Abstract: A polarizer suitable for transforming incident linearly polarized or circularly polarized light into exiting radially or tangentially polarized light with virtually no transmission losses has, in one of its embodiments, a plate fabricated from birefringent material on whose entrance and exit faces small zones (11, 12) with deflecting structures (8, 9) in the form of gratings or Fresnel surfaces have been created. The crystal axis (5) of said birefringent material is aligned parallel to the incident light beam. Said deflecting structures deflect light along a transmission direction (13) that is inclined with respect to said crystal axis (5), causing a phase shift between the field components of the transmitted light.

Abstract: A catadioptric projection lens for projecting a pattern located in an object plane onto an image plane without an intermediate image includes the following components between the object plane and the image plane in the given order: a first lens part for creating a beam that is directed at a physical beam splitter, a physical beam splitter with a beam splitter surface, a mirror group with a concave mirror, and a second lens part with positive focal power to create an image of the pattern on the image plane. The mirror group preferably has no free-standing lens, and the focal power of the mirror group is largely determined by the magnification of the concave mirror. The focal power of the mirror group is large enough to convert the incident divergent beam into a convergent beam. The system aperture is located on the image side behind of the concave mirror, preferably at the exit of the beam splitter.

Abstract: A method for reducing the contamination of at least one optical component (2, 3) contained in the beam guidance space (6) and held by a frame (4, 5) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer (7) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.

Abstract: An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the same material is arranged before the entrance surface of the rod. The aspect ratio between width and height of the small rods is the inverse of the aspect ratio between width and height of the rod. The rod arrangement, or some analogous structure, surface or treatment substituted therefor, serves to compensate the direction-dependent total reflection losses of the rod.

Abstract: Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.

Abstract: In a method for coating optical elements for systems working with ultraviolet light, the coating process is performed in the evacuable working chamber of a coating system. At least one lock system is provided, equipped with a lock chamber that can be evacuated and, if desired, separated from the working chamber or connected to the working chamber in order to introduce optical elements. After the optical elements are moved into the lock chamber, different treatment steps may be performed there on the elements that were, or will be, coated. The treatment may include in particular cleansing with ultraviolet light, controlled heating or cooling, and/or measurement of at least one optical property of the optical elements. Using the lock chambers for the pre-treatment and post-treatment of optical elements immediately before or after a coating process permits improved control of the coating process and production of elements of highest quality with minimal total processing time.

Abstract: A device is used to hold an optical element, in particular one made of a crystalline material, in particular of CaF2, while the optical element is being coated, in particular by the vapor-deposition of at least one functional layer in a vacuum coating plant. The latter has a device for mounting the optical element, it being possible for the optical element to be heated in the vacuum coating plant via suitable radiation, in particular infrared radiation. An intermediate element which has a lower thermal absorption than the device for mounting the optical element is arranged between the device for mounting the optical element and the optical element.

Abstract: An optical component with a low reflectance for ultraviolet light in a wavelength range between approx. 180 nm and approx. 370 nm, in particular approx. 248 nm, and for a high angle of incidence up to at least approx. 40° has a substrate and a multilayer antireflection system arranged on at least one surface of said substrate to provide reflection reduction. The multilayer system distinguishes itself in that the layer adjacent to the substrate does not consist of magnesium fluoride and that none of the layers has a thickness of more than half of the working wavelength. In particular, the layer thicknesses of the low refractive materials should not exceed 1/3 the working wavelength. By adhering to these boundary conditions, antireflective coatings can be produced that provide both permanent laser resistance as well as a high resistance against inner layer stress and thermal stress.