Abstract: The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).

Abstract: The present invention provides a process for the separation and removal of iron ions from a basic zinc solution. The process involves: treating an aqueous basic zinc solution with a solid ion exchange resin containing an insoluble cross-linked polymer which contains at least one pendant phosphonate group, at a pH of from about 8 to about 12, and a temperature of from about 10° C. to about 90° C., for a time period sufficient to form solid phase-bound iron ions and a liquid phase containing the aqueous basic zinc solution having an iron ion concentration that is substantially reduced; separating the solid phase-bound iron ions and the liquid phase; and treating the solid phase-bound iron ions with an aqueous acidic solution under conditions sufficient to regenerate the solid ion exchange resin. The present invention also provides a process for preparing zinc oxide that is substantially free of iron ions.

Abstract: (Co)poly-&agr;-hydroxyacrylic-acid-based polymers (P), optionally in lactonized form or in salt form, optionally as Mg-complexes, and which are characterized by a content in carbohydrate units and 2-hydroxy-2-carboxyethylene-1,2 monomer units, are suitable as biologically degradable, alkali-resistant stabilizers for peroxide bleaching agents.

Abstract: The present invention is to provide a coating composition capable of forming a protective film excellent in adhesion properties. Such a coating composition comprises a specific polymer containing carboxyl group, a specific multifunctional epoxide-containing compound having two or more epoxy groups, an organic solvent, and an amino-containing silane coupling agent represented by the following general formula (I): H2N—R1—Si—(OR2)3  (I) wherein, R1 is an unsubstituted alkylene group, and R2's are independently an unsubstituted alkyl group.

Abstract: The invention relates to a stabilizer composition comprising at least one processing stabilizer selected from special phosphite, mono- and diphosphonite compounds, at least one acid scavenger selected from the group consisting of selected metal stearates, hydrotalcites, oxides, hydroxides of alkaline earth metals, at least one UV stabilizer selected from compounds containing at least one 2,2,6,6-tetraalkylpiperidinyl-group and optionally at least one sterically hindered phenolic antioxidant. A further subject matter of the invention is a solid masterbatch composition or a liquid concentrate comprising above-mentioned stabilizer composition. The invention relates also to a process for stabilizing polymeric materials selected from the group consisting of special polyolefins comprising adding to the polymeric material a stabilizing quantity of said stabilizing composition.

Abstract: A method of producing a sintered article of polybenzimidazole by using a polybenzimidazole resin is disclosed. This method comprises the steps of: filling a mold with a polybenzimidazole resin; after closing the mold so that the polybenzimidazole resin can be densely packed in the mold, heating the mold to a predetermined temperature ranging from 500° C. to 600° C. without applying pressure to the mold from the outside; after increasing the pressure on the mold from 0 kg/cm2 to 50-750 kg/cm2, sintering the polybenzimidazole resin while maintaining the temperature and the pressure for 15 to 200 minutes; cooling the mold; and removing the sintered article of the polybenzimidazole resin from the mold. By this method, sintered articles of polybenzimidazole resins having no weak parts can be obtained in high yields.

Abstract: A process for the preparation of 5′-deoxy-5-fluorouridine, which comprises the transformation of 2′,3′-O-isopropylidene-5-fluorouridine in the corresponding 5′-O-sulfonyl derivative, subsequent reaction with alkaline or earth-alkaline iodides and, after hydrolysis of the isopropylidene group, reduction of the 5′-deoxy-5′-iodo-5-fluorouridine thus obtained, is described.

Abstract: Disclosed are improved solid, colored wax-based article having longer color shelf-life. The invention comprises a synthetic wax, a colorant, and an effective amount of a compound of the formula (1) having symbols defined in the text. The preferred embodiments of the articles contain (1) that exhibits a UV absorptivity greater than or equal to 70 liters per gram-cm. at a wavelength of less than or equal to 400 nm, as measured in either methanol, toluene or chloroform, using a conventional UV spectrophotometer. The uses for the articles include candles, crayons, fertilizer coatings, rosebush coatings, plant grafting, sealants, sun-cracking protection of rubber and plastic products, paper coating, packaging food products, electrical insulation, waterproofing and cleaning compounds, carbon paper, and precision investment casting.

Abstract: A method of forming a minute resist pattern wherein a positive-working photoresist composition containing 3 to 15 parts by weight of a quinone diazide group-containing photosensitizer relative to 100 parts by weight of alkali-soluble novolak resin is developed by an aqueous organic or inorganic alkali solution having a lower alkali concentration than that of the conventional one as the developer. The preferable example of the organic alkali materials in the developer is quaternary ammonium hydroxide, and the preferable example of the inorganic alkali materials in the developer is alkali metal hydroxide. The concentrations of the quaternary ammonium hydroxide and the alkali metal hydroxide in the developing solution are 2.2% by weight or less and 0.4% by weight or less respectively. Using such developing solution, high sensitivity, a high film retention rate, high resolution, low process dependency of dimension accuracy, and a formation of excellent pattern profile can be achieved.

Abstract: A chemically-amplified, negative-acting, radiation-sensitive photoresist composition that is developable in an alkaline medium, the photoresist comprising: a) a phenolic film-forming polymeric binder resin having ring bonded hydroxyl groups; b) a photoacid generator that forms an acid upon exposure to radiation, in an amount sufficient to initiate crosslinking of the film-forming binder resin; c) a crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises an etherified aminoplast polymer or oligomer; d) a second crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises either 1) a hydroxy substituted- or 2) a hydroxy C1-C4 alkyl substituted-C1-C12 alkyl phenol, wherein the total amount of the crosslinking agents from steps c) and d) is an effective crosslinking amount; and e) a photoresist solvent, and a process for producing a microelectro

Abstract: The present invention relates to a cleaner for lithography which is excellent in the ability to dissolve a resist and highly safe to the human body and which can be used usefully to clean a coater such as in a coater cup, to remove an unnecessary resist from a substrate when or after coating of a resist, to remove the resist from the substrate after the object using the resist was achieved, and to clean and rinse the substrate after removal of the resist. The cleaner for lithography comprises a homogeneous solution of at least one organic solvent selected from the group consisting of propylene glycol alkyl ether, propylene glycol alkyl ether acetate, ethylene glycol alkyl ether, ethylene glycol alkyl ether acetate, acetic acid alkyl ester, propionic acid alkyl ester, alkoxypropionic acid alkyl ester, lactic acid alkyl ester, aliphatic ketone, and alkoxybutanol and at least one selected from alcohols having alkyl group with 1 to 4 carbon atoms.

Abstract: The present invention relates to a continuous electrochemical process for preparing zinc powder. The process involves providing to an electrochemical cell a suspension in a 1.25 Molar to 10.0 Molar aqueous alkaline solution of zinc oxide or any other zinc compound that reacts with an aqueous alkaline solution to produce zinc oxide, such that the solution or suspension comprises at least 2 millimoles of solubilized zinc based species per 100 grams of electrolyte. Current is passed to the cell at a current density of about 500 to 40,000 A/m2, for a time period sufficient to electrochemically reduce the solubilized zinc based species to zinc powder, while continuously or intermittently adding a sufficient amount of the zinc oxide or the other zinc compound to the cell to maintain the concentration of the solubilized zinc based species at a level of at least 2 millimoles per 100 grams of electrolyte.

Abstract: Disclosed is an electrochemical process for preparing zinc powder which involves: a) providing to an electrochemical cell a basic solution of zinc oxide or any other zinc compound that reacts with an aqueous base to produce zinc oxide, the basic solution prepared by dissolving the zinc oxide or the other zinc compound in an aqueous 2.5 to 10.0 M base solution; and b) passing current to the cell at a current density of about 10,000 to about 40,000 A/m2 for a time period sufficient to electrochemically reduce the zinc oxide to zinc powder, wherein the electrochemical process has a current efficiency of at least 70% and is substantially free from electrode corrosion.

Abstract: Organic pigments are conditioned by introducing a liquid prepigment suspension into a miniaturized continuous reactor and thermally treating therein.

Abstract: This invention relates to new fluorescent or non-fluorescent dye compounds having a terminal hydroxy, carboxylic acid/ester or amino group and a process for their preparation. The new fluorescent or non-fluorescent dye compounds are useful as colorants for preparing colored synthetic polymer resins with pigmentary properties, for dyeing or printing homo- or mixed synthetic, semi-synthetic or natural polymers or substrates or for preparing inks. The dye compounds provide excellent properties, especially high temperature stability and easy applicability.

Abstract: The invention is directed to an electrophotographic toner or developer, powder coating, ink jet ink or an electronic media having an azo colorant prepared by conducting the diazotization of aromatic or hetaromatic amines or the azo coupling reaction or the diazotization and the azo coupling reaction in a microreactor.

Abstract: A water-soluble resin composition comprising (1) a water-soluble resin, (2) a water-soluble crosslinking agent, (3) at least one of surface active agents selected from acetylene alcohols, acetylene glycols, polyethoxylates of acetylene alcohols and polyethoxylates of acetylene glycols, and (4) a solvent consisting of water or a mixture of water and a water-soluble solvent. This water-soluble resin composition is applied onto a resist pattern, then heated to crosslink by an acid supplied from the resist, followed by development to remove the non-crosslinked water-soluble resin coating layer. This water-soluble resin composition is excellent in coating characteristics on steps of resist patterns and in dimensional regulation upon fining of patterns so that resist patterns such as trench patterns and hole patterns can effectively be fined.

Abstract: Use of a pigment of formula (I) where both R are Cl or COOCH3 for the coloration of polyolefins which do not warp.

Abstract: Process for the yellowing-inhibiting finishing of textile, indigo-dyed, washed and/or stonewashed and/or bleached denim articles, characterized in that the finishing is carried out from aqueous medium with protonated fatty acid ester-aminoamides and/or hydroxyaminoamides of N-(&bgr;-hydroxyethyl)ethylenediamine, in which the fatty acid radicals each contain from 12 to 22 carbon atoms and which have been protonated with at least 1.5 equivalents of ortho-phosphoric acid per equivalent of basic amino groups.

Abstract: A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc.