Patents Assigned to C Technologies, Inc
  • Publication number: 20110076222
    Abstract: In a process for producing ammonia from urea which process comprises: (a) heating a liquid phase reaction medium comprising an aqueous solution of urea, or a mixture of urea, containing biuret or ammonium carbamate on site, in a hydrolysis reactor such that a pressurized gaseous ammonia and carbon dioxide-containing product is obtained which is essentially free of urea, biuret, or ammonium carbamate; (b) separating the gaseous ammonia and carbon dioxide-containing product from the liquid phase reaction medium at the prevailing pressure; (c) retaining the liquid phase reaction medium in the reactor for further conversion to gaseous ammonia and carbon dioxide, and/or recycling at least a portion of the said reaction medium back into the reactor, a urea dissolver, or feed solution to the reactor for further conversion; and (d) withdrawing the gaseous ammonia and carbon dioxide-containing product separated in step (b) at a controlled rate to meet varying ammonia demand requirements; the improvement wherein th
    Type: Application
    Filed: December 8, 2010
    Publication date: March 31, 2011
    Applicant: EC&C Technologies, Inc
    Inventors: Herbert W. Spencer, III, H. James Peters, William G. Hankins, Madoka Fujita
  • Patent number: 7808641
    Abstract: This disclosure relates generally to a sampling device, and, more particularly, a sampling device that facilitates spectroscopic measurements with a variable path length and the necessary software controlled algorithms, and methods for using such a device.
    Type: Grant
    Filed: April 10, 2008
    Date of Patent: October 5, 2010
    Assignee: C Technologies Inc.
    Inventors: Mark Salerno, Tsung Shih, Craig Harrison
  • Publication number: 20100146153
    Abstract: A function module integrating device is disposed on an upper frame of a display of an electronic apparatus to communicate with a peripheral communication module on a motherboard of the electronic apparatus. In an embodiment, the function module integrating device comprises plural function modules and a connector. The function modules comprise a long-distance wireless communication module, a short-distance wireless communication module, and a video module. The connector is connected to each function modules and also electrically connected to the peripheral communication module on the motherboard of the electronic apparatus. In another embodiment, the function module integrating device is wirelessly connected to the electronic apparatus via wireless communication of a module-end wireless communication module of the device with an apparatus-end wireless communication module of the electronic apparatus.
    Type: Application
    Filed: August 18, 2009
    Publication date: June 10, 2010
    Applicant: CC&C Technologies,Inc
    Inventors: YIH-CHENG CHEN, Chung-Kwang Chen
  • Publication number: 20080220134
    Abstract: A system and method for barrier submersion cooking comprising a thin walled plastic cooking pouch for receiving a food item effectively dimensioned such that when placed into a hot liquid cooking medium a vent remains above a top surface of the liquid cooking medium and a rack for lowering the vessel into the liquid cooking medium to an effective depth such that the food item received by the pouch is below the top surface of the liquid cooking medium and the vent is above the top surface of the liquid cooking medium.
    Type: Application
    Filed: July 31, 2007
    Publication date: September 11, 2008
    Applicant: B.S.C. Technologies, Inc.
    Inventors: Robert Cohn, J. Mark Suchecki
  • Publication number: 20080212086
    Abstract: A machine for optically inspecting a transparent or semi-transparent workpiece composed of a material having a known, predetermined optical absorption property, that includes a light energy transmitting module having at least one light energy transmitting element disposed therein for transmitting light energy at a frequency tuned to the known, predetermined absorption property and along a predetermined axis, a support for securely engaging the workpiece and positioning it in the path of the predetermined axis, and a light energy collection module having a filter in tune with the known, predetermined absorption property and at least one light energy sensor contained therein, wherein the support is positioned between the light energy transmitting module and the light energy collection module.
    Type: Application
    Filed: December 5, 2006
    Publication date: September 4, 2008
    Applicant: I. C. TECHNOLOGIES, INC.
    Inventor: Steven Antonacci
  • Patent number: 7220395
    Abstract: This patent describes technology for generating ammonia from urea. The method is based on the hydrolysis of an aqueous solution of urea and/or biuret by heating under pressure to form a mixture of ammonia, carbon dioxide and water. The gas mixtures produced are useful for supplying ammonia at controlled pressure and rate of flow for many industrial applications without the risks and hazards associated with the transportation and on-site storage of ammonia, thereby providing a significant safety advantage over present industrial practice.
    Type: Grant
    Filed: September 15, 2003
    Date of Patent: May 22, 2007
    Assignee: EC&C Technologies, Inc.
    Inventors: John Douglas Cooper, legal representative, Herbert W. Spencer, III, Hal B. H. Cooper, Sr., deceased
  • Publication number: 20050287224
    Abstract: Disclosed herein are oxygen generating compositions. More specifically, the oxygen generating compositions comprise potassium superoxide or sodium peroxide, a material for stabilizing the reactivity and oxidizing power of potassium superoxide or sodium peroxide, and optionally at least one selected from an oxidation catalyst of carbon monoxide, a material for improving the moldability and processability of the composition and a material for increasing initial carbon dioxide absorption rate. The oxygen generating compositions can be utilized in a wide range of applications. The material for stabilizing the reactivity and oxidizing power of potassium superoxide or sodium peroxide is selected from calcium hydroxide (Ca(OH)2), aluminum hydroxide (Al(OH)3), magnesium hydroxide (Mg(OH)2), barium hydroxide (Ba(OH)2), calcium carbonate (CaCO3), talc and clay. The oxidation catalyst of carbon monoxide is selected from copper oxide (CuO), manganese oxide (MnO) and a mixture thereof (hopcalite).
    Type: Application
    Filed: August 12, 2004
    Publication date: December 29, 2005
    Applicant: J. C. Technologies, Inc.
    Inventor: Man-Khyun Rho
  • Patent number: 6879741
    Abstract: A fiber optic probe device having a sampling end positionable over optical fibers is provided. The sleeve could be releasably attached to the fiber optic probe device. The sampling end can be discarded after use, or re-used. A sample chamber including a reflective surface can be formed at the distal end of the sampling end.
    Type: Grant
    Filed: November 4, 2002
    Date of Patent: April 12, 2005
    Assignee: C Technologies, Inc
    Inventors: Mark Salerno, Craig D. Harrison, Ishai Nir, Hans DeWaal, Mario Vieira
  • Patent number: 6845507
    Abstract: A method and system for performing straight through processing is presented. The method includes monitoring a queue in order to detect a specific message. This message is parsed to take it from an external format into an internal format. The contents of the message include stages, with one stage being marked as active, and each stage having at least one step and a queue identifier. The processing specified in the steps contained in the active stage is performed, the active stage is marked inactive, and a new stage is marked active. The message is parsed back into the external format and directed to the queue specified by the queue identifier. Additional embodiments include a storage medium and a signal propagated over a propagation medium for performing computer messaging.
    Type: Grant
    Filed: May 18, 2001
    Date of Patent: January 18, 2005
    Assignee: SS & C Technologies, Inc.
    Inventor: Stephen J. Kenton
  • Patent number: 6730280
    Abstract: This patent describes technology for generating ammonia from urea. The method is based on the hydrolysis of an aqueous solution of urea and/or biuret by heating under pressure to form a mixture of ammonia, carbon dioxide and water. The gas mixtures produced are useful for supplying ammonia at controlled pressure and rate of flow for many industrial applications without the risks and hazards associated with the transportation and on-site storage of ammonia, thereby providing a significant safety advantage over present industrial practice.
    Type: Grant
    Filed: June 17, 2002
    Date of Patent: May 4, 2004
    Assignee: EC&C Technologies, Inc.
    Inventors: Hal B. H. Cooper, Herbert W. Spencer, III
  • Patent number: 6544339
    Abstract: A processing reactor for processing semiconductor substrates includes a reactor housing, which defines a processing chamber, and a platform which is rotatably supported in the reactor housing for supporting a substrate in the processing chamber. The processing reactor further includes a gas injection assembly which is adapted to inject at least one gas into the processing chamber. The gas injection assembly has a substrate facing surface, which is adapted to vary the dynamic pressure in the processing chamber to vary the processing time of the semiconductor substrate in the processing chamber. For example, gas injection assembly may include a gas injection manifold, which includes the substrate facing surface. Preferably the substrate facing surface is repositionable in the processing chamber to vary the dynamic pressure in said processing chamber.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: April 8, 2003
    Assignee: Micro C Technologies, Inc.
    Inventor: Imad Mahawili
  • Patent number: 6530994
    Abstract: A platform for supporting a semiconductor substrate during processing in a processing chamber includes a body having a first support surface for supporting the substrate thereon and a second support surface for being supported by a rotatable housing over a heater in the processing chamber. The body comprises a quartz material, with at least a portion of the quartz material being adapted to be opaque to block transmission of photon energy through that portion during heating. For example, the quartz material may include a coating over at least a portion of the quartz material, with the coating adapting the quartz material to be opaque. In preferred form, the coating comprises a composite film of silicon and silicon carbide.
    Type: Grant
    Filed: October 18, 1999
    Date of Patent: March 11, 2003
    Assignee: Micro C Technologies, Inc.
    Inventor: Imad Mahawili
  • Patent number: 6506350
    Abstract: This patent describes technology for generating ammonia from urea. The method is based on the hydrolysis of an aqueous solution of urea and/or biuret by heating under pressure to form a mixture of ammonia, carbon dioxide and water. The gas mixtures produced are useful for supplying ammonia at controlled pressure and rate of flow for many industrial applications without the risks and hazards associated with the transportation and on-site storage of ammonia, thereby providing a significant safety advantage over present industrial practice.
    Type: Grant
    Filed: October 22, 2001
    Date of Patent: January 14, 2003
    Assignee: EC&C Technologies, Inc.
    Inventors: Hal B. H. Cooper, Herbert W. Spencer, III
  • Patent number: 6436359
    Abstract: A process to provide a pressurized gas stream useful for removing nitrogen oxides from a combustion gas stream by hydrolyzing urea in aqueous solution in a closed reactor to evolve gaseous ammonia at a rate essentially balanced to the amount required from the combustion gas stream. The improvement resides in maintaining the pressure in the reactor within a preselected range when the demand for ammonia for external use suddenly drops by cooling the solution within the hydrolysis reactor by heat exchange either within or external to the reactor in response to rapid changes in demand for ammonia required to remove said nitrogen oxides.
    Type: Grant
    Filed: October 25, 2000
    Date of Patent: August 20, 2002
    Assignee: EC&C Technologies, Inc.
    Inventors: Herbert W. Spencer, III, Harold James Peters
  • Patent number: 6310323
    Abstract: A heating assembly for heating a semiconductor substrate in a processing chamber of a reactor includes a plurality of heater supports and a plurality of heating devices supported by the heater supports. The heater supports provide conductive paths for the heating devices for coupling the heating devices to an external power source and, further, are adapted to cool the heating devices whereby the heating devices may be operated at a high power output while maintaining the temperature of the heating devices below a maximum temperature. Preferably the heater supports are cooled by a coolant system, for example a coolant system which circulates coolant through at least a portion of the heater supports to thereby cool the heater supports and the heating devices.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: October 30, 2001
    Assignee: Micro C Technologies, Inc.
    Inventors: Imad Mahawili, John M. Arend
  • Patent number: 6244641
    Abstract: A wafer transfer arm made from a machineable material for picking up and delivering a semiconductor wafer from one location to another, includes a blade body with a longitudinal channel extending along one surface, and a coverplate adapted to matingly fit into the channel for defining a vacuum conduit therein. The vacuum conduit provides fluid communication between an inlet at one end of the blade body and an outlet at the other end, for suctionally retaining the semiconductor wafer by vacuum pressure or suction.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: June 12, 2001
    Assignee: M.E.C. Technology, Inc.
    Inventors: Matthew Peter Szapucki, Richard Kulkaski, Trevor J. Hadley, Mark Anthony Santorelli
  • Patent number: 6237528
    Abstract: A plasma reactor showerhead electrode assembly for processing semiconductor wafers comprised of a typically silicon disk shaped gas plate having a plurality of gas passage holes formed therethrough by a ultrahigh velocity water jet boring apparatus, and a graphite circular split collar assembly including first and second semicircular sections forming a circumferential inner slot when opposing ends of said sections are secured together, the slot mating in a dovetail connection with an outer circumferential groove of said gas plate for retaining the latter between said sections. A conductive gasket may be interposed between the gas plate groove and the mating collar assembly to provide an electrically and thermally conductive seal. The first and second semicircular sections have opposing ends screwed or pinned together for providing easy disassembly thereof for replacement of the gas plate.
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: May 29, 2001
    Assignee: M.E.C. Technology, Inc.
    Inventors: Matthew P. Szapucki, Richard Kulkaski, Trevor J. Hadley, Mark Anthony Santorelli
  • Patent number: 6215586
    Abstract: An active optical image enhancer for a microscope, and a method of enhancing an image for a microscope, are provided. The image enhancer has a tube for attachment to a microscope. Photo-detector elements are disposed on an end of the tube remote from an end thereof that is attachable to the microscope. Lens elements are disposed in or on the tube between the photo-detector elements and the end of the tube that is attachable to the microscope. The optical path length of the tube is adjustable via an appropriate device.
    Type: Grant
    Filed: May 25, 1999
    Date of Patent: April 10, 2001
    Assignee: R.K.C. Technologies Inc.
    Inventor: Natalie Clark
  • Patent number: RE37546
    Abstract: A reactor for processing a substrate includes a first housing defining a processing chamber and supporting a light source and a second housing rotatably supported in the first housing and adapted to rotatably support the substrate in the processing chamber. A heater for heating the substrate is supported by the first housing and is enclosed in the second housing. The reactor further includes at least one gas injector for injecting at least one gas into the processing chamber onto a discrete area of the substrate and a photon density sensor extending into the first housing for measuring the temperature of the substrate. The photon density sensor is adapted to move between a first position wherein the photon density sensor is directed to the light source and a second position wherein the photon density sensor is positioned for directing toward the substrate. Preferably, the communication cables comprise optical communication cables, for example sapphire or quartz communication cables.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: February 12, 2002
    Assignee: Micro C Technologies, Inc.
    Inventor: Imad Mahawili
  • Patent number: D534262
    Type: Grant
    Filed: February 14, 2005
    Date of Patent: December 26, 2006
    Assignee: J. C. Technologies, Inc.
    Inventor: Man-khyun Rho