Abstract: A phenolic novolak composition prepared by a process comprising the steps of:(1) reacting a first phenolic monomer comprising a major portion of at least one trifunctional phenolic monomer with a first aldehyde source in the absence of a catalyst at a reaction temperature from about 100.degree. C. to about 200.degree. C. and at a reaction pressure of about 2 to about 15 atmospheres to form a phenolic oligomer having a weight average molecular weight from about 500 to about 2,000, having ortho-ortho bonding of about 55% to about 75% of the methylene bonds between the phenolic moieties; and having a time to clear of less than 125 seconds per micron; wherein the mole ratio of said first aldehyde source to said first phenolic monomer is from about 0.3:1.0 to about 0.55:1.0; and(2) then reacting said oligomer with an optional second phenolic source and a second aldehyde source at a temperature from about 80.degree. C. to about 150.degree. C.
Type:
Grant
Filed:
May 7, 1993
Date of Patent:
May 9, 1995
Assignee:
OCG Microelectronic Materials, Inc.
Inventors:
Joseph J. Sizensky, Thomas R. Sarubbi, Medhat A. Toukhy
Abstract: A process for dissolving calcium carbonate solids in the presence of an aqueous chlorine-containing solution without the formation of chlorine gas comprising adding a sufficient amount of lactic acid to the solution dissolving said solids.
Abstract: A process for producing manganese dioxide and zinc metal comprising the steps of:(1) reacting a mixture of zinc oxide and manganese oxide with an aqueous chloric acid solution wherein the chloric acid is in molar excess of the manganese oxide in a reaction zone to form a reaction mixture in the zone comprising chlorine gas, a solid phase containing manganese dioxide, and a liquid phase containing zinc oxide, chloric acid and water; the concentration of chloric acid in the liquid phase is greater than about 1% by weight of the liquid phase upon leaving the reaction zone;(2) separating the chlorine gas from the solid phase and the liquid phase;(3) separating the solid phase containing manganese dioxide from the liquid phase containing zinc ions, chlorate ions, chloric acid, and water thereby forming a separated solid phase and a separated liquid phase;(4) subjecting the separated liquid phase to electrolysis in an electrochemical cell, thereby producing zinc metal at the cathode and oxygen at the anode;(5) remo
Abstract: A process for removing alkaline earth metal impurities (e.g. calcium and magnesium ions) from an aqueous alkali metal chlorate solution which includes adding sufficient alkali metal carbonate or hydroxide or both to the impure solution to raise the pH to above 9 and form alkaline earth metal precipitates which are then removed from the pH-adjusted solution (e.g. by microfiltration). This process can lower the level of these impurities from about 1-20 ppm to less than about 0.3 ppm or less.
Type:
Grant
Filed:
March 18, 1994
Date of Patent:
April 25, 1995
Assignee:
Olin Corporation
Inventors:
Jerry J. Kaczur, David W. Cawlfield, Julian F. Watson
Abstract: A process for producing manganese dioxide comprising the steps of:(1) reacting manganese oxide with a molar excess of an aqueous chloric acid solution in a reaction zone to form a reaction mixture in said zone comprising chlorine gas, a solid phase containing manganese dioxide, and a liquid phase containing chloric acid and water; the concentration of chloric acid in said liquid phase is greater than about 5% by weight of said liquid phase upon leaving the reaction zone;(2) separating said chlorine gas from said solid phase and said liquid phase;(3) separating said solid phase containing manganese dioxide from liquid phase containing chloric acid and water;(4) removing water from said separated liquid phase to concentrate said chloric acid in said separated liquid phase; and(5) returning said separated and concentrated liquid phase back to said reaction zone for further reaction with manganese oxide.
Abstract: A method of removing ionic impurities from a resist component, comprising the steps of:(a) dissolving said resist component in a solvent;(b) contacting said resist component solution with a fibrous ion exchange resin for a sufficient amount of time to remove at least a portion of said ionic impurities onto said fibrous ion exchange resin; and(c) separating said fibrous ion exchange resin bearing said ionic impurities from said resist component solution.
Abstract: A process for electrochemically treating an aqueous solution containing inorganic oxynitrogen species is disclosed in which the aqueous solution is fed into the catholyte compartment of an electrochemical reduction cell using a high surface area cathode separated from an anolyte compartment to electrochemically reduce substantially all of the oxynitrogen species to nitrogen or ammonia and produce a purified water product.
Type:
Grant
Filed:
November 23, 1993
Date of Patent:
December 27, 1994
Assignee:
Olin Corporation
Inventors:
Jerry J. Kaczur, David W. Cawlfield, Kenneth E. Woodard, Jr.
Abstract: A sanitizer composition comprising a bactericidal effective amount of the combination of (a) a quaternary ammonium compound selected from the group consisting of (hydrogenated tallow) 2-ethylhexyl dimethyl ammonium salt, dicoco dimethyl ammonium salt, and mixtures thereof; and (b) a copper (II) ion source.
Abstract: A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one compound of formula (I): ##STR1## wherein each R is individually selected from the group consisting of hydrogen and a lower alkyl group having 1-4 carbon atoms and each n is 0, 1, or 2; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition.
Abstract: The novel process of the invention produces chlorine dioxide by feeding an aqueous solution of chloric acid to a chlorine dioxide generator. The aqueous solution of chloric acid is reacted with a reducing agent in the chlorine dioxide generator to produce chlorine dioxide and a spent chloric acid solution containing metallic impurities. A portion of the spent chloric acid solution containing metallic impurities is reacted with a basic compound selected from the group consisting of alkali metal hydroxides, and alkali metal carbonates in a neutralizing zone to form a precipitate of the metallic impurities and an alkali metal chlorate solution. The precipitate of the metallic impurities is separated from the alkali metal chlorate solution and the alkali metal chlorate solution fed to an ion exchange compartment of an electrolytic cell having an anode compartment, a cathode compartment, and at least one ion exchange compartment between the anode compartment and the cathode compartment.
Type:
Grant
Filed:
December 31, 1992
Date of Patent:
October 11, 1994
Assignee:
Olin Corporation
Inventors:
Jerry J. Kaczur, David W. Cawlfield, Kenneth E. Woodard, Jr., Budd L. Duncan, Sudhir K. Mendiratta
Abstract: A novolak resin composition comprising at least one unit of the reaction product of a para-, para-bonded bisphenol having formula (A): ##STR1## wherein R.sub.1 =hydrogen, lower alkyl group having 1-4 carbon atoms, halogen, or lower alkoxy group having 1-4 carbon atoms;wherein R.sub.2 =hydrogen or lower alkyl group having 1-4 carbon atoms; andwherein X is selected from the group consisting of: CH.sub.2, CH(CH.sub.3), C(CH.sub.3).sub.2, O, and S;with a bismethylol monomer selected from a difunctional ortho-, ortho-phenolic bismethylol of Formula (B), a difunctional ortho-, para-phenolic bismethylol of Formula (C): ##STR2## wherein R.sub.3 is selected from CH.sub.3, CH.sub.2 CH.sub.3, Cl, and Br; andwherein R.sub.4 is selected from H and CH.sub.3.
Abstract: An aqueous solution of chloric acid and alkali metal chlorate is produced in an electrolytic cell having an anode compartment, a cathode compartment, and at least one ion exchange compartment between the anode compartment and the cathode compartment.
Type:
Grant
Filed:
April 5, 1993
Date of Patent:
September 20, 1994
Assignee:
Olin Corporation
Inventors:
Jerry J. Kaczur, David W. Cawlfield, Kenneth E. Woodard, Jr., Budd L. Duncan
Abstract: A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one compound of formula (I): ##STR1## wherein each R is individually selected from the group consisting of hydrogen and a lower alkyl group having 1-4 carbon atoms and each n is 0, 1, or 2; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition.
Abstract: An alkali-soluble novolak binder resin made by the condensation reaction of a mixture of phenolic monomers with at least one aldehyde source, said phenolic monomers consisting of:(1) about 2-18% by weight of said mixture being 2,6-dimethylphenol;(2) about 55-75% by weight of said mixture being 2,3-dimethylphenol;(3) about 16-40% by weight of said mixture being a para-substituted lower alkyl phenol selected from the group consisting of 3,4-dimethylphenol, para-cresol, and para-cresol dimer;and the amount of said aldehyde source being at least a stoichiometric amount to react with all of said phenolic moieties. These novolak binder resins may be used in radiation-sensitive compositions useful as positive-working photoresists.
Type:
Grant
Filed:
December 7, 1992
Date of Patent:
September 13, 1994
Assignee:
OCG Microelectronic Materials, Inc.
Inventors:
Alfred T. Jeffries, III, David J. Brzozowy
Abstract: A method for detecting the presence of a vapor of an alkyl ester of phosphoric acid, particularly tributylphosphate, in ambient air. A sample of ambient air is heated to convert any alkyl ester of phosphoric acid to an alkene. The heated sample of air is then passed to a sample loop. Carrier air periodically carries a fixed volume of sample from the sample loop through a chromatographic column to a photoionization detector which detects the presence and amount of the alkene in the sample.
Abstract: A process which comprises heating a reaction mixture comprised of an aqueous solution containing perchlorate ions, chlorate ions and hydrogen ions to produce chlorine dioxide and oxygen gas.The novel process of the present invention provides a commercially viable process for producing chlorine dioxide from mixtures of oxy-chlorine species in the absence of a reducing agent. The process can be operated without producing an acidic salt by-product while producing a chlorine dioxide product which is substantially free of chlorine. In addition, the process of the invention permits a reduction in the amount of acid fed to the chlorine dioxide generator.
Type:
Grant
Filed:
August 5, 1992
Date of Patent:
August 30, 1994
Assignee:
Olin Corporation
Inventors:
David W. Cawlfield, Sudhir K. Mendiratta
Abstract: An alkali-soluble binder resin made by a condensation reaction of hydroxy styrene moiety having formulae (I) or (II): ##STR1## wherein x is an integer from 2 to 300; with a monomethylolated phenolic compound having a formula (III): ##STR2## wherein R.sub.1 and R.sub.2 are individually selected from the group consisting of lower alkyl group having 1-4 carbon atoms, lower alkoxy group having 1-4 carbon atoms, amino group, and carboxylic acid group; wherein R.sub.3 and R.sub.4 are individually selected from the group consisting of hydrogen, lower alkyl group having 1-4 carbon atoms, lower alkoxy groups having 1-4 carbon atoms, an amino group, and a carboxylic group; and wherein the mole ratio of the hydroxy styrene moiety to the monomethylolated phenolic compound is from about 1:10 to about 10:1.
Abstract: A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in radiation-sensitive compositions, especially those useful as positive-working photoresists.
Abstract: A novolak resin composition comprising at least one unit of the reaction product of a para-, para-bonded bisphenol having formula (A): ##STR1## wherein R.sub.1 =hydrogen, lower alkyl group having 1-4 carbon atoms, halogen, or lower alkoxy group having 1-4 carbon atoms; whereinR.sub.2 =hydrogen or lower alkyl group having 1-4 carbon atoms; and whereinX is selected from the group consisting of: CH.sub.2, CH(CH.sub.3), C(CH.sub.3).sub.2, O, and S;with a bismethylol monomer selected from a difunctional ortho-, ortho-phenolic bismethylol of Formula (B), a difunctional ortho-, para-phenolic bismethylol of Formula (C): ##STR2## wherein R.sub.3 is selected from CH.sub.3, CH.sub.2 CH.sub.3, Cl, and Br; and whereinR.sub.4 is selected from H and CH.sub.3.
Abstract: A process of making poly(dianhydride) compounds having formulae (I) and (II): ##STR1## where m is 0 to 50. ##STR2## wherein n is 0 to 20 and X is bond junction, oxygen atom, sulfur atom, SO.sub.2, C(CF.sub.3), CO, C(CH.sub.3).sub.2, CF.sub.2 --O--CF.sub.2, CH.sub.2, and CHOH.
Type:
Grant
Filed:
February 1, 1993
Date of Patent:
August 9, 1994
Assignee:
Olin Corporation
Inventors:
Murray A. Ruggiero, Renata C. Stegmeier, Bruce A. Marien, Keith O. Wilbourn