Patents Assigned to Chemicals Industries Co., Ltd.
  • Patent number: 6680040
    Abstract: The porous composite oxide particle is coated with a porous silica-based inorganic oxide layer, and also a substrate has a coating film with the fine particles thereon, which has a low refractive index and excellent in adhesion with a resin or the like, strength, the ability to reduce reflection and the like. The fine particles include porous composite oxide with silica and an inorganic oxide other than silica, wherein the fine particles are coated with a porous silica-based inorganic oxide layer having a thickness from 0.5 to 20 nm. The fine particles include preferably an organic group directly bonded to silicon, and SR/ST, the ratio of the molar amount of silicon having the organic group directly bonded thereto (SR) vs the molar amount of the total silicon (ST), is preferably in the range from 0.001 to 0.9.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: January 20, 2004
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Hiroyasu Nishida, Mitsuru Nakai, Michio Komatsu, Hiroo Yoshitome
  • Patent number: 6680348
    Abstract: A cement dispersant (especially a dispersant for concretes with ultrahigh performance) comprising as a main component a water-soluble amphoteric copolymer obtained by copolymerizing (A) a polyamide-polyamine of an alkylene oxide adduct thereof with (B) (meth)acrylic acid or an alkali metal, ammonium, or alkanolamine salt thereof and (C) a polyalkylene glycol ester of (meth)acrylic acid in an A/B/C ratio of (10-40)/(10-40)/(50-80) (wt. %); and a concrete composition (especially an ultral high-performance concrete) containing the dispersant. The dispersant satisfies all of a water-reducing effect, slump flow retention, strength development, etc.
    Type: Grant
    Filed: June 20, 2001
    Date of Patent: January 20, 2004
    Assignees: Sika Ltd., Toho Chemical Industry Co., Ltd.
    Inventors: Toshihiko Amaya, Akira Ikeda, Jun Imamura, Atsushi Kobayashi, Kaname Saito, Wernher M. Danzinger, Tetsu Tomoyose
  • Patent number: 6679971
    Abstract: The present invention provides a front plate for plasma display panels with the transparent substrate, electroconductive member and optical film fast adhered to each other, easily produced by a simple process, and excellent in productivity. The present invention further provides a method of producing the same. The present invention provides a front plate for plasma display panels comprising a transparent substrate laminated, at least on one side, with an electroconductive member and at least one type of optical film to form a monolithic structure, wherein (a) two types of adhesive layers of tackifier layer and heat-bond film are orderly placed between the optical film as the outermost layer and the adjacent member, and (b) the transparent substrate, electroconductive member and at least one type of optical film are pressed under heating.
    Type: Grant
    Filed: August 9, 2001
    Date of Patent: January 20, 2004
    Assignees: Nisshinbo Industries, Inc., Hasegawa Chemical Industry Co., Ltd.
    Inventors: Masashi Tone, Shun Hasegawa, Gen Masuda, Yasushi Hasegawa, Yatsuhiro Hasegawa, Shigekazu Hasegawa
  • Patent number: 6676920
    Abstract: Provided are magnesium hydroxide particles having a hexagonal crystal form and having an aspect ratio (H) which satisfies the following expression (I), 0.45·A·B<H<1.1·A·B  (I) (wherein H is an aspect ratio, A is an average secondary particle diameter (&mgr;m) of all of the particles measured by a laser diffraction scattering method and B is a specific surface area (m2/g) of all of the particles measured by a BET method), a flame-retardant comprising the particles, a flame-retardant resin composition comprising 100 parts by weight of a synthetic resin and a 5 to 300 parts by weight of the magnesium hydroxide particles, and a molded article therefrom. The magnesium hydroxide particles are hexagonal single crystals, the hexagonal form thereof are not necessarily required to be regular hexagonal, and the size thereof are not necessarily constant.
    Type: Grant
    Filed: August 11, 2000
    Date of Patent: January 13, 2004
    Assignee: Kyowa Chemical Industry Co., Ltd.
    Inventors: Shunji Oishi, Taro Ando, Makoto Yoshii, Wataru Hiraishi
  • Patent number: 6673975
    Abstract: The invention provides a process for production of high purity 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane (BPTMC) which comprises: (a) a reaction step wherein phenol is reacted with 3,3,5-trimethylcyclohexanone (TMC) in a slurry containing phenol adduct crystals of BPTMC in the presence of an acid catalyst; (b) a neutralization step wherein after the reaction, the resulting reaction mixture in the form of slurry is neutralized with an alkali while heating to convert the slurry to a solution; (c) a primary crystallization and filtration step wherein the resulting solution is cooled and the resulting phenol adduct crystals of BPTMC are collected by filtration; (d) a secondary crystallization and filtration step wherein the adduct crystals obtained in the primary crystallization and filtration step are heated in a crystallization solvent to dissolve the crystals therein to prepare a solution and then the solution is cooled to crystallize BPTMC out of the solution, followed by collecting the crystals of
    Type: Grant
    Filed: March 7, 2003
    Date of Patent: January 6, 2004
    Assignee: Honshu Chemical Industry Co., Ltd.
    Inventors: Kazuhiko Yao, Kenji Ekawa, Yoichiro Isota, Toru Nakaguchi
  • Patent number: 6673973
    Abstract: A process for production of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane which comprises reacting phenol with 3,3,5-trimethylcyclohexanone in the presence of an acid catalyst, adding an aqueous solution of an alkali to the resulting reaction mixture to neutralize it, removing a water phase from the thus neutralized reaction mixture, cooling the resulting oil phase to crystallize phenol adduct crystals of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane while obtaining a primary crystallization filtrate, wherein the primary crystallization filtrate is heated to a temperature of 150-250° C. in the presence of an alkali catalyst in an inert gas atmosphere under a reduced pressure to thermally decompose 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane in the primary crystallization filtrate.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: January 6, 2004
    Assignee: Honshu Chemical Industry Co., Ltd.
    Inventors: Kazuhiko Yao, Kenji Ekawa, Yoichiro Isota, Toru Nakaguchi
  • Patent number: 6673974
    Abstract: A process for production of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane which comprises reacting phenol with 3,3,5-trimethylcyclohexanone in the presence of an acid catalyst wherein the reaction of phenol with 3,3,5-trimethylcyclohexanone is started in a slurry comprising phenol adduct crystals of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane and hydrated phenol in the presence of an acid catalyst, and then the reaction is continued in the slurry.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: January 6, 2004
    Assignee: Honshu Chemical Industry Co. Ltd.
    Inventors: Kazuhiko Yao, Kenji Ekawa, Yoichiro Isota, Toru Nakaguchi
  • Patent number: 6669748
    Abstract: The present invention provides a dispersion liquid of silica particles for polishing with a low content of Na ions and also with a content of ions other than Na ions in a prespecified range. This dispersion liquid is a dispersion liquid of silica particles in which the silica particles having the average particle diameter in the range from 5 to 300 nm is dispersed, and a content of Na ions in the silica particle is less than 100 ppm, while a contents of ions other than Na ions is in the range from 300 ppm to 2 weight %.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: December 30, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Manabu Watanabe, Michio Komatsu
  • Patent number: 6664332
    Abstract: A resin composition suitable for forming ink receptive layer of recording sheets and having excellent ink receptivity, feathering prevention, gloss and weatherability, which comprises (A) an oxyalkylene group-containing polyvinyl alcohol resin and (B) a cationic group-containing polyvinyl alcohol resin, wherein a 15% by weight aqueous solution of the resin composition has a transparency according to JIS K 6726 of at least 50%.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: December 16, 2003
    Assignee: The Nippon Synthetic Chemical Industry Co., Ltd.
    Inventor: Masaru Saeki
  • Patent number: 6660380
    Abstract: The invention provides a zinc oxide particle having suppressed surface activity which gives safe and effective UV ray shielding ability (especially at longer wavelengths) to a variety of products such as resin molds, coating compositions or cosmetics, and a process for the production of the same. The zinc oxide particle of the invention has on the surface a cover layer formed of zinc silicate in an amount of 0.5-50% by weight in terms of zinc silicate (Zn2SiO4) relative to the zinc oxide. The zinc oxide particle which contains solid solution iron or cobalt therein as well as a cover layer formed of zinc silicate has effective UV ray shielding ability at much longer wavelengths while it is suppressed in the surface activity.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: December 9, 2003
    Assignee: Sakai Chemical Industry Co., Ltd.
    Inventors: Kuniteru Ishida, Hiroshi Hakozaki, Keita Kobayashi, Keiji Ono
  • Patent number: 6657004
    Abstract: The present invention provides a film for packaging chemical agents, which contains an oxyalkylene unit-containing polyvinyl alcohol resin (A) and a carboxyl-containing polyvinyl alcohol resin (B), and preferably further containing a sulfo-containing polyvinyl alcohol resin (C). This film shows fine solubility in water even after a long-term packaging of an acidic chemical agent or alkaline chemical agent, and is superior in mechanical strength. Thus, the film for packaging chemical agents of the present invention is suitably used for packaging a chemical agent, such as powdered soap, synthetic detergent, agricultural chemical, antibacterial, deodorant, insecticide and the like, which is cast into water when in use.
    Type: Grant
    Filed: May 15, 2001
    Date of Patent: December 2, 2003
    Assignee: The Nippon Synthetic Chemical Industry Co., Ltd.
    Inventor: Tomoyoshi Mizutani
  • Patent number: 6652612
    Abstract: Silica particles for polishing have a three-dimensional polycondensation structure with an average particle diameter in a range from 5 to 300 nm. The silica particles have residual alkoxy groups therein and a carbon content in a range from 0.5 to 5 weight % retained in the residual alkoxy groups.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: November 25, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Kazuhiro Nakayama, Akira Nakashima, Michio Komatsu
  • Patent number: 6653418
    Abstract: There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2′-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.
    Type: Grant
    Filed: August 16, 2002
    Date of Patent: November 25, 2003
    Assignee: Gun EI Chemical Industry Co., Ltd.
    Inventors: Katsuhiro Maruyama, Satoru Yoshida, Satoru Kitano, Hitoshi Mashio
  • Publication number: 20030215734
    Abstract: An object of the present invention is to provide a material which resolves the drawbacks associated with polyimide polymers, and yet retains the advantages offered by conventional polyimide polymers.
    Type: Application
    Filed: January 31, 2003
    Publication date: November 20, 2003
    Applicant: Gun Ei Chemical Industry Co., Ltd.
    Inventors: Takeshi Tsuihiji, Michiyasu Yamazaki
  • Patent number: 6649139
    Abstract: A process for producing a highly purified aqueous hydrogen peroxide solution by removing silicon oxide impurities from an aqueous hydrogen peroxide solution containing silicon oxide impurities by adding a flocculating agent and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter bringing the aqueous hydrogen peroxide solution into contact with an anion exchange resin in a fluoride ion form by at least one fluoride compound which contains 0.05% by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: November 18, 2003
    Assignee: Santoku Chemical Industries Co., Ltd.
    Inventors: Fujio Tanaka, Takashi Adachi, Kazuhisa Mine, Kazuya Kimura
  • Patent number: 6645896
    Abstract: A dielectric ceramic composition for high frequency is obtained by using La and/or Nd in the main composition and iron as the additive. The main composition is expressed by the general formula x(CayTiO2+y)·(1−x)(LnzAl2−zO3) where Ln is at least one rare earth element containing La and/or Nd, and 0.600≦x≦0.730, 0.950≦y≦1.050, 0.980≦z≦1.030, and 0.01 to 0.5 parts by weight of iron as Fe2O3 is added to 100 parts by weight of the main composition. NiO may be comprised together with the Fe2O3.
    Type: Grant
    Filed: November 23, 2001
    Date of Patent: November 11, 2003
    Assignee: Hayashi Chemical Industry Co., Ltd.
    Inventors: Susumu Okamoto, Yoshitaka Nagamori, Toshiaki Maeoka
  • Patent number: 6646087
    Abstract: A method of manufacturing an ethylene-vinyl acetate copolymer is provided which suppresses the formation of scale and gelled product. In a continuous polymerization of ethylene and vinyl acetate in a polymerizing vessel with a cooling jacket and/or coil, the heat transfer area of the jacket and/or coil and the polymerizing calorific value per hour satisfy the following formula: A<Q/2000 wherein A is the heat transfer area (m2) and Q is the calorific value (kcal/hr) for polymerization.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: November 11, 2003
    Assignee: Nippon Synthetic Chemical Industry Co., Ltd.
    Inventor: Yoshiharu Nagao
  • Patent number: 6641866
    Abstract: The present invention relates to a manufacturing process of a coated granular sodium percarbonate, wherein the surface of said sodium percarbonate establishes a multiple coating layer by being internally coated with a specific composition containing alkali metal silicate while externally coated with a specific composition containing alkali metal sulfate on upper part of said internally coated layer thus providing said sodium percarbonate an excellent dissolving rate in water as well as a good storage stability, preventing it from caking during delivery or storage, and being ultimately utilized as an effective detergent bleach containing zeolite as its detergent builder.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: November 4, 2003
    Assignee: Oriental Chemical Industries Co., Ltd.
    Inventors: Sang Hwa Lee, Yong Il Kim, Sun Ki Shur, Jong Pill Lee
  • Publication number: 20030201010
    Abstract: A photovoltaic cell includes a first substrate having on its surface a first electrode layer having on its surface a semiconductor film on which a photosensitizer is adsorbed, and a second substrate having on its surface a second electrode layer. The first and second substrates are arranged so that the first electrode layer overlaid with the semiconductor film and the second electrode layer are opposite each other with an electrolyte disposed therebetween. Spacer particles are interposed between the semiconductor film and the second electrode layer, and at least one of the electrode-layer-having substrates is transparent. A coating liquid for forming the semiconductor film includes both a component for forming the semiconductor film as well as the spacer particles, dispersed in a dispersion medium.
    Type: Application
    Filed: April 24, 2003
    Publication date: October 30, 2003
    Applicant: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Tsuguo Koyanagi, Michio Komatsu
  • Patent number: 6639015
    Abstract: A coating liquid for forming a silica-containing film with a low-dielectric constant, which enables the formation of a low-density film having a dielectric constant as low as 3 or less and having excellent resistance to oxygen plasma and process adaptation but also in the adhesion to a substrate and film strength, is provided. The coating liquid for forming a silica-containing film with a low-dielectric constant comprises a polymer composition mainly constituted by (i) a polysiloxane and (ii) a readily decomposable resin, said polysiloxane being a reaction product between fine particles of silica and a hydrolyzate of at least one alkoxysilane represented by the following formula (I): XnSi(OR)4−n  (I),  wherein X represents a hydrogen atom, a fluorine atom, an unfluorinated or fluorinated alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; and n is an integer of 0 to 3.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: October 28, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Akira Nakashima, Michio Komatsu