Abstract: A device for determining biometric variables of the eye, as are incorporated in the calculation of intraocular lenses including a multi-point keratometer and an OCT arrangement. The keratometer measurement points are illuminated telecentrically and detected telecentrically and the OCT arrangement is designed as a laterally scanning swept-source system with a detection region detecting the whole eye over the whole axial length thereof. The multi-point keratometer ensures that a sufficient number of keratometer points are available for measuring the corneal surface. By contrast, telecentricity ensures that the positioning inadequacies of the measuring instrument in relation to the eye to be measured do not lead to a local mismatch of the reflection points. The swept-source OCT scan detects the whole eye over the length thereof so that both anterior chamber structures and retina structures can be detected and a consistent whole eye image can be realized.

Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.

Abstract: An optical module includes a chamber capable of being evacuated and a mirror in the chamber. The mirror includes a plurality of individual mirrors. Each individual mirror includes: a mirror body including a reflection face; a support structure; and a thermally conductive portion that mechanically connects the support structure to the mirror body. For at least one individual mirror, the thermally conductive portion includes a plurality of thermally conductive strips arranged radially, adjacent thermally conductive strips being separated from each other, and each of the plurality of thermally conductive strips connecting the mirror body to the support structure. For at least one individual mirror, an actuator is associated with the mirror body, the actuator being configured to displace the mirror body relative to the support structure in at least one degree of freedom.

Abstract: A mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure of a reticle arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source that emits projection light, at least one illumination beam path, and a first diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane of the illumination beam path, that is optically conjugate with respect to the object plane. The mask inspection microscope has at least one further diaphragm for generating the resultant intensity distribution. The first diaphragm and the at least one further diaphragm influence the resultant intensity distribution of the projection light at least partly at different locations of the pupil plane.

Abstract: An illuminating system for transmitted-light microscopes has a illuminator unit seated on a bracket. A condenser is mounted on the bracket by way of a condenser holder and is rotatable with respect to the bracket. The condenser has an integrated modulator slider that slidably extends through the condenser. The bracket has an upright portion with a window through which the modulator slider may be fed in the direction facing away from the operator. the bracket may be provided with a stand mount.

Abstract: The invention provides a method for the magnified depiction of samples, wherein at least two sections from a sample, which are present on at least one sample carrier, are depicted in magnified form using an apparatus for the magnified depiction of samples, wherein the sample carrier is connected to the apparatus via a sample carrier holder, wherein the position of the depicted sample carrier regions in relation to the apparatus and the magnification stage used are recorded, at least one selected feature contained in the image information from the sections depicted in magnified form, particularly at least one suitable contour and/or structure, is/are used to define local coordinate systems, which are specific to the respective section, for the at least two sections depicted in magnified form, at least one region within at least one of the sections depicted in magnified form is/are selected (selection region) and the relative position of this at least one selection region in relation to the local coordinate sys

Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.

Abstract: The present invention refers to an apparatus and a method for investigating an object with a scanning particle microscope and at least one scanning probe microscope with a probe, wherein the scanning particle microscope and the at least one scanning probe microscope are spaced with respect to each other in a common vacuum chamber so that a distance between the optical axis of the scanning particle microscope and the measuring point of the scanning probe microscope in the direction perpendicular to the optical axis of the scanning particle microscope is larger than the maximum field of view of both the scanning probe microscope and the scanning particle microscope, wherein the method comprises the step of determining the distance between the measuring point of the scanning probe microscope and the optical axis of the scanning particle microscope.

Abstract: An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane. The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

Abstract: Techniques for collecting and processing complex OCT data to detect localized motion contrast information with enhanced accuracy and sensitivity are presented. In a preferred embodiment, vector differences between complex OCT signals taken at the same location on the sample are used to detect blood flow in the retina. Additional embodiments involving non-linear intensity weighting of the motion contrast information, normalization of the vector difference amplitudes, and calculating the absolute value of the standard deviation of Doppler signal are described. Image processing techniques to enhance the images resulting from these motion contrast techniques are also presented.

Abstract: A family of microscopes with illumination systems directing a sheet of light having an approximately planar extension in an illumination axis of an illumination beam path and in a transverse axis orthogonally oriented to the illumination axis. The microscopes have detection devices used to detect light that is emitted by a sample region. The detection devices including a detection lens system disposed in the detection beam path and an optical detection element spaced from a front lens of the detection lens system and independently adjustable thereof. The optical detection element continuously varies the size of a detection image field and/or continuously displaces a focal plane of detection in the P-region.

Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.

Abstract: An illumination optical system for projection lithography has an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optical system divides a bundle of the illumination light into a plurality of part bundles, which are allocated to various illumination directions of the object field illumination. The illumination optical system is configured in such a way that at least some of the part bundles are superimposed on one another in a first superimposition plane according to a first superimposition specification and in a second superimposition plane, which is spaced apart from the first superimposition plane, according to a second superimposition specification. The result is an illumination optical system, in which an influencing and/or a monitoring of an illumination intensity distribution over the object field is made possible, as far as possible without influencing an illumination angle distribution.

Abstract: The disclosure provides a projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask. The mask has a first pattern area with a first subpattern, and at least one second pattern area, arranged laterally offset from the first pattern area, with a second subpattern. The first subpattern is irradiated during a first illumination time interval with a first angular distribution, adapted to the first subpattern, of the illumination radiation. Thereafter, the second subpattern is irradiated during the second illumination time interval with a second angular distribution, adapted to the second subpattern, of the illumination radiation, said second angular distribution differing from the first angular distribution.

Abstract: A linear motion machine includes a base having an upper surface configured to support one or more work pieces and an instrument movably mounted to the base via a plurality of guideways permitting movement of the instrument relative to the base along three axes. At least one of the pluralities of guideways includes an elongated guideway member made of a plurality of elongated generally planar web members. Each of the elongated generally planar web members has a length and a pair of opposite side edges running along the length. The plurality of elongated generally planar web members are bonded together at least at one or more of the side edges to form the elongated guideway member. The elongated guideway member includes a ceramic material.

Abstract: A metrology system serves to examine an object arranged in an object field using EUV illumination light. An illumination optics of the metrology system has a collector mirror which is arranged in the beam path directly downstream of an EUV light source. Downstream of the collector mirror, less than three additional illumination mirrors are arranged in the beam path between the collector mirror and the object field. An intermediate focus is arranged in the beam path between the collector mirror and the additional illumination mirror. The metrology system further includes a magnifying imaging optics for imaging the object field into an image field in an image plane. As a result a metrology system is obtained which comprises an illumination optics that ensures an efficient illumination of the object field by means of illumination parameters which are well adapted to the illumination situation of current EUV projection exposure apparatuses.

Abstract: A method for performing a corneal ablation procedure on an eye of a patient including determining a refractive correction for the eye and determining a first parameter corresponding to the refractive correction or a condition of the patient. An ablation profile is selected that includes a refractive correction component and a pre-compensating component that is selected based on the first parameter. The ablation profile is configured to promote a controlled induction of a higher order aberration, where the pre-compensating component limits the induction of the higher order aberration to be within a predefined range. The cornea is ablated using the selected ablation profile.