Patents Assigned to Applied Science & Technology
  • Patent number: 6786976
    Abstract: The invention relates to a method and system for cleaning semiconductor elements accommodated in a tank which uses ozonized, deionized (DI) ultrapure water. According to the invention, ozone is generated in an ozone generator (3) according to the principal of silent electric discharge while admitting highly pure oxygen. Said ozone is fed to a contactor (7) through which DI water flows. The ozone is then dissolved in the DI water. While optionally admitting additional chemicals, the ozonized DI water is conducted through the tank (12) holding the semiconductor elements in order to clean the same, and the used DI water is carried away (15). In order to stabilize the ozone concentration, CO2 is added to the ozone/oxygen mixture generated by the ozone generator (7).
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: September 7, 2004
    Assignee: Applied Science and Technology, Inc.
    Inventors: Christiane Gottschalk, Jürgen Schweckendiek, Ulrich Brammer
  • Patent number: 6781317
    Abstract: The invention features RF plasma generation systems, methods for operating the systems, methods for calibrating the systems, and calibration apparatus. One RF plasma generation system includes an impedance matching network having an input port to receive an RF signal from an RF generator, and an output port to deliver the RF signal to an input port of a plasma vessel associated with a load. The system includes an RF signal probe in electromagnetic communication with the input port of the impedance matching network to detect at least one RF signal parameter associated with the RF signal at the input port of the impedance matching network. The system can include a calibration storage unit that stores calibration data. The calibration data includes an association of values of the RF signal parameter with values of at least one characteristic of the load.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: August 24, 2004
    Assignee: Applied Science and Technology, Inc.
    Inventor: Daniel Goodman
  • Publication number: 20040146013
    Abstract: A time division duplex repeater system includes two antennas, a switched directional amplifier and control circuitry. The antennas serve first and second coverage areas where the second coverage area is an extension of the first coverage area. The switched directional amplifier is coupled between the two antennas and has a single amplifier. The control circuitry is coupled to the switched directional amplifier and to receive inputs of the antennas. The control circuitry receives transmissions from the coverage areas and applies control signals to the switched directional amplifier to control the direction of transmission. The control circuitry may control the amplifier gain and direction of transmission based on the input signal power level.
    Type: Application
    Filed: January 22, 2003
    Publication date: July 29, 2004
    Applicant: Hong Kong Applied Science and Technology Research Institute Co., Ltd
    Inventors: Peter Chun Teck Song, Ross David Murch, Hang Ching Jason Leung, Wai Yuk William Tao
  • Publication number: 20040079287
    Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
    Type: Application
    Filed: October 20, 2003
    Publication date: April 29, 2004
    Applicant: Applied Science & Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Publication number: 20040077354
    Abstract: Disclosed are systems and methods which provide for management of wireless communications through the development and use of link space information. Such link space information provides link-centric information with respect to wireless links of a network to thereby provide a view of the network which takes into account phenomena affecting the wireless links. Utilizing such link space information, automated management of various aspects of a wireless network may be provided, including automated provisioning, management, and/or optimization of network links. Network operations may include use of link space information in providing network management applications such as automatic fault management, automatic performance management, operation advisories, and/or the like.
    Type: Application
    Filed: October 21, 2002
    Publication date: April 22, 2004
    Applicant: Hong Kong Applied Science and Technology Research Institute Co. Ltd.
    Inventors: Leung Hang Ching Jason, Piu Bill Wong
  • Publication number: 20040043390
    Abstract: Nucleotide sequences are used to store meaningful information, such as letters, words, phrases, signs, icons, musical notes, numbers or bits and bitmaps in any cultural context including languages, phonetics, multimedia applications, codes, abbreviations, personal and scientific information. The information is stored by creating a plurality of codons composed of nucleotides that it is readable by any technique that is capable of analyzing nucleotide sequences. The information can also be encrypted by all known or to be developed algorithms of cryptography.
    Type: Application
    Filed: September 20, 2002
    Publication date: March 4, 2004
    Applicant: ASAT AG Applied Science & Technology
    Inventor: Beda M. Stadler
  • Patent number: 6664497
    Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: December 16, 2003
    Assignee: Applied Science and Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Publication number: 20030213559
    Abstract: A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.
    Type: Application
    Filed: May 20, 2002
    Publication date: November 20, 2003
    Applicant: Applied Science and Technology, Inc.
    Inventor: Daniel Goodman
  • Publication number: 20030164338
    Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.
    Type: Application
    Filed: April 26, 2002
    Publication date: September 4, 2003
    Applicant: Applied Science & Technology, Inc.
    Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
  • Patent number: 6559408
    Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: May 6, 2003
    Assignee: Applied Science & Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Patent number: 6559183
    Abstract: The present invention relates to a composition comprising a nano-emulsion that contains 5-aminolevulinic acid as well as a carrier in an aqueous phase. This invention also relates to a pharmaceutical preparation containing this composition. The nano-emulsions of this type can be used in photodynamic therapy as well as in the photodiagnostic detection of proliferatives cells.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: May 6, 2003
    Assignee: ASAT AG Applied Science & Technology
    Inventors: Hans W. Schmid, Gerd Burmeister
  • Patent number: 6552296
    Abstract: An improved toroidal low-field plasma source allows plasma ignition within a wider range of gas conditions than permitted by prior art plasma sources. Power efficiency of the plasma source is improved by automatically adjusting the power delivered to the plasma based on the load to the power supply. The plasma source can be operated over a wider pressure range than allowed by prior art plasma sources. The plasma source can be operated so as to increase the output of atomic species from the source. The plasma source can be operated to increase the etch rate of organic materials. The plasma source can efficiently remove hazardous gas compounds from effluent gas streams by converting them into scrubbable products.
    Type: Grant
    Filed: September 17, 2001
    Date of Patent: April 22, 2003
    Assignee: Applied Science and Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Patent number: 6486431
    Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
    Type: Grant
    Filed: September 12, 2000
    Date of Patent: November 26, 2002
    Assignee: Applied Science & Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Publication number: 20020125225
    Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
    Type: Application
    Filed: May 10, 2002
    Publication date: September 12, 2002
    Applicant: Applied Science & Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Publication number: 20020125226
    Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
    Type: Application
    Filed: May 10, 2002
    Publication date: September 12, 2002
    Applicant: Applied Science & Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Patent number: 6388226
    Abstract: An improved toroidal low-field plasma source allows plasma ignition within a wider range of gas conditions than permitted by prior art plasma sources. Power efficiency of the plasma source is improved by automatically adjusting the power delivered to the plasma based on the load to the power supply. The plasma source can be operated over a wider pressure range than allowed by prior art plasma sources. The plasma source can be operated so as to increase the output of atomic species from the source. The plasma source can be operated to increase the etch rate of organic materials. The plasma source can efficiently remove hazardous gas compounds from effluent gas streams by converting them into scrubbable products.
    Type: Grant
    Filed: February 10, 2000
    Date of Patent: May 14, 2002
    Assignee: Applied Science and Technology, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Patent number: 6281241
    Abstract: The invention relates to the use of melatonin and melatonin-containing preparations for the treatment of androgenetic alopecia of the female type.
    Type: Grant
    Filed: February 18, 2000
    Date of Patent: August 28, 2001
    Assignee: ASAT AG Applied Science and Technology
    Inventor: Peter Elsner
  • Patent number: 6234788
    Abstract: A furnace for thermal processing of substrates includes a substrate cassette that supports at least one substrate and a process chamber for thermal processing. A process chamber that includes a port for receiving a substrate, a heater that generates a thermal distribution, and a rotatable member having a substrate support. The rotatable member rotates a substrate positioned on the substrate support so that a temperature of the substrate is controlled according to a temperature profile. A transport mechanism transports substrates between the substrate cassette and the substrate support of the rotatable member.
    Type: Grant
    Filed: November 4, 1999
    Date of Patent: May 22, 2001
    Assignee: Applied Science and Technology, Inc.
    Inventor: Chunghsin Lee
  • Patent number: 6235172
    Abstract: A robotic arm assembly in a transport module is expansible to have an effector at its end receive a substrate in a cassette module and is then contracted and rotated with the effector to have the effector face a process module. Planets on a turntable in the process module are rotatable on first parallel axes. The turntable is rotatable on a second axis parallel to the first axes to move successive planets to a position facing the effector. At this position, an alignment assembly is aligned with, but axially displaced from, one of the planets. This assembly is moved axially into coupled relationship with such planet and then rotated to a position aligning the substrate on the effector axially with such planet when the arm assembly is expanded. A lifter assembly aligned with, and initially displaced from, such planet is moved axially to lift the substrate from the effector. The arm assembly is then contracted, rotated with the effector and expanded to receive the next cassette module substrate.
    Type: Grant
    Filed: August 31, 1999
    Date of Patent: May 22, 2001
    Assignee: Applied Science & Technology
    Inventors: Robert George Begin, Peter J. Clarke
  • Patent number: 6217272
    Abstract: An apparatus for simultaneously transporting and processing substrates is described. The apparatus includes a load lock that stores at least one substrate prior to processing and that stores at least one substrate after processing. A first transport mechanism transports at least one substrate into and out of the load lock. A multi-stage elevator is adapted to receive the first transport mechanism. A first process chamber is vertically disposed from the multi-stage elevator. The multi-stage elevator vertically transports at least one substrate into and out of the first process chamber. A second process chamber may be coupled to the multi-stage elevator. A second transport mechanism transports at least one substrate between the multi-stage elevator and the second process chamber.
    Type: Grant
    Filed: September 23, 1999
    Date of Patent: April 17, 2001
    Assignee: Applied Science and Technology, Inc.
    Inventors: David Felsenthal, Chunghsin Lee, Piero Sferlazzo