Patents Assigned to ASML Netherlands
  • Publication number: 20180356734
    Abstract: A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied; wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.
    Type: Application
    Filed: November 30, 2016
    Publication date: December 13, 2018
    Applicants: CYMER, LLC, ASML NETHERLANDS B.V.
    Inventors: Willard Earl CONLEY, Wei-An HSIEH, Tsann-Bim CHIOU, Jason SHIEN
  • Publication number: 20180356740
    Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.
    Type: Application
    Filed: November 21, 2016
    Publication date: December 13, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Ruud Hendrikus Martinus Johannes BLOKS, Günes NAKIBOGLU, Marinus Jan REMIE, Johan Gertrudis Cornelis KUNNEN
  • Patent number: 10151984
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: December 11, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • Patent number: 10151987
    Abstract: A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: December 11, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: David Deckers, Franciscus Godefridus Casper Bijnen, Sami Musa
  • Patent number: 10151989
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: December 11, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Patent number: 10151985
    Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: December 11, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Remco Dirks, Seyed Iman Mossavat, Hugo Augustinus Joseph Cramer
  • Patent number: 10151988
    Abstract: A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: December 11, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Johannes Hubertus Antonius Van De Rijdt
  • Publication number: 20180348145
    Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
    Type: Application
    Filed: May 15, 2018
    Publication date: December 6, 2018
    Applicants: ASML Netherlands B.V., Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van Amsterdam
    Inventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
  • Publication number: 20180348650
    Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
    Type: Application
    Filed: December 28, 2017
    Publication date: December 6, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas TEN KATE, Raymond Wilhelmus Louis Lafarre
  • Publication number: 20180348645
    Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.
    Type: Application
    Filed: May 24, 2018
    Publication date: December 6, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Janneke Ravensbergen, Nitesh Pandey, Zili Zhou, Armand Eugene Albert Koolen, Sebastianus Adrianus Goorden, Bastiaan Onne Fagginger Auer, Simon Gijsbert Josephus Mathijssen
  • Publication number: 20180348654
    Abstract: A method of characterizing a deformation of a plurality of substrates is described. The method comprising the steps of: —measuring, for a plurality of n different alignment measurement parameters ? and for a plurality of substrates, a position of the alignment marks; —determining a positional deviation as the difference between the n alignment mark position measurements and a nominal alignment mark position; —grouping the positional deviations into data sets; —determining an average data set; —subtracting the average data set from the data sets to obtain a plurality of variable data sets; —performing a blind source separation method on the variable data sets, thereby decomposing the variable data sets into a set of eigenwafers representing principal components of the variable data sets; —subdividing the set of eigenwafers into a set of mark deformation eigenwafers and a set of substrate deformation eigenwafers.
    Type: Application
    Filed: June 28, 2016
    Publication date: December 6, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Franciscus Godefridus Casper BIJNEN
  • Patent number: 10146133
    Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wilhelmus Patrick Elisabeth Maria Op 'T Root, Herman Philip Godfried, Hubertus Petrus Leonardus Henrica Van Bussel, Arij Jonathan Rijke, Marc Wilhelmus Maria Van Der Wijst, Mathijs Leonardus Johan Verhees
  • Patent number: 10146143
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
  • Patent number: 10146139
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • Patent number: 10149375
    Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
    Type: Grant
    Filed: September 14, 2016
    Date of Patent: December 4, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Michael Leslie Price, Cory Alan Stinson, Mark Joseph Mitry
  • Patent number: 10146142
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 10146134
    Abstract: An illumination system for a lithographic apparatus includes an array of lenses configured to receive a radiation beam and focus the beam into a plurality of sub-beams, an array of reflective elements configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam, a beam splitting device configured to split the illumination beam into a first portion and a second portion wherein the first portion is directed to be incident on a lithographic patterning device, a focusing unit configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements configured to measure the intensity of radiation which is incident on the detection plane.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Herman Philip Godfried, Hubertus Petrus Leonardus Henrica Van Bussel, Wilhelmus Patrick Elisabeth Maria Op 'T Root
  • Patent number: 10149374
    Abstract: A target material receptacle includes a structure including a passageway that extends in a first direction, the passageway configured to receive target material that travels along a target material path; and a deflector system configured to receive target material from the passageway. The deflector system includes a plurality of deflector elements. Each deflector element is oriented at a first acute angle relative to a direction of travel of an instance of the target material that travels along the target material path, and each deflector element in the deflector system is separated from a nearest deflector element by a distance along a second direction that is different from the first direction.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: December 4, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Armin Bernhard Ridinger, Kyle John Scaffidi, Michael Arthur Perry, Jr.
  • Patent number: 10146140
    Abstract: A structure of interest is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (306). A processor (308) calculates a property such as linewidth (CD) by simulating interaction of radiation with a structure and comparing the simulated interaction with the detected radiation. A layered structure model (600, 610) is used to represent the structure in a numerical method. The structure model defines for each layer of the structure a homogeneous background permittivity and for at least one layer a non-homogeneous contrast permittivity. The method uses Maxwell's equation in Born approximation, whereby a product of the contrast permittivity and the total field is approximated by a product of the contrast permittivity and the background field. A computation complexity is reduced by several orders of magnitude compared with known methods.
    Type: Grant
    Filed: October 4, 2016
    Date of Patent: December 4, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Maxim Pisarenco, Richard Quintanilha, Markus Gerardus Martinus Maria Van Kraaij
  • Publication number: 20180341053
    Abstract: A laser-operated light source encompasses a chamber for accommodating an ionizable gas and an ignition source for ionizing the gas in the chamber for generating a plasma. The light source furthermore encompasses a laser for inputting laser energy into the plasma such that, under the impact of the laser radiation, the plasma emits useful light, which forms the output signal of the light source, wherein provision is made for means for coupling the useful light into a transferring optical fiber. In the case of the light source according to the invention, at least one mode scrambler is assigned to the optical fiber or the optical fibers.
    Type: Application
    Filed: July 17, 2018
    Publication date: November 29, 2018
    Applicant: ASML Netherlands B. V.
    Inventors: Ekkehard BRUNE, Dieter Frerking, Thomas Thönlß, Claus Spruch