Patents Assigned to Central Glass Co., Ltd.
  • REFRIGERANT CIRCULATION DEVICE, METHOD FOR CIRCULATING REFRIGERANT AND METHOD FOR SUPPRESSING ISOMERIZATION
    Publication number: 20160200955
    Abstract: The present invention provides a heat pump device and an organic Rankine cycle device that are capable of maintaining a stable thermal cycle even when an HFO or HCFO is used as the refrigerant. The refrigerant circulation device uses a refrigerant, wherein the refrigerant comprises a hydrofluoroolefin or hydrochlorofluoroolefin having a carbon-carbon double bond within the molecular structure, and a reaction suppression unit which suppresses an isomerization reaction of the refrigerant is provided within the refrigerant circulation circuit.
    Type: Application
    Filed: October 23, 2014
    Publication date: July 14, 2016
    Applicants: MITSUBISHI HEAVY INDUSTRIES, LTD., CENTRAL GLASS CO., LTD.
    Inventors: Kenji UEDA, Naoki KOBAYASHI, Yoshinori AKAMATSU, Fuyuhiko SAKYU, Yoshio NISHIGUCHI
  • INFRARED REFLECTIVE FILM, AND LAMINATED GLASS EMPLOYING SAME
    Publication number: 20160085002
    Abstract: The present invention has the objective of providing an infrared reflective film by means of which it is possible to achieve an effective heat-shielding performance with a smaller number of layers than hitherto using a construction employing specified infrared reflective layers. Solution Means The infrared reflective film of the present invention has at least two infrared reflective layers and, of these infrared reflective layers, the center reflective wavelength of at least one infrared reflective layer is between 1200 and 1300 nm. Furthermore, the laminated glass of the present invention is formed by interposing this infrared reflective film between two sheets of intermediate film, and laminating these between two sheets of glass.
    Type: Application
    Filed: May 23, 2014
    Publication date: March 24, 2016
    Applicants: Nippon Kayaku Co., Ltd., BASF SE, Central Glass Co., Ltd.
    Inventors: Kouichi TANAKA, Hideyoshi FUJISAWA, Kensuke IZUTANI, Satoshi NISHIYAMA, Atsushi TAKAMATSU, Akira MATSUMOTO, Masayoshi FURUKAWA
  • Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use
    Publication number: 20160053129
    Abstract: Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art.
    Type: Application
    Filed: November 5, 2015
    Publication date: February 25, 2016
    Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Daniel Paul Sanders, Masaki Fujiwara, Yoshiharu Terui
  • Non-ionic photo-acid generating polymers for resist applications
    Patent number: 9244345
    Abstract: Photo-acid generating vinyl polymerizable monomers (PAG monomers) were prepared comprising sulfonate ester groups of N-hydroxide imides. The photo-acid generating portion of the PAG monomer is linked to a polymerizable portion of the monomer by an amide linking group. Photo-acid generating polymers (PAG polymers) of the PAG monomers show high sensitivity to extreme ultraviolet radiation (13.5 nm) and much less sensitivity to far ultraviolet wavelengths (193 nm, 248 nm). The PAG polymers also exhibit thermal and chemical amplification properties useful for forming high resolution positive tone or negative tone lithographic resist patterns.
    Type: Grant
    Filed: November 6, 2014
    Date of Patent: January 26, 2016
    Assignees: International Business Machines Corporation, Central Glass Co., LTD.
    Inventors: Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong, Rudy J. Wojtecki, Manabu Yasumoto
  • Sulfonamide-containing photoresist compositions and methods of use
    Patent number: 9223209
    Abstract: Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: December 29, 2015
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Daniel Paul Sanders, Masaki Fujiwara, Yoshiharu Terui
  • Sulfonamide-containing topcoat and photoresist additive compositions and methods of use
    Patent number: 9223217
    Abstract: Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: December 29, 2015
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Daniel Paul Sanders, Masaki Fujiwara, Yoshiharu Terui
  • LITHIUM OXYGEN BATTERY AND ELECTROLYTE COMPOSITION
    Publication number: 20150280296
    Abstract: A battery employing lithium-oxygen chemistry may include an anode comprising lithium, an electrolyte, and a porous cathode. The electrolyte may include a lithium-containing salt; a partially fluorinated ether, such as 2,2-bis(trifluoromethyl)-1,3-dioxolane; and a co-solvent selected from the group consisting of ethers, amides, nitriles, and combinations thereof. In some examples, the electrolyte does not include a cyclic carbonate ester, a sulfolane, or a sulfolane derivative. The porous cathode allows oxygen to come into contact with the electrolyte.
    Type: Application
    Filed: March 28, 2014
    Publication date: October 1, 2015
    Applicants: Central Glass Co., Ltd., International Business Machines Corporation
    Inventors: Seok J. Kang, Bryan D. McCloskey, Takashi Mori, Satoru Narizuka, Gregory M. Wallraff
  • Method for preparing fluorinated nanodiamond liquid dispersion
    Patent number: 8790541
    Abstract: The present invention herein provides a method for preparing a dispersion of fluorinated nanodiamond particles, which can be used in, for instance, an abrasive, a lubricant, and a heat-exchanging fluid medium, which is stable over a long period of time on the order of not less than 120 hours and which has a viscosity, as determined at 20° C., of not less than 3 cP. This dispersion can be prepared by blending fluorinated nanodiamond particles with a first liquid having a viscosity, as determined at 20° C., of not higher than 2.5 cP to thus form a suspension, classifying the suspension to give a classified suspension, and then blending the classified suspension with a second liquid having a viscosity value, as determined at 20° C., of not less than 4 cP.
    Type: Grant
    Filed: June 5, 2007
    Date of Patent: July 29, 2014
    Assignee: Central Glass Co., Ltd.
    Inventor: Akifumi Yao
  • Polyamide membranes with fluoroalcohol functionality
    Patent number: 8754139
    Abstract: A polymeric membrane includes an active layer on a support. The active layer includes a polymer with a backbone, and the backbone has attached thereto at least one fluoroalcohol moiety.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: June 17, 2014
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Robert David Allen, Na Young-Hye, Ratnam Sooriyakumaran, Masaki Fujiwara, Kazuhiro Yamanaka
  • PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY
    Publication number: 20130260313
    Abstract: A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L?-C(CF3)2(OH). L? is a divalent linking group comprising at least one carbon and the starred bond of L? is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.
    Type: Application
    Filed: March 31, 2012
    Publication date: October 3, 2013
    Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert David Allen, Phillip Joe Brock, Masaki Fujiwara, Kazuhiko Maeda, Hoa D. Truong
  • Compound
    Patent number: 8497395
    Abstract: A compound represented by general formula (c1) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation or a metal cation).
    Type: Grant
    Filed: December 7, 2011
    Date of Patent: July 30, 2013
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Central Glass Co., Ltd.
    Inventors: Yoshiyuki Utsumi, Masaru Takeshita, Yoshitaka Komuro
  • Polymers bearing pendant pentafluorophenyl ester groups, and methods of synthesis and functionalization thereof
    Patent number: 8455612
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Grant
    Filed: March 8, 2012
    Date of Patent: June 4, 2013
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Masaki Fujiwara, James Lupton Hedrick, Daniel Paul Sanders, Yoshiharu Terui, Manabu Yasumoto
  • Cyclic carbonyl compounds with pendant carbonate groups, preparations thereof, and polymers therefrom
    Patent number: 8410290
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: April 2, 2013
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Masaki Fujiwara, James Lupton Hedrick, Daniel Paul Sanders, Manabu Yasumoto
  • Cyclic carbonyl compounds with pendant carbonate groups, preparations thereof, and polymers therefrom
    Patent number: 8389746
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: March 5, 2013
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Masaki Fujiwara, James Lupton Hedrick, Daniel Paul Sanders, Manabu Yasumoto
  • CYCLIC CARBONYL COMPOUNDS WITH PENDANT CARBONATE GROUPS, PREPARATIONS THEREOF, AND POLYMERS THEREFROM
    Publication number: 20120252983
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Application
    Filed: June 8, 2012
    Publication date: October 4, 2012
    Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Masaki Fujiwara, James L. Hedrick, Daniel P. Sanders, Manabu Yasumoto
  • CYCLIC CARBONYL COMPOUNDS WITH PENDANT CARBONATE GROUPS, PREPARATIONS THEREOF, AND POLYMERS THEREFROM
    Publication number: 20120245304
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Application
    Filed: June 8, 2012
    Publication date: September 27, 2012
    Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Masaki Fujiwara, James L. Hedrick, Daniel P. Sanders, Manabu Yasumoto
  • Fit up pin for automotive glass
    Patent number: D679639
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: April 9, 2013
    Assignee: Central Glass Co., Ltd.
    Inventor: Masanori Yamade
  • Fit up pin for automotive glass
    Patent number: D679640
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: April 9, 2013
    Assignee: Central Glass Co., Ltd.
    Inventor: Masanori Yamade
  • Fit up pin for automotive glass
    Patent number: D679641
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: April 9, 2013
    Assignee: Central Glass Co., Ltd.
    Inventor: Masanori Yamade
  • Fit up pin for automotive glass
    Patent number: D680044
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: April 16, 2013
    Assignee: Central Glass Co., Ltd.
    Inventor: Masanori Yamade