Patents Assigned to ASML Netherlands
  • Patent number: 10527957
    Abstract: A lithographic apparatus has a substrate table on which a substrate is positioned, and an alignment sensor used to measure the alignment of the substrate. In an exemplary processing method, the alignment sensor is used to perform one or more edge measurements in a first step. In a second step, one or more edge measurements are performed on the notch of the substrate. The edge measurements are then used to align the substrate in the lithographic apparatus. In a particular example, the substrate is arranged relative to the alignment sensor such that a portion of the edge surface is positioned at the focal length of the lens. When the alignment sensor detects radiation scattered by the edge surface at the focal length of the lens, the presence of the edge of the substrate is detected.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: January 7, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Cayetano Sanchez-Fabres Cobaleda, Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Arie Jeffrey Den Boef, Marcel Hendrikus Maria Beems, Piotr Michał Stolarz
  • Patent number: 10527958
    Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov, Ahmet Koray Erdamar, Loek Johannes Petrus Verhees, Willem Seine Christian Roelofs, Wendy Johanna Martina Van De Ven, Hadi Yagubizade, Hakki Ergün Cekli, Ralph Brinkhof, Tran Thanh Thuy Vu, Maikel Robert Goosen, Maaike Van't Westeinde, Weitian Kou, Manouk Rijpstra, Matthijs Cox, Franciscus Godefridus Casper Bijnen
  • Patent number: 10527950
    Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including an array of radiation source modules configured to project the modulated radiation onto a respective array of exposure regions on the substrate; and a distributed processing system configured to process projection related data to enable the projection of the desired pattern onto the substrate, the distributed processing system including at least one central processing unit and a plurality of module processing units each associated with a respective radiation source module.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Erwin Paul Smakman, Coen Adrianus Verschuren
  • Patent number: 10527955
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Patent number: 10530111
    Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Sudhir Srivastava, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sjoerd Nicolaas Lambertus Donders, Krijn Frederik Bustraan, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
  • Patent number: 10527959
    Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Simon Reinald Huisman, Simon Gijsbert Josephus Mathijssen, Sebastianus Adrianus Goorden, Duygu Akbulut, Alessandro Polo
  • Patent number: 10527092
    Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.
    Type: Grant
    Filed: October 7, 2015
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
  • Patent number: 10527953
    Abstract: A method including evaluating a plurality of substrate measurement recipes for measurement of a metrology target processed using a patterning process, against stack sensitivity and overlay sensitivity, and selecting one or more substrate measurement recipes from the plurality of substrate measurement recipes that have a value of the stack sensitivity that meets or crosses a threshold and that have a value of the overlay sensitivity within a certain finite range from a maximum or minimum value of the overlay sensitivity.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Kaustuve Bhattacharyya, Arie Jeffrey Den Boef, Martin Jacobus Johan Jak
  • Patent number: 10527946
    Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: January 7, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Robert Albertus Johannes Van Der Werf, Michaël Josephus Evert Van De Moosdijk, Pascale Anne Maury
  • Publication number: 20200004164
    Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
    Type: Application
    Filed: January 3, 2018
    Publication date: January 2, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Emil Peter SCHMITT-WEAVER, Kaustuve BHATTACHARYYA, Wim Tjibbo TEL, Frank STAALS, Leon Martin LEVASIER
  • Publication number: 20200004165
    Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
    Type: Application
    Filed: September 6, 2019
    Publication date: January 2, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Janneke RAVENSBERGEN, Duygu AKBULUT, Nitesh PANDEY, Jin LIAN
  • Publication number: 20200004162
    Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
    Type: Application
    Filed: September 13, 2019
    Publication date: January 2, 2020
    Applicant: ASML NETHERLANDS H.V.
    Inventors: Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Johannes Cornelis Paulus MELMAN, Han Henricus Aldegonda LEMPENS, Miao YU, Cornelius Maria ROPS, Ruud OLIESLAGERS, Arturnç ULUCAN, Theodorus Wilhelmus POLET, Patrick Johannes Wilhelmus SPRUYTENBURG
  • Patent number: 10520835
    Abstract: The invention relates to a measurement system for a projection system of a lithographic apparatus, comprising: —a sensor plate; —a detector comprising an array of detector areas; —a randomly ordered optical fiber bundle; —a positioner to position the sensor plate in the projection system; and —a control unit to control the positioning of the sensor plate and to obtain measurement data from an output of the detector, wherein a first free end of the optical fiber bundle is arranged to receive light from the sensor plate, wherein a second free end of the optical fiber bundle opposite the first free end of the optical fiber bundle is aligned with the array of detector areas of the detector, and wherein the control unit is configured to match each detector area with a corresponding location in a pupil plane of the projection system by collecting measurement data corresponding to different positions of the sensor plate relative to the projection system.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: December 31, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Johannes Maria Van Benten
  • Patent number: 10520824
    Abstract: A light combiner (500) for use in a metrology tool includes a plurality of light sources (LED 1, LED 2, LED 3, LED 4, LED 5), a first filter (502), and a second filter (504). The first filter is designed to substantially reflect light generated from a first source of the plurality of light sources, and to substantially transmit light generated from a second source of the plurality of light sources. The second filter is designed to substantially reflect light generated from the first source and the second source of the plurality of light sources, and to substantially transmit light generated from a third source of the plurality of light sources. An angle of incidence of the light generated from the first source on a surface of the first filter is less than 30 degrees.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: December 31, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Ronald Franciscus Herman Hugers, Parag Vinayak Kelkar, Paulus Antonius Andreas Teunissen
  • Patent number: 10520451
    Abstract: Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: December 31, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Arie Jeffrey Den Boef
  • Patent number: 10522472
    Abstract: An electronic device comprising a semiconductor chip which comprises a plurality of structures formed in the semiconductor chip, wherein the semiconductor chip is a member of a set of semiconductor chips, the set of semiconductor chips comprises a plurality of subsets of semiconductor chips, and the semiconductor chip is a member of only one of the subsets. The plurality of structures of the semiconductor chip includes a set of common structures which is the same for all of the semiconductor chips of the set, and a set of non-common structures, wherein the non-common structures of the semiconductor chip of the subset is different from a non-common circuit of the semiconductor chips in every other subset. At least a first portion of the non-common structures and a first portion of the common structures form a first non-common circuit, wherein the first non-common circuit of the semiconductor chips of each subset is different from a non-common circuit of the semiconductor chips in every other subset.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: December 31, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Cornelis Jacobus De Langen, Marcel Nicolaas Jacobus van Kervinck, Vincent Sylvester Kuiper
  • Patent number: 10520837
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: December 31, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
  • Patent number: 10520830
    Abstract: A method is described herein including applying, by a metrology apparatus, an incident radiation beam to a substrate including first features on a first layer and second features on a second layer, a relationship between the first and second features being characterized by a parameter of interest having a first value, wherein the metrology apparatus is operated in accordance with at least one characteristic having a first setting; receiving intensity data representing intensity of a portion of the incident radiation beam scattered by the first and second features; determining, based on the intensity data, a second value of the parameter of interest; and applying one or more adjustments to the at least one characteristic such that the at least one characteristic has a second setting different from the first, the one or more adjustments being determined based on a difference between the first value and the second value.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: December 31, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Harm Hubertus Joseph Elizabeth Kicken, Martijn Maria Zaal
  • Publication number: 20190391498
    Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
    Type: Application
    Filed: September 5, 2019
    Publication date: December 26, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Scott Anderson MIDDLEBROOKS, Markus Gerardus Martinus Maria VAN KRAAIJ, Adrianus Cornelis Matheus KOOPMAN, Stefan HUNSCHE, Willem Marie Julia Marcel COENE
  • Publication number: 20190391499
    Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.
    Type: Application
    Filed: September 9, 2019
    Publication date: December 26, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aart Adrianus VAN BEUZEKOM, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems