Patents Assigned to ASML Netherlands
  • Method and apparatus for design of a metrology target
    Patent number: 9355200
    Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: May 31, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Guangqing Chen, Eric Richard Kent, Jen-Shiang Wang, Omer Abubaker Omer Adam
  • Radiation Source for an EUV Optical Lithographic Apparatus, and Lithographic Apparatus Comprising such a Radiation Source
    Publication number: 20160147160
    Abstract: A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma. A receiving structure is provided to trap debris particles on its surface that are generated with the formation of the plasma. The receiving structure has a rod-shaped heater element for heating the receiving surface, the device preventing large droplets of fuel from forming on the receiving surface. Instead, the trapped fuel is melted off the receiving surface.
    Type: Application
    Filed: June 5, 2014
    Publication date: May 26, 2016
    Applicant: ASML Netherlands B.V.
    Inventor: Johannes Christiaan Leonardus FRANKEN
  • METROLOGY METHOD AND APPARATUS
    Publication number: 20160146740
    Abstract: A method to determine an overlay error between a first structure and a second structure, wherein the first structure and second structures are on different layers on a substrate and are imaged onto the substrate by a lithographic process, the method comprising: obtaining an apparent overlay error; obtaining a systematic error caused by a factor other than misalignment of the first and second structures; and determining the overlay error by removing the systematic error from the apparent overlay error. The method may alternatively comprise obtaining apparent characteristics of diffraction orders of diffraction by an overlapping portion of the first and second structures; obtaining corrected characteristics of the diffraction orders; determining the overlay error from the corrected characteristics; and adjusting a characteristic of the lithographic process based on the overlay error.
    Type: Application
    Filed: November 18, 2015
    Publication date: May 26, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yen-Wen Lu, Jay Jianhui Chen, Wei Liu, Boris Menchtchikov, Jen-Shiang Wang, Te-Chih Huang
  • PROCESS BASED METROLOGY TARGET DESIGN
    Publication number: 20160140267
    Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.
    Type: Application
    Filed: November 13, 2015
    Publication date: May 19, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Guangqing CHEN, Shufeng BAI, Eric Richard KENT, Yen-Wen LU, Paul Anthony TUFFY, Jen-Shiang WANG, Youping ZHANG, Gertjan ZWARTJES, Jan Wouter BIJLSMA
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160139514
    Abstract: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate, A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 19, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joost Jeroen OTTENS, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders
  • Viewport protector for an extreme ultraviolet light source
    Patent number: 9341752
    Abstract: A protector for a viewport of a vacuum chamber includes a substrate material that absorbs radiation having a wavelength of an amplified light beam and radiation having a wavelength included in an emission spectra of a target material that produces EUV light when ionized by the amplified light beam. The substrate material transmits one or more of visible or near-infrared light. The protector also includes a layer formed on the substrate material, and the layer reflects radiation having the wavelength of the amplified light beam.
    Type: Grant
    Filed: November 7, 2012
    Date of Patent: May 17, 2016
    Assignee: ASML Netherlands B.V.
    Inventor: Vahan Senekerimyan
  • Imprint lithography
    Patent number: 9341944
    Abstract: A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: May 17, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Helmar Van Santen, Yvonne Kruijt-Stegeman
  • Lithographic apparatus and device manufacturing method
    Patent number: 9341960
    Abstract: An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.
    Type: Grant
    Filed: November 14, 2012
    Date of Patent: May 17, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Arno Jan Bleeker
  • Optical element mount for lithographic apparatus
    Patent number: 9335641
    Abstract: A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: May 10, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Henricus Gerardus Tegenbosch, Alexander Matthijs Struycken, Jacob Kleijn, Ruud Antonius Catharina Maria Beerens, Ivo Vanderhallen
  • Extreme ultraviolet light source
    Patent number: 9338870
    Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: May 10, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, John Tom Stewart, IV, Daniel J.W. Brown
  • Lithographic apparatus, programmable patterning device and lithographic method
    Patent number: 9335638
    Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
    Type: Grant
    Filed: August 22, 2013
    Date of Patent: May 10, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Jozef Petrus Henricus Benschop, Cheng-Qun Gui, Johannes Onvlee, Erwin John Van Zwet
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20160124319
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Application
    Filed: October 30, 2015
    Publication date: May 5, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • APPARATUS FOR AND METHOD OF SUPPLYING TARGET MATERIAL
    Publication number: 20160128170
    Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.
    Type: Application
    Filed: November 5, 2014
    Publication date: May 5, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Chirag RAJYAGURU, John M. Algots, Tetsuya Ishikawa, Peter Baumgart
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160124321
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Application
    Filed: January 12, 2016
    Publication date: May 5, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans JANSEN, Marco Koert STAVENGA
  • Lithographic apparatus, method of deforming a substrate table and device manufacturing method
    Patent number: 9329501
    Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
    Type: Grant
    Filed: June 12, 2012
    Date of Patent: May 3, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Yang-Shan Huang, Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robbert Edgar Van Leeuwen
  • Substrate and patterning device for use in metrology, metrology method and device manufacturing method
    Patent number: 9331022
    Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.
    Type: Grant
    Filed: April 25, 2014
    Date of Patent: May 3, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Patrick Warnaar, Kaustuve Bhattacharyya, Hendrik Jan Hidde Smilde, Michael Kubis
  • Substrate table, lithographic apparatus and device manufacturing method
    Patent number: 9329497
    Abstract: A substrate table comprising a base and a plurality of burls that project from the base, wherein an upper surface of the burls is provided with a multilayer coating.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: May 3, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Bensely Albert, Rene Theodorus Petrus Compen
  • Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor
    Patent number: 9329500
    Abstract: The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
    Type: Grant
    Filed: April 29, 2008
    Date of Patent: May 3, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Staals, Joeri Lof, Erik Roelof Loopstra, Wim Tjibbo Tel, Bearrach Moest
  • Lithographic apparatuses and methods for compensating for eigenmode coupling
    Patent number: 9329502
    Abstract: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.
    Type: Grant
    Filed: April 11, 2013
    Date of Patent: May 3, 2016
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Christopher Charles Ward, Mark Henricus Wilhelmus Van Gerven, Bram Paul Theodoor Van Goch
  • Sensor and lithographic apparatus
    Patent number: 9331117
    Abstract: A backside illuminated sensor comprising a supporting substrate, a semiconductor layer which comprises a photodiode comprising a region of n-doped semiconductor provided at a first surface of the semiconductor layer, and a region of p-doped semiconductor, wherein a depletion region is formed between the region of n-doped semiconductor and the region of p-doped semiconductor, and a layer of p-doping protective material provided on a second surface of the semiconductor layer, wherein the first surface of the semiconductor layer is fixed to a surface of the supporting substrate.
    Type: Grant
    Filed: October 9, 2013
    Date of Patent: May 3, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Stoyan Nihtianov, Haico Victor Kok, Martijn Gerard Dominique Wehrens