Abstract: The invention relates to a gas for removing deposits by a gas-solid reaction. This gas includes a hypofluorite that is defined as being a compound having at least one OF group in the molecule. Various deposits can be removed by the gas, and the gas can easily be made unharmful on the global environment after the removal of the deposits, due to the use of a hypofluorite. The gas may be a cleaning gas for cleaning, for example, the inside of an apparatus for producing semiconductor devices. This cleaning gas comprises 1-100 volume % of the hypofluorite. Alternatively, the gas of the invention may be an etching gas for removing an unwanted portion of a film deposited on a substrate. The unwanted portion can be removed by this etching gas as precisely as originally designed, due to the use of a hypofluorite. The invention further relates to a method for removing a deposit by the gas.

Abstract: A resist protective coating material is provided comprising an ?-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F.

Abstract: A polymer comprising recurring units of (1a) or (1b) wherein R1 is an acid labile group, adhesive group or fluoroalkyl, R2 is H, F, alkyl or fluoroalkyl, R3 and R4 each are a single bond, alkylene or fluoroalkylene, R5 is H or an acid labile group, “a” is 1 or 2, 0<U11<1 and 0<U12<1 and having a Mw of 1,000–500,000 is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance.

Abstract: A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.

Abstract: The present invention provides novel compounds, 2,4,4,4-tetrafluoro-1-butene and (E)- and (Z)-1,1,1,3-tetrafluoro-2 butenes. Furthermore, the present invention provides the following novel first and second processes for producing 2,4,4,4-tetrafluoro-1-butene, (E)- and (Z)-1,1,1,3-tetrafluoro-2-butenes, and 1,1,3-trifluorobutadiene. The first process is a process for producing 2,4,4,4-tetrafluoro-1-butene by heating 1,1,1,3,3-pentaflurobutane at from about 200° C. to about 700° C. The second process is a process for producing (E)- and (Z)-1,1,1,3-tetrafluoro-2-butenes by bringing 1,1,1,3,3-pentafluorobutane with a base. By the first and second processes, it is possible to obtain respective target fluorobutenes with high selectivity. In third to fifth processes, 2,4,4,4-tetrafluoro-1-butene, (E)- and (Z)-1,1,1,3-tetrafluoro-2-butene, and 1,1,3,-trifluorobutadiene can be produced by heating 1,1,1,3,3-pentafluorobutane in the presence of a catalyst.

Abstract: A glass antenna for a vehicle includes: a window to be disposed along a metal window frame. The window includes a first wire, a second wire and a heating conductor wire. The first wire is capacitive-coupled with a part of the metal window frame. The second wire is capacitive-coupled with the heating conductor wire. The first wire and the second wire are connected with each other.

Abstract: The invention relates to first, second and third glasses for wavelength division multiplexing optical filters. The first glass contains 50–65 wt % of SiO2, 5–25 wt % of Na2O, 4–20 wt % of K2O, 0–20 wt % of CaO, 0–10 wt % of MgO, 0–10 wt % of BaO, 0–10 wt % of Al2O3, and 0–10 wt % of TiO2. The second glass contains 35–55 wt % of SiO2, 10–30 wt % of TiO2, 4–20 wt % of ZrO2, 5–25 wt % of Na2O, 0–10 wt % of Al2O3, 0–20 wt % of CeO2, 0–5 wt % of Li2O, 0–20 wt % of K2O, and 0–3 wt % of at least one metal oxide selected from MgO, CaO, SrO, BaO, and ZnO. The third glass contains 35–55 wt % of SiO2, 0–20 wt % of Al2O3, 0–10 wt % of B2O3, 1–35 wt % of TiO2, 1–15 wt % of CeO2, 0–10 wt % of Li2O, 5–25 wt % of Na2O, and 0–20 wt % of K2O.

Abstract: An antenna for vehicle, i.e. a wire antenna being arranged on the surface of the window glass of an automobile or the like, comprising a first element having a length extending from a first feeding point equal to any one of ¼, ¾ or 5/4 of the wavelength of a transmitting/receiving radio wave, and a second closed loop element having a length extending from a second feeding point, provided in the vicinity of the first feeding point, while surrounding the first element not shorter than one wavelength of the transmitting/receiving radio wave.

Abstract: Optically active (R)-1-(4-trifluoromethylphenyl)ethylamine is a novel compound as an important intermediate for medicines and agricultural chemicals. This compound can be obtained with high optical purity and high yield by a process including the steps of (a) a dehydrocondensation of 4?-(trifluoromethyl)acetophenone and an optically active (R)-1-phenylethylamine to obtain an optically active imine; (b) asymmetrically reducing the imine into an optically active secondary amine; (c) reacting the amine with an organic acid (phthalic acid or benzenesulfonic acid), thereby obtaining a product that is a phthalate of or benzenesulfonate of the amine; (d) subjecting the product of the step (c) to a hydrogenolysis, thereby obtaining a product that is a phthalate of or benzenesuilfonate of optically active (R)-1-(4-trifluoromethylphenyl)ethylamine; and (e) neutralizing the product of the step (d) into the optically active (R)-1-(4-trifluoromethylphenyl)ethylamine.

Abstract: A process for producing an ?-substituted acrylic acid ester represented by the formula [1], wherein each of R1 and R2 is independently a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, includes reacting an ?-substituted acrylic acid anhydride represented by the formula [7], with 1,1-bis(trifluoromethyl)-1,3-diol represented by the formula [2].

Abstract: A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance

Abstract: In an antenna coil device 11, a coil portion 12 having a lead wire 2 wound around a magnetic core 1 is mounted on a case 3 made of plastic resin, and on one side of the case 3, terminal boards 4 and 5 that electrically connect one end and the other end of the lead wire 2 of the coil portion 12 to an external device are placed in a protruding manner. A through hole 4D is provided in an inserting end portion 4C of the terminal board 4, a through hole 5H is provided in a central flat portion 5G of the terminal board 5, and the two through holes 4D and 5H are placed opposite each other. This reduces stray capacitance caused between the two terminal boards 4 and 5 connected to both ends of the coil portion 12, and allows a self resonance frequency band where an impedance is equal to or above a predetermined value to be shifted to a high frequency side.

Abstract: The present invention relates to a fluorine-containing copolymer. This fluorine-containing copolymer includes (a) a first unit derived from ?-trifluoromethyl acrylic ester represented by the following general formula (1); and (b) a second unit derived from a vinyl monomer, where R1 is an organic group containing at least one fluorine atom.

Abstract: A ternary copolymer comprising units of ?-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of ?-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.

Abstract: A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.

Abstract: In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material.

Abstract: A chemically amplified resist composition using an alternating copolymer of ?-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.