Patents Assigned to ASML Netherlands
  • Lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7561270
    Abstract: The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.
    Type: Grant
    Filed: December 5, 2005
    Date of Patent: July 14, 2009
    Assignee: ASML Netherlands B.V.
    Inventor: Yim Bun Patrick Kwan
  • Interferometric lithography system and method used to generate equal path lengths of interfering beams
    Patent number: 7561252
    Abstract: A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.
    Type: Grant
    Filed: December 29, 2005
    Date of Patent: July 14, 2009
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Harry Sewell, Johannes Jacobus Matheus Baselmans
  • Alignment System and Alignment Marks for Use Therewith
    Publication number: 20090176167
    Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
    Type: Application
    Filed: December 30, 2008
    Publication date: July 9, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Edo Maria HULSEBOS, Franciscus Godefridus Casper Bijnen, Patrick Warnaar
  • Lithographic Apparatus, and Device Manufacturing Method
    Publication number: 20090173360
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Application
    Filed: March 17, 2009
    Publication date: July 9, 2009
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Maarten Marinus Johannes Wilhelmus VAN HERPEN, Vadim Yevgenyevich BANINE, Johannes Peterus Henricus DE KUSTER, Johannes Hubertus Josephina MOORS, Lucas Henricus Johannes STEVENS, Bastiaan Theodoor WOLSCHRIJN, Yurii Victorovitch SIDELNIKOV, Marc Hubertus Lorenz VAN DER VELDEN, Wouter Anthon SOER, Thomas STEIN, Kurt Gielissen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7557903
    Abstract: A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: July 7, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Carolus Johannes Catharina Schoormans, Emiel Jozef Melanie Eussen, Willem Herman Gertruda Anna Koenen, Nicolas Alban Lallemant, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Mathias Theodorus Antonius Adriaens
  • Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7557366
    Abstract: An apparatus for producing radiation by an electrically operated discharge has a first electrode, a second electrode. and a capacitor bank. The electrodes are configured at a distance from each other which allows plasma ignition. The capacitor bank is electrically connected at a first terminal to the first electrode and at a second terminal to the second electrode, and configured to store a discharge energy. The electrodes and the capacitor bank form an electric circuit. At least the first electrode is formed by an electrically conducting fluid supplied via a first feeding line. The apparatus further has a charger and a first high inductance unit. The charger is connected to at least one of the terminals. The first high inductance unit is provided upstream the first terminal in the first feeding line for electrically decoupling the electric circuit.
    Type: Grant
    Filed: May 4, 2006
    Date of Patent: July 7, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Vladimir Mihailovitch Krivtsun
  • Lithographic apparatus and device manufacturing method
    Patent number: 7557901
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: July 7, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Thimotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
  • Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
    Patent number: 7557934
    Abstract: In a scatterometer, an aperture plate comprising an array of transmissive apertures is inserted into a plane in the illumination optical system that is conjugate with the pupil plane of the projection optical system. Aberrations in the optical systems can be measured by measuring the relative positions of bright spots in the pupil plane.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: July 7, 2009
    Assignee: ASML Netherlands B.V.
    Inventor: Ronald Franciscus Herman Hugers
  • Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
    Patent number: 7558643
    Abstract: A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
    Type: Grant
    Filed: December 9, 2004
    Date of Patent: July 7, 2009
    Assignees: ASML Netherlands B.V., IMEC v.z.w.
    Inventors: Maurits Van Der Schaar, Jeroen Huijbregtse, Sicco Ian Schets, Bart Luc Swinnen
  • Method of Creating an Alignment Mark on a Substrate and Substrate
    Publication number: 20090166899
    Abstract: In an embodiment, a method of creating an alignment mark on a substrate includes forming a plurality of lines segmented into electrically conducting line segments and space segments, thereby forming spaces between the lines to form a macroscopic structure in a first layer of the substrate, creating a plurality of electrically conducting trenches in a second layer of the substrate, and arranging the plurality of trenches to be in electrical contact with the line segments and overlapping the space segments at least partially.
    Type: Application
    Filed: December 29, 2008
    Publication date: July 2, 2009
    Applicant: ASML Netherlands B.V.
    Inventor: Richard Johannes Franciscus VAN HAREN
  • Immersion lithography
    Publication number: 20090170041
    Abstract: A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material.
    Type: Application
    Filed: December 19, 2008
    Publication date: July 2, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Dirk De Vries, Richard Moerman, Cedric Desire Grouwstra, Michel Franciscus Johannes Van Rooy
  • Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell, and Device Manufacturing Method to Measure a Property of a Substrate
    Publication number: 20090168062
    Abstract: A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the two beams. The relative phases of the two radiation beams and other features of the beams are measured in a detector to provide information on the properties of the substrate surface.
    Type: Application
    Filed: October 23, 2008
    Publication date: July 2, 2009
    Applicant: ASML Netherlands B.V.
    Inventor: Alexander STRAAIJER
  • Lithographic Apparatus with Pre-Formed Flexible Transportation Line
    Publication number: 20090169661
    Abstract: A lithographic apparatus includes, in an embodiment, an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a flexible transportation line extending between a first and second part of the apparatus, the second part moveable with respect to the first part, wherein the line is pre-formed in a three-dimensional curve.
    Type: Application
    Filed: December 1, 2008
    Publication date: July 2, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Marcus Martinus Petrus Adrianus VERMEULEN, Henrikus Herman Marie Cox, Godfried Katharina Hubertus Franciscus Geelen, Jerome Francois Sylvain Virgile Van Loo
  • Device Manufacturing Method and Lithographic Apparatus
    Publication number: 20090168039
    Abstract: A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condition with a first pattern in its cross-section, and projecting the patterned beam onto a sensor capable of providing a sensor output signal. The exposure phase includes fast switching the conditioning of the radiation beam to a second beam condition, the second beam condition being different from the first beam condition, forming the patterned radiation beam by imparting the radiation beam with the second beam condition with a second pattern in its cross-section, the second pattern being provided by a patterning device, and projecting the patterned beam onto a target portion of the substrate.
    Type: Application
    Filed: December 29, 2008
    Publication date: July 2, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Haico Victor KOK, Johannes Jacobus Matheus Baselmans, Marcus Adrianus Van De Kerkhof
  • Illumination System
    Publication number: 20090168072
    Abstract: A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.
    Type: Application
    Filed: December 4, 2008
    Publication date: July 2, 2009
    Applicant: ASML Netherlands B.V. and ASML Holding N.V.
    Inventors: Huibert VISSER, Jacob Fredrik Friso Klinkhamer, Lev Ryzhikov, Scott D. Coston, Adel Joobeur, Rob Vink, Yevgeniy Shmarev
  • Lithographic apparatus and device manufacturing method
    Patent number: 7554105
    Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
    Type: Grant
    Filed: November 1, 2005
    Date of Patent: June 30, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Dominicus Jacobus Petrus A. Franken, Erik Roelof Loopstra, Pertrus Rutgerus Bartray, Marc Wilhelmus Maria Van Der Wijst, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Johan Juliana Dries
  • Pulse Modifier, Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20090159819
    Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.
    Type: Application
    Filed: November 26, 2008
    Publication date: June 25, 2009
    Applicant: ASML Netherlands B. V.
    Inventor: Hako Botma
  • Alignment mark, use of a hard mask material, and method
    Patent number: 7550379
    Abstract: In a method to produce an alignment mark, an oxide layer and sacrificial layer are processed to comprise recesses. The recesses are filled with a filler material. During filling the recesses, a layer of filler material is formed on the sacrificial layer. The layer of filler material is removed by chemical mechanical polishing. The sacrificial layer protects the oxide layer during filling the recesses and removing the layer of filler material. The sacrificial layer is then removed by etching. This provides an unscratched oxide layer with protrusions. The oxide layer with protrusions is covered with a conducting layer whereby the protrusions punch through the oxide layer to form related protrusions. The related protrusions form an alignment mark.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: June 23, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos
  • Alignment Method, Alignment System, and Product with Alignment Mark
    Publication number: 20090153861
    Abstract: The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. The alignment mark comprises a set of mutually parallel conductor tracks from which the diffracted radiation is collected, the pattern being defined by a pattern of variation of the pitch between successive tracks as a function of position along the surface of the product. Thus, for example the pattern comprises alternating first and second areas wherein the pitch has a first and second value, respectively. Because the tracks in the different parts of the pattern, such as the first and second areas, are parallel to each other improved measurements are possible.
    Type: Application
    Filed: December 11, 2008
    Publication date: June 18, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Sami MUSA, Richard Johannes Franciscus Van Haren, Sanjaysingh Lalbahadoersing, Xiuhong Wei
  • Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device
    Patent number: RE40774
    Abstract: A positioning device with a drive unit with which an object table is displaceable over a guide which is fastened to a first frame thereof. A stationary part of the drive unit is fastened to a second frame thereof and dynamically isolated from the first frame while a reaction force of the object table arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: June 23, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Gerard van Engelen, Cornelis D. van Dijk, Johannes M. M. van Kimmenade, Jan van Eijk