layer adjacent the upper portion of each trench, each source region extending from the upper surface to a depth in the upper layer selected to provide overlap between the source regions and the conductive material in the trenches.

Abstract: A first thin film resistor formed by direct etch or lift off on a first dielectric layer that covers an integrated circuit in a substrate. A second thin film resistor comprised of a different material than the first resistor, formed by direct etch or lift off on the first dielectric layer or on a second dielectric layer over the first dielectric layer. The first and second thin film resistors are interconnected with another electronic device such as other resistors or the integrated circuit.

Abstract: Semiconductor structures such as the trench and planar MOSFETs (UMOS), trench and planar IGBTs and trench MCTs using trenches to establish a conductor. Improved control of the parasitic transistor in the trench MOSFET is also achieved and cell size and pitch is reduced relative to conventional structures.

Abstract: A trench MOS-gated device comprises a doped monocrystalline semiconductor substrate that includes an upper layer and is of a first conduction type. An extended trench in the substrate in the upper layer comprises two segments having differing widths relative to one another: a bottom segment of lesser width filled with a dielectric material, and an upper segment of greater width lined with a dielectric material and substantially filled with a conductive material, the filled upper segment of the trench forming a gate region. An extended doped zone of a second opposite conduction type extends from an upper surface into the upper layer of the substrate only on one side of the trench, and a doped well region of the second conduction type overlying a drain zone of the first conduction type is disposed in the upper layer on the opposite side of the trench.

Abstract: A radiation hardening isolation technique uses a poly buffered LOCOS structure (34, 36) to protect the device areas during field oxide 40 formation. The field oxide 40 is removed, and the polysilicon structure 34 is covered with a PSG or BPSG layer 42. Layer 42 is planarized and the polysilicon 34 is removed to provide a self-aligned device region 31.

Abstract: The planarity of semiconductor device pins is measured simultaneously by multiple pneumatic comparator circuits by detecting pressure changes proportional to pin position.