Abstract: The invention relates to a process of using certain piperidine compounds of formula I ##STR1## in which R.sub.1 is hydrogen, hydroxyl, lower alkyl, lower alkoxy or acyl,R.sub.2 is a substituted or unsubstituted mono- or bicyclic radical which is aromatic in type,R.sub.3 is oxygen, --NH-- or --N(C.sub.1-4 -alkyl)-- andR.sub.8 independently at each occurrence is hydrogen or methylfor stabilizing natural or synthetic, organic or inorganic pigments or pigment mixtures in natural or synthetic, polymeric or prepolymeric substrates against the adverse effects of heat and/or light on the light fastness and color stability, respectively, especially against alterations in shade or light-induced bleaching. The invention also relates to a masterbatch composition.

Abstract: The invention relates to novel compositions of photoreactive, UV-light absorbing, low molecular weight polyalkylpiperidines and non-photoreactive low molecular weight sterically hindered polyalkylpiperidines as well as to masterbatch compositions comprising the novel compositions. The invention relates further to a process for enhancing the light stability of organic material, the stabilized organic material and its use.

Abstract: A dyestuff according to formula (I) ##STR1## or a salt thereof wherein the substituents have the definitions as defined in claim 1.The dyestuffs are useful for dyeing or printing nitrogen-containing or hydroxy-group-containing organic substrates and for the production of printing inks.

Abstract: The present invention provides a method for producing a film forming, fractionated novolak resin, by:a) condensing formaldehyde with one or more phenolic compounds, and thereby producing a novolak resin;b) adding a photoresist solvent, and optionally a water-soluble organic polar solvent;c) feeding the mixture into a liquid/liquid centrifuge and feeding a C.sub.5 -C.sub.8 alkane, water or aromatic hydrocarbon solvent into the liquid/liquid centrifuge at a ratio of optional water-soluble organic polar solvent and photoresist solvent to C.sub.5 -C.sub.8 alkane, water or aromatic solvent, of from 5:1 to 0.5:1;d) rotating the liquid/liquid centrifuge containing the mixture at a speed of at least 500 rpm and thereby separating the mixture into two phases, collecting the two phases;e) optionally separating the lighter phase (L) into two second phases;f) removing residual C.sub.5 -C.sub.

Abstract: The present invention relates to a novel antireflecting coating composition, where the composition comprises a polymer, thermal acid generator and a solvent composition. The invention further comprises processes for the use of such a composition in photolithography. The composition strongly absorbs radiation ranging from about 130 nm (nanometer) to about 250 nm.

Abstract: The present invention relates to an antireflective coating composition comprising an admixture of:a) a polymer defined by the following structure: ##STR1## where, R.sub.1 & R.sub.2 are independently hydrogen, or C.sub.1 to C.sub.5 alkylR.sub.3 is a methyl, ethyl, propyl or butyl groupR.sub.4 -R.sub.7 are independently hydrogen, or C.sub.1 to C.sub.5 alkyln=10 to 50,000(b) a fluorine-containing, sparingly water-soluble (0.1%-10% by weight in water) organic C.sub.3 -C.sub.13 aliphatic carboxylic acid;(c) a non-metallic hydroxide; and(d) a solvent.The invention also relates to a method for producing such an antireflective coating composition and to a method for producing a microelectronic device using such an antireflective coating composition in conjunction with a photoresist composition.

Abstract: A homogeneous blended additive useful as a processing stabilizer for polymers which is a blend of Component (a), a defined phosphite or phosphonite; and Component (b) which is micronized zinc oxide. Component (b) is preferably in an amount of 5 to 10% based on the weight of component (a). This additive composition improves the resistance of phosphites and phosphonites against hydrolysis in the presence of moisture, by providing Component (b) as a hydrolysis stabilizer for Component (a).

Abstract: The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

Abstract: The present invention provides a method for producing a water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin without high temperature distillation. A method is also provided for producing photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.

Abstract: A process for producing a naphthoquinone diazide ester of a phenolic compound that is useful in a photoresist composition, which process comprises providing a naphthoquinone diazide ester solution in an organic polar solvent; adding the resulting naphthoquinone diazide ester solution to a precipitation bath that is maintained at a temperature of from about 0.degree. C. to about -30.degree. C.; and filtering the resulting naphthoquinone diazide ester.

Abstract: Disclosed is a process for stabilizing polyamides against the damage effected by light, heat and/or oxidation while improving the differential dyeability, and processing stability therefore, comprising incorporating therein by melt-processing a synergistic additive system resulting in a uniform and intimate mixture with said polyamide, said additive system is selected from the group consisting of (I), (II) and (III)(I) is from 0.01% to 1% by weight of a sterically hindered phenylphosphonite (Ia) with from 0.05% to 5% by weight of oxanilide (Ib) or said (Ia) together with from 0.05% to 5% by weight of an aromatic di- or tri-carbonyl compound containing at least one, and preferably two hindered amine moieties (Ic);(II) is from 0.05% to 5% by weight of oxanilide (IIa) together with from 0.05% to 5% by weight of a aromatic di- or tri-carbonyl compound (IIb) containing at least one hindered amine moieties;(III) is from 0.01% to 1% by weight of a sterically hindered phenyl phosphonite (Ia), from 0.

Abstract: A polymer that when used with a suitable photoacid generator (PAG) forms a positive working photoresist. The polymer comprises of a tartaric polyanhydride backbone, an acetal protected 1,2 diol group; and a fused ring acetal group pendant to the backbone. The acetal protected .alpha.-hydroxy anhydride backbone structure, undergoes an efficient photoacid catalyzed cleavage, which gives rise to small molecular weight fragments which are readily dissolved in an aqueous base developer. This high contrast in solubility allows high resolution images to be produced. The fused rings offer etch resistance and can be comprised of either an adamantone or norcamphor ring structure. With the addition of a commercially available photo acid generator, the polymer formulation forms a positive working photoresist that offers high contrast and resolution.

Abstract: The claimed process consists in treating the tertiary amine oxide with a sulphite or a bleach activator.

Abstract: The present invention provides for process of preparing a photoactive ester compound of high purity using a solid base catalyst, preferably an anionic exchange resin. The invention further provides for preparing and imaging a photosensitive composition comprising such a photoactive compound, a film-forming resin and a solvent composition.

Abstract: The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such a novolak resin fraction. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

Abstract: Tetrakisazo dyes of formula (I), as defined in claim 1, optionally in admixture with trisazo dyes of formula (X) as defined in claim 4, are valuable anionic dyes for the dyeing of substrates dyeable with anionic dyes, in particular for the dyeing of leather in very intense dark shades.

Abstract: The invention provides a process for the generation of an antireflective bottom layer with effective reduction of substrate reflectivity and swing curve effects in lithographic applications. It involves the use of a suitably selected monomeric and/or polymeric dye which brings the real part of the refractive index into a range which is optimal for the suppression of reflection-related effects. The refractive index change is effected via anomalous dispersion, i.e., by utilizing changes in the real part of the refractive index caused by the bottom layer's absorption.

Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing a specially treated anion exchange resin. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.

Abstract: A process for producing a deionizing resin, which comprises reacting an organic compound having at least one reactive hydroxy group and at least one active chelating site with an organic polymer matrix having at least one reactive --OH or --NH.sub.2 group, and thereby producing a chelated.sub.-- polymer complex, as shown in FIG. II or FIG. IV: ##STR1## Washing the polymer complex with water, followed by washing with a mineral acid solution and then again washing with water and thereby reducing the level of sodium, iron and chromium ions in the polymer complex to less than 100 ppb each.

Abstract: Mixtures of 2:1 Aluminium complexes of the type (Ic) are useful as solvent dyes.