Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

Abstract: A substrate has a plurality of overlay gratings formed thereon by a lithographic process. Each overlay grating has a known overlay bias. The values of overlay bias include for example two values in a region centered on zero and two values in a region centered on P/2, where P is the pitch of the gratings. Overlay is calculated from asymmetry measurements for the gratings using knowledge of the different overlay bias values, each of the overall asymmetry measurements being weighted by a corresponding weight factor. Each one of the weight factors represents a measure of feature asymmetry within the respective overlay grating. The calculation is used to improve subsequent performance of the measurement process, and/or the lithographic process. Some of the asymmetry measurements may additionally be weighted by a second weight factor in order to eliminate or reduce the contribution of phase asymmetry to the overlay.

Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.

Abstract: A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Abstract: An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.

Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.

Abstract: A product structure (407, 330?) is formed with defects (360-366). A spot (S) of EUV radiation which is at least partially coherent is provided on the product structure (604) to capture at least one diffraction pattern (606) formed by the radiation after scattering by the product structure. Reference data (612) describes a nominal product structure. At least one synthetic image (616) of the product structure is calculated from the captured image data. Data from the synthetic image is compared with the reference data to identify defects (660-666) in the product structure. In one embodiment, a plurality of diffraction patterns are obtained using a series overlapping spots (S(1)-S(N)), and the synthetic image is calculated using the diffraction patterns and knowledge of the relative displacement. The EUV radiation may have wavelengths in the range 5 to 50 nm, close to dimensions of the structures of interest.

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract: A support table (WT) for a lithographic apparatus, the support table is configured to support a lower surface of a substrate (W). The support table comprises: a base surface (22) configured to be substantially parallel to the lower surface of the substrate supported on the support table, a plurality of burls (20) protruding above the base surface, each of the plurality of burls having a respective distal end and a first height above the base surface, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the plurality of the burls, and a plurality of elongate raised protrusions (45) protruding above the base surface, each of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height. The base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located.

Abstract: Disclosed is a cleaning apparatus configured to clean a radiation transmission assembly (such as a viewport), or part thereof. The radiation transmission assembly provides for radiation transmission to and/or from a low pressure chamber. The cleaning apparatus comprises, a hydrogen radical generator configured to generate hydrogen radicals for use in cleaning said radiation transmission assembly or part thereof, and a connection assembly for connection to said radiation transmission assembly.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Abstract: A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (200) to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.