Abstract: What is disclosed is a dry etching gas containing 1,3,3,3-tetrafluoropropene, wherein 1,3,3,3-tetrafluoropropene has purity of 99.5 mass % or more, and a total of concentration of each mixed metal component of Fe, Ni, Cr, Al, and Mo is 500 mass ppb or less. Furthermore, regarding to the dry etching gas, it is preferable that a content of nitrogen is 0.5 volume % or less, and that a content of water is 0.05 mass % or less. In a dry etching with a plasma gas obtained by making a dry etching gas into plasma, the dry etching gas of the present invention can improve etching selectivity of silicon-based material with respect to a mask.

Abstract: To provide high sensitivity to high frequency band signals, it is provided an antenna to be arranged on a window glass of a vehicle, the antenna comprising: a planar conductor to be arranged on the window glass; a slot formed as a rectangular region obtained by removing a conductor from the planar conductor; a power feeding unit arranged on a first side of the slot; and an element extending from a core-side terminal of the power feeding unit to a second side of the slot opposite to the first side, the slot being disposed at a position offset from a center of the planar conductor in a direction toward the first side.

Abstract: The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing cyclopropane monoester is obtained by: forming a fluorine-containing cyclic sulfate with the use of a fluorine-containing dial compound and sulfuryl fluoride (as a cyclic sulfuric esterification step); reacting the fluorine-containing cyclic sulfate with a malonic diester, thereby forming a fluorine-containing cyclopropane diester (as a cyclopropanation step); and hydrolyzing the fluorine-containing cyclopropane diester (as a hydrolysis step).

Abstract: To provide excellent reception performance on a narrow area of an automotive window glass, it is provided an antenna to be arranged on a window glass of a vehicle, the antenna comprising: a core-side power feeding unit; an earth-side power feeding unit; a first element extending from the core-side power feeding unit; and a second element extending at an angle of approximately 90 degrees with respect to the first element from the core-side power feeding unit, the first element having a length of 3a?/4+? and the second element having a length of a?/4??, or the first element having a length of 3a?/4?? and the second element having a length of a?/4+?, where A refers to a wavelength of a reception frequency, a refers to a wavelength shortening rate of glass, and ? refers to an offset length for each of the first element and the second elements.

Abstract: A garnet-type oxide sintered body according to the present invention includes crystal grains composed of a garnet-type oxide containing Li, La and Zr and a grain boundary composition containing boron and silicon and filling gaps between the crystal grains. The oxide sintered body has the characteristics of high density and high ion conductivity. A production method of the sintered body includes a step of providing a precursor material by mixing a garnet-type oxide powder containing Li, La and Zr with a sintering aid; a step of forming the precursor material into a formed body; and a sintering step of sintering the formed body. The sintering aid contains oxygen, boron, silicon and lithium. The oxygen and boron, or the oxygen and silicon, contained in the sintered aid form a compound.

Abstract: Disclosed is an industrial method for efficient production of an ?,?-difluoroaldehyde compound, which includes reaction of an ?,?-difluoroacetate with hydrogen gas (H2) in the presence of a ruthenium catalyst and a base. By the adoption of specific reaction conditions (catalyst, base, pressure etc.), it is possible to produce the target ?,?-difluoroaldehyde compound with a high conversion rate and high selectivity.

Abstract: A liquid composition according to one embodiment of the present invention contains 0.0001 mol % to 40 mol % (Z)-1,2-dichloro-3,3,3-trifluoropropene (1223Z) and 99.9999 mol % to 60 mol % (E)-1,2-dichloro-ethylene (t-DCE). The liquid composition has less influence on the global environment and azeotropic (or azeotrope-like) properties. There occurs practically no composition change even when the liquid composition is used in an open system or used for a long term. Further, it is less likely that there will occur a composition change even when the liquid composition is recovered by distillation. The liquid composition is thus suitably usable as a cleaning agent (solvent). In particular, the liquid composition of 90 mol % or less of t-DCE is classified as non-hazardous under the Fire Serves Act.

Abstract: It is possible to produce an optically active fluoroalkyl chloromethyl alcohol with a high optical purity and a good yield by treating a fluoroalkyl chloromethyl ketone with a microorganism having an activity for asymmetrically reducing the ketone or an enzyme having the activity. Then, it is possible to obtain a fluoroalkyl ethylene oxide by treating the alcohol with a base. Industrial implementation of the production method of the present invention is easy.

Abstract: To provide a manufacturing method with which lithium difluorophosphate powder can be recovered from a lithium difluorophosphate solution. A method for manufacturing lithium difluorophosphate powder is used which includes the steps of precipitating solid lithium difluorophosphate by adding a poor solvent to a solution in which lithium difluorophosphate is dissolved in a main solvent, and obtaining lithium difluorophosphate powder by solid-liquid separation of the solid lithium difluorophosphate from the liquid containing the main solvent and the poor solvent, wherein the relational expression between the octanol/water partition coefficient PP of the main solvent and the octanol/water partition coefficient PA of the poor solvent is defined by the following formula (1). PA??4/3×PP+1.

Abstract: Disclosed is a practical method for production of 3,3-difluoro-2-hydroxypropionic acid, which is important as pharmaceutical and agrichemical intermediates. The method includes forming a 4,4-difluoro-2,2-dichloro-3-oxobutanoic acid ester by reaction of a 4,4-difluoro-3-oxobutanoic acid ester with chlorine (Cl2), forming 3,3-difluoro-1,1-dichloro-2-propanone by reaction of the chlorination product with an acid, and then, reacting the degradation product with a basic aqueous solution.

Abstract: An electrolyte for a non-aqueous electrolyte battery includes a non-aqueous organic solvent and at least lithium hexafluorophosphate as a solute, characterized by further including 10 to 1000 mass ppm of a phosphorus-containing acidic compound and 0.01 to 10.0 mass % of a difluorophosphate. The phosphorus-containing acidic compound is preferably at least one selected from the group consisting of HPF6, HPO2F2, H2PO3F and H3PO4. By the use of such an electrolyte, it is possible to provide the non-aqueous electrolyte lithium battery capable of maintaining high discharge capacity even after repeated charge/discharge cycles under a high temperature environment.

Abstract: What is disclosed is a liquid composition containing: 80 mol % to 99.9999 mol % of (Z)-1,2-dichloro-3,3,3-trifluoropropene (1223Z) and 0.0001 mol % to 20 mol % of (E)-1,2-dichloro-3,3,3-trifluoropropene (1223E). The liquid composition has small impact on the global environment and exerts azeotrope-like properties. Therefore, the composition of the liquid composition is not substantially changed even when the liquid composition is used in an open system or used for a long period. The composition of the liquid composition is also rarely changed even when the liquid composition is recovered by distillation. Therefore, the liquid mixture according to the present invention can be used suitably as a cleaning agent (a solvent).

Abstract: Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

Abstract: A heat transmission method using a high-temperature heat pump system accommodating a heat transmission composition includes the step of evaporating the heat transmission composition, the step of compressing the heat transmission composition, the step of condensing the heat transmission composition, and the step of decreasing the pressure of the heat transmission composition at a temperature of 70° C. or higher, which are performed sequentially. The heat transmission composition contains cis-1,3,3,3-tetrafluoropropene at a mass ratio of 95.0% by mass or more and 99.9% by mass or less, and contains trans-1,3,3,3-tetrafluoropropene or 2,3,3,3-tetrafluoropropene at a mass ratio of 0.1% by mass or more and 5.0% by mass or less; and the heat transmission composition has a condensation temperature of 70° C. or higher.

Abstract: Disclosed is a purification method for removing a metal component from a fluorine compound gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine compound gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. It is preferable for the fluorine compound gas to contain at least one kind selected from the group consisting of CIF, CIF3, IF5, IF7, BrF3, BrF5, NF3, WF6, SiF4, CF4, SF6 and BF3. It is also preferable for the metal fluoride to be an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine compound gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.

Abstract: Disclosed is a purification method for removing a metal component from a fluorine gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. The content of the hydrogen fluoride in the fluorine gas before the removing step is 50 volume ppm to 1 volume %, relative to the total volume of the fluorine gas, the hydrogen fluoride and the metal component. The metal fluoride is preferably an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.

Abstract: An automotive glass antenna includes (a) a defogger having first and second bus bars; (b) a first L-shape auxiliary element connected to a lower end of the first bus bar; (c) a second L-shape auxiliary element connected to an upper end of the second bus bar; (d) a feed point provided at a position near an upper portion of the first bus bar or a lower portion of the second bus bar; and (e) a main element that includes a main vertical element extending along an outside of the first or second bus bar to achieve a capacitive coupling therewith and a main horizontal element extending from the feed point in a substantially horizontal direction. This antenna is capable of receiving FM radio broadcast waves with high gain, even if it is installed in a limited blank space around the defogger.

Abstract: An etching fault is suppressed by use of an etching gas containing iodine heptafluoride. Provided is an attached substance removing method of removing an attached substance containing an iodine oxide attached to a component included in a chamber or a surface of a pipe connected with the chamber by use of a cleaning gas containing a fluorine-containing gas. Also provided is a dry etching method, including the steps of supplying an etching gas containing an iodine-containing gas into a chamber to perform etching on a surface of a substrate; and after the etching is performed on the surface of the substrate, removing an attached substance containing an iodine oxide attached to a component included in the chamber or a surface of a pipe connected with the chamber by use of a cleaning gas containing a fluorine-containing gas.

Abstract: An object of the present invention is to provide a heat source machine that can reduce the environmental load and can output the thermal energy with high temperature, and a method for operating the heat source machine. A heat source machine of the present invention includes a centrifugal compressor, condensers, expansion valves, and an evaporator, in which a refrigerant enclosed in a refrigerant circulation circuit configured by sequentially connecting the centrifugal compressor, the condensers, the expansion valves, and the evaporator contains a composition A, a composition B, or a composition C, the composition A has 4 or 5 carbon atoms, 6 or more fluorine atoms, and one or more oxygen atoms, the composition B has 4 or 5 carbon atoms and 6 or more fluorine atoms, the composition C has 3 carbon atoms, 2 chlorine atoms, 3 fluorine atoms, and an intramolecular double bond, and the composition A, the composition B, or the composition C has a boiling point of 20° C. or more and a critical temperature of 180° C.

Abstract: A processing method of a semiconductor substrate according the present invention includes: cleaning a surface of the semiconductor substrate with a water-based cleaning liquid; and drying the semiconductor substrate by replacing the water-based cleaning liquid attached to the surface of the semiconductor substrate with a supercritical fluid, characterized by using as the supercritical fluid a C2-C6 fluoroalcohol-containing solvent whose Fe, Ni, Cr, Al, Zn, Cu, Mg, Li, K, Na and Ca contents are each 500 mass ppb or less. In this processing method, it is possible to reduce the amount of fluorine atoms released in the supercritical fluid.