Abstract: Liquid chemical supply ampules, commonly called "bubblers", which are used in semiconductor and fiber optic component production lines are automatically refilled without the need to interrupt operation of the production lines. The bubbler ampules utilize a supply of the liquid chemicals from which the ampules produce a gas stream which is saturated with the chemicals. An individual ampule will be connected by means of a selectively operable series of transfer valves to two separate chemical bulk supply tanks. The bulk supply tanks can include one fixed and one replaceable tank; or two replaceable tanks.

Abstract: A chemically amplified-type radiation-sensitive composition comprising:(a) an alkali-soluble binder resin made by a condensation reaction of:(i) hydroxystyrene moiety having formula [1] or [2]: ##STR1## wherein x is an integer from 2 to 300; with (ii) a monomethylolated phenolic compound having a formula [8]: ##STR2## wherein R.sub.1 and R.sub.2 are individually selected from the group consisting of lower alkyl group having 1-4 carbon atoms, lower alkoxy group having 1-4 carbon atoms, amino group, and carboxylic acid group; wherein R.sub.3 and R.sub.

Abstract: A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.

Abstract: A non-corrosive photoresist composition containing:(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;(b) 70-20% by weight of selected amine compounds;(c) 0.1-10% by weight of (2-benzothiozolylthio)succinic acid.

Abstract: A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the photosensitive compound is used in a positive photoresist composition and process for forming patterned image. Further the invention is drawn to a positive photoresist composition comprising an alkali-soluble resin and quinone diazide sulfonic acid triesters and diesters characterized by their HPLC peak areas.

Abstract: Playpen and crib construction which utilizes a high modulus fiber-reinforced plastic matrix tubing in the frame, said tubing being made of lightweight, high modulus fiber-reinforced plastic matrix composite tubing having a weight of 0.25 pounds or less per lineal foot, a tubing diameter of 0.2 to 1.2 inches, a tubing thickness of 0.03 to 10.0 inches, a single fiber angle of 20.degree. to 50.degree. and fabricated from a single tow or at least one sheet of fibers, and wherein said plastic matrix is a thermoplastic resin or thermoset plastic resin with a minimum modulus of 250,000 psi; a minimum tensile strength of 6,000 psi; and a glass transition temperature of at least 50.degree. C. and wherein said high modulus fiber reinforcement is selected from the group consisting of carbon fibers, aramid fibers, glass fibers, polyolefin fibers, boron fibers and mixtures thereof.

Abstract: A liquid toner composition comprising:A. a colored predispersion comprising a homogeneous mixture of at least one selected nonpolymeric resin material, at least one selected polymeric plasticizer, and at least one selected colorant material;B. an aliphatic hydrocarbon carrier liquid;C. charge system comprising amphipathic copolymer; andD. cleaning agent comprising fumed silica.

Abstract: An insert is positioned in the upper end of a pail, which pail contains a liquid. The insert blocks entry of a child's head into the pail. The insert is screwed into the upper end of the pail. Mating locking detents are provided on the pail and on the insert so that the insert, once screwed into the pail, cannot be thereafter unscrewed from the pail. The insert allows ready withdrawal of the liquid from the pail. A child in the vicinity of a pail equipped with the aforesaid insert is protected from drowning in a liquid contained in the pail because insert prevents a child from accidentally, or intentionally, inserting his or her head into the pail.

Abstract: A sanitizer composition comprising a bactericidal effective amount of the combination of (a) chlorinated isocyanuric acids such as trichloroisocyanuric acid or sodium dichloroisocyanurate and alkali metal salts thereof; (b) aluminum sulfate; and (c) copper sulfate.

Abstract: A noncorrosive photoresist composition containing:(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;(b) 70-20% by weight of selected amine compounds;(c) about 0.01% to about 1% by weight of novolak resin having a weight-average molecular weight (M.sub.w) from about 200 to about 5,000;(d) optionally 0-10% by weight of selected amino acid having a hydroxyl group; and(e) optionally 0-10% by weight of water.

Abstract: A phenolic novolak composition prepared by a process comprising the steps of:(1) reacting a first phenolic monomer comprising a major portion of at least one trifunctional phenolic monomer with a first aldehyde source in the absence of a catalyst at a reaction temperature from about 100.degree. C. to about 200.degree. C. and at a reaction pressure of about 2 to about 15 atmospheres to form a phenolic oligomer having a weight average molecular weight from about 500 to about 2,000, having ortho-ortho bonding of about 55% to about 75% of the methylene bonds between the phenolic moieties; and having a time to clear of less than 125 seconds per micron; wherein the mole ratio of said first aldehyde source to said first phenolic monomer is from about 0.3:1.0 to about 0.55:1.0; and(2) then reacting said oligomer with an optional second phenolic source and a second aldehyde source at a temperature from about 80.degree. C. to about 150.degree. C.

Abstract: A process for gas phase delignifying wood pulp comprising: contacting wood pulp in the first stage of pulp bleaching with chlorine dioxide-containing gas to delignify said wood pulp; wherein(a) said wood pulp has a consistency of at least about 15 percent;(b) said chlorine dioxide-containing gas contains less than about 3% by weight chlorine gas, based on the weight of chlorine dioxide in said gas; and(c) said contacting is conducted at a subatmospheric pressure from about 15 to about 750 mm Hg. This process reduces the formation of chloroform and significantly reduces the amounts of toxic by-products such as dioxin and other organic chlorides. These undesirable by-products, collectively identified as absorbable organic halides (AOX), require effluents from pulp bleaching processes to undergo expensive treatment methods to eliminate AOX's prior to discharges to sewers. The effluent discharge from this process generally has less than 2.0 kg adsorbed organic halides (AOX) per ton of wood pulp.

Abstract: A non-corrosive photoresist stripping composition containing:(a) 85-10% by weight of an organic polar solvent having a dipole moment of more than 3.5;(b) 10-40% by weight of selected amine compounds;(c) 5-30% by weight of selected amino acid having a hydroxyl group; and, optionally,(d) 0-20% by weight water.

Abstract: A phenolic novolak composition prepared by a process comprising the steps of:(1) reacting a first phenolic monomer comprising a major portion of at least one trifunctional phenolic monomer with a first aldehyde source in the absence of a catalyst at a reaction temperature from about 100.degree. C. to about 200.degree. C. and at a reaction pressure of about 2 to about 15 atmospheres to form a phenolic oligomer having a weight average molecular weight from about 500 to about 2,000, having ortho--ortho bonding of about 55% to about 75% of the methylene bonds between the phenolic moieties; and having a time to clear of less than 125 seconds per micron; wherein the mole ratio of said first aldehyde source to said first phenolic monomer is from about 0.3:1.0 to about 0.55:1.0; and(2) then reacting said oligomer with an optional second phenolic source and a second aldehyde source at a temperature from about 80.degree. C. to about 150.degree. C.

Abstract: A reusable, high purity liquid chemical dispensing assembly is provided for use in a production line that processes chemically treated articles such as semiconductors. This dispensing assembly contains a high purity liquid chemical, such as photoresist, which it dispenses into a production line application station. The dispensing assembly can be disconnected from the production line when it is essentially emptied of the liquid chemical, and can be then rinsed and purged of chemical residue, and refilled with fresh chemical. The rinsing, purging, and refilling operations are performed in an environmentally safe manner. By providing a reusable dispensing assembly the problem of disposing of chemically polluted containers is eliminated.

Abstract: A system and a process for monitoring the supplying of a working apparatus (e.g., spray etching tool employed in the semiconductor industry) via a flow control valve from a supply container to ensure the proper chemical is delivered to said working apparatus by (1) applying an optical bar code scanning label on the supply container and either the working container or the flow control valve or both and then (2) comparing the sensings of said bar code labels with a microprocessor controller that is programmed to open the flow control valve, if the comparings show a match and to send a visual error message and a signal to leave the flow control valve closed if the comparing shows a mismatch.

Abstract: A method of removing metal impurities from a resist component, comprising the steps of:(a) dissolving said resist component in a solvent;(b) contacting said resist component solution with a cation exchange resin and a chelate resin for a sufficient amount of time to absorb at least a portion of said metal impurities onto said cation exchange and chelate resins; and(c) separating said cation exchange and chelate resins bearing said metal impurities from said resist component solution.

Abstract: A method of removing metal impurities from a resist component, comprising the steps of:(a) dissolving said resist component in a solvent;(b) washing a cation exchange resin with a solution of a quaternary ammonium compound;(c) contacting the prewashed cation exchange resin with the solution of resist component to remove metal impurities from said solution of resist component; and(d) separating said cation exchange resin bearing said metal impurities from said resist component solution.

Abstract: An apparatus and method for dissolving a chlorine containing treating material such as calcium hypochlorite in which water is fed to a container preferably in the form of a column containing the treating material. The water is caused to cyclically rise in the container to a predetermined height to dissolve a portion of the material and then discharge to a storage container to empty the material containing container. The height at which the water rises within the container, the cross-sectional area of the container and the length of time the liquid is in contact with the material during the cycle is set to produce a solution having a concentration of from between about 2 to about 18% available chlorine at a feed rate of at least about 2 lbs/hr available chlorine. The cyclical action is preferably achieved through the use of a siphon tube connected to the material holding container and through which the fluid in the container is discharged.

Abstract: A bipolar water ionizing electrode and a process employing such an electrode in an electrodialytic cell are disclosed. The cell has a plurality of ion exchange compartments separated by cation permselective membranes and the bipolar water ionizing electrode. The bipolar electrode is permeable to gas and electric current and impervious to liquid.