Patents Assigned to Chemicals Industries Co., Ltd.
  • Patent number: 6599846
    Abstract: The present invention provides a method for forming a silica-containing film with a low-dielectric constant of 3 or less on a semiconductor substrate steadily, which comprises steps of (a) applying a coating liquid for forming the silica-containing film with the low-dielectric constant onto the semiconductor substrate, (b) heating the thus coated film at 50 to 350° C., and then (c) curing the thus treated film at 350 to 450° C. in an inert-gas atmosphere containing 500 to 15,000 ppm by volume of oxygen, and also provides a semiconductor substrate having a silica-containing film formed by the above method. The above step (b) for the thermal treatment is preferably conducted at 150 to 350° C. for 1 to 3 minutes in an air atmosphere. Also, the above curing step (c) is preferably conducted by placing the semiconductor substrate on a hot plate kept at 350 to 450° C.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: July 29, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Michio Komatsu, Akira Nakashima, Miki Egami, Ryo Muraguchi
  • Patent number: 6592975
    Abstract: A laminated packaging material which comprises at least three layers of polymer materials comprising a surface layer, one or more intermediate layers adjacent thereto, and another surface layer, characterized in that the intermediate layer adjacent to each surface layer contains a lubricant, at least one of the intermediate layers has gas-barrier properties, and the total amount of a lubricant in the two surface layers is smaller than that in the intermediate layer(s) adjacent thereto. In production of the packaging material, adhesion of a lubricant to a die lip is reduced. The laminated packaging material has excellent transparency and gloss.
    Type: Grant
    Filed: June 22, 2000
    Date of Patent: July 15, 2003
    Assignee: Kureha Chemical Industry Co., Ltd.
    Inventors: Takahisa Ueyama, Tadayoshi Itoh, Hisanori Tobita
  • Patent number: 6592700
    Abstract: The present invention relates to a method for preparing retro-reflective sheet with high abrasion resistance produced by initially coating the first coating layer one component type polyurethane (hereinafter refer to PU) resin mixed with reflective particles on the pattern releasing paper with embossed grain, and after drying, further coating the second layer two component type PU resin adhesive agent containing colorant, then drying; above this, coating a kind of paste; finally, adhering substrate; after pre-drying and curing, divesting releasing paper, using solvent to solve the part of PU resin leaving reflective particles exposed and hardened. The material produced characterized in high abrasion resistance and using soft material as substrate. Use of the retro-reflective material produced by the invention is valuable for commercial fields like coat, vest, shoes, cap, poster, and the like.
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: July 15, 2003
    Assignee: San Fang Chemical Industry Co., Ltd.
    Inventors: Ching-Tang Wang, Mong-Ching Lin, Chih-Chen Lin, Yung-Hsiang Chou
  • Patent number: 6592645
    Abstract: A process for the production of fine powder of metallic nickel which comprises a first step of dissolving nickel carbonate and/or nickel hydroxide in aqueous ammonia or in an aqueous solution of ammonia and at least one selected from the group consisting of ammonium carbonate, ammonium hydrogencarbonate, a carbonate of an alkali metal and a hydrogencarbonate of an alkali metal to prepare an aqueous solution of a nickel salt; converting the aqueous solution of a nickel salt to a W/O emulsion, and then removing volatile components including ammonia from the droplets to form precipitates of nickel carbonate in the droplets, thereby providing fine spherical particles of nickel carbonate; and a second step of heating the particles of nickel carbonate in the presence of a fusion preventive agent that is a compound of at least one element selected from the group consisting of alkaline earth elements, aluminum, silicon and rare earth elements in an atmosphere of hydrogen, thereby reducing the nickel carbonate to meta
    Type: Grant
    Filed: July 18, 2001
    Date of Patent: July 15, 2003
    Assignee: Sakai Chemical Industry Co., Ltd.
    Inventors: Hideto Mizutani, Minoru Yoneda, Toshihiro Sugaya, Hiroyoshi Urasumi, Chiyo Honda, Hiroshi Nakao, Tsutomu Hatanaka, Shinji Ohgama, Kiyoshi Fukai, Kazuhiko Nagano, Shigefumi Kamisaka, Kazunobu Abe
  • Patent number: 6586104
    Abstract: A coating liquid for forming a transparent coating comprising fine particles of an inorganic compound and a hydrolyzate of an organosilicon compound represented by the general formula (I): RnSi(OR′)4−n  (I) wherein R and R′ represent organic groups which may be identical to each other or different from each other, and n is an integer of 1 to 3. This coating liquid ensures excellent substrate wettability and compatibility with various organic solvents so that the printability and applicability thereof are desirable, with the result that a transparent coating film of high uniformity, for example, a flattening coating film, can be formed. The present invention comprises a substrate having a transparent coating film formed on the substrate surface from the above coating liquid.
    Type: Grant
    Filed: February 23, 1998
    Date of Patent: July 1, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Masayuki Matsuda, Nobuaki Yoshida, Tsuguo Koyanagi, Michio Komatsu
  • Publication number: 20030118581
    Abstract: An adsorbent for an oral administration, comprising a porous spherical carbonaceous substance wherein a diameter is 0.01 to 1 mm, a specific surface area determined by a BET method is 700 m2/g or more, a volume of pores having a pore diameter of 20 to 15000 nm is from not less than 0.04 mL/g to less than 0.10 mL/g, a total amount of acidic groups is 0.30 to 1.20 meq/g, and a total amount of basic groups is 0.20 to 1.00 meq/g, is disclosed.
    Type: Application
    Filed: October 10, 2002
    Publication date: June 26, 2003
    Applicant: KUREHA CHEMICAL INDUSTRY CO., LTD.
    Inventors: Naohiro Sonobe, Michihito Ise, Susumu Morimoto, Hideyuki Yamato, Satoshi Mitsuhashi, Haruhisa Hayashi
  • Patent number: 6583118
    Abstract: A chondroprotective agent comprising a flavonoid compound of the general formula (I): wherein R1 to R9 are, independently, a hydrogen atom, hydroxyl group, or methoxyl group and X is a single bond or a double bond, or a stereoisomer thereof, or a naturally occurring glycoside thereof is disclosed. The above compound strongly inhibits proteoglycan depletion from the chondrocyte matrix and exhibits a function to protect cartilage, and thus, is extremely effective for the treatment of arthropathy.
    Type: Grant
    Filed: February 24, 1997
    Date of Patent: June 24, 2003
    Assignee: Kureha Chemical Industry Co., Ltd.
    Inventors: Koju Watanabe, Koichi Niimura, Kiyonori Umekawa
  • Patent number: 6583339
    Abstract: A series of independent technical systems including a combination of mutation methods such as cellular mutation, ultraviolet irradiation, X-ray irradiation or the like, formation and use of shoot primordium and selection of mutated cells are employed to produce genetic mutation in Manilagrass and obtain Manilagrass that retains its green leaves in winter while producing substantially no anthocyanins under normal cultivating conditions, Manilagrass that has a high stolon density, and dwarfed Manilagrass; the newly invented completely novel genotypes are used to obtain new Eragrostoideae plants.
    Type: Grant
    Filed: August 23, 2000
    Date of Patent: June 24, 2003
    Assignee: Kaisui Chemical Industry Co., Ltd.
    Inventor: Itsuki Tsunemori
  • Patent number: 6580026
    Abstract: A photovoltaic cell including a first substrate having on its surface a first electrode layer having on its surface a semiconductor film on which a photosensitizer is adsorbed, and a second substrate having on its surface a second electrode layer. The first and second substrates are arranged so that the first electrode layer overlaid with the semiconductor film and the second layer are opposite each other with an electrolyte layer disposed therebetween. The electrolyte layer includes an electrolyte and a liquid crystal and at least one of the electrode-layer-having substrates is transparent.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: June 17, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Tsuguo Koyanagi, Michio Komatsu
  • Patent number: 6576765
    Abstract: The present invention provides a process for producing an amic acid ester represented by the following general formula (7) (wherein A is substituted or unsubstituted lower alkylene or the like; R1 is substituted or unsubstituted lower alkyl or the like; and R3 is hydrogen or lower alkyl), which process comprises reacting, in the presence of water, an amino acid represented by formula (1) with a halogenated carbonic acid ester represented by formula (2) (wherein X is halogen) to form an amide compound represented by formula (3), then reacting the amide compound with a halogenated carbonic acid ester represented by formula (4) (wherein R2 is substituted or unsubstituted lower alkyl or the like; and X is halogen) to form, in the system, a mixed acid anhydride represented by formula (5), and reacting the mixed acid anhydride with an amine compound represented by formula (6) (wherein Het is substituted or unsubstituted heterocyclic).
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: June 10, 2003
    Assignee: Ihara Chemical Industry Co., Ltd.
    Inventor: Keisuke Isozumi
  • Patent number: 6576631
    Abstract: A pyrimidinylbenzimidazole or triazinylbenzimidazole derivative represented by the general formula (I): wherein A is N or CR3, and R1, R2, R3, X, Y and n are as defined in the disclosure.
    Type: Grant
    Filed: May 8, 2001
    Date of Patent: June 10, 2003
    Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.
    Inventors: Masaru Shibata, Kiyoshi Kawai, Takechi Makihara, Norihisa Yonekura, Takehiro Kawashima, Junetsu Sakai, Norimichi Muramatsu
  • Patent number: 6576733
    Abstract: This invention provides a curable composition capable of giving cured products drastically improved in resilience. This composition includes (A) an oxypropylene polymer having at least one silicon atom-containing group with a hydroxyl group or a hydrolyzable group bound to the silicon atom and having an Mw/Mn ratio of not more than 1.6 and a number average molecular weight of not less than 6,000, (B) an organic carboxylic acid salt of divalent tin and (C) an organic amine compound.
    Type: Grant
    Filed: March 20, 1997
    Date of Patent: June 10, 2003
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Masayuki Fujita, Michihide Homma, Hiroshi Wakabayashi
  • Patent number: 6565846
    Abstract: A method for screening a bacterium antagonistic to pathogenic bacteria that emerge during raising of seedlings of gramineous plants utilizing tropolone resistance and tropolone non-producing property as indices, and a microbial pesticide containing as an active ingredient the bacterium that has tropolone resistance and tropolone non-producing property selected by the screening method or spores thereof.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: May 20, 2003
    Assignee: Kureha Chemical Industry Co., Ltd.
    Inventor: Hideaki Tateishi
  • Patent number: 6565858
    Abstract: A human ADAMTS-1 protein, a gene encoding the same, a pharmaceutical composition containing the protein as an active ingredient, and a method for immunologically analyzing the human ADAMTS-1 protein are disclosed. The protein can decrease the number of leukocytes and platelets, and at the same time, increase the number of erythrocytes.
    Type: Grant
    Filed: December 3, 1999
    Date of Patent: May 20, 2003
    Assignee: Kureha Chemical Industry Co., Ltd.
    Inventors: Kunitaka Hirose, Eiji Inoguchi, Michinori Hakozaki, Keiko Ishioka, Yukako Ishida, Kouji Matsushima, Kouji Kuno
  • Publication number: 20030089276
    Abstract: The present invention provides amorphous inorganic particles as a dental material comprising silica and inorganic oxide(s) other than silica and having high x-ray impermeability. The inorganic particles as a dental material comprise silica with the content in the range from 70 to 98 weight % and oxide(s) of one or more elements selected from the group consisting of Zr, Ti, La, Ba, Sr, Hf, Y, Zn, AL, and B, wherein 5 to 70 weight % of the silica is originated from an acidic silicic acid solution and 30 to 95 weight % of the silica is originated from a sol of silica. This inorganic particles as a dental material have average particle diameter in the range from 1 to 10 &mgr;m, specific surface area in the range from 50 to 350 m2/g, pore volume in the range from 0.05 to 0.5 ml/g, amorphous crystallinity as observed by x-ray diffraction, and the refractive index in the range from 1.47 to 1.60.
    Type: Application
    Filed: November 12, 2002
    Publication date: May 15, 2003
    Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.
    Inventors: Hiroyasu Nishida, Noboru Senju, Michio Komatsu
  • Publication number: 20030089045
    Abstract: Silica particles for polishing to planarize a surface of a substrate without generating scratches, having the average particle diameter in the range from 5 to 300 nm, carbon content in the range from 0.5 to 5 weight %, and 10%-compressive elasticity modulus in the range from 500 to 3000 kgf/mm2. When the carbon content in the silica particles is less than 0.5 weight %, there is no residual alkoxy group and siloxane bonding proceeds, so that the obtained particles are hard. In that case, although the polishing rate is high, scratches remain or are generated anew after polishing, and planarity of the polished surface is insufficient. On the other hand, when the carbon content is over 5 weight %, many residual alkoxy group are contained in the particles, so that the particles are relatively soft and a sufficient polishing rate can not be achieved.
    Type: Application
    Filed: November 12, 2002
    Publication date: May 15, 2003
    Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.
    Inventors: Kazuhiro Nakayama, Akira Nakashima, Michio Komatsu
  • Patent number: 6562323
    Abstract: A composite powder prepared by coating a ramentaceous substrate with at least two color layers. A difference between the maximum value and the minimum value of the ab hue angle hab (hmax−hmin) as defined in the recommendation on uniform color space by CIE is in the range from 10° to 180°. A ratio of the maximum value vs the minimum value of the brightness L* as defined in the recommendation is in the range from 1.0 to 2.0. According to the viewing angle, the color tone of the composite powder changes.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: May 13, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Takumi Miyazaki, Hirokazu Tanaka
  • Patent number: D475810
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: June 10, 2003
    Assignee: Chao Ling Chemical Industry Co., Ltd
    Inventor: Chin Chun Lai
  • Patent number: D478191
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: August 5, 2003
    Assignee: Chao Ling Chemical Industry Co., Ltd.
    Inventor: Chin Chun Lai
  • Patent number: D478192
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: August 5, 2003
    Assignee: Chao Ling Chemical Industry Co., Ltd.
    Inventor: Chin Chun Lai