Abstract: A pure metal is vaporized in a receiver, and a quantity of oxygen slightly substoichiometric for the oxide is introduced. To determine the thickness of the layer deposited on the film and to control the vaporization rate, optical sensors are installed in an area where the layer, because of the presence of unoxidized metal, has sufficient absorption for optical measurement. After the determination of the transparency by the sensors, the layer is subjected to a secondary oxidation process.

Abstract: A method is disclosed for the operation of a high-power electron beam for the vaporization of materials in a target. With this method, static and dynamic deflection errors are corrected. First, the static and dynamic deflection errors are ascertained by means of a teach-in process for concrete spatial coordinates and concrete frequencies of the deflection currents and stored in a memory. For the later operation, this stored data is used in such a way that input geometric data for the incidence points of the electron beam is automatically recalculated into corrected current values which bring about the exact incidence onto the input points. A corresponding procedure takes place with the input of frequencies for the deflection current. The input frequencies are automatically corrected in terms of frequency and amplitude in order to eliminate the frequency-dependent attenuation effects.

Abstract: In a device for holding lenses for eye glasses to be coated (3,3′, . . . ) with a substrate holder (4) consisting of cap-like sheet-metal blanks (4a,b,c,d) forming a dish in the form of a spherical segment and having several drill-holes (5,5′, . . . ), rotating on a vertical axis (R) in the vacuum chamber (2) above a coating source (Q), the coating source (Q) being mounted to the side of the axis of rotation (R) and the lenses (3,3′, . . . ) being placed and held in the drill-holes (5,5′, . . .

Abstract: Power supply lines (41, 42) connect poles of an alternating current power source (43) to respective cathodes (58, 59) in compartments (32, 39), included among a plurality of adjacent compartments (32-39′), which together form a vacuum chamber (31) and which are connected to each other by a passageway (60). The two compartments (32, 39) with the cathodes (58, 59) are separated from each other by intermediate compartments (32′-38′), at least some of which are equipped with additional sputter cathodes (61-66).

Abstract: A disc lacquering station, a laser beam recorder, a developing station and a metallizer are arranged in tandem. A cassette station (7) for the intermediate storage of substrates precedes and another follows the laser beam recorder. The cassette station (7) has a fixedly installed buffer magazine (9) for substrates and an extra magazine (10), removable from the apparatus, for additional substrates. In this manner substrates can be taken with the extra magazine from the cassette station preceding the laser beam recorder, recorded on a separate laser beam recorder, and then air-locked back into the production apparatus.

Abstract: A first vacuum pump (14) is connected to a vacuum chamber (5) by a primary intake line (13) having a first vacuum valve (4) therein. A second vacuum pump (15) is connected to the output of the first vacuum pump (14) by a connecting line (20) having a second vacuum valve (12) therein. A blowout valve (17) is connected to the connecting line (20) between the first pump (14) and the second valve (12). A secondary intake line (19) having therein a third vacuum valve (13) is connected between the vacuum chamber (5) and the intake of the second vacuum pump (15).

Abstract: A system of layers applied to a transparent substrate includes a first layer of an oxide such as ZnO or SnO.sub.2, a second layer of a substoichiometric oxide of Zn or Ta, a third layer of Ag or Cu, a fourth layer of a substoichiometric oxide of Ti, Cr, or Nb, and a fifth layer of similar composition as the first layer. The layers are preferably deposited by magnetron cathode sputtering in an atmosphere which consists of inert gas and, in the case of the oxide layers, a reactive gas.

Abstract: A dual magnetron cathode assembly includes a pair of elongate, parallel targets in coplanar relationship fixed to respective magnetic yokes with associated rows of permanent magnets for producing a magnetic field over the targets. A common back plate is provided for both cathodes, a center shield plate extending from the back plate to between the targets, side shield plates and end shield plates likewise extending from the back plate to form side-by-side rectangular shielding enclosures which expose only the sputtering surface of the targets. The yokes are fixed with respect to the vacuum chamber by insulative holders which extend through openings in the back plate.

Abstract: The invention pertains to a rotary vane vacuum pump (1) with a high vacuum stage (9, 22), with a fore-vacuum stage (8, 21), with a substantially cylindrical rotor (3) which has bearing and anchor segments (11 and 21, 22), a bearing segment (11) being situated between two anchor segments (21, 22) and the anchor segments (21, 22) having vane slots (25, 26), and with a roughly pot-shaped housing (2) which contains the pump chambers (8, 9) and whose base is designed as a bearing piece (13) with a passage (35) for the rotor drive. To provide for a simple manufacture, the invention proposes that the operational rotor (3) is of one piece, that both anchor sections (21, 22) of the rotor (3) are arranged on the face side, that the bearing segment (11) between the anchor segments (21, 22) is the only bearing segment and that both vane slots (25, 26) are open from their respective front sides. (Drawing FIG.

Abstract: In an apparatus for the laser beam exposure of a substrate disc (5), linked block tables (19, 29) are provided, which have each a piezotranslator (24, 31). This makes it possible to perform a fine correction of the movements very rapidly and very precisely.

Abstract: A crucible is mounted on a crucible support bolt (11, 34) in a vacuum chamber (33) resting on a base stand (32) and can be heated by the thermal radiation of a heating element. A drawing element (35) is provided above the melt, by means of which the crystal can be drawn up from the surface of the melt into a transfer lock chamber (36), which can be pivoted laterally with respect to the base stand (32). A separating device is provided between the crystal and the drawing element (35) to separate the crystal from the drawing element (35). The base stand (32) is formed by a platform (38) supported by four posts (37) three additional legs (39) of equal length extend upward from three of the four corners of the rectangular platform (38) holding the vacuum chamber (33), these (39) being held together at their top ends by a horizontal frame (40), which forms a right triangle.

Abstract: The invention relates to a process for operating a test gas leak indicator (1) with a gas inlet (2) and a test gas-sensitive detector (4), in which all or part of a stream of gas containing the test gas reaching the inlet (2) is taken to the detector (4) in the event of a leak; in order to improve the sensitivity of the leakage detection, it is proposed that the stream of gas be preferably periodically modulated and the signal from the test gas detector (4) be processed in synchronism with the modulation of the gas flow.

Abstract: An alternating-current source (2) is connected to two cathodes (6,7) which cooperate electrically with targets which are sputtered in a gas discharge while a process gas is introduced in a vacuum chamber (15). A network formed of a transformer (3) and additional coils (5, 12, 13) and condensers (4, 8, 9, 10, 11) acts as a filter to assure a stable coating process.

Abstract: A source of alternating current (3), is connected to two magnetron cathodes (4, 5), one pole (8) of the a.c. current source (4) being connected to one of the cathodes (4), while the other pole (9) is connected to the other cathode (5), each by its own power supply line (10, 11). Each of the two cathodes (4, 5) is installed in its own compartment (12, 13), the two compartments enclosing between them a third compartment (14), connected to a vacuum source (21). The two outside compartments (12, 13) are connected to each other by openings (15, 16) or gaps in the walls (17, 18) separating them, and the substrate (2) set up in the third compartment (14) facing a CVD source, which consists essentially of a reactive gas inlet (19) and a collimator (20).

Abstract: A plurality of finger-like grippers (12, 13, 14) pivotably supported in a housing (4, 5), and a plunger or piston (7) with a head part (8a) acting on the grippers (12, 13, 4), the piston being supported in such a way that it is free to slide in the housing (4). The grippers are held and guided in openings (17, 18) in the top part (5) of the housing (4) and can pivot about axes transverse to the longitudinal axis (L) of the housing (4, 5), where the pivot axes (a, b, c) of all the grippers are in the same plane (e) and together form a regular polygon surrounding the longitudinal axis (L). The ends of the grippers (12, 13, 14) facing the piston (7) are surrounded as a group by a ring of elastic material or by a garter spring (15), which pulls them toward stop surfaces (4b), which limit the pivoting movement.

Abstract: A flat, elongate, trough-shaped part (8) made of an electrically conductive ceramic can be heated by the direct passage of current between clamping points at opposite ends. The trough-shaped part (8) being provided with openings (12) for reducing cross sectional area where increased ohmic heating is desired, such as near the clamping points and between individual areas where wire is fed for melting in the trough.

Abstract: A vertically disposed drive spindle (5) rotates turntable (6) supporting a substrate (7) at high speed, the turntable having a smaller diameter than the substrate. Coaxial with the turntable (6), a centering ring (10) having a frustoconical inside surface can be raised vertically between a lower and upper position. The latter has on its upper side a greater diameter and on its lower side a smaller diameter than the substrate (7). In its lower position the centering ring (10) is at a distance from a substrate (7) lying on the turntable (6), but in its upper position its inside surface supports the substrate (7) at an axial distance above turntable (6).

Abstract: Optical measuring apparatus for determining chromaticity of thin films on a substrate includes a light source for illuminating the substrate and a measuring apparatus for dispersing light into various wavelengths and making wavelength dependent intensity measurements. Radiation from the light source is reflected or transmitted by the substrate to the measuring apparatus along a first beam path having a first diaphragm for cutting off the radiation from the substrate in a leak-tight manner. Radiation from the light source is also transmitted to the measuring apparatus directly along a second beam path having a second diaphragm for cutting off radiation from the light source in a leak-tight manner. The light source (6a) consists of a globe photometer (6a), in which a lamp (4) is provided. A steadily burning light source, especially a halogen lamp, is used as the lamp (4).

Abstract: A puller (22) above the melt extracts a crystal (8) upwardly out of the melt surface into a laterally turnable airlock chamber (5) An uncoupling device (7) provided between the crystal (8) and the puller permits the severance of the crystal (8) from the puller. The device (7) is formed by a coupling ring (10) connected to the pull shaft (22) and having a longitudinal slot (9) which cooperates with a crystal holder which is provided with a mushroom-shaped head part (11), and by an airlock ring (14) held by the cover plate (15) of the airlock chamber (5). Airlock gates (13, 13') journaled on the airlock ring (14) pivot about horizontal axes (35, 35') from a horizontal locking position to a vertical open position and vice versa, their end faces (16, 16') forming an opening (17) in the locking position, thereby encompassing the shaft (19) of the seed holder (12) to lock it in the plane of the airlock ring (14).

Abstract: A vacuum chamber includes a central compartment (1) in which a diode cathode (6) carrying an electrically conductive sputtering target (7) is located, and two outer compartments (11, 12) in which magnetron cathodes (13, 14) carrying target 15, 16) are located, the magnetron cathodes (13, 14) being connected to respective poles (20, 21) of an AC power source. The outer compartments (11, 12) are separated from the central compartment by walls having openings (33, 34) which flank a space (28) between the sputtering target (6) and the substrate (3). Process gas lines 24, 25) are arranged to introduce process gas into this space (3).