Patents Assigned to Asahi Glass Company Ltd.
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Publication number: 20180002585Abstract: To provide a working medium for heat cycle which has less influence over the ozone layer, which has less influence over global warming and which provides a heat cycle system excellent in the cycle performance (the efficiency and the capacity), and a heat cycle system excellent in the cycle performance (the efficiency and the capacity). A working medium for heat cycle comprising 1,2-difluoroethylene is employed for a heat cycle system (such as a Rankine cycle system, a heat pump cycle system, a refrigerating cycle system 10 or a heat transport system).Type: ApplicationFiled: September 14, 2017Publication date: January 4, 2018Applicant: ASAHI GLASS COMPANY, LTD.Inventor: Masato FUKUSHIMA
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Patent number: 8691857Abstract: Provided is a compound represented by the formula (1): wherein R1 and R2 are each independently a hydrogen atom or a straight chain alkyl group having a carbon number of 1-3, R3 is a hydrogen atom, an alkyl group having a carbon number of 1-4, an alkoxyalkyl group, an aryl group, a halogen atom or a haloalkyl group, or a pharmaceutically acceptable salt thereof, which has, unlike known PGI2 analogs, a selective EP4 agonist action, and a medicament containing the compound, which is useful for the prophylaxis and/or treatment of immune diseases, diseases of the digestive tract, cardiovascular diseases, cardiac diseases, respiratory diseases, neurological diseases, ophthalmic diseases, renal diseases, hepatic diseases, bone diseases, skin diseases and the like.Type: GrantFiled: November 13, 2012Date of Patent: April 8, 2014Assignees: Asahi Glass Company, Ltd., Kaken Pharmaceutical Co., Ltd.Inventors: Takahiko Murata, Masahiro Amakawa, Shin Teradaira, Yasushi Matsumura, Katsuhiko Konishi
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Publication number: 20130128213Abstract: A process for producing a liquid crystal display device enabling to produce with simple process, and such a liquid crystal display device, are provided. A process for producing a liquid crystal display device comprising: a step of forming transparent electrodes (41, 42) on first and second substrates (11, 12); a step of applying an uncured raw seal material; a step of dropping a first functional material; a step of dropping a second functional material; a step of sandwiching the raw seal material (13a, 14a), the first functional material (32a) and the second functional material (31a) between the first and second substrates under a predetermined reduced pressure atmosphere, and thereby forming a sealed product wherein the first functional material is isolated from the second functional material by the raw seal material and sealed between the first and the second substrates; a step of exposing the sealed product to a normal atmospheric pressure; and a step of curing at least the raw seal material.Type: ApplicationFiled: December 18, 2012Publication date: May 23, 2013Applicant: Asahi Glass Company, Ltd.Inventor: Asahi Glass Company, Ltd.
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Patent number: 8282936Abstract: The object of the present invention is to provide an edible vaccine which is effective for human papilloma virus (HPV) type 16 and available in large amounts inexpensively. An edible human papilloma virus vaccine obtained by culturing a transformant of an avirulent fission yeast host, wherein the transformant carries a gene encoding an antigenic protein of human papilloma virus introduced therein and accumulates the expressed antigenic protein in it.Type: GrantFiled: May 7, 2008Date of Patent: October 9, 2012Assignees: Asahi Glass Company, Ltd., National University Corporation Kanazawa UniversityInventors: Toshiyuki Sasagawa, Hideki Tohda, Yuko Hama
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Patent number: 8048531Abstract: A protective plate for a plasma display comprises conductive substrate for protecting a plasma display and an electrode in electrical contact with the conductive substrate.Type: GrantFiled: November 14, 2006Date of Patent: November 1, 2011Assignee: Asahi Glass Company Ltd.Inventors: Nobuyoshi Sakurada, Toshihiro Ajikata, Kouichi Osada, Ken Moriwaki, Katsuaki Aikawa, Kazuyoshi Noda, Takuji Oyama
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Publication number: 20100286344Abstract: To provide a curable composition comprising a polymer having a reactive silicon group as a curing component, containing no or substantially no organic metal compound, and having a high curing rate. A curable composition comprising a polymer (A) having a reactive silicon group as a curing component and comprising an amidine derivative salt (B) represented by the following formula (2) as a curing catalyst: wherein R2 is a hydrocarbon group or a hydrogen atom, each of R3 and two R4's which are independent of one another, is an organic group or a hydrogen atom, R5 is a C1-25 hydrocarbon group or a hydrogen atom, and X2 is an organic acid ion, an inorganic acid ion or a hydroxy group, and optional two or more of R2, R3 and two R4's may be bonded to form a cyclic structure.Type: ApplicationFiled: July 22, 2010Publication date: November 11, 2010Applicant: ASAHI GLASS COMPANY, LTD.Inventors: Yoshitaka SUNAYAMA, Genichirou Enna
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Publication number: 20100087597Abstract: To provide a water/oil repellent composition which can give water/oil repellency to a surface of an article and has excellent durability (wash durability and heavy-rain durability), a method for producing such a composition, and an article which has water/oil repellency and is less susceptible to deterioration of water/oil repellency when it is washed or in heavy rain. A water/oil repellent composition which comprises a copolymer having polymerized units derived from monomer (a) and polymerized units derived from monomer (b), wherein the proportion of the polymerized units derived from the monomer (b) is 30 to 80 mol % in the total of the polymerized units derived from the monomer (a) and the polymerized units derived from the monomer (b).Type: ApplicationFiled: September 30, 2009Publication date: April 8, 2010Applicant: ASAHI GLASS COMPANY., LTD.Inventors: Minako Shimada, Kazunori Sugiyama, Yuuichi Oomori
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Patent number: 7549141Abstract: A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.Type: GrantFiled: September 12, 2005Date of Patent: June 16, 2009Assignee: Asahi Glass Company, Ltd.Inventors: Yoshiaki Ikuta, Hiroshi Kojima, Kouji Otsuka
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Publication number: 20080153010Abstract: A method for depositing, on a substrate, a reflective multilayer film of a reflective mask blank for EUV lithography by sputtering, comprises: depositing a reflective multilayer film in such a state that a substrate has been deformed so as to be subjected to a stress, which is directed to the opposite direction to a stress applied to the substrate by deposition of the reflective multilayer film; and returning the substrate to the shape before deformation, after deposition of the reflective multilayer film.Type: ApplicationFiled: February 20, 2008Publication date: June 26, 2008Applicant: ASAHI GLASS COMPANY., LTD.Inventor: Takashi SUGIYAMA
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Patent number: 7342666Abstract: There are carried out a first measurement operation for measuring the shape of a front surface of a sample held in a held state, a second measurement operation for measuring the shape of a back surface of the sample held in the same state, and a third measurement operation for measuring the shape of the back surface of the sample held so as to cause inverse distortion. First data are acquired on the basis of the front surface shape data obtained through the first measurement operation and the back surface shape data obtained through the second measurement operation. Second data are obtained on the basis of the front surface shape data obtained through the first measurement operation and the back surface shape data obtained through the third measurement operation. Holding distortion is determined on the basis of the first and second data.Type: GrantFiled: October 27, 2005Date of Patent: March 11, 2008Assignees: Fujinon Corporation, Asahi Glass Company, Ltd.Inventors: Nobuaki Ueki, Koji Otsuka
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Publication number: 20070298265Abstract: To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance. An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.Type: ApplicationFiled: August 16, 2007Publication date: December 27, 2007Applicants: ASAHI GLASS COMPANY., LTD., ASAHI GLASS CERAMICS COMPANY, LTD.Inventors: Tamotsu Morimoto, Masato Kawasaki, Makoto Hiramoto, Koichi Kanda, Susumu Nakagama
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Patent number: 7264881Abstract: A protective plate for a plasma display comprises conductive substrate for protecting a plasma display and an electrode in electrical contact with the conductive substrate.Type: GrantFiled: October 7, 2004Date of Patent: September 4, 2007Assignee: Asahi Glass Company Ltd.Inventors: Nobuyoshi Sakurada, Toshihiro Ajikata, Kouichi Osada, Ken Moriwaki, Katsuaki Aikawa, Kazuyoshi Noda, Takuji Oyama
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Patent number: 7230695Abstract: A defect repair device includes a defect inspection unit configured to find a size of a protruding defect on a front surface of a multi-layer film having a rear surface opposite to the front surface, a calculation unit configured to calculate a repair energy so as to repair the protruding defect based on the size of the protruding defect found by the defect inspection unit, an energy supplier, and an energy controller configured to control the energy supplier to supply the repair energy calculated by the calculation unit to a portion in the multi-layer film from the rear surface of the multi-layer film so as to cause a decrease in a volume of the portion and retract the protruding defect into the multi-layer film.Type: GrantFiled: July 8, 2004Date of Patent: June 12, 2007Assignee: Asahi Glass Company, Ltd.Inventors: Yoshiaki Ikuta, Toshiyuki Uno
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Publication number: 20070059608Abstract: A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.Type: ApplicationFiled: September 12, 2005Publication date: March 15, 2007Applicant: ASAHI GLASS COMPANY, LTD.Inventors: Yoshiaki Ikuta, Hiroshi Kojima, Kouji Otsuka
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Patent number: 7087308Abstract: A protective plate for a plasma display including a conductive substrate for protecting the plasma display. The conductive substrate includes a substrate having a glass plate and a conductive film formed on a resinous film bonded to the glass plate substrate. The plasma display also includes an electrode in electrical contact with the conductive substrate.Type: GrantFiled: August 18, 2003Date of Patent: August 8, 2006Assignee: Asahi Glass Company Ltd.Inventors: Nobuyoshi Sakurada, Toshihiro Ajikata, Kouichi Osada, Ken Moriwaki, Katsuaki Aikawa, Kazuyoshi Noda, Takuji Oyama
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Patent number: 7045208Abstract: A synthetic resin molded material characterized in that a thin film made of an oxide of at least one metal selected from the group consisting of Si, Zr, Ti, Ta, Hf, Mo, W. Nb, Sn, In, Al and Zn, is formed by a dry method on a synthetic resin substrate having hydrophobicity, and a method for its production.Type: GrantFiled: August 17, 2004Date of Patent: May 16, 2006Assignee: Asahi Glass Company Ltd.Inventors: Kazuo Harada, Atsushi Hayashi, Tatsuo Momii, Teruo Takakura, Seitoku Kaya
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Patent number: 6989112Abstract: A bandpass filter containing specific red dyes alone or in combination with other dyes selectively transmits predetermined primary color wavelengths as well as selectively absorbs wavelengths other than the predetermined primary color wavelength. The filter is particularly useful for enhancing the contrast of color plasma displays by absorbing visible light emitted at 590 nm from the display.Type: GrantFiled: August 19, 2002Date of Patent: January 24, 2006Assignee: Asahi Glass Company Ltd.Inventors: Chia-Chi Teng, Suk Youn Suh, George Malinoski
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Publication number: 20060007433Abstract: A defect repair device includes a defect inspection unit configured to find a size of a protruding defect on a front surface of a multi-layer film having a rear surface opposite to the front surface, a calculation unit configured to calculate a repair energy so as to repair the protruding defect based on the size of the protruding defect found by the defect inspection unit, an energy supplier, and an energy controller configured to control the energy supplier to supply the repair energy calculated by the calculation unit to a portion in the multi-layer film from the rear surface of the multi-layer film so as to cause a decrease in a volume of the portion and retract the protruding defect into the multi-layer film.Type: ApplicationFiled: July 8, 2004Publication date: January 12, 2006Applicant: ASAHI GLASS COMPANY LTD.Inventors: Yoshiaki Ikuta, Toshiyuki Uno
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Publication number: 20060001342Abstract: A bandpass filter containing specific red dyes alone or in combination with other dyes selectively transmits predetermined primary color wavelengths as well as selectively absorbs wavelengths other than the predetermined primary color wavelength. The filter is particularly useful for enhancing the contrast of color plasma displays by absorbing visible light emitted at 590 nm from the display.Type: ApplicationFiled: September 6, 2005Publication date: January 5, 2006Applicant: ASAHI GLASS COMPANY, LTD.Inventors: Chia-Chi Teng, Suk Suh, George Malinoski
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Patent number: 6949226Abstract: A sodium-based dechlorinating agent is added to a flue gas; hydrogen chloride contained in this flue gas is removed as residue of dechlorination; the thus removed residue of dechlorination is dissolved by adding water; water-insoluble constituents are separated from the resulting aqueous solution; and after adjusting pH of the aqueous solution remaining after separation of the water-insoluble constituents, mercury, dioxin, and the like are removed and discharged. The sodium-based dechlorinating agent is mixed with a hydrophilic anti-caking agent, with an angle of repose of 40° or more, a dispersibility of less than 50, and a floodability index value of less than 90. This permits inhibition of occurrence of a pressure drop and leakage in the filter cloth of the dust collector.Type: GrantFiled: June 25, 2001Date of Patent: September 27, 2005Assignees: Mitsui Engineering & Shipbuilding, Asahi Glass Company Ltd.Inventors: Tomio Sugimoto, Masumi Itaya, Yoshinao Hirano, Hiroaki Harada, Hachiro Hirano, Sigeru Sakurai, Makoto Yoshida, Masaharu Tanaka