Patents Assigned to ASML Netherlands
  • Illumination system, lithographic apparatus and method
    Patent number: 9360762
    Abstract: An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventor: Andrey Sergeevich Tychkov
  • Module and method for producing extreme ultraviolet radiation
    Patent number: 9363879
    Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: June 7, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van de Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
  • Inspection method and apparatus
    Patent number: 9360768
    Abstract: A method defines one or more monitoring target profiles, collects and stores initial calibration data of the metrology apparatus, compiling a library of spectra that would be observed from inspection of the monitoring target profiles using the metrology apparatus calibrated according to the initial calibration data. Some operations can be performed periodically, e.g., on a daily basis: obtaining current calibration data from the apparatus, modeling the effect of the current calibration data on the metrology apparatus operation, and using the result of the modeling and the contents of the library to determine any differences between one or more values of the initial calibration data and the current calibration data, and how these changes will be translated into changes in the measurement output for a given number of stacks and geometries.
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Gerardo Bottiglieri, Elliott Gerard Mc Namara, Ruben Alvarez Sanchez
  • Method of determining focus corrections, lithographic processing cell and device manufacturing method
    Patent number: 9360769
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
  • System and method to reduce oscillations in extreme ultraviolet light generation
    Patent number: 9363877
    Abstract: A droplet generation system for use with a laser produced plasma (LPP) extreme ultraviolet (EUV) source plasma chamber is described. During EUV generation, oscillations can occur as a function of droplet time-of-flight within the plasma chamber. To reduce these oscillations, a droplet controller adjusts the rate at which droplets are generated which, in turn, dictates the droplet time-of-flight. The droplets are a result of coalescence of generated microdroplets such that the rate at which the droplets are generated is dictated by a frequency of a signal used to generate the microdroplets. This adjustment can be a modulation of a baseline droplet frequency. In some instances, the modulation function may be a sinusoid or implemented as a pseudo-random switch.
    Type: Grant
    Filed: August 7, 2014
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventor: Matthew Graham
  • Method of improved hierarchical XML databases
    Patent number: 9361400
    Abstract: A method is provided for initializing an XML database. The method includes the steps of parsing an XML file to extract a plurality of records, the records arranged in a hierarchical form, creating, for each record, a plurality of class objects, each class having associated therewith one or more attributes, and creating a plurality of handling methods for each of one or more attributes associated with each class object, the handling methods defining how the database can be accessed.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: June 7, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Leo Lilin Zhao, Jang Fung Chen, Joseph Werner De Vocht
  • Lithographic apparatus with a deformation sensor
    Patent number: 9360774
    Abstract: Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Hendrikus Maria Spruit, Ruud Antonius Catharina Maria Beerens, Richard Henricus Adrianus Van Lieshout, Cristian Dan
  • System and method for correcting the focus of a laser beam
    Patent number: 9360600
    Abstract: Focus of a laser optical system can be corrected using a variable radius mirror having a focusing cavity and a separate cooling cavity. Pressure of a focusing material at a sufficiently low mass flow in the focusing cavity deforms a reflective surface mounted to the focusing cavity, changing its radius. Cooling material provided to the cooling cavity cools the variable radius mirror. A laser beam is reflected by the deformed reflecting surface to focusing optics, focusing the reflected laser beam on an EUV-emitting target, and minimizing a laser focus error by one or more of: maximizing a measured EUV power or minimizing a measured laser beam divergence. Providing focusing material at a deformation pressure and at a sufficiently low mass flow, and providing a separate cooling cavity, avoids perturbations in the reflective surface which would otherwise affect laser beam focus.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Christopher Paul Pate, Jason Michael Arcand
  • Method and system for lithography process-window-maximixing optical proximity correction
    Patent number: 9360766
    Abstract: The present invention relates to an efficient OPC method of increasing imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and optimizing target gray level for each evaluation point in each OPC iteration based on this function. In one given embodiment, the function is approximated as a polynomial function of focus and exposure, R(?, f )=P0+f2·Pb with a threshold of T+V? for contours, where P0 represents image intensity at nominal focus, f represents the defocus value relative to the nominal focus, ? represents the exposure change, V represents the scaling of exposure change, and parameter “Pb” represents second order derivative images.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: June 7, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jun Ye, Yu Cao, Hanying Feng
  • Lithographic apparatus and device manufacturing method
    Patent number: 9360765
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: August 3, 2015
    Date of Patent: June 7, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
  • Electrostatic clamp, lithographic apparatus, and device manufacturing method
    Patent number: 9360771
    Abstract: An electrostatic clamp for use in holding an object onto a supporting table, the electrostatic clamp comprising: a multi-layer film comprising an electrode defined in an electrically conducting layer which is positioned between electrically insulating layers.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Eugene Maria Brinkhof, Jan Bex, Anko Jozef Cornelus Sijben, Johannes Wilhelmus Damen
  • Method of determining focus corrections, lithographic processing cell and device manufacturing method
    Patent number: 9360770
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
  • Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20160154322
    Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
    Type: Application
    Filed: January 21, 2016
    Publication date: June 2, 2016
    Applicant: ASML Netherlands B. V.
    Inventors: Yang-Shan Huang, Theodorus Petrus Maria Cadee
  • Method and Inspection Apparatus and Computer Program Product for Assessing a Quality of Reconstruction of a Value of a Parameter of Interest of a Structure
    Publication number: 20160154319
    Abstract: Methods and inspection apparatus and computer program products for assessing a quality of reconstruction of a value of a parameter of interest of a structure, which may be applied for example in metrology of microscopic structures. It is important the reconstruction provides a value of a parameter of interest (e.g. a CD) of the structure which is accurate as the reconstructed value is used to monitor and/or control a lithographic process. This is a way of assessing a quality of reconstruction (803) of a value of a parameter of interest of a structure which does not require the use of a scanning electron microscope, by predicting (804) values of the parameter of interest of structures using reconstructed values of parameters of structures, and by comparing (805) the predicted values of the parameter of interest and the reconstructed values of the parameter of interest.
    Type: Application
    Filed: August 5, 2014
    Publication date: June 2, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Seyed Iman MOSSAVAT, Hugo Augustinus Joseph CRAMER, Willem Jan GROOTJANS, Adriaan Johan VAN LEEST
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160154321
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
    Type: Application
    Filed: February 4, 2016
    Publication date: June 2, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena CORTIE, Paulus Martinus Maria LIEBREGTS, Michel RIEPEN, Fabrizio EVANGELISTA
  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 9354528
    Abstract: A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: May 31, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jan Bex, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Johannes Wilhelmus Damen, Eugene Maria Brinkhof, Yogesh Pramod Karade
  • Arrangement for use in a projection exposure tool for microlithography having a reflective optical element
    Patent number: 9354529
    Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: May 31, 2016
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Maarten van Kampen, Stefan-Wolfgang Schmidt, Vadim Yevgenyevich Banine, Erik Loopstra
  • Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
    Patent number: 9354502
    Abstract: An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: May 31, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Martinus Hendricus Hoeks
  • Photon source, metrology apparatus, lithographic system and device manufacturing method
    Patent number: 9357626
    Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: May 31, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Jozef Johannes Gerardus Anna Maria Smeets, Gerbrand Van Der Zouw
  • Extreme ultraviolet light source
    Patent number: 9357625
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: May 31, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Andrew LaForge, Daniel Brown, Jason M. Arcand, Alexander A. Schafgans, Michael A. Purvis