Patents Assigned to ASML Netherlands
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Publication number: 20140116980Abstract: Methods are disclosed for depositing a template for directed self-assembly of a self-assemblable block polymer on a surface of a substrate. The method involves providing a chemical epitaxy pattern of alternating first and second regions having differing chemical affinities for first and second blocks of the polymer on the surface by photolithography, and providing spaced graphoepitaxy features on the surface by photolithography. The chemical epitaxy pattern is aligned with and located between pairs of spaced graphoepitaxy features. The spaced graphoepitaxy features and chemical epitaxy pattern are arranged to act together to direct self-assembly of the self-assemblable block copolymer. The resulting template may be used to direct self-assembly of a suitable self-assemblable polymer and the resulting aligned and oriented self-assembled polymer may itself be used as a resist for lithography of the substrate.Type: ApplicationFiled: June 14, 2012Publication date: May 1, 2014Applicant: ASML Netherlands B.V.Inventor: Sander Frederik Wuister
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Publication number: 20140123082Abstract: A method for improving a lithographic process for imaging a design layout onto a substrate using a lithographic projection apparatus comprising a patterning device, wherein the patterning device deforms from a first state to a second state, the method comprising: determining a deformation of the patterning device from the first state to the second state; determining a compensatory design layout from the design layout and the deformation; wherein the compensatory design layout is such that when the compensatory design layout is generated on the patterning device in the first state, the deformation of the patterning device deforms the compensatory design layout to the design layout.Type: ApplicationFiled: October 24, 2013Publication date: May 1, 2014Applicant: ASML NETHERLANDS B.V.Inventor: M'hamed AKHSSAY
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Patent number: 8711326Abstract: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.Type: GrantFiled: May 2, 2011Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Ham, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Richard Moerman, Michel Riepen, Sergei Shulepov, Koen Steffens, Jan Willem Cromwijk, Johanna Antoinette Maria Sondag-Huethorst, Marco Baragona, Robertus Leonardus Maria In 'T Groen, Ralph Theodorus Hubertus Maessen, Jacob Marinus Jan Den Toonder, Milica Kovacevic-Milivojevic
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Patent number: 8707890Abstract: A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.Type: GrantFiled: July 18, 2006Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers
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Patent number: 8709687Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.Type: GrantFiled: February 22, 2012Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Maurits Van Der Schaar, Patrick Warnaar, Kaustuve Bhattacharyya, Hendrik Jan Hidde Smilde, Michael Kubis
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Patent number: 8711323Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.Type: GrantFiled: July 7, 2006Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
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Patent number: 8711329Abstract: A lithographic apparatus and method are used for manufacturing a device. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate. A Higher Order Wafer Alignment (HOWA) model is applied so as to model higher order distortions across the substrate. The model is applied using at least one input parameter for which at least one intra-field effect has been taken into account. In an example, the intra-field effect taken into account is the ScanUp-ScanDown effect and/or the ScanLeft-ScanRight effect.Type: GrantFiled: March 8, 2011Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventor: Marc Van Kemenade
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Patent number: 8711325Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.Type: GrantFiled: November 6, 2008Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Hans Johannes Maria Freriks, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Marc Antonius Maria Haast, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers, Dzmitry Labetski
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Patent number: 8711333Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: June 4, 2009Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
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Patent number: 8711330Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: May 6, 2011Date of Patent: April 29, 2014Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Patent number: 8709908Abstract: A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).Type: GrantFiled: March 16, 2010Date of Patent: April 29, 2014Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva
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Publication number: 20140113232Abstract: A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.Type: ApplicationFiled: June 7, 2012Publication date: April 24, 2014Applicant: ASML Netherlands B.V.Inventors: Aurelie Marie Andree Brizard, Sander Frederik Wuister, Roel Koole, Emiel Peeters
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Patent number: 8704104Abstract: An electrical connector comprises a high voltage pad and a high voltage plate. When connected to another electrical connector, the two plates, which are at the same voltage as the pads, form a region of high voltage in which the field is low. The pads are positioned in that region. An electrostatic clamp of an EUV lithographic apparatus may have such a pad and plate, for connecting to the electrical connector. By placing the interconnection in a low field region, triple points (points of contact between a conductor, a solid insulator and a gas) may be present in that region.Type: GrantFiled: July 7, 2011Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Alexander Petrus Hilbers, Ronald Van Der Wilk
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Patent number: 8705007Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.Type: GrantFiled: January 20, 2010Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph Cramer, Antoine Gaston Marie Kiers, Henricus Petrus Maria Pellemans
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Patent number: 8706455Abstract: A projection operator framework is described to analyze the concept of localized normal-vector fields within field-material interactions in a spectral basis, in isotropic and anisotropic media. Generate a localized normal-vector field n in a region of the structure defined by the material boundary, decomposed into sub-regions with a predefined normal-vector field and possibly corresponding closed-form integrals. Construct a continuous vector field F using the normal-vector field to select continuous components ET and Dn. Localized integration of normal-vector field n over the sub-regions to determine coefficients of, C. Determine components Ex, Ey, Ez of the electromagnetic field by using field-material interaction operator C to operate on vector field F. Calculate electromagnetic scattering properties of the structure using the determined components of the electromagnetic field.Type: GrantFiled: October 15, 2010Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Martijn Constant Van Beurden, Irwan Dani Setija, Remco Dirks
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Patent number: 8706442Abstract: A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.Type: GrantFiled: July 3, 2009Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Everhardus Cornelis Mos, Henricus Johannes Lambertus Megens, Maurits Van Der Schaar, Hubertus Johannes Gertrudus Simons, Scott Anderson Middlebrooks
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Patent number: 8704199Abstract: A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).Type: GrantFiled: July 15, 2009Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Jan Bernard Plechelmus Van Schoot, Sylvain Dutartre
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Patent number: 8705004Abstract: A method is disclosed. A change in position of a substrate in a direction substantially parallel to a direction of propagation of a radiation beam that is, or is to be, projected on to that substrate is determined, which change in position would result in a lithographic error in the application of a pattern to that substrate using that radiation beam. The change in position of the substrate is used to control a property of the radiation beam when, or as, the radiation beam is projected onto the substrate in order to reduce the lithographic error.Type: GrantFiled: October 4, 2010Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Remco Jochem Sebastiaan Groenendijk
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Patent number: 8705009Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.Type: GrantFiled: September 27, 2010Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Joost Jeroen Ottens, Gerrit Van Donk, Johannes Van Es
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Patent number: 8704998Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: GrantFiled: January 24, 2011Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
