Patents Assigned to Central Glass Company, Limited
  • Patent number: 10121647
    Abstract: An etching fault is suppressed by use of an etching gas containing iodine heptafluoride. Provided is an attached substance removing method of removing an attached substance containing an iodine oxide attached to a component included in a chamber or a surface of a pipe connected with the chamber by use of a cleaning gas containing a fluorine-containing gas. Also provided is a dry etching method, including the steps of supplying an etching gas containing an iodine-containing gas into a chamber to perform etching on a surface of a substrate; and after the etching is performed on the surface of the substrate, removing an attached substance containing an iodine oxide attached to a component included in the chamber or a surface of a pipe connected with the chamber by use of a cleaning gas containing a fluorine-containing gas.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: November 6, 2018
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Akiou Kikuchi, Masanori Watari, Kenji Kameda, Shin Hiyama, Yasutoshi Tsubota
  • Patent number: 10118856
    Abstract: What is disclosed is a lead-free glass, which is a V2O5—TeO2—RO (at least one selected from the group consisting of MgO, CaO, SrO, and BaO)—ZnO glass and has a low softening point, comprising: 5-55 wt % of V2O5, 5-75 wt % of TeO2, 1-25 wt % of RO (at least one selected from the group consisting of MgO, CaO, SrO, and BaO) in total, 0.1-6 wt % of ZnO, and 0.1-3 wt % of R2O (at least one selected from the group consisting of Li2O, Na2O, and K2O) in total. This glass can be used as a sealing material providing fluidity which is capable of being sealed at a temperature of 400° C. or less.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: November 6, 2018
    Assignee: Central Glass Company, Limited
    Inventors: Masamichi Yanagisawa, Jun Hamada
  • Publication number: 20180305252
    Abstract: The present invention provides an electromagnetic shielding metal-coated glass fiber filler to be used as a composite with resin, the glass fiber filler including: glass fiber; and a metal coating in the longitudinal direction of the glass fiber, wherein the metal coating is made of an alloy containing a first metal consisting of zinc and a second metal consisting of a metal having a lower oxidation-reduction potential than zinc (i.e., being more easily oxidized than zinc), the second metal is at least one selected from the group consisting of barium, strontium, calcium, magnesium, beryllium, aluminum, titanium, zirconium, manganese, and tantalum, and the alloy contains the first metal in an amount of 50% by mass or more.
    Type: Application
    Filed: October 31, 2016
    Publication date: October 25, 2018
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Yuya ASAKAWA, Masanori SAITO
  • Patent number: 10101065
    Abstract: A heat transmission method using a heat pump system according to the present invention uses a heat transmission medium containing at least one compound represented by general formula (1). In the formula, R1 is a CHmF3-m group, m is an integer of 0 or more and 3 or less, R2, R3 and R4 are each independently a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or a hydrogen atom, and at least one fluorine atom is contained in a molecule. The heat transmission method includes (A) step of gasifying the heat transmission medium; (B) step of compressing the heat transmission medium into a supercritical state; (C) step of causing heat exchange between the heat transmission medium in the supercritical state and a medium to be heated; and (D) step of decreasing the pressure of the heat transmission medium.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: October 16, 2018
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Yoshio Nishiguchi, Satoru Okamoto, Masatomi Kanai
  • Patent number: 10090148
    Abstract: A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer. (R1 represents a C1-C18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). R2 mutually independently represents a monovalent organic group having a C1-C18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). “a” is an integer of from 0 to 2.
    Type: Grant
    Filed: July 4, 2013
    Date of Patent: October 2, 2018
    Assignee: Central Glass Company, Limited
    Inventors: Takashi Saio, Soichi Kumon, Masanori Saito, Shinobu Arata
  • Patent number: 10087284
    Abstract: Disclosed in the present invention are a fluorine-containing polymerizable compound of the general formula (1) and a polymer compound obtained therefrom: where A represents a single bond, an oxygen atom, a sulfur atom, SO2, CH2, CO, C(CH3)2, C(CH3)(CH2CH3), C(CF3)2, C(CH3)(C6H5), CH2—C6H4—CH2 or a divalent organic group obtained by elimination of two hydrogen atoms from benzene, biphenyl, naphtharene, cyclohexene or fluorene; and a and b each independently represent an integer of 0 to 2 and satisfy a relationship of 1?a+b?4. The thus-obtained polymer compound combines adequate hydrophilicity and high transparency with low water adsorption of fluorine-containing compound.
    Type: Grant
    Filed: December 12, 2016
    Date of Patent: October 2, 2018
    Assignee: Central Glass Company, Limited
    Inventors: Junya Nakatsuji, Makoto Matsuura, Kazuhiro Yamanaka
  • Publication number: 20180265821
    Abstract: What is disclosed is a liquid composition containing: 80 mol % to 99.9999 mol % of (Z)-1,2-dichloro-3,3,3-trifluoropropene (1223Z) and 0.0001 mol % to 20 mol % of (E)-1,2-dichloro-3,3,3-trifluoropropene (1223E). The liquid composition has small impact on the global environment and exerts azeotrope-like properties. Therefore, the composition of the liquid composition is not substantially changed even when the liquid composition is used in an open system or used for a long period. The composition of the liquid composition is also rarely changed even when the liquid composition is recovered by distillation. Therefore, the liquid mixture according to the present invention can be used suitably as a cleaning agent (a solvent).
    Type: Application
    Filed: January 14, 2016
    Publication date: September 20, 2018
    Applicant: Central Glass Company, Limited
    Inventors: Hideaki IMURA, Naoto TAKADA
  • Patent number: 10077365
    Abstract: A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: September 18, 2018
    Assignee: Central Glass Company, Limited
    Inventors: Soichi Kumon, Takashi Saio, Masanori Saito, Shinobu Arata
  • Patent number: 10065912
    Abstract: An object of the present invention is to remove a compound A from “sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)” so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: September 4, 2018
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Takaaki Yoshimura, Toshihiko Oono, Shinya Akiba, Masaki Fujiwara
  • Publication number: 20180241082
    Abstract: An object of the present invention is to provide a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery capable of showing high output characteristics at a low temperature even after the battery is used to some extent, and capable of showing good high-rate properties, and further capable of showing sufficient performance again at low temperature even after stored at a high temperature. The present invention is characterized in the use of a nonaqueous electrolytic solution containing a nonaqueous organic solvent and an electrolyte dissolved in the nonaqueous organic solvent, the nonaqueous electrolytic solution comprising a difluoro ionic complex (1-Cis) in a cis configuration represented by the general formula (1-Cis), and at least one compound selected from the group consisting of a carbonate having an unsaturated bond, a carbonate having a fluorine atom, an acid anhydride, and a compound having an isocyanato group.
    Type: Application
    Filed: December 28, 2015
    Publication date: August 23, 2018
    Applicant: Central Glass Company, Limited
    Inventors: Katsutoshi SUZUKI, Toru TANAKA, Mikihiro TAKAHASHI, Kazunari TAKEDA
  • Patent number: 10050329
    Abstract: Disclosed is a window-glass antenna for a vehicle in which a conductive film is formed on the vehicle window glass, the antenna being provided in a film-removed portion formed between an opening edge of flange and an end edge of the conductive film. The antenna includes a first feeding point provided on the film-removed portion and close to the end edge of the conductive film, a second feeding point provided on the flange and at a location near the first feeding point, and a first substantially-U-shaped element connected with the first feeding point. The first substantially-U-shaped element is provided in a manner that a conductive-film-side line is arranged adjacent to the end edge of the conductive film, a tip of the conductive-film-side line is connected with a substantially-orthogonal line, and another tip of the substantially-orthogonal line is connected with a flange-side line arranged adjacent to the flange opening edge.
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: August 14, 2018
    Assignee: Central Glass Company, Limited
    Inventors: Hisashi Kobayashi, Kanya Hirabayashi
  • Patent number: 10047326
    Abstract: An azeotropic-like composition containing 2-chloro-1,3,3,3-tetrafluoropropene and 1-chloro-3,3,3-trifluoropropene is provided. The azeotropic-like composition according to the present invention is non-flammable, has little influence on the environment, and has substantially the same composition ratio in the liquid phase and the gas phase. By use of an azeotropic-like composition according to the present invention, a washing detergent, a solvent, a silicone solvent, a foaming agent, a coolant, a heating medium for a heat pump, and a high temperature working fluid that are non-flammable, have little influence on the environment, and have substantially the same composition ratio in a liquid phase and a gas phase thereof may be provided.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: August 14, 2018
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Masahiko Tani, Hideaki Imura, Yoshio Nishiguchi, Naoto Takada
  • Publication number: 20180222834
    Abstract: An object of the present invention is to remove a compound A from “sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)” so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).
    Type: Application
    Filed: March 30, 2017
    Publication date: August 9, 2018
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Takaaki YOSHIMURA, Toshihiko OONO, Shinya AKIBA, Masaki FUJIWARA
  • Publication number: 20180215689
    Abstract: A method for isomerizing a hydrohalofluoroolefin isomer to produce a corresponding hydrohalofluoroolefin isomer includes a step contacting a composition that contains at least a hydrohalofluoroolefin isomer and that has been adjusted to 100 ppm or lower in moisture concentration, with a catalyst in a gas phase, thereby obtaining a product. This method makes it possible to suppress the catalyst performance lowering.
    Type: Application
    Filed: May 27, 2016
    Publication date: August 2, 2018
    Applicant: Central Glass Company, Limited
    Inventors: Takamasa KITAMOTO, Satoru OKAMOTO, Masahiko TANI, Masatomi KANAI, Kohei SUMIDA
  • Patent number: 10037882
    Abstract: A method for cleaning a wafer that has a pattern of recessed and projected portions formed on a surface thereof and contains at least one element selected from titanium, tungsten, aluminum, copper, tin, tantalum, and ruthenium on a surface of a recessed portion of the pattern. The method at least includes a pre-treating step of holding a cleaning liquid at least in the recessed portion of the pattern; a protective film forming step of holding a protective film forming chemical liquid, which is a chemical liquid containing a water-repellant protective film forming agent, at least in the recessed portion of the pattern after the pre-treating step; and a drying step of removing the liquids from the pattern by drying. The cleaning liquid is acidic if the protective film forming chemical liquid is basic, or is basic if the protective film forming chemical liquid is acidic.
    Type: Grant
    Filed: September 8, 2014
    Date of Patent: July 31, 2018
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Masanori Saito, Takashi Saio, Soichi Kumon, Shinobu Arata
  • Publication number: 20180175446
    Abstract: A garnet-type oxide sintered body according to the present invention includes crystal grains composed of a garnet-type oxide containing Li, La and Zr and a grain boundary composition containing boron and silicon and filling gaps between the crystal grains. The oxide sintered body has the characteristics of high density and high ion conductivity. A production method of the sintered body includes a step of providing a precursor material by mixing a garnet-type oxide powder containing Li, La and Zr with a sintering aid; a step of forming the precursor material into a formed body; and a sintering step of sintering the formed body. The sintering aid contains oxygen, boron, silicon and lithium. The oxygen and boron, or the oxygen and silicon, contained in the sintered aid form a compound.
    Type: Application
    Filed: July 13, 2016
    Publication date: June 21, 2018
    Applicant: Central Glass Company, Limited
    Inventors: Tsutomu NISHIZAKI, Ryota ESAKI, Tetsuya TAMURA
  • Patent number: 9966575
    Abstract: A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), R1 represents a C1-C15 straight, C3-C15 branched or C3-C15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.
    Type: Grant
    Filed: July 14, 2014
    Date of Patent: May 8, 2018
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Yoshiharu Terui, Fumito Kobayashi, Yukari Hara, Ikunari Hara
  • Publication number: 20180117644
    Abstract: It is an object of the present invention to provide a method for effectively washing a used “sevoflurane storage container” without using expensive sevoflurane as a washing liquid. This object is achieved by employing the washing method, comprising the steps of: creating a state in which at least sevoflurane vapor is present in the storage container (step A); bringing a “liquid containing water as a major component” into contact with the inner wall of the sevoflurane storage container in the state in which sevoflurane vapor is present in the storage container and draining the liquid outside of the storage container while the liquid remains liquid after step A (step B); and introducing a drying gas into the storage container so as to drain the liquid remaining on the inner wall of the storage container together with the drying gas outside of the storage container after step B (step C).
    Type: Application
    Filed: December 22, 2016
    Publication date: May 3, 2018
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Katsumi IWAO, Takaaki YOSHIMURA, Toshihiko OONO, Shinya AKIBA, Masaki FUJIWARA
  • Publication number: 20180105840
    Abstract: The present invention provides a process for industrial production of chiral-1,1-difluoro-2-propanol. More specifically, a microorganism having the activity to cause asymmetric reduction of 1,1-difluoroacetone or an enzyme having the same activity is allowed to act on 1,1-difluoroacetone, whereby chiral-1,1-difluoro-2-propanol can be produced with high optical purity and in good yield. The process for production of the present invention is easy for industrial implementation.
    Type: Application
    Filed: March 2, 2016
    Publication date: April 19, 2018
    Applicants: PUBLIC UNIVERSITY CORPORATION TOYAMA PREFECTURAL UNIVERSITY, CENTRAL GLASS COMPANY, LIMITED
    Inventors: Yasuhisa ASANO, Kimiyasu ISOBE, Ryoko UEDA, Tetsuro NISHII, Akihiro ISHII
  • Patent number: 9932282
    Abstract: A method for producing 1-chloro-3,3,3-trifluoropropene efficiently from an intermediate product having a low reactivity is provided. A method for producing trans-1-chloro-3,3,3-trifluoropropene comprising reacting a halogenated hydrocarbon compound having 3 carbon atoms represented by Formula (1) shown below in a gas phase with hydrogen fluoride in the presence of chlorine is provided. C3HXClYFZ (1) wherein X is 2 or 3; and when X=2, Y is an integer from 1 to 4, Z is an integer from 0 to 3, and Y+Z=4; and when X=3, Y is an integer from 1 to 5, Z is an integer from 0 to 4, and Y+Z=5; provided that Formula (1) shown above represents a halogenated hydrocarbon compound having 3 carbon atoms excluding trans-1-chloro-3,3,3-trifluoropropene.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: April 3, 2018
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Satoru Okamoto, Fuyuhiko Sakyu, Masatomi Kanai, Takamasa Kitamoto