Abstract: Processes are disclosed for increasing the condensed phase production of BCl3 comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl3 therein, the condensed BCl3 having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl3 is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl3 product condensed stream, and an inert gas is used to pump the BCl3 product condensed stream to a product receiver.

Abstract: Provided is a novel method and system for preparing ultra-high-purity buffered-hydrofluoric acid or ammonium fluoride controlled concentration The method comprises bubbling purified ammonia vapor into ultra-pure hydrofluoric acid. The inventive method and system can be used as an on-site subsystem in a semiconductor device fabrication facility for supplying the buffered-hydrofluoric acid and ammonium fluoride to points of use in the semiconductor device fabrication facility.

Abstract: A variable position sensing device is provided. The device includes a fixed track attached to a track holder. An adjustable sensor holder is adapted to receive a sensor and is capable of sliding and locking into position on the fixed track. The sensor device has particular applicability and the semiconductor manufacturing industry for setting sensors at different positions in a liquid chemical holding vessel.

Abstract: Provided is a system for controlled vaporization of a liquid chemical. The system includes: (a) an evaporation vessel connected to receive a liquid chemical which is carrier gas free; (b) a mechanism for maintaining the liquid chemical in the evaporation vessel at a substantially constant level; and (c) a mechanism for controlling the temperature of the liquid chemical in the evaporation vessel to a desired value, the controlling mechanism including: (I) a system for cooling the liquid chemical, and (II) a heater inside the evaporation vessel for heating the liquid chemical. Also provided, are methods of controlled delivery of a vaporized liquid chemical. The above systems and methods are particularly applicable to the semiconductor manufacturing industry.

Abstract: A corrosion resistant gas cylinder and gas delivery system includes an electroless nickel-phosphorous layer overlying the inner surface of a steel alloy cylinder. The nickel-phosphorous layer has a thickness of at least about 20 micrometers and a porosity of no greater than about 0.1%. The electroless nickel-phosphorous layer has a phosphorous content of at least about 10% by weight and a surface roughness of no greater than about 5 micrometers. Prior to introducing liquefied gas into the gas cylinder, a cleaning process is carried out using a two-step baking process to clean the surface of the nickel-phosphorus layer. The nickel-phosphorous layer substantially reduces the contamination of liquefied corrosive gasses stored in the gas cylinder by metal from the steel wall surface underlying the nickel-phosphorous layer.

Abstract: A method and system for controlling a temperature of products in a rotating drum employs nozzles to deliver a heat transfer fluid in a more efficient manner. The heat transfer fluid nozzles which are positioned around the interior of the rotating drum deliver the heat transfer fluid to the product in the drum when the nozzles are positioned under the product and prevent delivery of the heat transfer fluid when the nozzles are not under the product. This improves the efficiency of the heat transfer system substantially over known systems in which the heat transfer fluid is delivered continuously and a large portion of the heat transfer fluid is exhausted from the rotating drum before contacting the product. The heat transfer system also provides a self cleaning system for the nozzles which deliver the heat transfer fluid to the drum.

Abstract: A system and method for purifying liquefied corrosive gases of metallic impurities is described. The principle for this purification method relies on vapor-phase transfilling the vapor phase from a source container into a receiving container. This method has been observed to decrease metal concentrations by a factor of at least 1000 and decreases the metallic impurity levels in the resulting condensate. The vapor transfer is accomplished by controlled differential pressure rather than mechanical pumping, thereby generating no particle or metal impurities.

Abstract: A corrosion resistant gas cylinder and gas delivery system includes an electroless nickel-phosphorous layer overlying the inner surface of a steel alloy cylinder. The nickel-phosphorous layer has a thickness of at least about 20 micrometers and a porosity of no greater than about 0.1%. The electroless nickel-phosphorous layer has a phosphorous content of at least about 10% by weight and a surface roughness of no greater than about 5 micrometers. Prior to introducing liquefied gas into the gas cylinder, a cleaning process is carried out using a two-step baking process to clean the surface of the nickel-phosphorus layer. The nickel-phosphorous layer substantially reduces the contamination of liquefied corrosive gasses stored in the gas cylinder by metal from the steel wall surface underlying the nickel-phosphorous layer.

Abstract: Provided is a novel method of cleaning a chemical vapor deposition processing chamber having deposits on an inner surface thereof is provided. The process involves forming a plasma from one or more gases comprising a fluorine-containing but otherwise halogen-free non-global-warming compound, and contacting active species generated in the plasma with the inner surface of the chamber, with the proviso that the non-global-warming compound is not trifluoroacetic anhydride. Also provided is a method of etching a layer on a silicon wafer. The method involves the steps of: (a) introducing a silicon wafer into a processing chamber, the silicon wafer comprising a layer to be etched; and (b) forming a plasma from one or more gases comprising a fluorine-containing but otherwise halogen-free non-global-warming compound. Active species generated in the plasma are contacted with the silicon wafer, thereby etching the layer, with the proviso that the non-global-warming compound is not trifluoroacetic anhydride.

Abstract: Processes are disclosed for increasing the condensed phase production of BCl3 comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl3 therein, the condensed BCl3 having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl3 is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl3 product condensed stream, and an inert gas is used to pump the BCl3 product condensed stream to a product receiver.

Abstract: Provided is a novel system for delivery of a gas from a liquefied state. The system includes: (a) a cabinet having a first and second panel disposed therein; (b) at least one compressed liquefied gas cylinder corresponding to each panel disposed in the cabinet; (c) temperature and/or pressure sensors disposed on each the cylinder; and (d) a controller for monitoring and adjusting the energy input into each of the cylinders based on the temperature and/or pressure in each of the cylinders sensed by the temperature and/or pressure sensors.

Abstract: An oxy-burner having a back-up firing system includes an oxidant conduit coupled to an oxidant injector nozzle. A primary oxygen line is coupled to the oxidant conduit and transports oxygen into the oxidant conduit. An auxiliary air ejector is coupled to the oxidant conduit and is configured to receive a motive fluid and to entrain ambient air and force the entrained air into the oxidant conduit. In operation, upon detecting a disruption in the primary oxygen supply, a motive fluid is supplied to the auxiliary air ejector. The motive fluid injected by the auxiliary air ejector entrains ambient air sufficient to either continue operation of the oxy-burner, or provide cooling air to the oxy-burner in the event that the burner is shut down. Upon restoring the primary oxygen supply, the back-up oxy-burner system can be deactivated and the oxy-burner return to standard operation.

Abstract: In order to allow more flexible operation of a column for separating air by cryogenic distillation, a first air stream (6) exchanges heat with a liquid (16) which vaporizes, while a second air stream (7, 7A) is drawn off from an intermediate level in the exchange line and sent to a column in order to be distilled therein.

Abstract: A process for recovering olefins from a gas stream containing olefins and hydrogen. The process comprises compressing the gas stream in at least one compression stage to form a compressed gas stream, contacting the compressed gas stream with a membrane at conditions effective to obtain a permeate stream rich in hydrogen and a retentate stream depleted in hydrogen, and introducing the permeate stream into a pressure swing adsorption system at conditions effective to obtain a nonadsorbed stream rich in hydrogen and a desorbed stream comprising olefins.

Abstract: Provided are a system and method for saturating a gas with a vapor from a liquid chemical. The system includes: (a) a saturation vessel connected to receive a liquid chemical and a carrier gas; (b) a gas sparger in the saturation vessel for sparging the carrier gas into the liquid chemical; (c) means for maintaining the liquid chemical in the saturation vessel at a substantially constant level; (d) means for controlling the temperature of the liquid chemical in the saturation vessel to a desired value, comprising (I) a system for cooling the liquid chemical, and (ii) a heater inside the saturation vessel extending vertically in the liquid a distance at least half of the height of the liquid chemical level for heating the liquid chemical; and (e) means for controlling the pressure of the saturated gas to a desired value. The invention also relates to novel methods and systems for controlled delivery of a vaporized liquid chemical.

Abstract: Provided are novel methods and systems for separating a mixed gas containing oxygen and chlorine. According to one method in accordance with the invention, the mixed gas and a refrigerant are introduced into a separator unit. At least a portion of the chlorine is condensed from the mixed gas in the separator unit, thereby forming a condensed chlorine-rich liquid fraction and an oxygen-enriched gas fraction. The condensing duty is supplied by the refrigerant, which can be liquid oxygen. The mixed gas and refrigerant can be brought into direct or indirect contact with one another. The invention can be advantageously applied to the treatment of exhaust gases from an ore treatment plant, and can result in enriched oxygen and chlorine streams which may be recycled or used in other applications.

Abstract: Systems and processes are described for sanitizing a food product with ozone gas. The ozone gas is generated using a low pressure, low volume ozone gas generator and is delivered to a fluid injector. The fluid injector receives high pressure carrier fluid from a carrier fluid source and causes the ozone to be entrained in a stream of carrier fluid. The entrainment is created by passing the carrier fluid through a venturi diffuser inside the injector which creates a negative pressure in the sanitizing fluid line, thus drawing the sanitizing fluid into the carrier fluid and creating a highly homogenized fluid jet. The fluid jet is then injected into a container which contains a food product to be sanitized by the ozone. The container may also be provided with a mixing paddle to vigorously mix the food product while the ozone/carrier fluid jet is injected into the food product, which further ensures that the food product is contacted with sanitizing ozone gas.

Abstract: A system for purification and generation of hydrofluoric acid on-site at a semiconductor device fabrication facility. An evaporation stage (optionally with arsenic oxidation) is followed by a fractionating column to remove most other impurities, an Ionic Purifier column to suppress contaminants not removed by the fractionating column, and finally the HF Supplier (HFS).

Abstract: A system and method for mixing and/or diluting ultrapure fluids, such as liquid acids, for semiconductor processing. The system includes first and second chemical dispensers, the first and second chemical dispensers adapted to contain first and second fluids to be mixed, respectively; a process connection between the first and second chemical dispensers which allows the first and second fluids to flow therethrough and intermingle to form a mixed fluid, the process connection further allowing the mixed fluid to flow to a location needed by the operator; and an ultrasonic wave emitting device provided in a location sufficient to transmit an ultrasonic wave through the mixed fluid, the device including means to measure the velocity of the wave through the mixed fluid, and thus indirectly measure a ratio defined by a quantity of the first chemical to a quantity of the second chemical in the mixed fluid.

Abstract: The present invention relates to a continuous processing apparatus and method for cleaning articles with a liquified compressed gaseous solvent mixture. The continuous processing apparatus includes three processing chambers including an entrance chamber, a cleaning chamber, and an exit chamber. The chambers are provided with hatches which are opened and closed at appropriate times to allow the articles to be cleaned to pass into and out of the chambers. The entrance chamber is used for evacuation of the incoming articles to remove the majority of the air and moisture from the articles. After evacuation of the incoming articles, the entrance chamber is pressurized and the articles pass into the cleaning chamber. The cleaning chamber is maintained at a temperature and a pressure at which the liquified compressed gaseous solvent mixture is in a subcritical state and a liquid/gas interface exists between a liquid and a gas portion of the liquified compressed gaseous solvent mixture.