Patents Assigned to ASML Netherlands
  • Patent number: 10503084
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: December 10, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
  • Patent number: 10503086
    Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.
    Type: Grant
    Filed: December 7, 2016
    Date of Patent: December 10, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
  • Patent number: 10503087
    Abstract: A lithographic apparatus uses a height sensor to obtain height sensor data representing a topographical variation across a substrate. The height sensor data is used to control focusing of a device pattern at multiple locations across the substrate. A controller identifies one or more first areas where height sensor data is judged to be reliable and one or more second areas where the height sensor data is judged to be less reliable. Substitute height data is calculated for the second areas using height sensor data for the first areas together with prior knowledge of expected device-specific topography. The focusing of the lithographic apparatus is controlled using a combination of the height data from the sensor and the substitute height data.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: December 10, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Rene Marinus Gerardus Johan Queens, Arend Johannes Donkerbroek, Pietro Andricciola, Ewoud Frank Van West
  • Publication number: 20190369502
    Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
    Type: Application
    Filed: August 19, 2019
    Publication date: December 5, 2019
    Applicant: Asml Netherlands B.V.
    Inventors: Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk, Martinus Hendrikus Antonius Leenders
  • Publication number: 20190369498
    Abstract: Methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use a deviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust a parameter of the process model.
    Type: Application
    Filed: January 24, 2018
    Publication date: December 5, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mu FENG, Mir Farrokh SHAYEGAN SALEK, Dianwen ZHU, Leiwu ZHENG, Rafael C. HOWELL, Jen-Shiang WANG
  • Publication number: 20190369503
    Abstract: A technique to generate predicted data for control or monitoring of a production process to improve a parameter of interest. Context data associated with operation of the production process is obtained. Metrology/testing is performed on the product of the production process, thereby obtaining performance data. A context-to-performance model is provided to generate predicted performance data based on labeling of the context data with performance data. This is an instance of semi-supervised learning. The context-to-performance model may include the learner that performs semi-supervised labeling. The context-to-performance model is modified using prediction information related to quality of the context data and/or performance data. Prediction information may include relevance information relating to relevance of the obtained context data and/or obtained performance data to the parameter of interest.
    Type: Application
    Filed: December 13, 2017
    Publication date: December 5, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Alexander YPMA, Dimitra GKOROU, Georgios TSIROGIANNIS, Thomas Leo Maria HOOGENBOOM, Richard Johannes Franciscus VAN HAREN
  • Publication number: 20190369505
    Abstract: The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.
    Type: Application
    Filed: May 13, 2019
    Publication date: December 5, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Jin LIAN, Zili ZHOU, Duygu AKBULUT, Sergey TARABRIN
  • Publication number: 20190369480
    Abstract: A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.
    Type: Application
    Filed: August 30, 2017
    Publication date: December 5, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Steven George HANSEN, Kateryna Stanislavovna LYAKHOVA, Paulus Jacobus Maria VAN ADRICHEM
  • Publication number: 20190368867
    Abstract: Disclosed is a method of, and associated metrology apparatus for, determining a characteristic of a target on a substrate. The method comprises obtaining a plurality of intensity asymmetry measurements, each intensity asymmetry measurement relating to a target formed on the substrate and determining a sensitivity coefficient corresponding to each target, from the plurality of intensity asymmetry measurements. Using these sensitivity coefficients a representative sensitivity coefficient is determined for said plurality of targets or a subset greater than one thereof. The characteristic of the target can then be determined using the representative sensitivity coefficient.
    Type: Application
    Filed: May 21, 2019
    Publication date: December 5, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Alberto DA COSTA ASSAFRAO, Mohammadreza Hajiahmadi
  • Publication number: 20190369508
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Application
    Filed: August 13, 2019
    Publication date: December 5, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik KOEVOETS, Erik Johan Arlemark, Sander Catharina Reinier Derks, Sjoerd Nicolaas Lambertus Donders, Wiilfred Edward Endendijk, Franciscus Johannes Joseph Janssen, Raymond Wilhelmus Louis Lafarre, Leon Martin Levasier, Jim Vincent Overkamp, Nicolaas Ten Kate, Jacobus Corlelis Gerardus Van Der Sanden
  • Patent number: 10495980
    Abstract: A projection optical system for an immersion exposure apparatus which exposes a substrate with an illumination light through the projection optical system and a liquid, the projection optical system includes: a plurality of reflective and refractive optical elements through which the illumination light passes, the plurality of reflective and refractive optical elements having a final lens, through which the illumination light passes, the final lens having a light emitting surface through a part of which the illumination light passes, the part of the light emitting surface being in contact with the liquid, wherein the image is projected in a projection region, a center of the projection region is away from an optical axis of the projection optical system with respect to a first direction perpendicular to the optical axis, and a center of the light emitting surface is away from the optical axis with respect to the first direction.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Bob Streefkerk
  • Patent number: 10497538
    Abstract: A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.
    Type: Grant
    Filed: April 23, 2018
    Date of Patent: December 3, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wei Fang, Kevin Liu, Fei Wang, Jack Jau, Zhaohui Guo
  • Patent number: 10493504
    Abstract: Apparatus for and method of cleaning an electrically conductive surface of an optical element in a system for generating extreme ultraviolet radiation in which electrically conductive surface is used as an electrode for generating a plasma which cleans the surface.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: December 3, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Alexander I. Ershov
  • Patent number: 10499485
    Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
    Type: Grant
    Filed: April 25, 2018
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Gerhardus Winkels, Georgiy O. Vaschenko, Theodorus Wilhelmus Driessen, Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Wilhelmus Henricus Theodorus Maria Aangenent
  • Patent number: 10495985
    Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: December 3, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Günes Nakiboglu, Jan Steven Christiaan Westerlaken, Frank Johannes Jacobus Van Boxtel, Maria del Carmen Mercado Carmona, Thibault Simon Mathieu Laurent
  • Patent number: 10495889
    Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: December 3, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Markus Franciscus Antonius Eurlings, Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov
  • Patent number: 10495984
    Abstract: A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
  • Patent number: 10495976
    Abstract: An apparatus (60) for adjusting an intensity of radiation. The apparatus comprises a grating (61) for receiving a radiation beam (Ba) and for directing at least a portion of the radiation beam in a first direction in the form of a first reflected radiation beam (Ba0), and one or more first actuators operable to rotate the grating to adjust a grazing angle between the radiation beam and a surface of the grating so as to vary an intensity of the reflected radiation beam.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Gosse Charles De Vries
  • Patent number: 10495990
    Abstract: Metrology measurements are performed on substrates that have been subjected to lithographic processing. Model parameters are calculated by fitting the measurements to an extended high-order substrate model defined using a combination of basis functions that include an edge basis function related to a substrate edge. A radial edge basis function may be expressed in terms of distance from a substrate edge. The edge basis function may, for example, be an exponential decay function or a rational function. Lithographic processing of a subsequent substrate is controlled using the calculated high-order substrate model parameters, in combination with low-order substrate model parameters obtained by fitting inline measurements to a low order model.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jasper Menger, Paul Cornelius Hubertus Aben, Everhardus Cornelis Mos
  • Patent number: 10495986
    Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: December 3, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hakki Ergün Cekli, Güneş Nakibo{hacek over (g)}lu, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Richard Johannes Franciscus Van Haren