Patents Assigned to ASML Netherlands
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20170315450
    Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
    Type: Application
    Filed: July 18, 2017
    Publication date: November 2, 2017
    Applicant: ASML NETHERLANDS B. V.
    Inventors: Heine Melle MULDER, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Markus Franciscus Antonius EURLINGS, Hendrikus Robertus Marie VAN GREEVENBROEK, Paul VAN DER VEEN, Patricius Aloysius Jacobus TINNEMANS, Wilfred Edward ENDENDIJK
  • OBJECT HOLDER AND LITHOGRAPHIC APPARATUS
    Publication number: 20170315454
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Application
    Filed: June 21, 2017
    Publication date: November 2, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
  • METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED PHASE
    Publication number: 20170315441
    Abstract: A method including obtaining wavefront phase information caused by a three-dimensional topography of a pattern of a lithographic patterning device, and based on the wavefront phase information, adjusting a physical parameter of the pattern.
    Type: Application
    Filed: November 26, 2015
    Publication date: November 2, 2017
    Applicant: ASML Netherlands B.V.
    Inventor: Jozef Maria FINDERS
  • HHG Source, Inspection Apparatus and Method for Performing a Measurement
    Publication number: 20170315456
    Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.
    Type: Application
    Filed: April 14, 2017
    Publication date: November 2, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Nan LIN, Arie Jeffrey DEN BOEF, Sander Bas ROOBOL, Simon Gijsbert Josephus MATHIJSSEN, Niels GEYPEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 9804509
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: October 31, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
  • Method and apparatus for design of a metrology target
    Patent number: 9804504
    Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: October 31, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Guangqing Chen, Eric Richard Kent, Jen-Shiang Wang, Omer Abubaker Omer Adam
  • Device For Monitoring A Radiation Source, Radiation Source, Method Of Monitoring A Radiation Source, Device Manufacturing Method
    Publication number: 20170307978
    Abstract: Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
    Type: Application
    Filed: August 11, 2015
    Publication date: October 26, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Willem BOGAART, Chuangxin ZHAO
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20170307977
    Abstract: A lithographic apparatus including: a radiation system; a frame; a substrate table for holding a substrate; and a scanning mechanism. The radiation system is operable to produce a radiation beam. The substrate table is moveably mounted to the frame and arranged such that a target portion of the substrate is arranged to receive the radiation beam. The scanning mechanism is operable to move the substrate table relative to the frame so that different portions of the substrate may receive the radiation beam. A mechanism is operable to determine a quantity indicative of a velocity of the radiation system relative to the frame. An adjustment mechanism is operable to control a power or irradiance of the radiation beam so as to reduce a variation in a dose of radiation received by the substrate as a result of relative motion of the radiation system and the frame.
    Type: Application
    Filed: August 21, 2015
    Publication date: October 26, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Herman Philip GODFRIED, Hubertus Petrus Leonardus Henrica VAN BUSSEL, Arij Jonathan RIJKE, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
  • DETERMINATION OF STACK DIFFERENCE AND CORRECTION USING STACK DIFFERENCE
    Publication number: 20170307983
    Abstract: A method including: obtaining a measurement of a metrology target on a substrate processed using a patterning process, the measurement having been obtained using measurement radiation; and deriving a parameter of interest of the patterning process from the measurement, wherein the parameter of interest is corrected by a stack difference parameter, the stack difference parameter representing an un-designed difference in physical configuration between adjacent periodic structures of the target or between the metrology target and another adjacent target on the substrate.
    Type: Application
    Filed: March 30, 2017
    Publication date: October 26, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Jeffrey DEN BOEF, Kaustuve BHATTACHARYYA
  • Patterning Device Support, Lithographic Apparatus, And Method Of Controlling Patterning Device Temperature
    Publication number: 20170307986
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Application
    Filed: July 13, 2017
    Publication date: October 26, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
  • Method of characterizing, method of forming a model, method of simulating, mask manufacturing method and device manufacturing method
    Patent number: 9798225
    Abstract: A method of characterizing a lithographic mask type uses a mask having thereon test pattern units of linear features at different orientations. The mask is exposed, rotated by angle, exposed again, rotated by a further angle, exposed, etc. The printed features are measured to determine one or more characteristics of the mask. The method can be used to model shadowing effects of a EUV mask with a thick absorber illuminated at an angle.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Eelco Van Setten, Natalia Viktorovna Davydova, Eleni Psara, Anton Bernhard Van Oosten
  • Lithographic apparatus and device manufacturing method involving a liquid confinement structure
    Patent number: 9798247
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 9798253
    Abstract: A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daan Daniel Johannes Antonius Van Sommeren, Thomas Poiesz
  • Lithographic apparatus and device manufacturing method
    Patent number: 9798246
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Lithographic apparatus for measuring overlay error and a device manufacturing method
    Patent number: 9798250
    Abstract: A lithographic apparatus including an inspection apparatus can measure the overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: October 24, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, Leonardus Henricus Marie Verstappen
  • Object holder, lithographic apparatus, device manufacturing method, and method of manufacturing an object holder
    Patent number: 9798251
    Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LaFarre, Satish Achanta, Matteo Filippi, Yogesh Karade, Antonius Johannes Maria Nellissen, Ronald Van Der Wilk, Hendrikus Christoffel Maria Van Doremalen, Wilhelmus Jacobus Johannes Welters
  • OBJECT TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170299967
    Abstract: An object table has a lifting mechanism to displace an object from a support surface. The lifting mechanism includes one or more elongated rods extending in a direction substantially perpendicular to the support surface to support the object at a distance from the support surface, the one or more elongated rods being displaceable between positions below the support surface and protruding from the support surface. The mechanism further includes a locking mechanism configured to limit a rotation about a longitudinal axis of the one or more elongated rods. The locking mechanism includes an elastic element that is mechanically connected to both a housing of the lifting mechanism and the one or more elongated rods, the elastic element configured to have a comparatively low stiffness in the support direction and a comparatively high stiffness in a rotational direction about the longitudinal axis.
    Type: Application
    Filed: August 20, 2015
    Publication date: October 19, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Jeroen Gertruda Antonius HUINCK
  • A COMPONENT FOR A LITHOGRAPHY TOOL, A LITHOGRAPHY APPARATUS, AN INSPECTION TOOL AND A METHOD OF MANUFACTURING A DEVICE
    Publication number: 20170299969
    Abstract: A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.
    Type: Application
    Filed: October 8, 2015
    Publication date: October 19, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Johannes Hubertus Antonius VAN DE RIJDT
  • Lithographic method and apparatus
    Patent number: 9791787
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: October 17, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Apparatus for and method of source material delivery in a laser produced plasma EUV light source
    Patent number: 9795023
    Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: October 17, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Alexander I. Ershov, David Evans, Matthew Graham