Patents Assigned to ASML Netherlands
  • Extreme ultraviolet light source utilizing a target of finite extent
    Patent number: 9826616
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: November 21, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown
  • Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method
    Patent number: 9823576
    Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: November 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Dries Smeets, Arno Jan Bleeker, Christopher James Lee, Pieter Willem Herman De Jager, Heine Melle Mulder, Rudy Jan Maria Pellens
  • Lithographic apparatus and device manufacturing method
    Patent number: 9823590
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: November 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Manish Ranjan, Carlo Cornelis Maria Luijten, Franciscus Johannes Joseph Janssen, Maksym Chernyshov
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170329240
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Application
    Filed: August 2, 2017
    Publication date: November 16, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Antonius Theodorus Anna Maria DERKSEN, Joeri LOF, Klaus SIMON, Alexander STRAAIJER
  • IMPRINT LITHOGRAPHY
    Publication number: 20170329218
    Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
    Type: Application
    Filed: August 1, 2017
    Publication date: November 16, 2017
    Applicant: ASML NETHERLANDS B .V.
    Inventor: Klaus SIMON
  • Lithographic apparatus and device manufacturing method
    Patent number: 9817321
    Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: November 14, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Helmar Van Santen, Aleksey Kolesnychenko
  • Lithographic method and apparatus
    Patent number: 9817320
    Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
    Type: Grant
    Filed: October 2, 2014
    Date of Patent: November 14, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Jaqueline Borges Nicolau, Hannah Noble, Johannes Jacobus Matheus Baselmans, Bart Smeets, Paulus Jacobus Maria Van Adrichem
  • Target expansion rate control in an extreme ultraviolet light source
    Patent number: 9820368
    Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: November 14, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jason Riggs, Robert Jay Rafac
  • Method and Apparatus for Generating Illuminating Radiation
    Publication number: 20170322497
    Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.
    Type: Application
    Filed: May 2, 2017
    Publication date: November 9, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Nan LIN, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen
  • Radiation Source and Lithographic Apparatus
    Publication number: 20170322499
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Application
    Filed: July 27, 2017
    Publication date: November 9, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Lithographic apparatus and device manufacturing method
    Patent number: 9811005
    Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: November 7, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Yang-Shan Huang, Theodorus Petrus Maria Cadee
  • Method and apparatus for inspection and metrology
    Patent number: 9811001
    Abstract: A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: November 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Peter Danny Van Voorst, Duygu Akbulut, Koos Van Berkel, Jeroen Johan Maarten Van De Wijdeven, Ferry Zijp
  • Metrology method and apparatus, substrate, lithographic system and device manufacturing method
    Patent number: 9811003
    Abstract: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and ?1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: November 7, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Armand Eugene Albert Koolen, Hendrik Jan Hidde Smilde
  • Photon source, metrology apparatus, lithographic system and device manufacturing method
    Patent number: 9814126
    Abstract: A radiation driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a first container containing a gas (e.g. Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. First container is enclosed within a hermetically sealed second container. Any ozone generated within the second container as a result of ultraviolet components of the output radiation is completely contained within the second container. Second container further filters out the ultraviolet components. Microwave radiation may be used instead of laser radiation to form the plasma.
    Type: Grant
    Filed: September 23, 2014
    Date of Patent: November 7, 2017
    Assignee: ASML Netherlands B.V.
    Inventor: Martijn Petrus Christianus Van Heumen
  • Lithographic apparatus and method of cooling a component in a lithographic apparatus
    Patent number: 9811007
    Abstract: A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: November 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus Van Boxtel, Antonius Johannus Van Der Net, Leonarda Hendrika Van Den Heuvel
  • Method of determining a measurement subset of metrology points on a substrate, associated apparatus and computer program
    Patent number: 9811006
    Abstract: A method of determining a measurement subset of metrology point locations which includes a subset of potential metrology point locations on a substrate. The method including identifying a plurality of candidate metrology point locations from the potential metrology point locations. A change in the level of informativity imparted by the measurement subset of metrology point locations which is attributable to the inclusion of that candidate metrology point location into the measurement subset of metrology point locations is evaluated for each of the candidate metrology point locations. The candidate metrology point locations which have the greatest increase in the level of informativity attributed thereto are selected for inclusion into the measurement subset of metrology point locations.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: November 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos
  • Determination and application of non-monotonic dose sensitivity
    Patent number: 9811002
    Abstract: A method of lithography in a lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate, the method including: determining a dose sensitivity of at least part of the pattern at a plurality of values of a dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose. A computer product including a processor, a memory and a storage device, wherein the storage device at least stores values of, or a function describing, a dose sensitivity of at least part of a lithographic pattern at a plurality of values of dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: November 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Jozef Maria Finders
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20170312826
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: July 19, 2017
    Publication date: November 2, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • Method and Apparatus for Determining the Property of a Structure, Device Manufacturing Method
    Publication number: 20170315055
    Abstract: A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.
    Type: Application
    Filed: April 21, 2017
    Publication date: November 2, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Simon Gijsbert Josephus MATHIJSSEN, Sander Bas ROOBOL, Nan LIN
  • Metrology Method and Apparatus, Lithographic System, Device Manufacturing Method and Substrate
    Publication number: 20170314915
    Abstract: A lithographic process is used to form a plurality of target structures distributed at a plurality of locations across a substrate and having overlaid periodic structures with a number of different overlay bias values distributed across the target structures. At least some of the target structures comprising a number of overlaid periodic structures (e.g., gratings) that is fewer than said number of different overlay bias values. Asymmetry measurements are obtained for the target structures. The detected asymmetries are used to determine parameters of a lithographic process. Overlay model parameters including translation, magnification and rotation, can be calculated while correcting the effect of bottom grating asymmetry, and using a multi-parameter model of overlay error across the substrate.
    Type: Application
    Filed: July 13, 2017
    Publication date: November 2, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Kaustuve Bhattacharyya, Hendrik-Jan Hidde Smilde