Abstract: This disclosure describes systems, methods, and apparatus for generating a control signal for one or more actuators that is adjusted from a control signal dictated by setpoints, where the adjustment accounts for predicted delays and amplitude errors. More specifically, cross correlation between measurements of the actuator(s) outputs and time-shifted setpoints can be optimized for a time-shift that minimizes the cross correlation. The time-shifted setpoints along with the measurements can then be used to determine an amplitude difference and to remove noise from the amplitude difference. Dynamic uncertainty can then be found from this denoised data set and further optionally used to find the noise that was removed. The time delay, noise, and dynamic uncertainty can be used to preemptively adjust the control signal.

Abstract: This disclosure describes systems, methods, and apparatus for adjusting at least one actuator using at least one control output value to control a plasma processing system. More specifically, the controlling is based on receiving a reference signal defining target values for a parameter that is controlled at an output within the plasma processing system; obtaining a measure of the parameter, where the parameter is measured at a first sampling frequency; calculating one or more internal control signal values at a second sampling frequency; predicting, using an internal model, one or more internal measurements of the controlled parameter at the second sampling frequency; and adjusting, based upon the one or more control output values, at least one actuator at the first sampling frequency, where the control output values are based on the internal control signal values and the predicted internal measurements.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheath(s) proximate to the bias electrodes.

Abstract: Bias supplies, plasma processing systems, and associated methods are disclosed. One bias supply comprises a first inductor coupled between a first node of a switch and an output node where a first node of a second inductor is coupled to one of the output node or the first node of the switch. A voltage source is coupled between a second node of the switch and a second node of the second inductor. A connection is made between the return node and one of the second node of the switch and the second node of the second inductor. The bias supply also comprises a controller configured to cause an application of the periodic voltage between the output node and the return node by repeatedly closing the switch so current through the switch completes a full cycle.

Abstract: A bias supply comprising power circuitry configured to apply an asymmetric periodic voltage waveform at the output node wherein the asymmetric periodic voltage waveform comprises a first section that begins with a first negative voltage and changes during a first transition to a peak voltage before changing during a second transition to a second negative voltage and a second section that begins with the second negative voltage and comprises a voltage ramp between the second negative voltage and a third negative voltage. Transition circuitry is configured to adjust a slope of one, or both, of the first and second transitions.

Abstract: Fuzzy control systems and methods are disclosed. A method includes receiving a reference signal defining target values for a parameter that is controlled at an output of the plasma processing system and obtaining a measure of the parameter that is controlled at the output. A fuzzy controller provides a control signal to adjust at least one actuator based at least upon the reference signal and the measure of the controlled parameter. In addition, output membership functions of the fuzzy controller, input membership functions of the fuzzy controller, and a rule base of the fuzzy controller are adapted while controlling an output of a system based at least upon the based at least upon an estimated model parameter tensor, the reference signal and the measure of the controlled parameter, and the control signal.

Abstract: Various illustrative aspects are directed to a system. The system comprises a setpoint waveform streaming progenitor module, configured to receive inputs indicative of a desired setpoint waveform, and to output a data package based at least in part on the inputs indicative of the desired setpoint waveform, wherein the data package comprises a plurality of points, an interpolation method, and one or more interpolation parameters. The system further comprises a setpoint waveform streaming processing module, configured to receive the data package from the setpoint waveform streaming progenitor module, and to output a streaming setpoint waveform based at least in part on the data package.

Abstract: This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a capacitive element, two inductive elements, and three switches, where a duty cycle of two of the three switches controls the voltage boost. The snubber can be arranged between a DC power supply and a switching circuit configured to generate a pulsed waveform for provision to the load.

Abstract: This disclosure describes systems, methods, and apparatus for generating a control signal for one or more actuators that is adjusted from a control signal dictated by setpoints, where the adjustment accounts for predicted delays and amplitude errors. More specifically, cross correlation between measurements of the actuator(s) outputs and time-shifted setpoints can be optimized for a time-shift that minimizes the cross correlation. The time-shifted setpoints along with the measurements can then be used to determine an amplitude difference and to remove noise from the amplitude difference. Dynamic uncertainty can then be found from this denoised data set and further optionally used to find the noise that was removed. The time delay, noise, and dynamic uncertainty can be used to preemptively adjust the control signal.

Abstract: Systems and methods for operating a match network are disclosed. One match network comprises at least one first sensor to measure one or more first parameters and at least one second sensor to measure one or more second parameters. The match network also comprises means for assessing whether the match is operating as expected or operating outside of specifications using the one or more first-parameter measurements; the one or more second-parameter measurements; a setting of the match; or one or more expected parameter values.

Abstract: A method for emulating a reactive source impedance for a generator connected to a load. The method comprises adjusting an output of the generator, wherein, in response to adjustment of the output, a first measured value M1 calculated with respect to a weighted sum of voltage v, current i and derivatives of the voltage v and the current i tends to a first setpoint S1 for M1. The method also includes receiving a second setpoint S2 for a second measured value M2 and adjusting S1 to adjust the second measured value M2 of a conventional measure of generator output towards the second setpoint S2 for M2, wherein holding M1 constant emulates a desired source impedance of the generator.

Abstract: Current sharing in a power system having multiple PSUs comprises generating and supplying a first power and a second power to a load, and sensing a remote voltage value received by the load based on an accumulation of the first and second powers. The method further comprises determining, by the first PSU, local voltage and current values of the first power, a real impedance value of the first PSU based on the remote voltage value and the local voltage and current values of the first power, and a virtual impedance value of the first PSU based on the real impedance value of the first PSU and a reference impedance value. The method further comprises controlling generation of the first power by the first PSU based on the virtual impedance value of the first PSU.

Abstract: An apparatus and method to produce a waveform. The apparatus includes a first node to couple to a substrate support and a power supply coupled to a second node wherein the power supply is configured to provide a DC voltage to set an ion-energy at a surface of the substrate. The apparatus also includes a first switch that couples the second node to the first node, and responsive to the first switch being closed, a first voltage is applied at the first node. A second switch of the power supply couples a third node to the first node, and responsive to the second switch being closed, a second voltage is applied at the first node to effectuate a negative voltage at the surface of the substrate.

Abstract: A fan assembly comprises first and second fans and a first press fit stabilizer. The first and second fans comprise housings having a plurality of fastener apertures formed in a first side thereof the first housing. The first press fit stabilizer comprises a plurality of press fit tabs. The first fan is coupled to the second fan via a first press fit tab of the plurality of press fit tabs inserted into a first fastener aperture of the plurality of fastener apertures of the first housing and via a second press fit tab of the plurality of press fit tabs inserted into a first fastener aperture of the plurality of fastener apertures of the second housing.

Abstract: Input impedance networks and associated methods are disclosed. An input impedance network comprises a source-terminal-pair configured to couple to a power source, a recovered-power-terminal-pair configured to couple to a power sink, a transmission line coupled to the source-terminal-pair that comprises M sections, and N clamping circuits. Each of the N clamping circuits is configured to clamp at least one of voltage or current in one of the M sections, and a power recovery circuit is coupled to the N clamping circuits to enable recovered energy to be applied to the recovered-power-terminal-pair.

Abstract: Plasma processing systems and power delivery methods are disclosed. A system may comprise at least one modulating supply that modulates plasma properties where the modulation of the plasma properties has a repetition period, T. Electrical characteristics of an output of the modulating supply are monitored and provided to a controller where the electrical characteristics are analyzed. Characteristics of a waveform with the repetition period T are communicated to at least one piece of equipment connected to plasma processing system to enable synchronization of pieces of equipment connected to the plasma processing system. And in addition, instructions are relayed to the modulating supply and a match network, based on the analyzing of the electrical characteristics, enabling simultaneous tuning of the modulating supply and the match network.

Abstract: An apparatus comprises a vacuum chamber configured to produce a substantially atmospheric vacuum environment for plasma processing; a radio frequency (RF) power supply located outside of the vacuum chamber; an RF matching network operatively coupled to the RF power supply; and a plurality of electrodes mounted within the vacuum chamber, the plurality of electrodes configured to receive RF power signals from the RF power supply through the RF matching network. The RF power signals are simultaneously delivered to the plurality of electrodes during a sputtering operation. The plurality of electrodes and a set of electrical components are operative to manage the inductive and capacitive reactance for coupling the RF power signals to provide more desirable plasma coupling during the sputtering operation.

Abstract: Various illustrative aspects are directed to a system that comprises a tensor data pre-processing circuit and a tensor data write/read circuit. One or more output ports of the tensor data pre-processing circuit are operably coupled to one or more input ports of the tensor data write/read circuit.

Abstract: An adaptive engine and method of adaptive control. The adaptive control method comprises receiving a reference signal, a system output measurement, and a control output. The method also includes applying one or more estimation laws to estimate an estimated model parameter tensor, ?, for a nonlinear model; generating a possible control signal or an internal possible control signal using a control portion of the nonlinear model; receiving a linear time varying system corresponding to the reference signal, and the possible control signal or the internal possible control signal; and generating one or more of a predicted system output and an estimated system output using an estimation portion of the nonlinear model.

Abstract: This disclosure describes systems, methods, and apparatus for reducing ripple in a pulsed waveform power generation system, often for use providing power to a plasma processing chamber. A snubber can be provided between a DC power supply and a switching circuit. A buck converter can also be provided between the snubber and the switching circuit, where the buck converter takes its input from within the snubber and in particular from between a rectifying and capacitive component of the snubber. In this way, the buck converter can be isolated from the DC power supply via an input inductor on a high-input line from the DC power supply.