Abstract: A sputtering chamber includes at least two sputtering targets, one of the at least two targets disposed on a first side a substrate conveyor extending within the chamber, and another of the at least two targets disposed on a second side of the conveyor. The at least two targets may be independently operable, and at least one of the targets, if inactivated, may be protected by a shielding apparatus. Both of the at least two targets may be mounted to a first wall of a plurality of walls enclosing the sputtering chamber.

Abstract: The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.

Abstract: The invention provides a glazing sheet and a coating on the glazing sheet. The coating comprises, in sequence moving outwardly from the glazing sheet, a dielectric base coat comprising oxide film, nitride film, or oxynitride film, a first infrared-reflective layer, a first nickel-aluminum blocker layer in contact with the first infrared-reflective layer, a first dielectric spacer coat comprising an oxide film in contact with the first nickel-aluminum blocker layer, a second infrared-reflective layer, a second nickel-aluminum blocker layer in contact with the second infrared-reflective layer, a second dielectric spacer coat comprising an oxide film in contact with the second nickel-aluminum blocker layer, a third infrared-reflective layer, a third nickel-aluminum blocker layer in contact with the third infrared-reflective layer, and a dielectric top coat comprising an oxide film in contact with the third nickel-aluminum blocker layer. Also provided are methods of depositing such a coating.

Abstract: A method of depositing coating onto both sides of a substrate is provided, which includes steps of upwardly sputtering one or more lower targets to deposit a sacrificial coating onto a second surface and downwardly sputtering one or more upper targets to deposit a first functional coating onto a first surface, washing the substrate with one or more washers to remove the sacrificial coating from the second surface while leaving intact the first functional coating on the first surface, and upwardly sputtering the one or more upper targets to deposit a second functional coating onto the second surface.

Abstract: The invention provides a glass pane that has a transparent electrically conductive coating on a surface of the glass pane, such that the glass pane has a coated surface. The coated surface has a central region and a perimeter region. The transparent electrically conductive coating has a higher electrical conductivity at the central region than it does at the perimeter region. In some embodiments, the coated glass pane is part of an IG unit. Also provided are methods of producing a coated glass pane having an anti-condensation perimeter region.

Abstract: The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.

Abstract: A gas manifold for delivery gas to a sputtering chamber is provided with ports to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced.

Abstract: The invention provides a glazing sheet and a low-emissivity coating on the glazing sheet. The low-emissivity coating comprises, in sequence moving outwardly from the glazing sheet, a layer comprising oxide film, nitride film, or oxynitride film, an infrared-reflective film, a nickel-aluminum blocker film, and an oxide film. Also provided are methods of depositing such a low-emissivity coating.

Abstract: The invention provides emission control coatings. The coating includes a transparent conductive film over which there is an oxygen barrier film. In some embodiments, the transparent conductive film comprises indium tin oxide and the oxygen barrier film comprises silicon nitride.

Abstract: Low-emissivity coatings that are highly reflective to infrared-radiation. The coating includes three infrared-reflection film regions, which may each include silver.

Abstract: A thermoelectric device for use with solar cells or other heat sources. A substrate has a manufactured surface with a plurality of highland features and lowland features. Each highland feature defines a peak adjacent to which there is an interface of two different film regions (formed of two different metals, two different semiconductors, or one metal and one semiconductor). The two film regions diverge away from each other with increasing distance from the interface and terminate at distal end regions. In response to a temperature difference between the interface and the distal end regions, the device produces a voltage.

Abstract: The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.

Abstract: The invention provides a coater, and methods of using the coater, for depositing thin films onto generally-opposed major surfaces of a sheet-like substrate. The coater has a substrate transport system adapted for supporting the substrate in a vertical-offset configuration wherein the substrate is not in a perfectly vertical position but rather is offset from vertical by an acute angle. The transport system defines a path of substrate travel extending through the coater. The transport system is adapted for conveying the substrate along the path of substrate travel. Preferably, the transport system includes a side support for supporting a rear major surface of the substrate. The preferred side support bounds at least one passage through which coating material passes when such coating material is deposited onto the substrate's rear major surface. Preferably, the coater includes at least one coating apparatus (e.g.

Abstract: The invention provides emission control coatings. The coating includes a transparent conductive film over which there is an oxygen barrier film. In some embodiments, the transparent conductive film comprises indium tin oxide and the oxygen barrier film comprises silicon nitride.

Abstract: A system for measuring properties of a thin film coated glass having a light source, a spectrometer, at least one pair of probes, a first optical fiber switch and a second optical fiber switch. The pair of probes includes a first probe located on one side of a glass sheet and a second probe located on the opposite side of the glass sheet, directly across from the first probe. The first and second optical fiber switches are adapted to couple either probe to the light source and/or the spectrometer. Because the design of the system is optically symmetrical, calibration may be performed without the use of a reference material such as a tile or mirror. Each of the first and second probes has a first leg and a second leg that are separated from each other by a distance n so that angled reflections may be detected.

Abstract: The invention provides methods and equipment for depositing a low-maintenance coating.

Abstract: The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

Abstract: Low-emissivity coatings that are highly reflective to infrared-radiation. The coating includes three infrared-reflection film regions, which may each include silver.

Abstract: The invention provides emission control coatings. The coating includes a transparent conductive film over which there is an oxygen barrier film. In some embodiments, the transparent conductive film comprises indium tin oxide and the oxygen barrier film comprises silicon nitride.

Abstract: Disclosed is a coated transparent pane that is part of a multiple-pane insulating glazing unit. The unit has a between-pane space to which the second major surface of the coated pane is exposed. The second major surface bears a low-emissivity coating, which includes in sequence a first dielectric film region, a first infrared-reflection film region, a second dielectric film region, a second infrared-reflection film region, a third dielectric film region, a third infrared-reflection film region, and a fourth dielectric film region.