Patents Assigned to Adshir Ltd.
  • Patent number: 10380785
    Abstract: A novel ray tracing acceleration structure is divided into one central acceleration structure and multiple local acceleration structures, to support intersection tests between incoming rays and scene polygons, while the scene is divided into multiple non uniform cells.
    Type: Grant
    Filed: May 20, 2018
    Date of Patent: August 13, 2019
    Assignee: ADSHIR LTD.
    Inventors: Reuven Bakalash, Elad Haviv
  • Patent number: 10332304
    Abstract: The present disclosure describes a system of fast intersection between secondary rays and geometric objects for a global illumination ray tracing. A hardware graphics pipeline of GPU is used as a means for carrying out the intersection between secondary rays and scene geometry in large groups of rays, gaining high speed and lowering computational complexity. The resulting power consumption is reduced.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: June 25, 2019
    Assignee: ADSHIR LTD.
    Inventor: Reuven Bakalash
  • Patent number: 10297068
    Abstract: The present disclosure describes a new global illumination ray tracing, concentrated at augmented objects of virtual or augmented reality, utilizing the graphics pipeline. Secondary rays are handled in large groups, originating at clusters of primary hit points, and intersecting with scene geometry.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: May 21, 2019
    Assignee: ADSHIR LTD.
    Inventors: Reuven Bakalash, Amit Porat, Elad Haviv
  • Patent number: 10229527
    Abstract: The present disclosure describes a fast intersection between secondary rays and geometric objects for a global illumination ray tracing. The Acceleration Structures of prior art are replaced by a new and novel device—a Dynamically Aligned Structure (DAS), a means for carrying out the intersection between secondary rays and scene geometry in large groups of rays, gaining high speed and lowering computational complexity. Its reduced power consumption is suitable to consumer level computing devices.
    Type: Grant
    Filed: July 1, 2017
    Date of Patent: March 12, 2019
    Assignee: ADSHIR LTD.
    Inventors: Reuven Bakalash, Amit Porat, Elad Haviv
  • Patent number: 10217268
    Abstract: The present disclosure describes a fast intersection between secondary rays and geometric objects for a global illumination ray tracing. The Acceleration Structures of prior art are replaced by a new and novel device—a Dynamically Aligned Structure (DAS), a means for carrying out the intersection between secondary rays and scene geometry in large groups of rays, gaining high speed and lowering computational complexity. Its reduced power consumption is suitable to consumer level computing devices.
    Type: Grant
    Filed: July 1, 2017
    Date of Patent: February 26, 2019
    Assignee: ADSHIR LTD.
    Inventors: Reuven Bakalash, Amit Porat, Elad Haviv
  • Patent number: 10204442
    Abstract: The present disclosure describes a new global illumination ray tracing, concentrated at augmented objects of virtual or augmented reality, utilizing the graphics pipeline. Secondary rays are handled in large groups, originating at clusters of primary hit points, and intersecting with scene geometry.
    Type: Grant
    Filed: July 1, 2017
    Date of Patent: February 12, 2019
    Assignee: ADSHIR LTD.
    Inventors: Reuven Bakalash, Amit Porat, Elad Haviv
  • Publication number: 20190012823
    Abstract: Aspects comprise a ray tracing system based on data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures, typical to the prior art ray tracing, are greatly reduced. The stencils, generated in a preprocessing phase, hold visibility information, for a runtime use. Each cell achieves high locality, allowing improved parallel processing.
    Type: Application
    Filed: July 10, 2017
    Publication date: January 10, 2019
    Applicant: Adshir Ltd.
    Inventors: Reuven Bakalash, Gal Hochberg
  • Publication number: 20180374256
    Abstract: The present disclosure describes a fast intersection between secondary rays and geometric objects for a global illumination ray tracing. The Acceleration Structures of prior art are replaced by a new and novel device—a Dynamically Aligned Structure (DAS), a means for carrying out the intersection between secondary rays and scene geometry in large groups of rays, gaining high speed and lowering computational complexity. Its reduced power consumption is suitable to consumer level computing devices.
    Type: Application
    Filed: July 1, 2017
    Publication date: December 27, 2018
    Applicant: Adshir Ltd.
    Inventors: Reuven Bakalash, Amit Porat, Elad Haviv
  • Publication number: 20180365880
    Abstract: The present disclosure describes a new global illumination ray tracing, concentrated at augmented objects of virtual or augmented reality, utilizing the graphics pipeline. Secondary rays are handled in large groups, originating at clusters of primary hit points, and intersecting with scene geometry.
    Type: Application
    Filed: July 1, 2017
    Publication date: December 20, 2018
    Applicant: Adshir Ltd.
    Inventors: Reuven Bakalash, Amit Porat, Elad Haviv
  • Patent number: 9741160
    Abstract: Aspects comprise a ray tracing shadowing method based on the data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures are cut down. The object's visibility from the viewpoint and from light sources, as well as the primary workload and its distribution among cells, are gained in the preprocessing stage and cached in stencils for runtime use. In runtime, the use of stencils allows a complete locality at each cell, for load balanced parallel processing.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: August 22, 2017
    Assignee: ADSHIR LTD.
    Inventor: Reuven Bakalash
  • Patent number: 9633467
    Abstract: Aspects comprise shadowing system as part of ray tracing. It is based on uniform grid of cells, and on local stencils in cells. The acceleration structures are abandoned along with high traversal and construction costs of these structures. The amount of intersection tests is cut down. The stencils are generated in the preprocessing stage and utilized in runtime. The relevant part of scene data, critical for shadowing of all visible intersection points in a cell, is registered in the local stencil map, as a volumetric data. The runtime use of stencils allows a complete locality at each cell, enhanced utilization of processing resources and load balancing of parallel processing.
    Type: Grant
    Filed: September 7, 2014
    Date of Patent: April 25, 2017
    Assignee: ADSHIR LTD.
    Inventor: Reuven Bakalash
  • Patent number: 9558530
    Abstract: Novel method and system for distributed database ray-tracing is presented, based on modular mapping of scene-data among processors. Its inherent properties include matching between geographical proximity in the scene with communication proximity between processors.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: January 31, 2017
    Assignee: ADSHIR LTD.
    Inventor: Reuven Bakalash
  • Patent number: 9483865
    Abstract: Aspects comprise a ray shooting method based on the data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures are cut down. The object's visibility from the viewpoint and from light sources, as well as the primary workload and its distribution among cells, are gained in the preprocessing stage and cached in stencils for runtime use. In runtime, the use of stencils allows a complete locality at each cell, for load balanced parallel processing.
    Type: Grant
    Filed: September 7, 2014
    Date of Patent: November 1, 2016
    Assignee: ADSHIR LTD.
    Inventor: Reuven Bakalash
  • Publication number: 20160155258
    Abstract: Aspects comprise a ray tracing shadowing method based on the data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures are cut down. The object's visibility from the viewpoint and from light sources, as well as the primary workload and its distribution among cells, are gained in the preprocessing stage and cached in stencils for runtime use. In runtime, the use of stencils allows a complete locality at each cell, for load balanced parallel processing.
    Type: Application
    Filed: January 28, 2016
    Publication date: June 2, 2016
    Applicant: Adshir Ltd.
    Inventor: Reuven Bakalash
  • Patent number: 9117306
    Abstract: Aspects comprise shadowing method as part of ray tracing. It is based on uniform grid of cells, and on local stencils in cells. The acceleration structures are abandoned along with high traversal and construction costs of these structures. The amount of intersection tests is cut down. The stencils are generated in the preprocessing stage and utilized in runtime. The relevant part of scene data, critical for shadowing of all visible intersection points in a cell, is registered in the local stencil map, as a volumetric data. The runtime use of stencils allows a complete locality at each cell, enhanced utilization of processing resources and load balancing of parallel processing.
    Type: Grant
    Filed: September 7, 2014
    Date of Patent: August 25, 2015
    Assignee: ADSHIR LTD.
    Inventor: Reuven Bakalash
  • Patent number: 9007372
    Abstract: Aspects comprise ray shooting system based on the data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures are cut down. The object's visibility from the viewpoint and from light sources, as well as the primary workload and its distribution among cells, are gained in the preprocessing stage and cached in stencils for runtime use. In runtime, the use of stencils allows a complete locality at each cell, for load balanced parallel processing.
    Type: Grant
    Filed: September 7, 2014
    Date of Patent: April 14, 2015
    Assignee: Adshir Ltd.
    Inventor: Reuven Bakalash
  • Patent number: 8373699
    Abstract: Novel method and system for distributed database ray-tracing is presented, based on modular mapping of scene-data among processors. Its inherent properties include scattering data among processors for improved load balancing, and matching between geographical proximity in the scene with communication proximity between processors. High utilization is enabled by unique mechanism of cache sharing. The resulting improved performance enables deep level of ray tracing for real time applications.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: February 12, 2013
    Assignee: Adshir Ltd.
    Inventor: Reuven Bakalash
  • Patent number: 8189001
    Abstract: Novel method and system for distributed database ray-tracing is presented, based on modular mapping of scene-data among processors. Its inherent properties include scattering data among processors for improved load balancing, and matching between geographical proximity in the scene with communication proximity between processors. High utilization is enabled by unique mechanism of cache sharing. The resulting improved performance enables deep level of ray tracing for real time applications.
    Type: Grant
    Filed: December 24, 2010
    Date of Patent: May 29, 2012
    Assignee: Adshir Ltd.
    Inventor: Reuven Bakalash