Abstract: A compressor comprises an hour-glass screw meshing with a pinion-wheel and a slide operable to obstruct partly a discharge port so as to increase the compression ratio by delaying the discharge moment. An edge of a part of the slide is used to obstruct the discharge cavity. The other edge of this part is provided with a removable spacer hvaing a thickness adapted to fill the slide-groove for a given adjustment of the slide. If the slide is moved so as to vary the compression ratio, a spacer having another thickness may be mounted to avoid modifying the volumetric capacity.

Abstract: A screw compressor discharges a fluid including a mixture of highly compressed gas and liquid into a separator reservoir, and a hydraulic motor is driven by at least a portion of the fluid. An injection conduit connects the bottom of the reservoir to a liquid injection port through the casing of the compressor. A pump driven by the hydraulic motor is mounted on the injection conduit. The motor-pump assembly is in a common casing. The injection port is in an area of the casing which is substantially subjected to high pressure.

Abstract: A flashlight-radiant apparatus is constructed of a housing defining an object-handling space and an irradiation space located adjacent to the object-handling space, a plurality of flash discharge lamps provided side by side in an upper part of the irradiation space, a gas-discharging member provided in the upper part of the irradiation space for controlling the atmosphere of the housing, and an object-supporting table movable reciprocally between the object-handling space and the irradiation space in the housing and equipped with built-in subsidiary heating. An object, for example, a silicon wafer is preheated on the object-supporting table while the object-supporting table is located in the object-handling space. The flashlight-radiant apparatus has a simple structure, enjoys a high level of handling safety, assures long service life for its flash discharge lamps, and is suitable particularly for annealing semiconductor wafers.

Abstract: A ribbon feeding mechanism for a typewriter or printer includes a pivotally mounted platform for removably receiving a fabric or carbon ribbon cassette. A manually operable lever carries ribbon feeding components including a toothed wheel for engaging the carbon ribbon takeup unit in the carbon ribbon cassette and a gear for engaging a driven gear of a fabric ribbon cassette. The ribbon feeding components are rotated about a common axis by a cam-driven pawl and rachet mechanism.

Abstract: A carriage for a hand-operated knitting machine is disclosed which is suitable for knitting with a thick or heavy yarn. A brush wheel is supported on a support plate for rotation substantially in a vertical or acutely inclined plane and extends at a lower end thereof between a sinker and a forward edge of a needle bed and below a lower face of a knitting needle in the needle bed so that it may push down loops suspended from the knitting needles.

Abstract: A road block for preventing unauthorized vehicles from entering a secured area comprises a pit, a span covering the pit, collapsible support members supporting the span at the trailing end of the plate with respect to the direction of vehicle access, devices for collapsing the support members, and a triggering mechanism for actuating the collapsing devices in response to the approach of an unauthorized vehicle.

Abstract: Refrigerant liquid containing a little oil dissolved is vaporized while cooling the motor and a portion of the vaporization products is sent into the bearings to be lubricated.The large excess of available heat permits dispensing with an oil recirculating pump and keeping in the motor casing, acting as a sump, the major part of the oil present.

Abstract: A light-radiant heating furnace including a box-shaped container, having a transparent wall portion, adapted to receive an object to be treated, for example, a large-sized semiconductor wafer, a reflector arranged in the proximity of outer surfaces of the transparent wall portion of the container, a space formed between the reflector and the outer surface of the transparent wall portion of the container, tubular lamps provided in the space and an air duct equipped with a cooling fan and arranged in communication with the spacing only. The lamps and their adjacent reflector and container wall can be efficiently cooled by causing cooling air to pass through the air duct and space, thereby avoiding overheating of the lamps and thus prolonging the service lives of the lamps. The reflector may be provided with water conduits through which cooling water flows.

Abstract: Disclosed herein is a plane light source unit comprising a plurality of lamps disposed closely with each other in proximity to a mirror with the longitudinal axes of the lamps extending parallelly in a plane. Each of the lamps comprises an elongated sealed tubular body and a filament formed of alternating non-luminous portions and luminous portions and provided within the tubular body along the longitudinal axis of the tubular body. A radiant heating furnace comprising the above plane light source unit and a cooling system therefor is also disclosed. The plane light source unit and a radiant heating furnace incorporating the same light source unit can irradiate light onto a region of a large area with a uniform irradiation energy density. They are suitable for heat treatment of semiconductor wafers.

Abstract: Disclosed herein is a halogen lamp unit comprising a tubular halogen lamp having at its both ends sealed portions hermetically enclosing their respective conductive members. The halogen lamp is supported by holders at its tubular outer wall portions of the envelope adjacent to the sealed end portions without base shells which cover the sealed portions. The holders are cooled by a water-cooling system. The sealed end portions of the lamp are kept in a bare state, thereby avoiding the degradation of the conductive members due to the oxidation thereof. The sealed end portions may be exposed in air-paths to the cooling wind flowing along the tubular halogen lamp.

Abstract: A drive mechanism for a member to be driven in one direction is disclosed. The mechanism is incorporated in an electronic typewriter and includes a clutch including a clutch spring which provides a driving connection between a small DC motor and the member to be driven of the typewriter. Means is provided which normally holds a driven member of the clutch to a particular angular position and, when the motor is energized, it releases the driven member to allow the driven member to be rotated by the motor. After a cycle of rotation of the driven member, the holding means positively stops rotation of the second element and hence of the driving member and the motor.A new and efficient ribbon feed mechanism is also disclosed which enables selective use of a carbon ribbon and a fabric ink ribbon depending upon a cassette mounted thereon.

Abstract: An improved dental matrix band of the general type having a central tooth circumscribing portion extending between cervical and occlusal edges and merging with a pair of arms adapted for engagement by a retainer appliance and to which a leaf-like flap is secured to the tooth engaging surface of the band to be deformable away from the band by a compressible wedge against the surface of a tooth to be filled. The flap has an inner edge generally coextensive with the cervical edge of the band and extends to an outer edge coextensive with or beyond the occlusal edge of the band. The flap is secured at only one corner either by a pair of spot welds to leave remaining the major area of the flap to be deflectable against the surface of a tooth. Alternatively, the flap is secured by a bendable neck portion integral with both the flap and the band.

Abstract: A volumetric machine comprises a cylindrical screw meshing with a pinion-wheel, a low pressure port near one end of the screw, a high pressure port near the other end of the screw, and a control slide axially movable in the bore of a housing in which the screw is rotatable. In one condition, including a series of positions, the slide more or less broadens the high pressure port and thus controls the volumetric ratio of the machine, but covers any threads of the screw which are meshing with the pinion-wheel. In another condition, the slide closes the high pressure port except a stationary port but uncovers some of the threads meshing with the screw, such as to establish a part load with a predetermined volumetric ratio.

Abstract: When heating a semiconductor wafer by means of application of radiated light, a subsidiary heating device which is arranged in contact with the surface of a circumferential edge or a surface portion lying in the vicinity of the circumferential edge of the semiconductor wafer is employed to additionally heat or to preheat the circumferential portion of the wafer so as to make the temperature of the wafer uniform across the entire surface thereof. Use of such subsidiary heating device is effective to prevent the occurrence of such large "warping" as to impair subsequent treatment and/or processing or the development of "slip line".

Abstract: Disclosed herein are a heater assembly and a method for heat-treating a semiconductor wafer using the same. The heater assembly is formed of a heating device having a ring-shaped portion and a holder combined with the heating device detachably each other. A wafer material such as a semiconductor wafer is held on the holder of the heater assembly. A heat-treatment is effected by heating the wafer material by means of application of light radiated from a light source, which is formed of one or more lamps, while heating or after having heated the circumferential portion of the wafer by the heating device of the heater assembly. Owing to the subsidiary heating of the circumferential portion, the wafer may be heat-treated at substantially the same temperature in its entirety. Thus, the heat-treatment does not develop such large "warping" impairing subsequent treatment and/or treatment of the wafer or "slip lines". The heater assembly may be used successfully and conveniently in effecting uniform heating.

Abstract: Disclosed herein is a photoheating apparatus for heat-treating an object such as silicon semiconductor wafer in a flowing gas of a special composition. It comprises a container adapted to position the object therein, at least one part of the container being transparent, a heat-radiating lamp adapted to irradiate light onto the object through the transparent part of the container, a gas inlet and gas outlet formed through the wall of the container, and a gas flow dispersion barrier disposed within the container so as to confront the gas inlet, defining a plurality of gas through-holes and made of a transparent material. Owing to the provision of the gas flow dispersion barrier, the gas flow is kept uniform downstream the barrier. The photoheating apparatus is small in size and is capable of causing a reaction to proceed at a uniform rate on the whole surface of the object.

Abstract: In a photochemical vapor deposition apparatus comprising a reaction space, which forms a passage for a photoreactive gas and in which a substrate is to be placed, and a discharge space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical reaction of the photoreactive gas, both the spaces being surrounded by the same vessel, discharging electrodes arranged opposite one another with said discharge space therebetween, and a grid comprising a wire-netting of metal interposed between the discharge space and the reaction space, to which grid is applied a voltage of positive potential.This photochemical vapor deposition apparatus can achieve photochemical vapor deposition with high efficiency, because the diffusion of plasma into the reaction space is interrupted by the grid so that the substrate is permitted to be placed at a position closer to an ultraviolet ray source and ultraviolet rays of larger intensity are applied to the substrate.

Abstract: A method for heating a semiconductor wafer which may have a first region to be heated and a second region requiring no heating thereof, which method comprises forming a film on a surface of the semiconductor wafer so as to make the reflectivity of the whole surface of the wafer uniform, and then exposing the semiconductor wafer to a flash of light to heat same. The above method permits to heat the whole surface of the wafer at a uniform temperature thereby heating a region of the wafer which is required to be heated, and, at the same time, avoiding any overheating of another region of the wafer where no heating is required. The above heating method is effective for annealing a semiconductor wafer which has large surface area.

Abstract: Insulated composite aluminum profile, a method and a device for manufacturing thereof. The composite profile comprises two separate profile portions provided with grooves. Plastic strips engage the grooves in order to interconnect the profile portions and form an enclosed space for an insulating plastic foam. The profile portions are placed in a fixture, which determines the dimensions of the composite profile and the plastic foam is inserted in the space in order to expand and cure therein. Thence, the profile is removed from the fixture and eventually rolled as to the outer rims of the grooves, which are deformed and thereby fix the plastic strip.

Abstract: In a photochemical vapor deposition apparatus, a reaction space in which a substrate is to be placed and a discharge space adjacent to the reaction space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical decomposition reaction of a photoreactive gas, are surrounded by the same vessel, and discharging electrodes are provided in the discharge space so as to be opposite to each other in a first level and a second level, which are different in level in the direction in which the spaces align. The discharging electrode arranged in the first level, which is closer to the reaction space, has such a configuration or arrangement that an ultraviolet ray-passing opening is formed.According to the apparatus, a vapor-deposited film can be formed with high efficiency, because a large quantity of ultraviolet rays can be applied to the substrate without any damage of the vapor-deposited film.