Patents Assigned to Daikin Kogyo Co., Ltd.
  • Patent number: 4451616
    Abstract: A process for preparation of filler-containing polytetrafluoroethylene fine powder by coagulating polytetrafluoroethylene together with at least one filler selected from the group consisting of polyimide resins, polyamide-imide resins, polyamide resins and carbon fiber powders from their aqueous dispersion, characterized in that a water-insoluble organic liquid having a boiling point of from 30.degree. to 150.degree. C. and a surface tension of not more than 35 dyne/cm at 20.degree. C. is added to the aqueous dispersion under agitation at any stage from the start to the end of the coagulation.
    Type: Grant
    Filed: July 24, 1980
    Date of Patent: May 29, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shoji Kawachi, Toshinori Kadowaki, Katsutoshi Yamamoto
  • Patent number: 4447663
    Abstract: Continuous fluorination of carbon is carried out by employing an apparatus for contact reaction of solid powder and reactive gas which comprises a horizontal reactor having a trough provided with weirs (e.g. height: 1 to 6 mm., interval: 5 to 30 cm.) and a vibrating means for vibrating the trough, and in which carbon particles supplied continuously are transported on the trough in a form of thin layer by the vibration of the trough while continuing the reaction by contacting efficiently the carbon particles with a fluorine gas. The contact reaction is efficiently conducted without accumulating the reaction heat to produce the fluorinated carbon in high yields, and the process is useful for the mass production. The apparatus is also useful for various contact reaction of a solid powder and a reactive gas.
    Type: Grant
    Filed: March 1, 1982
    Date of Patent: May 8, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Toru Akiyama, Tsutomu Kamihigoshi, Shoji Takagi, Tadayuki Maeda
  • Patent number: 4440879
    Abstract: A process for preparing filler-containing polytetrafluoroethylene fine powder which comprises mixing together an aqueous dispersion of particles of polytetrafluoroethylene and an aqueous dispersion of particles of a filler adsorbed with polyvalent cation at the surfaces so as to be charged positively in the presence of an anionic surfactant and a water-immiscible organic liquid to coagulate the polytetrafluoroethylene particles and the filler particles in combination and recovering the coagulated particles from the resultant dispersion mixture, said filler particles being per se chargeable negatively in water.
    Type: Grant
    Filed: February 18, 1981
    Date of Patent: April 3, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shoji Kawachi, Katsutoshi Yamamoto, Shinichiro Kai
  • Patent number: 4434844
    Abstract: A cross-fin coil type heat exchanger wherein a multiplicity of raised fins of the louver type are formed on the major portion of the surface of a convoluted fin base plate and the area of the portion of the fin base plate reduced in heat transfer performance is minimized, to improve the heat transfer effects achieved by the fins. Means is provided to inhibit the growth of a boundary layer by the front edge effect of the raised fins and promote the conversion of a current of a heat exchange fluid. Ribs are formed in the fins remote from heat transfer tubes to further promote the conversion of the current of the heat exchange fluid into a turbulent flow and also to reinforce the fins. The raised fins of the louver type have a construction that tends itself to good draining, to avoid an increase in the resistance offered to the passage of the current of the heat exchange fluid in wet condition.
    Type: Grant
    Filed: August 4, 1981
    Date of Patent: March 6, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Katsumi Sakitani, Shigehiro Uemura, Ryuzaburo Yajima
  • Patent number: 4428854
    Abstract: An absorption refrigerant composition for use in absorption refrigeration systems comprising 1,1,1,2-tetrafluoroethane and an organic solvent capable of dissolving the ethane.
    Type: Grant
    Filed: November 15, 1982
    Date of Patent: January 31, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Naonori Enjo, Hideki Aomi
  • Patent number: 4428851
    Abstract: A volatile oil composition for use in metal working comprising a base oil and at least one halogenated hydrocarbon.
    Type: Grant
    Filed: December 1, 1981
    Date of Patent: January 31, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Iwao Hisamoto, Chiaki Maeda, Yukio Omure
  • Patent number: 4427803
    Abstract: A mold release composition consisting essentially of:(A) a fluorine-containing polyether comprising 3-perfluoroalkyl-1,2-epoxypropane having the formula ##STR1## wherein R.sub.f represents a perfluoroalkyl group containing from 5 to 13 carbon atoms and(B) at least one additive selected from the group consisting of a silicone oil, silicone varnish, a wax and a highly fluorinated organic compound having a boiling point above 100.degree. C.
    Type: Grant
    Filed: May 3, 1983
    Date of Patent: January 24, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shoshin Fukui, Masayoshi Shinjo, Hirokazu Aoyama
  • Patent number: 4424325
    Abstract: A copolymer comprising (a) a monomer having a C.sub.7 to C.sub.21 perfluoroalkyl or perfluoroalkenyl group at one end of the molecule and an ethylenically unsaturated group at the other end of the molecule, and (b) a monomer having a photosensitive group, e.g. an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group or .alpha.,.beta.-unsaturated ketone group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for various purposes, e.g. as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.
    Type: Grant
    Filed: May 20, 1981
    Date of Patent: January 3, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Takahiro Tsunoda, Tsuguo Yamaoka, Sinji Tamura
  • Patent number: 4421843
    Abstract: A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment.
    Type: Grant
    Filed: January 6, 1983
    Date of Patent: December 20, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shuzo Hattori, Shinzo Morita, Tsuneo Fujii
  • Patent number: 4421842
    Abstract: A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment.
    Type: Grant
    Filed: January 6, 1983
    Date of Patent: December 20, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shuzo Hattori, Shinzo Morita, Tsuneo Fujii
  • Patent number: 4409354
    Abstract: The present invention relates to a fluorinated resin coating composition comprising (a) a fluorinated resin, (b) micaceous iron oxide and (c) a liquid carrier. When the composition of the invention is used as a primer, an auxiliary agent for adhesion is necessitated as the supplemental component in addition to the components (a), (b) and (c). The composition of the invention can afford an excellent wear-resistance and is especially suitable for coating of inner surfaces of cooking utensils. The scratch-resistance of the coating film formed on a cooking utensil is greatly improved especially when the composition is employed for top coating. Sufficient improvement can be also attained in case of using the composition of the invention as a primer.
    Type: Grant
    Filed: September 1, 1981
    Date of Patent: October 11, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Mutsusuke Namba, Seisuke Suzue, Toshio Mizuno, Yoshiaki Kataoka
  • Patent number: 4402717
    Abstract: An apparatus for removing moisture and odors comprising a cylindrical honeycomb structure made by corrugation from paper uniformly containing an adsorbent, including a multiplicity of parallel gas passageways and having deposited thereon a water absorbent at least at one side thereof serving as an outlet for the gas to be treated, a number of the gas passageways being separated as a dehumidifying and deodorizing zone from the other passageways serving as a regenerating zone, the dehumidifying and deodorizing zone being continuously shiftable throughout the entire honeycomb structure circumferentially thereof to render the honeycomb structure serviceable, from portion to portion, as the dehumidifying and deodorizing zone provided by the number of passageways.
    Type: Grant
    Filed: May 22, 1980
    Date of Patent: September 6, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Masanori Izumo, Kenji Mikami, Keiichiro Kametani
  • Patent number: 4400563
    Abstract: A process for preparing perfluoro(lower)alkylbenzenes and derivatives thereof which comprises contacting a lower alkylbenzene or the corresponding derivative with hydrogen fluoride in the presence of chlorine in the gaseous phase at an elevated temperature to give the corresponding perfluoro(lower)alkylbenzene or its derivative thereof.
    Type: Grant
    Filed: June 20, 1979
    Date of Patent: August 23, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Yohnosuke Ohsaka, Uji Hiramatsu, Toshihide Honda
  • Patent number: 4393231
    Abstract: Fluorine-containing phenyl benzoate compounds which have the general formula: ##STR1## wherein R is a C.sub.1 -C.sub.12 perfluoroalkyl group, a C.sub.1 -C.sub.12 alkyl group, a C.sub.1 -C.sub.12 alkoxy group, a C.sub.2 -C.sub.13 alkanoyloxy group, a C.sub.2 -C.sub.13 alkoxycarbonyl group, a C.sub.2 -C.sub.13 alkoxycarbonyloxy group or a C.sub.2 -C.sub.13 alkyldioxycarbonyl group and X is a C.sub.1 -C.sub.12 alkyl group, a C.sub.1 -C.sub.12 alkoxy group, a cyano group, a trifluoromethyl group or a nitro group with the proviso that X is trifluoromethyl when R is other than perfluoroalkyl are useful as components of liquid crystals.
    Type: Grant
    Filed: September 11, 1981
    Date of Patent: July 12, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Susumu Misaki, Masahiro Suefuji, Tamio Mitote, Naotake Matsumura
  • Patent number: 4393257
    Abstract: A process for preparing benzotrifluoride or derivatives thereof by contacting benzotrichloride or the corresponding derivatives with hydrogen fluoride in a gaseous phase in the absence of any catalyst, the contact being carried out in the presence of chlorine at an elevated temperature so as to accelerate the reaction rate.
    Type: Grant
    Filed: June 20, 1979
    Date of Patent: July 12, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Tsuneo Nakagawa, Uji Hiramatsu, Toshihide Honda
  • Patent number: 4390740
    Abstract: Monofluorobenzene is prepared in a good yield by reacting cyclopentadiene or its dimer of the formula: ##STR1## with fluorohalomethane of the formula:CHFX.sub.2wherein Xs are, same or different, halogen atoms in the presence of a phase transfer catalyst and an acid acceptor.
    Type: Grant
    Filed: December 10, 1981
    Date of Patent: June 28, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Iwao Tabushi, Kazuhiro Shimokawa, Daiji Naito, Susumu Misaki, Tsutomu Yoshida
  • Patent number: 4387168
    Abstract: An adhesive composition comprising a low molecular weight fluorine-containing elastomer and fibrillated polytetrafluoroethylene, which is excellent in chemical resistance and weather resistance.
    Type: Grant
    Filed: September 25, 1981
    Date of Patent: June 7, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventor: Shigeru Morita
  • Patent number: 4383932
    Abstract: A water removing composition suitable for use in treating solid surfaces which comprises (a) a halogenated hydrocarbon solvent, (b) at least one member selected from the group consisting of amines having an oxyalkylene group, their salts with an organic acid of the formula, R.sup.1 COOH, HOOCR.sup.2 COOH, R.sup.1 SO.sub.3 H, R.sup.1 OPO.sub.3 H or (R.sup.1 O).sub.2 PO.sub.2 H, wherein R.sup.1 is an alkyl group having 1 to 20 carbon atoms which may be substituted with a hydroxyl group or an alkylphenyl group having 7 to 26 carbon atoms and R.sup.2 is an alkylene group having 1 to 10 carbon atoms, and quaternary ammonium salts composed of an ammonium having an oxyalkylene group and an acid radical of the above-mentioned organic acids, and (c) at least one substituted amine salt with dialkyl sulfosuccinate of the formula ##STR1## wherein R.sup.1 is as defined above, and R.sup.3, R.sup.4 and R.sup.
    Type: Grant
    Filed: November 4, 1977
    Date of Patent: May 17, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Iwao Hisamoto, Chiaki Maeda, Yukio Omure, Takashi Onishi
  • Patent number: 4382985
    Abstract: A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment.
    Type: Grant
    Filed: October 9, 1981
    Date of Patent: May 10, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shuzo Hattori, Shinzo Morita, Tsuneo Fujii
  • Patent number: RE31341
    Abstract: Polytetrafluoroethylene fine powders which have an average molecular weight of not less than 5,000,000, preferably not less than 5,500,000, an amorphous index of not more than 0.1, preferably not more than 0.09, a number average primary particle size of 0.1 to 0.4 micron, preferably 0.15 to 0.38 micron, and a sharp endothermic peak at a temperature between 343.degree. C. and 350.degree. C. on the melting diagram by a differential scanning calorimeter, said sharp peak having an endothermic ratio of not more than 0.3, preferably not more than 0.27, and a half value width of the endothermic peak of not more than 8 degrees, preferably not more than 6 degrees, and a process for producing the polytetrafluoroethylene fine powders. The polytetrafluoroethylene fine powders have an excellent stretchability and are useful for electric wire coating, small diameter tubes, large diameter tubes, sealing tapes and the like.
    Type: Grant
    Filed: June 25, 1981
    Date of Patent: August 9, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shun Koizumi, Shigeru Ichiba, Tetsuo Shimizu, Chuzo Okuno, Tosinori Kadowaki, Katsutoshi Yamamoto